JP2019502023A5 - - Google Patents
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- Publication number
- JP2019502023A5 JP2019502023A5 JP2018531355A JP2018531355A JP2019502023A5 JP 2019502023 A5 JP2019502023 A5 JP 2019502023A5 JP 2018531355 A JP2018531355 A JP 2018531355A JP 2018531355 A JP2018531355 A JP 2018531355A JP 2019502023 A5 JP2019502023 A5 JP 2019502023A5
- Authority
- JP
- Japan
- Prior art keywords
- transition metal
- precursor
- daughter
- solution
- reactor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052723 transition metal Inorganic materials 0.000 claims description 14
- 150000003624 transition metals Chemical class 0.000 claims description 14
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 150000001247 metal acetylides Chemical class 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 238000000034 method Methods 0.000 claims 22
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 9
- 239000002243 precursor Substances 0.000 claims 7
- 239000000243 solution Substances 0.000 claims 7
- 239000000463 material Substances 0.000 claims 6
- 239000010413 mother solution Substances 0.000 claims 5
- 230000001681 protective effect Effects 0.000 claims 5
- 229910045601 alloy Inorganic materials 0.000 claims 4
- 239000000956 alloy Substances 0.000 claims 4
- 229910052799 carbon Inorganic materials 0.000 claims 4
- 239000011651 chromium Substances 0.000 claims 4
- 125000003118 aryl group Chemical group 0.000 claims 3
- 238000005229 chemical vapour deposition Methods 0.000 claims 3
- 238000000354 decomposition reaction Methods 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 3
- 230000008021 deposition Effects 0.000 claims 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims 3
- 239000011253 protective coating Substances 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 2
- 150000004945 aromatic hydrocarbons Chemical group 0.000 claims 2
- 239000003112 inhibitor Substances 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 229910052751 metal Inorganic materials 0.000 claims 2
- 239000002184 metal Substances 0.000 claims 2
- 150000002902 organometallic compounds Chemical class 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 239000011593 sulfur Substances 0.000 claims 2
- 230000008016 vaporization Effects 0.000 claims 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 239000006227 byproduct Substances 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 238000009833 condensation Methods 0.000 claims 1
- 230000005494 condensation Effects 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 239000010410 layer Substances 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- -1 monocyclic aromatic hydrocarbon Chemical class 0.000 claims 1
- 239000011241 protective layer Substances 0.000 claims 1
- 210000002784 stomach Anatomy 0.000 claims 1
- 238000009834 vaporization Methods 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 description 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1562862A FR3045673B1 (fr) | 2015-12-18 | 2015-12-18 | Procede de depot d'un revetement par dli-mocvd avec recyclage du compose precurseur |
| FR1562862 | 2015-12-18 | ||
| PCT/FR2016/053541 WO2017103546A1 (fr) | 2015-12-18 | 2016-12-17 | Procede de depot d'un revetement par dli-mocvd avec recyclage direct du compose precurseur |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019502023A JP2019502023A (ja) | 2019-01-24 |
| JP2019502023A5 true JP2019502023A5 (cg-RX-API-DMAC7.html) | 2020-03-19 |
| JP6997711B2 JP6997711B2 (ja) | 2022-02-04 |
Family
ID=55948887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2018531355A Active JP6997711B2 (ja) | 2015-12-18 | 2016-12-17 | プリカーサ化合物の再利用を伴うｄｌｉ－ｍｏｃｖｄによる皮膜の成膜方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US20190003048A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP3390686B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6997711B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20180089515A (cg-RX-API-DMAC7.html) |
| FR (1) | FR3045673B1 (cg-RX-API-DMAC7.html) |
| RU (1) | RU2699126C1 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2017103546A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SI3519604T1 (sl) | 2016-09-28 | 2020-12-31 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Jedrska komponenta s kovinskim substratom, postopek za njeno proizvodnjo z DLI-MOCVD in uporabe proti oksidaciji/hidraciji |
| JP6924824B2 (ja) | 2016-09-28 | 2021-08-25 | コミサーリャ ア レナジー アトミック エー オー エナジー アルタナティブＣｏｍｍｉｓｓａｒｉａｔ Ａ Ｌ’Ｅｎｅｒｇｉｅ Ａｔｏｍｉｑｕｅ Ｅｔ Ａｕｘ Ｅｎｅｒｇｉｅｓ Ａｌｔｅｒｎａｔｉｖｅｓ | アモルファスＣｒＣ被覆を有する原子炉コンポーネント、ＤＬＩ−ＭＯＣＶＤによる製造方法および酸化／水素化に対する使用 |
| EP3520119B1 (fr) | 2016-09-28 | 2020-07-29 | Commissariat à l'Énergie Atomique et aux Énergies Alternatives | Composant nucléaire composite, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration |
| WO2018060643A1 (fr) | 2016-09-28 | 2018-04-05 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Composant nucléaire avec revetement de cr metastable, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration |
| US11560625B2 (en) * | 2018-01-19 | 2023-01-24 | Entegris, Inc. | Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor |
| US11180849B2 (en) | 2018-09-03 | 2021-11-23 | Applied Materials, Inc. | Direct liquid injection system for thin film deposition |
| FR3114588B1 (fr) * | 2020-09-29 | 2023-08-11 | Safran Ceram | Procédé de fabrication d’une barrière environnementale |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU1453950A1 (ru) * | 1987-01-07 | 1994-06-30 | А.И. Костылев | Парогазовая смесь для пиролитического нанесения защитных покрытий на основе хрома |
| FR2643071B1 (fr) * | 1989-02-16 | 1993-05-07 | Unirec | Procede de depot en phase vapeur a basse temperature d'un revetement ceramique du type nitrure ou carbonitrure metallique |
| SU1759958A1 (ru) * | 1990-04-19 | 1992-09-07 | Дзержинский филиал Ленинградского научно-исследовательского и конструкторского института химического машиностроения | Способ нанесени пиролитического карбидохромового покрыти на металлические поверхности |
| JPH0412525A (ja) * | 1990-05-02 | 1992-01-17 | Babcock Hitachi Kk | 有機金属化学気相成長装置 |
| ES2345109T3 (es) * | 2003-09-19 | 2010-09-15 | Akzo Nobel N.V. | Metalizacion de sustrato(s) mediante un procedimiento de deposicion liquido/vapor. |
| DE112007000541T5 (de) * | 2006-03-14 | 2009-01-22 | Praxair Technology, Inc., Danbury | Selektive Trennverfahren |
| FR2904007B1 (fr) | 2006-07-21 | 2008-11-21 | Toulouse Inst Nat Polytech | Procede de depot de revetements ceramiques non oxydes. |
| FR2904006B1 (fr) * | 2006-07-21 | 2008-10-31 | Toulouse Inst Nat Polytech | Procede de depot de revetements metalliques durs |
| JP5277784B2 (ja) | 2008-08-07 | 2013-08-28 | 東京エレクトロン株式会社 | 原料回収方法、トラップ機構、排気系及びこれを用いた成膜装置 |
| RU2513496C2 (ru) * | 2012-05-31 | 2014-04-20 | Федеральное государственное унитарное предприятие "Научно-производственное объединение "Радиевый институт имени В.Г. Хлопина" | Износостойкое металлическое покрытие на основе хрома и способ его нанесения |
| WO2014074589A1 (en) * | 2012-11-06 | 2014-05-15 | Applied Materials, Inc. | Apparatus for spatial atomic layer deposition with recirculation and methods of use |
| JP6101958B2 (ja) | 2013-02-13 | 2017-03-29 | 日本パイオニクス株式会社 | アンモニア及び水素の回収方法及び再利用方法 |
| JP2015151564A (ja) | 2014-02-13 | 2015-08-24 | 東洋製罐グループホールディングス株式会社 | 原子層堆積成膜装置 |
-
2015
- 2015-12-18 FR FR1562862A patent/FR3045673B1/fr active Active
-
2016
- 2016-12-17 EP EP16831495.3A patent/EP3390686B1/fr active Active
- 2016-12-17 JP JP2018531355A patent/JP6997711B2/ja active Active
- 2016-12-17 KR KR1020187020519A patent/KR20180089515A/ko not_active Ceased
- 2016-12-17 RU RU2018125304A patent/RU2699126C1/ru not_active IP Right Cessation
- 2016-12-17 WO PCT/FR2016/053541 patent/WO2017103546A1/fr not_active Ceased
- 2016-12-17 US US16/063,405 patent/US20190003048A1/en not_active Abandoned
-
2019
- 2019-10-31 US US16/669,854 patent/US11142822B2/en active Active
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