PH12016500005B1 - Dicing sheet - Google Patents
Dicing sheetInfo
- Publication number
- PH12016500005B1 PH12016500005B1 PH12016500005A PH12016500005A PH12016500005B1 PH 12016500005 B1 PH12016500005 B1 PH 12016500005B1 PH 12016500005 A PH12016500005 A PH 12016500005A PH 12016500005 A PH12016500005 A PH 12016500005A PH 12016500005 B1 PH12016500005 B1 PH 12016500005B1
- Authority
- PH
- Philippines
- Prior art keywords
- energy ray
- pressure sensitive
- sensitive adhesive
- polymerizable compound
- dicing sheet
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
Abstract
A dicing sheet (1) comprising a base film (2) and a pressure sensitive adhesive layer (3) laminated at least on one surface of the base film (2), wherein: the pressure sensitive adhesive layer (3) is formed of a pressure sensitive adhesive composition that contains an acrylic-based polymer (A) and a polyfunctional acrylate-based energy ray polymerizable compound (B); the polyfunctional acrylate-based energy ray polymerizable compound (B) has 0.004 to 0.009 moles of a polymerizable functional group in 1 g of the polyfunctional acrylate-based energy ray polymerizable compound (B); a ratio of the polyfunctional acrylate-based energy ray polymerizable compound (B) to a total amount of the acrylic-based polymer (A) and the polyfunctional acrylatebased energy ray polymerizable compound (B) is 20 to 65 mass pcnt ; and a thickness of the pressure sensitive adhesive layer (3) is 2 to 20 æm. When the adherend is a workpiece such as a semiconductor package having a large surface roughness, the dicing sheet (1) has a sufficient adhesive strength before energy ray irradiation and also has a moderate adhesive strength after energy ray irradiation, and pressure sensitive adhesive aggregates are unlikely to be generated in the dicing sheet (1).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013141816 | 2013-07-05 | ||
PCT/JP2014/067798 WO2015002270A1 (en) | 2013-07-05 | 2014-07-03 | Dicing sheet |
Publications (2)
Publication Number | Publication Date |
---|---|
PH12016500005B1 true PH12016500005B1 (en) | 2016-03-28 |
PH12016500005A1 PH12016500005A1 (en) | 2016-03-28 |
Family
ID=52143839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PH12016500005A PH12016500005A1 (en) | 2013-07-05 | 2016-01-04 | Dicing sheet |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6317744B2 (en) |
CN (1) | CN105378899B (en) |
MY (1) | MY176995A (en) |
PH (1) | PH12016500005A1 (en) |
SG (1) | SG11201600047XA (en) |
WO (1) | WO2015002270A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015115537A1 (en) | 2014-01-29 | 2015-08-06 | 日立化成株式会社 | Resin composition, method for manufacturing semiconductor device using resin composition, and solid-state imaging element |
CN108359390A (en) * | 2014-01-29 | 2018-08-03 | 日立化成株式会社 | Adhesive composite, used adhesive composite semiconductor device manufacturing method and solid-state imager |
CN105934488A (en) | 2014-01-29 | 2016-09-07 | 日立化成株式会社 | Adhesive composition, resin cured product obtained from adhesive composition, method for manufacturing semiconductor device using adhesive composition, and solid-state imaging element |
JP6209097B2 (en) * | 2014-02-07 | 2017-10-04 | 株式会社ディスコ | Wafer processing method |
WO2016144732A1 (en) * | 2015-03-06 | 2016-09-15 | Koninklijke Philips N.V. | Method for attaching ceramic phosphor plates on light-emitting device (led) dies using a dicing tape, method to form a dicing tape, and dicing tape |
KR102595289B1 (en) * | 2017-08-29 | 2023-10-27 | 도아고세이가부시키가이샤 | Resin sheet and curable composition for producing the same |
WO2021065071A1 (en) * | 2019-10-04 | 2021-04-08 | リンテック株式会社 | Pressure-sensitive-adhesive sheet |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4063614B2 (en) * | 2002-08-30 | 2008-03-19 | 日東電工株式会社 | Water-dispersed acrylic pressure-sensitive adhesive composition for re-peeling and pressure-sensitive adhesive sheet |
JP2004186263A (en) * | 2002-11-29 | 2004-07-02 | Sekisui Chem Co Ltd | Reinforced semiconductor wafer and method for manufacturing ic chip |
JP2007238802A (en) * | 2006-03-09 | 2007-09-20 | Sekisui Chem Co Ltd | Method for processing electronic part |
JP5049620B2 (en) * | 2007-03-20 | 2012-10-17 | リンテック株式会社 | Adhesive sheet |
JP5513866B2 (en) * | 2009-12-11 | 2014-06-04 | リンテック株式会社 | Adhesive sheet for processing electronic parts |
JP5743555B2 (en) * | 2010-02-02 | 2015-07-01 | リンテック株式会社 | Dicing sheet |
JP2012180494A (en) * | 2011-02-10 | 2012-09-20 | Nitto Denko Corp | Spontaneously rolling adhesive sheet, and method of manufacturing cut piece |
EP2676991B1 (en) * | 2011-02-14 | 2020-07-15 | LG Chem, Ltd. | Substrate film and method for manufacturing same |
JP5975621B2 (en) * | 2011-11-02 | 2016-08-23 | リンテック株式会社 | Dicing sheet and semiconductor chip manufacturing method |
JP6087122B2 (en) * | 2012-12-04 | 2017-03-01 | リンテック株式会社 | Dicing sheet |
-
2014
- 2014-07-03 MY MYPI2016700001A patent/MY176995A/en unknown
- 2014-07-03 CN CN201480038559.1A patent/CN105378899B/en active Active
- 2014-07-03 SG SG11201600047XA patent/SG11201600047XA/en unknown
- 2014-07-03 WO PCT/JP2014/067798 patent/WO2015002270A1/en active Application Filing
- 2014-07-03 JP JP2015525273A patent/JP6317744B2/en active Active
-
2016
- 2016-01-04 PH PH12016500005A patent/PH12016500005A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN105378899A (en) | 2016-03-02 |
JPWO2015002270A1 (en) | 2017-02-23 |
WO2015002270A1 (en) | 2015-01-08 |
JP6317744B2 (en) | 2018-04-25 |
PH12016500005A1 (en) | 2016-03-28 |
CN105378899B (en) | 2018-05-11 |
MY176995A (en) | 2020-08-31 |
SG11201600047XA (en) | 2016-02-26 |
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