JP2019516900A - 空気圧駆動式分注ユニットのソレノイド弁を用いて基板上に材料を分注する方法 - Google Patents
空気圧駆動式分注ユニットのソレノイド弁を用いて基板上に材料を分注する方法 Download PDFInfo
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- JP2019516900A JP2019516900A JP2018558677A JP2018558677A JP2019516900A JP 2019516900 A JP2019516900 A JP 2019516900A JP 2018558677 A JP2018558677 A JP 2018558677A JP 2018558677 A JP2018558677 A JP 2018558677A JP 2019516900 A JP2019516900 A JP 2019516900A
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- 238000000034 method Methods 0.000 title claims abstract description 33
- 239000000758 substrate Substances 0.000 title claims abstract description 25
- 239000000463 material Substances 0.000 title claims abstract description 17
- 238000010792 warming Methods 0.000 claims abstract 3
- 239000011345 viscous material Substances 0.000 claims description 9
- 230000004913 activation Effects 0.000 abstract 1
- 230000004044 response Effects 0.000 description 14
- 230000008901 benefit Effects 0.000 description 8
- 238000004804 winding Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 4
- 230000000737 periodic effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000004075 alteration Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
- B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
- F16K31/00—Actuating devices; Operating means; Releasing devices
- F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
- F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
- F16K31/0675—Electromagnet aspects, e.g. electric supply therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/565—Moulds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/13—Moulding and encapsulation; Deposition techniques; Protective layers
- H05K2203/1305—Moulding and encapsulation
Abstract
Description
サイクル周波数→消散する電力→コイル温度→巻線抵抗→ソレノイド応答
12 電子基板
14 分注ユニット
16 分注ユニット
18 コントローラー
20 フレーム
22 支持体
24 分注ユニットガントリー
26 計量器
28 ディスプレイユニット
30 視覚システム
32 視覚システムガントリー
40 アクチュエーター制御回路
42 ソレノイドコイル
44 ソレノイド弁
46 電流制御増幅器
48 フィルター構成要素
50 空気弁
52 エアシリンダ
54 ピストン
56 弁座
Claims (11)
- 基板上に材料を分注するために使用される分注ユニットを制御する方法において、
空気圧駆動式ポンプのソレノイドコイルを分注システムの増幅器の出力に接続し、
前記増幅器で前記ソレノイドコイルを駆動して、前記空気圧駆動式ポンプによって基板上に材料を分注するようにした方法。 - 非活動期間中に前記ソレノイドコイル内にアイドル電流を流すことを更に含む請求項1に記載の方法。
- 前記アイドル電流は、前記ソレノイドコイルの加温を生じさせるのに十分であるが、それでも、ソレノイドを作動位置まで駆動するのに不十分である請求項2に記載の方法。
- ソレノイドを迅速に作動させるために、前記ソレノイドコイル内に流れる第1の電流レベルを指示することと、
前記ソレノイドが作動した後に前記ソレノイドコイル内に流れる第2の電流レベルを指示することとを更に含む請求項1に記載の方法。 - 前記第2の電流レベルは、前記ソレノイドを作動状態に保持するのに十分である請求項4に記載の方法。
- 前記第2の電流レベルは、前記第1の電流レベルより低い請求項5に記載の方法。
- 前記ソレノイドコイル内に流れる第3の電流レベルを指示することを更に含む請求項6に記載の方法。
- 前記第3の電流レベルは前記第2の電流レベルとは逆の極性のものであり、前記ソレノイドを作動させないほど十分に小さい大きさのものである請求項7に記載の方法。
- 非活動期間中に前記ソレノイドコイル内に流れるアイドル電流を指示することを更に含む請求項8に記載の方法。
- 前記アイドル電流は、前記ソレノイドコイルの加温を生じさせるのに十分であるが、それでも、前記ソレノイドを作動位置まで駆動するのに不十分である請求項9に記載の方法。
- 前記分注ユニットは、電子基板上に粘性材料を分注するように構成される請求項1に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/153,178 US10071393B2 (en) | 2016-05-12 | 2016-05-12 | Method of dispensing material on a substrate with a solenoid valve of a pneumatically-driven dispensing unit |
US15/153,178 | 2016-05-12 | ||
PCT/US2017/031355 WO2017196672A1 (en) | 2016-05-12 | 2017-05-05 | Method of dispensing material on a substrate with a solenoid valve of a pneumatically-driven dispensing unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019516900A true JP2019516900A (ja) | 2019-06-20 |
JP7406302B2 JP7406302B2 (ja) | 2023-12-27 |
Family
ID=58710115
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018558677A Active JP7406302B2 (ja) | 2016-05-12 | 2017-05-05 | 空気圧駆動式分注ユニットのソレノイド弁を用いて基板上に材料を分注する方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US10071393B2 (ja) |
EP (1) | EP3454997A1 (ja) |
JP (1) | JP7406302B2 (ja) |
KR (1) | KR102324678B1 (ja) |
CN (1) | CN109311045B (ja) |
TW (1) | TWI719204B (ja) |
WO (1) | WO2017196672A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019518177A (ja) * | 2016-05-12 | 2019-06-27 | イリノイ トゥール ワークス インコーポレイティド | 空気圧駆動式分注ユニットのソレノイド弁を用いて基板上に材料を分注するシステム |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11945057B2 (en) | 2018-01-30 | 2024-04-02 | Illinois Tool Works Inc. | Bidirectional 3-level converter for use in energy storage system for welding generator |
KR102603999B1 (ko) * | 2021-11-19 | 2023-11-20 | 최성열 | 압축공기 자동분배 장치 |
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JPH1018888A (ja) * | 1996-07-01 | 1998-01-20 | Nissan Motor Co Ltd | 燃料噴射弁駆動回路 |
JP2002193394A (ja) * | 2000-10-31 | 2002-07-10 | Nordson Corp | 自動調整式ソレノイド駆動回路および方法 |
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JP2005312294A (ja) * | 2004-04-19 | 2005-11-04 | Buerkert Werke Gmbh & Co Kg | 弁用の磁気駆動装置 |
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2016
- 2016-05-12 US US15/153,178 patent/US10071393B2/en active Active
-
2017
- 2017-05-05 WO PCT/US2017/031355 patent/WO2017196672A1/en unknown
- 2017-05-05 KR KR1020187035587A patent/KR102324678B1/ko active IP Right Grant
- 2017-05-05 EP EP17724206.2A patent/EP3454997A1/en active Pending
- 2017-05-05 CN CN201780028859.5A patent/CN109311045B/zh active Active
- 2017-05-05 JP JP2018558677A patent/JP7406302B2/ja active Active
- 2017-05-11 TW TW106115533A patent/TWI719204B/zh active
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JPH1018888A (ja) * | 1996-07-01 | 1998-01-20 | Nissan Motor Co Ltd | 燃料噴射弁駆動回路 |
JP2002193394A (ja) * | 2000-10-31 | 2002-07-10 | Nordson Corp | 自動調整式ソレノイド駆動回路および方法 |
JP2004522058A (ja) * | 2001-05-23 | 2004-07-22 | ウエストポート リサーチ インコーポレーテツド | 直接作動噴射弁 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2019518177A (ja) * | 2016-05-12 | 2019-06-27 | イリノイ トゥール ワークス インコーポレイティド | 空気圧駆動式分注ユニットのソレノイド弁を用いて基板上に材料を分注するシステム |
JP7043421B2 (ja) | 2016-05-12 | 2022-03-29 | イリノイ トゥール ワークス インコーポレイティド | 空気圧駆動式分注ユニットのソレノイド弁を用いて基板上に材料を分注するシステム |
Also Published As
Publication number | Publication date |
---|---|
TWI719204B (zh) | 2021-02-21 |
KR20190008280A (ko) | 2019-01-23 |
CN109311045A (zh) | 2019-02-05 |
CN109311045B (zh) | 2021-11-02 |
WO2017196672A1 (en) | 2017-11-16 |
EP3454997A1 (en) | 2019-03-20 |
KR102324678B1 (ko) | 2021-11-09 |
JP7406302B2 (ja) | 2023-12-27 |
US10071393B2 (en) | 2018-09-11 |
TW201800153A (zh) | 2018-01-01 |
US20170326577A1 (en) | 2017-11-16 |
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