JP2019504813A - 集積デバイスを有する多層感光性ガラス - Google Patents
集積デバイスを有する多層感光性ガラス Download PDFInfo
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- JP2019504813A JP2019504813A JP2018538677A JP2018538677A JP2019504813A JP 2019504813 A JP2019504813 A JP 2019504813A JP 2018538677 A JP2018538677 A JP 2018538677A JP 2018538677 A JP2018538677 A JP 2018538677A JP 2019504813 A JP2019504813 A JP 2019504813A
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- JP
- Japan
- Prior art keywords
- glass
- glass substrate
- metal
- photosensitive glass
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000006089 photosensitive glass Substances 0.000 title abstract description 31
- 230000003287 optical effect Effects 0.000 claims abstract description 14
- 239000011521 glass Substances 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 28
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 20
- 229910052802 copper Inorganic materials 0.000 claims description 20
- 239000010949 copper Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 18
- 239000002184 metal Substances 0.000 claims description 18
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 4
- 229910052697 platinum Inorganic materials 0.000 claims 2
- 239000006112 glass ceramic composition Substances 0.000 claims 1
- 238000001465 metallisation Methods 0.000 abstract description 9
- 239000002356 single layer Substances 0.000 abstract description 3
- 230000008569 process Effects 0.000 description 12
- 238000004151 rapid thermal annealing Methods 0.000 description 10
- 238000001228 spectrum Methods 0.000 description 10
- 239000010410 layer Substances 0.000 description 8
- 239000006090 Foturan Substances 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 4
- 238000000280 densification Methods 0.000 description 4
- 230000009477 glass transition Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 2
- -1 silver ions Chemical class 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical group [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- GHPGOEFPKIHBNM-UHFFFAOYSA-N antimony(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Sb+3].[Sb+3] GHPGOEFPKIHBNM-UHFFFAOYSA-N 0.000 description 1
- 229910000413 arsenic oxide Inorganic materials 0.000 description 1
- 229960002594 arsenic trioxide Drugs 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- KTTMEOWBIWLMSE-UHFFFAOYSA-N diarsenic trioxide Chemical compound O1[As](O2)O[As]3O[As]1O[As]2O3 KTTMEOWBIWLMSE-UHFFFAOYSA-N 0.000 description 1
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- VFWRGKJLLYDFBY-UHFFFAOYSA-N silver;hydrate Chemical compound O.[Ag].[Ag] VFWRGKJLLYDFBY-UHFFFAOYSA-N 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
- C03C17/10—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the liquid phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/04—Compositions for glass with special properties for photosensitive glass
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/88—Metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
- C03C2217/253—Cu
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
- C03C2217/254—Noble metals
- C03C2217/255—Au
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/25—Metals
- C03C2217/251—Al, Cu, Mg or noble metals
- C03C2217/254—Noble metals
- C03C2217/256—Ag
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Structural Engineering (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
- Optical Integrated Circuits (AREA)
Abstract
Description
Ce3++Ag+=□Ce4++Ag0
となる。銀原子は、ベークプロセス中に銀ナノクラスター中で合体し、ガラスの周囲を結晶化するために核形成部位を誘導する。マスク越しにUV光に曝露した場合、ガラスの曝露した領域のみが、後続の熱処理中に結晶化することになる。
Claims (9)
- 十分に高密度にメタライズされたガラス基板を生成する方法であって、金属が、前記ガラス基板に比して優先的に加熱され、及び、又は、高密度化されており、
A,構造体の位置の変化が20μm未満であり、
B,前記ガラス基板の色が75nmを超えてずれておらず、
C,温度時間比が70℃/分を超えていない
方法。 - 金属が、銅、銀、白金、金又はそれらの組合せである、請求項1に記載の方法。
- ガラスが感光性である、請求項1に記載の方法。
- ガラス基板が、電子、光又はMEMSデバイスを含有する、請求項1に記載の方法。
- 2又は3以上のガラス基板を集積する方法であって、金属構造体が、前記ガラス基板に比して優先的に加熱され、及び、又は高密度化されており、20μm未満の構造体の位置の変化を誘発し、前記ガラス基板の色を有意に変化させず、A,前記構造体の位置の変化が20μm未満であり、B,前記ガラス基板の色が75nmを超えてずれておらず、C,温度時間比が70℃/分を超えていない、前記方法。
- 金属が、銅、銀、白金、金又はそれらの組合せである、請求項5に記載の方法。
- ガラスが感光性である、請求項5に記載の方法。
- ガラス基板が、電子、光又はMEMSデバイスを含有する、請求項5に記載の方法。
- 金属が、ガラスセラミック材料を通して部分的に、それを通して完全に、その中間に、若しくはその上部に、又はそれらの組合せに存在し得る、請求項5に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662289302P | 2016-01-31 | 2016-01-31 | |
US62/289,302 | 2016-01-31 | ||
PCT/US2017/014977 WO2017132280A2 (en) | 2016-01-31 | 2017-01-25 | Multi-layer photo definable glass with integrated devices |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2019504813A true JP2019504813A (ja) | 2019-02-21 |
JP6806781B2 JP6806781B2 (ja) | 2021-01-06 |
Family
ID=59398704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2018538677A Active JP6806781B2 (ja) | 2016-01-31 | 2017-01-25 | 集積デバイスを有する多層感光性ガラス |
Country Status (7)
Country | Link |
---|---|
US (1) | US20190177213A1 (ja) |
EP (1) | EP3414210A4 (ja) |
JP (1) | JP6806781B2 (ja) |
KR (2) | KR102456738B1 (ja) |
AU (2) | AU2017212424B2 (ja) |
CA (1) | CA3013205C (ja) |
WO (1) | WO2017132280A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022524227A (ja) * | 2019-04-18 | 2022-04-28 | スリーディー グラス ソリューションズ,インク | 高効率ダイダイシング及びリリース |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3140838B1 (en) | 2014-05-05 | 2021-08-25 | 3D Glass Solutions, Inc. | Inductive device in a photo-definable glass structure |
US10070533B2 (en) | 2015-09-30 | 2018-09-04 | 3D Glass Solutions, Inc. | Photo-definable glass with integrated electronics and ground plane |
WO2017147511A1 (en) | 2016-02-25 | 2017-08-31 | 3D Glass Solutions, Inc. | 3d capacitor and capacitor array fabricating photoactive substrates |
WO2017177171A1 (en) | 2016-04-08 | 2017-10-12 | 3D Glass Solutions, Inc. | Methods of fabricating photosensitive substrates suitable for optical coupler |
KR102420212B1 (ko) | 2017-04-28 | 2022-07-13 | 3디 글래스 솔루션즈 인코포레이티드 | Rf 서큘레이터 |
US11342896B2 (en) | 2017-07-07 | 2022-05-24 | 3D Glass Solutions, Inc. | 2D and 3D RF lumped element devices for RF system in a package photoactive glass substrates |
EP3724946B1 (en) | 2017-12-15 | 2024-04-17 | 3D Glass Solutions, Inc. | Coupled transmission line resonate rf filter |
AU2018399638B2 (en) | 2018-01-04 | 2021-09-02 | 3D Glass Solutions, Inc. | Impedance matching conductive structure for high efficiency RF circuits |
JP6888105B2 (ja) | 2018-04-10 | 2021-06-16 | スリーディー グラス ソリューションズ,インク3D Glass Solutions,Inc | Rf集積電力調整コンデンサ |
KR102475010B1 (ko) | 2018-05-29 | 2022-12-07 | 3디 글래스 솔루션즈 인코포레이티드 | 저 삽입 손실 rf 전송 라인 |
KR102322938B1 (ko) | 2018-09-17 | 2021-11-09 | 3디 글래스 솔루션즈 인코포레이티드 | 접지면을 갖는 고효율 컴팩트형 슬롯 안테나 |
KR102392858B1 (ko) | 2018-12-28 | 2022-05-03 | 3디 글래스 솔루션즈 인코포레이티드 | 환상형 커패시터 rf, 마이크로파, 및 mm 파 시스템들 |
WO2020139951A1 (en) | 2018-12-28 | 2020-07-02 | 3D Glass Solutions, Inc. | Heterogenous integration for rf, microwave and mm wave systems in photoactive glass substrates |
EP4121988A4 (en) | 2020-04-17 | 2023-08-30 | 3D Glass Solutions, Inc. | BROADBAND INDUCTOR |
Citations (6)
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JPS63166736A (ja) * | 1986-07-12 | 1988-07-09 | Sumita Kogaku Glass Seizosho:Kk | 低膨張感光性結晶化ガラス |
JPS63193587A (ja) * | 1987-02-06 | 1988-08-10 | 株式会社日立製作所 | 導体シ−ルド付微細スルホ−ル基板 |
JPH0393683A (ja) * | 1989-09-01 | 1991-04-18 | Fujitsu Ltd | 銅ペースト及びそれを用いたメタライズ方法 |
JPH04367575A (ja) * | 1991-04-04 | 1992-12-18 | Internatl Business Mach Corp <Ibm> | 銅へのガラスセラミックス接着の改良 |
JPH107435A (ja) * | 1996-06-26 | 1998-01-13 | Ngk Spark Plug Co Ltd | ガラスセラミック配線基板およびその製造方法 |
JP2004238280A (ja) * | 2003-02-03 | 2004-08-26 | Carl-Zeiss-Stiftung | 光構造化性物体とガラスおよび/またはガラスセラミック処理方法 |
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US4413061A (en) * | 1978-02-06 | 1983-11-01 | International Business Machines Corporation | Glass-ceramic structures and sintered multilayer substrates thereof with circuit patterns of gold, silver or copper |
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-
2017
- 2017-01-25 US US16/072,828 patent/US20190177213A1/en not_active Abandoned
- 2017-01-25 WO PCT/US2017/014977 patent/WO2017132280A2/en active Application Filing
- 2017-01-25 JP JP2018538677A patent/JP6806781B2/ja active Active
- 2017-01-25 EP EP17744848.7A patent/EP3414210A4/en active Pending
- 2017-01-25 KR KR1020207020414A patent/KR102456738B1/ko active IP Right Grant
- 2017-01-25 CA CA3013205A patent/CA3013205C/en active Active
- 2017-01-25 KR KR1020187025180A patent/KR102144780B1/ko active IP Right Grant
- 2017-01-25 AU AU2017212424A patent/AU2017212424B2/en active Active
-
2020
- 2020-06-23 AU AU2020204178A patent/AU2020204178A1/en not_active Abandoned
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JPS63166736A (ja) * | 1986-07-12 | 1988-07-09 | Sumita Kogaku Glass Seizosho:Kk | 低膨張感光性結晶化ガラス |
JPS63193587A (ja) * | 1987-02-06 | 1988-08-10 | 株式会社日立製作所 | 導体シ−ルド付微細スルホ−ル基板 |
JPH0393683A (ja) * | 1989-09-01 | 1991-04-18 | Fujitsu Ltd | 銅ペースト及びそれを用いたメタライズ方法 |
JPH04367575A (ja) * | 1991-04-04 | 1992-12-18 | Internatl Business Mach Corp <Ibm> | 銅へのガラスセラミックス接着の改良 |
JPH107435A (ja) * | 1996-06-26 | 1998-01-13 | Ngk Spark Plug Co Ltd | ガラスセラミック配線基板およびその製造方法 |
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AU2017212424A1 (en) | 2018-08-09 |
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CA3013205C (en) | 2021-07-27 |
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AU2017212424B2 (en) | 2020-04-30 |
US20190177213A1 (en) | 2019-06-13 |
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KR102144780B1 (ko) | 2020-08-14 |
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