JP2019153711A - 成膜方法および成膜装置 - Google Patents
成膜方法および成膜装置 Download PDFInfo
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Abstract
Description
本発明に係る成膜方法をSiN膜の成膜に適用した例について説明する。ここでは、被処理体として半導体ウエハ(以下、単にウエハと記す)Wを用い、その上にALD法によりSiN膜を成膜する。
610〜650℃、例えば630℃であり、成膜時間Zは膜厚により決定される適宜の時間とされる。
圧力:133〜1333Pa(1〜10Torr)
HCDガス流量:10〜1000sccm
NH3ガス流量:100〜10000sccm
ステップ1の時間:0.1〜5min
ステップ2の時間:0.1〜10min
ステップ3の時間:0.1〜5min
ステップ4の時間:0.1〜10min
また、サイクル数は膜厚によって変化するが、例えば10〜100回である。
(共通条件)
圧力:133Pa(1Torr)
HCDガス流量:300sccm
NH3ガス流量:5000sccm
(従来の方法の条件)
成膜温度:630℃
成膜時間:60min
サイクル数:20回
(本実施形態の方法の条件)
成膜開始時の温度X:550℃
成膜終了時の温度Y:630℃
成膜時間Z:60min
サイクル数:20回
その結果、膜厚の平均値は、従来の方法では31.8nm、本実施形態の方法では28.2nmであった。また、ウエハボートのTopのウエハ面内膜厚均一性(ばらつきレンジ)は、従来の方法では3.18%、本実施形態の方法では1.98%であった。このことから、両者の平均膜厚が大差ない条件で、本実施形態の方法のほうが従来の方法よりもウエハボートTopにおける面内膜厚均一性が良好であることが確認された。また、ウエハの面間膜厚均一性(ばらつきレンジ)は、従来の方法では1.94%、本実施形態では1.24%であった。このことから、面間膜厚均一性についても本実施形態の方法のほうが従来の方法のほうが良好であることが確認された。
次に、上記実施形態に係る成膜方法に適用可能な成膜装置の一例について説明する。図8は上記実施形態に係る成膜方法に適用可能な成膜装置の一例を示す縦断面図、図9はその水平断面図である。
成膜に際しては、制御部160において記憶媒体に記憶された処理レシピに基づいて以下のように行われる。
以上、本発明の実施の形態について説明したが、この発明は、上記の実施形態に限定されることはなく、その趣旨を逸脱しない範囲で種々変形可能である。
101;処理容器
101a;外管
101b;内管
102;本体部
120;ガス供給機構
121;HCDガス供給源
122;NH3ガス供給源
147,147a,147b;排気口
151;排気装置
152;加熱機構
160;制御部
W;半導体ウエハ(被処理体)
Claims (11)
- 被処理体上に成膜原料ガスと反応ガスとを交互に供給して原子層堆積法にて所定の膜を成膜する成膜方法であって、
前記成膜原料ガスの吸着のみが生じる温度で前記原子層堆積法による成膜を開始し、
温度を上昇させながら前記原子層堆積法による成膜を継続し、
前記成膜原料ガスの分解が生じる温度で前記原子層堆積法による成膜を終了することを特徴とする成膜方法。 - 前記成膜を終了する温度に達した時点で前記原子層堆積法による成膜を終了することを特徴とする請求項1に記載の成膜方法。
- 前記成膜を終了する温度に達した後、前記所定の膜の膜厚に応じた所定時間、前記成膜を終了する温度で前記原子層堆積法による成膜を継続することを特徴とする請求項1に記載の成膜方法。
- 前記成膜原料ガスおよび前記反応ガスを供給しない状態で、前記被処理体を、前記成膜を開始する温度で安定化させ、その後、前記成膜原料ガスおよび前記反応ガスを供給して前記原子層堆積法による成膜を開始することを特徴とする請求項1から請求項3のいずれか1項に記載の成膜方法。
- 前記原子層堆積法による成膜は、複数の被処理体に対して一括して成膜を行うバッチ式装置により行うことを特徴とする請求項1から請求項4のいずれか1項に記載の成膜方法。
- 前記成膜原料ガスとして、シリコンを含むシリコン原料ガスを用い、前記反応ガスとして、前記シリコン原料ガスを窒化する窒化ガスを用い、前記所定の膜としてシリコン窒化膜を成膜することを特徴とする請求項1から請求項5のいずれか1項に記載の成膜方法。
- 前記シリコン原料ガスはヘキサクロロジシランガスであり、前記窒化ガスはアンモニアガスであることを特徴とする請求項6に記載の成膜方法。
- 前記成膜を開始する温度は、530〜570℃であり、前記成膜を終了する温度は、610〜650℃であることを特徴とする請求項7に記載の成膜方法。
- 被処理体上に成膜原料ガスと反応ガスとを交互に供給して原子層堆積法にて所定の膜を成膜する成膜装置であって、
前記被処理体を収容する処理容器と、
前記処理容器内に前記成膜原料ガスと前記反応ガスを供給するガス供給部と、
前記被処理体を加熱する加熱機構と、
前記処理容器内を排気して減圧状態とする排気機構と、
前記ガス供給部、前記加熱機構、および前記排気機構を制御する制御部と
を具備し、
前記制御部は、前記成膜原料ガスの吸着のみが生じる温度で前記原子層堆積法による成膜を開始させ、温度を上昇させながら前記原子層堆積法による成膜を継続させ、前記成膜原料ガスの分解が生じる温度で前記原子層堆積法による成膜を終了させるように制御することを特徴とする成膜装置。 - 前記成膜装置は、前記処理容器内に複数の被処理体を収容してバッチ処理を行うバッチ式装置であることを特徴とする請求項9に記載の成膜装置。
- コンピュータ上で動作し、成膜装置を制御するためのプログラムが記憶された記憶媒体であって、前記プログラムは、実行時に、請求項1から請求項8のいずれかの成膜方法が行われるように、コンピュータに前記成膜装置を制御させる、記憶媒体。
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