JP2019504439A5 - - Google Patents
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- Publication number
- JP2019504439A5 JP2019504439A5 JP2018528217A JP2018528217A JP2019504439A5 JP 2019504439 A5 JP2019504439 A5 JP 2019504439A5 JP 2018528217 A JP2018528217 A JP 2018528217A JP 2018528217 A JP2018528217 A JP 2018528217A JP 2019504439 A5 JP2019504439 A5 JP 2019504439A5
- Authority
- JP
- Japan
- Prior art keywords
- operational amplifier
- input
- detection circuit
- output
- analog signal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001514 detection method Methods 0.000 claims 30
- 239000000523 sample Substances 0.000 claims 8
- 238000000034 method Methods 0.000 claims 7
- 239000003990 capacitor Substances 0.000 claims 3
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims 3
- 239000000758 substrate Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562263472P | 2015-12-04 | 2015-12-04 | |
| US62/263,472 | 2015-12-04 | ||
| PCT/US2016/060240 WO2017095586A1 (en) | 2015-12-04 | 2016-11-03 | Arcing detection apparatus for plasma processing |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019504439A JP2019504439A (ja) | 2019-02-14 |
| JP2019504439A5 true JP2019504439A5 (https=) | 2019-12-19 |
| JP6814213B2 JP6814213B2 (ja) | 2021-01-13 |
Family
ID=58797823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018528217A Active JP6814213B2 (ja) | 2015-12-04 | 2016-11-03 | プラズマ処理のためのアーキング検出装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10580626B2 (https=) |
| JP (1) | JP6814213B2 (https=) |
| KR (2) | KR102107160B1 (https=) |
| CN (2) | CN111508811A (https=) |
| TW (1) | TWI673757B (https=) |
| WO (1) | WO2017095586A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3035365A1 (en) * | 2014-12-19 | 2016-06-22 | TRUMPF Huettinger Sp. Z o. o. | Method of detecting an arc occurring during the power supply of a plasma process, control unit for a plasma power supply, and plasma power supply |
| CN114355244B (zh) * | 2021-12-29 | 2026-02-06 | 北京北方华创微电子装备有限公司 | 基座接地检测装置和方法 |
| US12590361B2 (en) * | 2022-06-28 | 2026-03-31 | Applied Materials Inc. | Methods and apparatus for processing a substrate |
| JP2024016522A (ja) * | 2022-07-26 | 2024-02-07 | パナソニックＩｐマネジメント株式会社 | プラズマ処理装置およびプラズマ処理方法 |
| CN115835467B (zh) * | 2022-12-26 | 2024-03-08 | 武汉大学 | 一种基于主被动融合的等离子体三维定位系统及方法 |
| CN119601446B (zh) * | 2023-09-08 | 2026-01-09 | 中微半导体设备(上海)股份有限公司 | 一种等离子体处理腔室的电弧的检测方法及检测装置 |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6894474B2 (en) * | 2002-06-07 | 2005-05-17 | Applied Materials, Inc. | Non-intrusive plasma probe |
| WO2005015964A1 (ja) * | 2003-08-07 | 2005-02-17 | Hitachi Kokusai Electric Inc. | 基板処理装置及び基板処理方法 |
| WO2008100318A1 (en) * | 2006-03-17 | 2008-08-21 | Schneider Automation Inc. | Current-based method and apparatus for detecting and classifying arcs |
| KR20080006750A (ko) * | 2006-07-13 | 2008-01-17 | 삼성전자주식회사 | 반도체소자 제조용 플라즈마 도핑 시스템 |
| US7795817B2 (en) * | 2006-11-24 | 2010-09-14 | Huettinger Elektronik Gmbh + Co. Kg | Controlled plasma power supply |
| JP4983575B2 (ja) | 2007-11-30 | 2012-07-25 | パナソニック株式会社 | プラズマ処理装置およびプラズマ処理方法 |
| ATE547804T1 (de) * | 2007-12-24 | 2012-03-15 | Huettinger Electronic Sp Z O O | Stromänderungsbegrenzungsvorrichtung |
| US8289029B2 (en) * | 2008-02-14 | 2012-10-16 | Mks Instruments, Inc. | Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events |
| US20090308734A1 (en) * | 2008-06-17 | 2009-12-17 | Schneider Automation Inc. | Apparatus and Method for Wafer Level Arc Detection |
| JP2011022657A (ja) * | 2009-07-13 | 2011-02-03 | Fujitsu Ltd | メモリシステムおよび情報処理装置 |
| US8440061B2 (en) * | 2009-07-20 | 2013-05-14 | Lam Research Corporation | System and method for plasma arc detection, isolation and prevention |
| KR101028406B1 (ko) * | 2009-08-12 | 2011-04-13 | (주)화백엔지니어링 | 아크 검출장치 및 방법 |
| US8502689B2 (en) * | 2010-09-23 | 2013-08-06 | Applied Materials, Inc. | System and method for voltage-based plasma excursion detection |
| US8587321B2 (en) * | 2010-09-24 | 2013-11-19 | Applied Materials, Inc. | System and method for current-based plasma excursion detection |
| KR101303040B1 (ko) * | 2012-02-28 | 2013-09-03 | 주식회사 뉴파워 프라즈마 | 플라즈마 챔버의 아크 검출 방법 및 장치 |
| KR20120127350A (ko) * | 2012-08-29 | 2012-11-21 | (주)쎄미시스코 | 플라즈마 모니터링 시스템 |
| US9653269B2 (en) * | 2013-08-14 | 2017-05-16 | Applied Materials, Inc. | Detecting arcing using processing chamber data |
| US10054631B2 (en) * | 2015-09-21 | 2018-08-21 | Advent Design Corporation | Electrical arcing detector for arcing at series electrictrical connection |
-
2016
- 2016-11-03 JP JP2018528217A patent/JP6814213B2/ja active Active
- 2016-11-03 WO PCT/US2016/060240 patent/WO2017095586A1/en not_active Ceased
- 2016-11-03 KR KR1020187018190A patent/KR102107160B1/ko active Active
- 2016-11-03 KR KR1020207012267A patent/KR102370438B1/ko active Active
- 2016-11-03 CN CN202010242936.0A patent/CN111508811A/zh active Pending
- 2016-11-03 CN CN201680068256.3A patent/CN108292582B/zh active Active
- 2016-11-10 US US15/348,579 patent/US10580626B2/en active Active
- 2016-11-28 TW TW105139047A patent/TWI673757B/zh active
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