JP2019502631A5 - - Google Patents
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- Publication number
- JP2019502631A5 JP2019502631A5 JP2018530493A JP2018530493A JP2019502631A5 JP 2019502631 A5 JP2019502631 A5 JP 2019502631A5 JP 2018530493 A JP2018530493 A JP 2018530493A JP 2018530493 A JP2018530493 A JP 2018530493A JP 2019502631 A5 JP2019502631 A5 JP 2019502631A5
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- melting
- furnace
- treatment
- octamethylcyclotetrasiloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000008018 melting Effects 0.000 description 10
- 238000002844 melting Methods 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- XMSXQFUHVRWGNA-UHFFFAOYSA-N Decamethylcyclopentasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 XMSXQFUHVRWGNA-UHFFFAOYSA-N 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- VEVRNHHLCPGNDU-MUGJNUQGSA-O desmosine Chemical compound OC(=O)[C@@H](N)CCCC[N+]1=CC(CC[C@H](N)C(O)=O)=C(CCC[C@H](N)C(O)=O)C(CC[C@H](N)C(O)=O)=C1 VEVRNHHLCPGNDU-MUGJNUQGSA-O 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP15201098 | 2015-12-18 | ||
| EP15201098.9 | 2015-12-18 | ||
| PCT/EP2016/081520 WO2017103167A2 (de) | 2015-12-18 | 2016-12-16 | Verringern des kohlenstoffgehalts von siliziumdioxidgranulat und herstellung eines quarzglaskörpers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019502631A JP2019502631A (ja) | 2019-01-31 |
| JP2019502631A5 true JP2019502631A5 (https=) | 2020-01-16 |
| JP6912098B2 JP6912098B2 (ja) | 2021-07-28 |
Family
ID=54850382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018530493A Active JP6912098B2 (ja) | 2015-12-18 | 2016-12-16 | 二酸化ケイ素造粒体の炭素含有量の低減および石英ガラス体の調製 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20190077672A1 (https=) |
| EP (1) | EP3390307A2 (https=) |
| JP (1) | JP6912098B2 (https=) |
| CN (1) | CN108698886A (https=) |
| TW (1) | TWI764879B (https=) |
| WO (1) | WO2017103167A2 (https=) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3390303B1 (de) | 2015-12-18 | 2024-02-07 | Heraeus Quarzglas GmbH & Co. KG | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| WO2017103153A1 (de) | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| CN109153593A (zh) | 2015-12-18 | 2019-01-04 | 贺利氏石英玻璃有限两合公司 | 合成石英玻璃粉粒的制备 |
| CN108698880B (zh) | 2015-12-18 | 2023-05-02 | 贺利氏石英玻璃有限两合公司 | 不透明石英玻璃体的制备 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| EP3390304B1 (de) | 2015-12-18 | 2023-09-13 | Heraeus Quarzglas GmbH & Co. KG | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
| JP6981710B2 (ja) | 2015-12-18 | 2021-12-17 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 二酸化ケイ素造粒体からの石英ガラス体の調製 |
| KR20180095618A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 다중-챔버 가열로에서 실리카 유리체의 제조 |
| TWI840318B (zh) | 2015-12-18 | 2024-05-01 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途 |
| CN112236392B (zh) * | 2019-03-22 | 2024-02-02 | 瓦克化学股份公司 | 用于生产工业硅的方法 |
| CN112390261A (zh) * | 2019-08-13 | 2021-02-23 | 斯特里特技术有限公司 | 气相二氧化硅颗粒分离脱氢的系统和方法 |
| EP4030204B1 (de) * | 2021-01-19 | 2023-09-20 | Heraeus Quarzglas GmbH & Co. KG | Mikrostrukturierte optische faser und vorform dafür |
| CN121605090A (zh) * | 2023-09-15 | 2026-03-03 | 日本板硝子株式会社 | 玻璃粉体 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60260434A (ja) * | 1984-06-04 | 1985-12-23 | Shin Etsu Chem Co Ltd | 光伝送用無水ガラス素材の製造方法 |
| JP2925797B2 (ja) * | 1991-07-30 | 1999-07-28 | 古河電気工業株式会社 | 光ファイバ用多孔質母材の精製方法 |
| US6136736A (en) * | 1993-06-01 | 2000-10-24 | General Electric Company | Doped silica glass |
| JP3751326B2 (ja) * | 1994-10-14 | 2006-03-01 | 三菱レイヨン株式会社 | 高純度透明石英ガラスの製造方法 |
| PT725037E (pt) * | 1995-02-04 | 2001-07-31 | Degussa | Granulados a base de dioxido de silicio preparado pirogenicamente processo para a sua preparacao e sua utilizacao |
| DE19729505A1 (de) * | 1997-07-10 | 1999-01-14 | Heraeus Quarzglas | Verfahren zur Herstellung von Si0¶2¶-Granulat |
| EP1088789A3 (en) * | 1999-09-28 | 2002-03-27 | Heraeus Quarzglas GmbH & Co. KG | Porous silica granule, its method of production and its use in a method for producing quartz glass |
| DE10019693B4 (de) * | 2000-04-20 | 2006-01-19 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines Bauteils aus opakem, synthetischen Quarzglas, nach dem Verfahren hergestelltes Quarzglasrohr, sowie Verwendung desselben |
| DE60123878T2 (de) * | 2000-06-28 | 2007-05-24 | Japan Super Quartz Corp. | Synthetisches Quarzpulver, Verfahren zur Herstellung und synthetischer Quarztiegel |
| DE10163938A1 (de) * | 2001-12-22 | 2003-07-10 | Degussa | Flammenhydrolytisch hergestelltes Silicium-Titan-Mischoxidpulver mit an der Oberfläche angereichertem Siliciumdioxid, dessen Herstellung und Verwendung |
| US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
| JP4470479B2 (ja) * | 2003-12-17 | 2010-06-02 | 旭硝子株式会社 | 光学部材用合成石英ガラスおよびその製造方法 |
| US7166963B2 (en) * | 2004-09-10 | 2007-01-23 | Axcelis Technologies, Inc. | Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation |
| US7452518B2 (en) * | 2004-12-28 | 2008-11-18 | Momentive Performance Materials Inc. | Process for treating synthetic silica powder and synthetic silica powder treated thereof |
| CN100463851C (zh) * | 2005-10-26 | 2009-02-25 | 太原理工大学 | 一种超细疏水性二氧化硅的制取方法 |
| WO2009096557A1 (ja) * | 2008-01-30 | 2009-08-06 | Asahi Glass Co., Ltd. | エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法 |
| US8925354B2 (en) * | 2009-11-04 | 2015-01-06 | Corning Incorporated | Methods for forming an overclad portion of an optical fiber from pelletized glass soot |
| WO2013085574A1 (en) * | 2011-07-29 | 2013-06-13 | Momentive Performance Materials, Inc. | Method for making high purity metal oxide particles and materials made thereof |
| DE102011121153B3 (de) * | 2011-12-15 | 2013-03-21 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von synthetischem Quarzglas sowie Quarzglas für den Einsatz als Mantelmaterial einer optischen Faser |
| DE102012008437B3 (de) * | 2012-04-30 | 2013-03-28 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung synthetischer Quarzglaskörnung |
| KR20160113573A (ko) * | 2014-01-29 | 2016-09-30 | 미쓰비시 마테리알 가부시키가이샤 | 합성 비정질 실리카 분말 및 그 제조 방법 |
| EP3000790B2 (de) * | 2014-09-29 | 2023-07-26 | Heraeus Quarzglas GmbH & Co. KG | Verfahren für die Herstellung von Bauteilen aus synthetischem Quarzglas aus SiO2-Granulat |
-
2016
- 2016-12-16 CN CN201680082012.0A patent/CN108698886A/zh active Pending
- 2016-12-16 WO PCT/EP2016/081520 patent/WO2017103167A2/de not_active Ceased
- 2016-12-16 EP EP16822148.9A patent/EP3390307A2/de not_active Withdrawn
- 2016-12-16 US US16/062,234 patent/US20190077672A1/en not_active Abandoned
- 2016-12-16 TW TW105141758A patent/TWI764879B/zh active
- 2016-12-16 JP JP2018530493A patent/JP6912098B2/ja active Active
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