JP2019176157A5 - - Google Patents

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Publication number
JP2019176157A5
JP2019176157A5 JP2019081609A JP2019081609A JP2019176157A5 JP 2019176157 A5 JP2019176157 A5 JP 2019176157A5 JP 2019081609 A JP2019081609 A JP 2019081609A JP 2019081609 A JP2019081609 A JP 2019081609A JP 2019176157 A5 JP2019176157 A5 JP 2019176157A5
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JP
Japan
Prior art keywords
tape
sum
base film
semiconductor processing
adhesive layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2019081609A
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Japanese (ja)
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JP6989562B2 (en
JP2019176157A (en
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Publication date
Priority claimed from JP2018061063A external-priority patent/JP6535118B1/en
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Priority to JP2019081609A priority Critical patent/JP6989562B2/en
Priority claimed from JP2019081609A external-priority patent/JP6989562B2/en
Publication of JP2019176157A publication Critical patent/JP2019176157A/en
Publication of JP2019176157A5 publication Critical patent/JP2019176157A5/ja
Application granted granted Critical
Publication of JP6989562B2 publication Critical patent/JP6989562B2/en
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Claims (3)

基材フィルムと、前記基材フィルムの少なくとも一面側に形成された粘着剤層とを有する粘着テープを有し、
前記基材フィルムは、アイオノマー樹脂を除く熱可塑性架橋樹脂からなり、
前記粘着テープは、MD方向における熱機械特性試験機により昇温時に測定した40℃〜80℃の間の1℃毎の熱変形率の微分値の総和と、TD方向における熱機械特性試験機により昇温時に測定した40℃〜80℃の間の1℃毎の熱変形率の微分値の総和との和がマイナス値であることを特徴とする半導体加工用テープ。
It has an adhesive tape having a base film and an adhesive layer formed on at least one surface side of the base film.
The base film is made of a thermoplastic crosslinked resin excluding ionomer resin.
The adhesive tape is prepared by the sum of the differential values of the thermal deformation rate for each 1 ° C. between 40 ° C. and 80 ° C. measured at the time of temperature rise by the thermomechanical property tester in the MD direction and the thermomechanical property tester in the TD direction. A tape for semiconductor processing, characterized in that the sum of the sum of the differential values of the thermal deformation rate for each 1 ° C. between 40 ° C. and 80 ° C. measured at the time of temperature rise is a negative value.
前記粘着剤層側に、接着剤層が積層されていることを特徴とする請求項1に記載の半導体加工用テープ。 The semiconductor processing tape according to claim 1, wherein an adhesive layer is laminated on the pressure-sensitive adhesive layer side. フルカットおよびハーフカットのブレードダイシング、レーザーダイシング、またはレーザーによるステルスダイシングに用いられることを特徴とする請求項1または請求項2に記載の半導体加工用テープ。
The semiconductor processing tape according to claim 1 or 2, wherein the tape is used for full-cut and half-cut blade dicing, laser dicing, or laser stealth dicing.
JP2019081609A 2018-03-28 2019-04-23 Semiconductor processing tape Active JP6989562B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019081609A JP6989562B2 (en) 2018-03-28 2019-04-23 Semiconductor processing tape

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018061063A JP6535118B1 (en) 2018-03-28 2018-03-28 Semiconductor processing tape
JP2019081609A JP6989562B2 (en) 2018-03-28 2019-04-23 Semiconductor processing tape

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2018061063A Division JP6535118B1 (en) 2018-03-28 2018-03-28 Semiconductor processing tape

Publications (3)

Publication Number Publication Date
JP2019176157A JP2019176157A (en) 2019-10-10
JP2019176157A5 true JP2019176157A5 (en) 2020-12-17
JP6989562B2 JP6989562B2 (en) 2022-01-05

Family

ID=79239765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2019081609A Active JP6989562B2 (en) 2018-03-28 2019-04-23 Semiconductor processing tape

Country Status (1)

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JP (1) JP6989562B2 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012174945A (en) * 2011-02-23 2012-09-10 Furukawa Electric Co Ltd:The Processing method of semiconductor wafer
CN104271694B (en) * 2012-05-14 2017-03-22 琳得科株式会社 Sheet having adhesive resin layer attached thereto, and method for producing semiconductor device
JP6306362B2 (en) * 2014-02-13 2018-04-04 リンテック株式会社 Extensible sheet and laminated chip manufacturing method
JP6295135B2 (en) * 2014-04-24 2018-03-14 日東電工株式会社 Dicing die bond film

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