JP2019505825A5 - - Google Patents

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Publication number
JP2019505825A5
JP2019505825A5 JP2018526111A JP2018526111A JP2019505825A5 JP 2019505825 A5 JP2019505825 A5 JP 2019505825A5 JP 2018526111 A JP2018526111 A JP 2018526111A JP 2018526111 A JP2018526111 A JP 2018526111A JP 2019505825 A5 JP2019505825 A5 JP 2019505825A5
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JP
Japan
Prior art keywords
optical system
reflecting surface
reflective
sensor
exposure apparatus
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JP2018526111A
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English (en)
Japanese (ja)
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JP2019505825A (ja
JP6864685B2 (ja
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Priority claimed from DE102015225262.0A external-priority patent/DE102015225262A1/de
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Publication of JP2019505825A5 publication Critical patent/JP2019505825A5/ja
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JP2018526111A 2015-12-15 2016-12-09 特にマイクロリソグラフィ投影露光装置用の光学系 Active JP6864685B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102015225262.0A DE102015225262A1 (de) 2015-12-15 2015-12-15 Optisches System, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
DE102015225262.0 2015-12-15
PCT/EP2016/080498 WO2017102599A1 (en) 2015-12-15 2016-12-09 Optical system, in particular for a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2019505825A JP2019505825A (ja) 2019-02-28
JP2019505825A5 true JP2019505825A5 (https=) 2020-01-30
JP6864685B2 JP6864685B2 (ja) 2021-04-28

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ID=57680209

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JP2018526111A Active JP6864685B2 (ja) 2015-12-15 2016-12-09 特にマイクロリソグラフィ投影露光装置用の光学系

Country Status (6)

Country Link
US (1) US10838306B2 (https=)
JP (1) JP6864685B2 (https=)
KR (1) KR102694720B1 (https=)
DE (1) DE102015225262A1 (https=)
TW (1) TWI720087B (https=)
WO (1) WO2017102599A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017202976A1 (en) * 2016-05-25 2017-11-30 Carl Zeiss Smt Gmbh Position measurement of optical elements in a lithographic apparatus
DE102022208204A1 (de) 2022-08-08 2023-08-31 Carl Zeiss Smt Gmbh Verfahren zur Kompensation von Abbildungsfehlern einer EUV-Projektionsbelichtungsanlage

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001215718A (ja) * 1999-11-26 2001-08-10 Nikon Corp 露光装置及び露光方法
JP2002231619A (ja) * 2000-11-29 2002-08-16 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
DE10118047A1 (de) 2001-04-11 2002-10-17 Zeiss Carl Katadioptrisches Objektiv
DE10204465A1 (de) * 2002-02-05 2003-08-14 Zeiss Carl Smt Ag Verfahren zur Korrektur von schwingungsinduzierten Abbildungsfehlern in einem Objektiv
AU2003227607A1 (en) * 2002-04-11 2003-10-20 Heidelberg Instruments Mikrotechnik Gmbh Method and device for imaging a mask onto a substrate
US6897940B2 (en) * 2002-06-21 2005-05-24 Nikon Corporation System for correcting aberrations and distortions in EUV lithography
JP2004266264A (ja) 2003-02-13 2004-09-24 Canon Inc 光学系、露光装置、デバイス製造方法
US7126671B2 (en) * 2003-04-04 2006-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006140366A (ja) * 2004-11-15 2006-06-01 Nikon Corp 投影光学系及び露光装置
US7283210B2 (en) * 2005-03-22 2007-10-16 Nikon Corporation Image shift optic for optical system
DE102006003375A1 (de) * 2006-01-24 2007-08-09 Carl Zeiss Smt Ag Gruppenweise korrigiertes Objektiv
JP2007317713A (ja) * 2006-05-23 2007-12-06 Canon Inc 光学素子駆動装置
DE102006034755A1 (de) * 2006-07-24 2008-01-31 Carl Zeiss Smt Ag Optische Vorrichtung sowie Verfahren zur Korrektur bzw. Verbesserung des Abbildungsverhaltens einer optischen Vorrichtung
JP2010506388A (ja) * 2006-10-02 2010-02-25 カール・ツァイス・エスエムティー・アーゲー 光学システムの結像特性を改善する方法及びその光学システム
CN101548240B (zh) * 2006-12-01 2014-09-17 卡尔蔡司Smt有限责任公司 具有用于减小像差的可替换、可操纵的校正布置的光学系统
US20090042115A1 (en) 2007-04-10 2009-02-12 Nikon Corporation Exposure apparatus, exposure method, and electronic device manufacturing method
JP4986754B2 (ja) 2007-07-27 2012-07-25 キヤノン株式会社 照明光学系及びそれを有する露光装置
EP2388649B1 (en) * 2007-12-21 2013-06-19 Carl Zeiss SMT GmbH Illumination system for illuminating a mask in a microlithographic exposure apparatus
US20110001945A1 (en) 2009-07-01 2011-01-06 Masayuki Shiraishi Projection optical system, exposure apparatus, and assembly method thereof
WO2011020690A2 (en) 2009-08-07 2011-02-24 Carl Zeiss Smt Gmbh Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus
DE102011087851A1 (de) 2010-12-22 2012-06-28 Carl Zeiss Smt Gmbh Verschlusseinrichtung für eine Lithographievorrichtung und Lithographievorrichtung
NL2007498A (en) 2010-12-23 2012-06-27 Asml Netherlands Bv Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus.
JP6012628B2 (ja) * 2011-01-20 2016-10-25 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィのための投影露光ツールを作動させる方法
DE102012202675A1 (de) 2012-02-22 2013-01-31 Carl Zeiss Smt Gmbh Abbildende Optik sowie Projektionsbelichtungsanlage für die Projektionslithografie mit einer derartigen abbildenden Optik
DE102012212064A1 (de) 2012-07-11 2014-01-16 Carl Zeiss Smt Gmbh Lithographianlage mit segmentiertem Spiegel
JP2014120682A (ja) * 2012-12-18 2014-06-30 Canon Inc 露光装置、露光方法及びデバイス製造方法
DE102014208770A1 (de) * 2013-07-29 2015-01-29 Carl Zeiss Smt Gmbh Projektionsoptik zur Abbildung eines Objektfeldes in ein Bildfeld sowie Projektionsbelichtungsanlage mit einer derartigen Projektionsoptik

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