JP2019502634A5 - - Google Patents

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Publication number
JP2019502634A5
JP2019502634A5 JP2018530537A JP2018530537A JP2019502634A5 JP 2019502634 A5 JP2019502634 A5 JP 2019502634A5 JP 2018530537 A JP2018530537 A JP 2018530537A JP 2018530537 A JP2018530537 A JP 2018530537A JP 2019502634 A5 JP2019502634 A5 JP 2019502634A5
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JP
Japan
Prior art keywords
chamber
melting
furnace
term
melting chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018530537A
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English (en)
Japanese (ja)
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JP2019502634A (ja
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Publication date
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Priority claimed from PCT/EP2016/081523 external-priority patent/WO2017103170A1/de
Publication of JP2019502634A publication Critical patent/JP2019502634A/ja
Publication of JP2019502634A5 publication Critical patent/JP2019502634A5/ja
Pending legal-status Critical Current

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JP2018530537A 2015-12-18 2016-12-16 石英ガラス調製時の二酸化ケイ素粉末の蒸気処理 Pending JP2019502634A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP15201111 2015-12-18
EP15201111.0 2015-12-18
PCT/EP2016/081523 WO2017103170A1 (de) 2015-12-18 2016-12-16 Wasserdampfbehandlung von siliziumdioxidpulver bei der herstellung von quarzglas

Publications (2)

Publication Number Publication Date
JP2019502634A JP2019502634A (ja) 2019-01-31
JP2019502634A5 true JP2019502634A5 (https=) 2020-01-23

Family

ID=54850385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018530537A Pending JP2019502634A (ja) 2015-12-18 2016-12-16 石英ガラス調製時の二酸化ケイ素粉末の蒸気処理

Country Status (6)

Country Link
US (1) US20190062194A1 (https=)
EP (1) EP3390309A1 (https=)
JP (1) JP2019502634A (https=)
CN (1) CN108698884A (https=)
TW (1) TW201733932A (https=)
WO (1) WO2017103170A1 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180095618A (ko) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 다중-챔버 가열로에서 실리카 유리체의 제조
US11339076B2 (en) 2015-12-18 2022-05-24 Heraeus Quarzglas Gmbh & Co. Kg Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass
CN109153593A (zh) 2015-12-18 2019-01-04 贺利氏石英玻璃有限两合公司 合成石英玻璃粉粒的制备
CN108698880B (zh) 2015-12-18 2023-05-02 贺利氏石英玻璃有限两合公司 不透明石英玻璃体的制备
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
EP3390303B1 (de) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
JP6981710B2 (ja) 2015-12-18 2021-12-17 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 二酸化ケイ素造粒体からの石英ガラス体の調製
EP3390304B1 (de) 2015-12-18 2023-09-13 Heraeus Quarzglas GmbH & Co. KG Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
TWI840318B (zh) 2015-12-18 2024-05-01 德商何瑞斯廓格拉斯公司 石英玻璃體、光導、施照體、成型體及製備彼等之方法及矽組分之用途
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
WO2021013876A1 (de) * 2019-07-24 2021-01-28 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur herstellung einer siliziumoxidsuspension
EP4030204B1 (de) * 2021-01-19 2023-09-20 Heraeus Quarzglas GmbH & Co. KG Mikrostrukturierte optische faser und vorform dafür

Family Cites Families (20)

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DE1642994A1 (de) * 1967-01-21 1971-06-03 Degussa Verfahren zum Reinigen von hochdispersen Oxiden
JPS60260434A (ja) * 1984-06-04 1985-12-23 Shin Etsu Chem Co Ltd 光伝送用無水ガラス素材の製造方法
JPS62246834A (ja) * 1986-04-17 1987-10-28 Mitsubishi Cable Ind Ltd 光フアイバ母材の製造方法
US5141786A (en) * 1989-02-28 1992-08-25 Shin-Etsu Chemical Co., Ltd. Synthetic silica glass articles and a method for manufacturing them
US6136736A (en) * 1993-06-01 2000-10-24 General Electric Company Doped silica glass
JP3751326B2 (ja) * 1994-10-14 2006-03-01 三菱レイヨン株式会社 高純度透明石英ガラスの製造方法
JP3546494B2 (ja) * 1994-10-27 2004-07-28 信越化学工業株式会社 微細シリカの精製法
US5855860A (en) * 1994-10-27 1999-01-05 Shin-Etsu Chemical Co., Ltd. Method for porifying fine particulate silica
JP2001220157A (ja) * 2000-02-01 2001-08-14 Tosoh Corp 非晶質合成シリカ粉体及びこれを用いたガラス成形体
DE10123950A1 (de) * 2001-05-17 2002-11-28 Degussa Granulate auf Basis von mittels Aerosol mit Aluminiumoxid dotiertem, pyrogen hergestelltem Siliziumdioxid, Verfahren zu ihrer Herstellung und ihre Verwendung
US20040118155A1 (en) * 2002-12-20 2004-06-24 Brown John T Method of making ultra-dry, Cl-free and F-doped high purity fused silica
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
US7166963B2 (en) * 2004-09-10 2007-01-23 Axcelis Technologies, Inc. Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
EP1700824A1 (en) * 2005-03-09 2006-09-13 Degussa AG Granules based on pyrogenically prepared silicon dioxide, method for their preparation and use thereof
EP1700828A1 (en) * 2005-03-09 2006-09-13 Degussa AG Method for producing ultra-high purity, optical quality, glass articles
EP1717202A1 (en) * 2005-04-29 2006-11-02 Degussa AG Sintered silicon dioxide materials
JP2006335577A (ja) * 2005-05-31 2006-12-14 Shinetsu Quartz Prod Co Ltd 高透過性エキシマｕｖランプ用合成石英ガラス管およびその製造方法
DE102006039273A1 (de) * 2006-08-22 2008-02-28 Evonik Degussa Gmbh Pyrogenes Siliciumdioxid zur Verwendung als Hilfsstoff in pharmazeutischen und kosmetischen Zusammensetzungen
JP5529369B2 (ja) * 2006-09-11 2014-06-25 東ソー株式会社 熔融石英ガラスおよびその製造方法
WO2009096557A1 (ja) * 2008-01-30 2009-08-06 Asahi Glass Co., Ltd. エネルギー伝送用または紫外光伝送用光ファイバプリフォームおよびその製造方法

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