JP2019159317A - 線幅の変動に対するリソグラフィマスクの構造非依存寄与を決定する方法 - Google Patents
線幅の変動に対するリソグラフィマスクの構造非依存寄与を決定する方法 Download PDFInfo
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- 238000001459 lithography Methods 0.000 title claims abstract description 18
- 238000005259 measurement Methods 0.000 claims abstract description 48
- 238000009826 distribution Methods 0.000 claims abstract description 47
- 238000003384 imaging method Methods 0.000 claims description 65
- 238000005286 illumination Methods 0.000 claims description 55
- 230000003287 optical effect Effects 0.000 claims description 51
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Abstract
Description
を2D強度分布のフーリエ変換によって決定する段階と、スペクトル
の複数のスペクトル成分S(νxi,νyi)のデフォーカス依存性を決定する段階と、スペクトル成分の決定されたデフォーカス依存性からリソグラフィマスクの光学面粗度を表すための関数のフーリエ変換を確認する段階とを含む。
の複数のスペクトル成分S(νxi,νyi)の実数部RS(z)及び虚数部IS(z)のフォーカス依存性を決定するための規定が為される。物体粗度
のフーリエ変換
は、スペクトル成分の線形回帰線からデフォーカスの関数として今や確認することができる。
及び次式のように書くことができる照明光1の視野分布をもたらす。
λ:照明光の波長
h:物体粗度(z方向のサジタル高さ)
を生じる。このスペックルスペクトルに対して次式が成り立つ。
ν:周波数座標νx,νyを有する周波数比例波数1/λである。
H:粗度スペクトル、すなわち、物体粗度hのフーリエ変換である。
σ:瞳平面内の照明設定の強度分布である。
P:光学ユニットの瞳伝達関数、すなわち、例えば開口及び/又は掩蔽絞りによる瞳制限効果である。
φe:光学ユニットの偶数波面収差、すなわち、偶数関数によって表すことができる収差寄与である。
を決定する段階が続く。それによって、周波数座標νx及びνyの関数としての2Dスペックルスペクトル24z1から24z7までのシーケンスが生じる。
H:物体粗度の寄与である。
Θd:結像光学ユニットのデフォーカス収差である。
Θopt:結像光学ユニットの他の結像収差寄与である。
を用いて次式が成り立つ。
を例示している。選ばれた照明設定に対して、この結像収差寄与は、ゼルニケ関数Z5との高い類似性を有する。
からスペックルコントラストΔI、すなわち、空中像強度、すなわち記録された2D強度分布15ziの標準偏差を直接計算することができる。
は、スペックルスペクトルS(ν,z)のスペクトル成分S(νxi,νyi)の回帰線の勾配から決定することができる。
の複素スペクトル
は、結像光学ユニット8の開口数及び照明光学ユニット7の開口数の関数である結像光学ユニット8の光学分解能の範囲内で確認することが可能である。更に、面粗度hの空間特性及びスペクトル特性からマスク5の面粗度の原因に関する情報を確認することができる。
上式中のΔIは、結像される構造が不在の測定領域内のスペックルコントラストを表す。
0≦w≦2が成り立つ。
Claims (12)
- 線幅の変動(LWR、線幅粗度)に対するリソグラフィマスク(5)の構造非依存寄与を決定する方法であって、
1.1.リソグラフィマスク(5)を結像するための結像光学ユニット(8)を有する光学系(2)を与える段階と、
1.2.結像される構造が不在の少なくとも1つの測定領域を有するリソグラフィマスク(5)を与える段階と、
1.3.前記少なくとも1つの測定領域を照明放射線(1)で照明する段階と、
1.4.前記リソグラフィマスク(5)の前記少なくとも1つの測定領域のフォーカススタックを記録する段階と、
1.5.前記記録されたフォーカススタックの2D強度分布(15zi)を空間分解方式で評価する段階と、
を含み、
1.6.前記2D強度分布(15zi)を評価する段階は、前記検出された2D強度分布(15zi)の標準偏差のデフォーカス依存性を確認する段階を含み、かつ
1.7.前記2D強度分布(15zi)を評価する段階は、
1.7.1.前記2D強度分布(15zi)のスペクトル
を該2D強度分布(15zi)のフーリエ変換によって決定する段階と、
1.7.2.前記スペクトル
の複数のスペクトル成分S(νxi,νyi)のデフォーカス依存性を決定する段階と、
1.7.3.前記スペクトル成分S(νxi,νyi)の前記決定されたデフォーカス依存性から前記リソグラフィマスク(5)の光学面粗度を表すための関数のフーリエ変換
を確認する段階と、
を含む、方法。 - 前記2D強度分布(15zi)を評価する段階は、専らフーリエ変換及び線形代数を含むことを特徴とする請求項1に記載の方法。
- 前記2D強度分布(15zi)を評価する段階は、強度変動を確認する段階を含むことを特徴とする請求項2に記載の方法。
- 前記2D強度分布(15zi)を評価する段階は、スペックルコントラスト(ΔI)を確認する段階を含むことを特徴とする請求項3に記載の方法。
- 前記2D強度分布(15zi)を評価する段階は、スペックル相関係数(w)を確認する段階を含むことを特徴とする請求項4に記載の方法。
- 前記スペックル相関係数(w)は、既知のデフォーカス収差関数から導出されることを特徴とする請求項5に記載の方法。
- 鏡面対称照明設定が、前記測定領域を照明するために使用されることを特徴とする請求項1から請求項6のいずれか1項に記載の方法。
- 少なくとも部分的にコヒーレントな照明放射線(1)が、前記測定領域を照明するために使用されることを特徴とする請求項1から請求項7のいずれか1項に記載の方法。
- コヒーレントな照明放射線(1)が、前記測定領域を照明するために使用されることを特徴とする請求項1から請求項8のいずれか1項に記載の方法。
- EUV範囲内の波長を有する照明放射線(1)が、前記測定領域を照明するために使用されることを特徴とする請求項1から請求項9のいずれか1項に記載の方法。
- 請求項1から請求項10のいずれか1項に記載の方法を実行するための計測系(2)であって、
11.1.前記測定領域を照明放射線(1)で照明するための照明光学ユニット(7)、
11.2.前記測定領域を空間分解検出デバイス(9)の上に結像するための結像光学ユニット(8)、及び
11.3.空間分解検出デバイス(9)、
を含む、計測系(2)。 - 前記記録されたフォーカススタックの2D強度分布(15zi)を評価するために、コンピュータデバイス(10)が、前記検出デバイス(9)にデータ転送方式で接続されることを特徴とする請求項11に記載の計測系(2)。
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DE102018202639.4A DE102018202639B4 (de) | 2018-02-21 | 2018-02-21 | Verfahren zur Bestimmung eines strukturunabhängigen Beitrags einer Lithographie-Maske zu einer Schwankung der Linienbreite |
DE102018202639.4 | 2018-02-21 |
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JP2019159317A true JP2019159317A (ja) | 2019-09-19 |
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TWI692678B (zh) | 2020-05-01 |
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