JP2019119086A - 基板の接合方法、透明基板積層体及び基板積層体を備えるデバイス - Google Patents
基板の接合方法、透明基板積層体及び基板積層体を備えるデバイス Download PDFInfo
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- JP2019119086A JP2019119086A JP2017254137A JP2017254137A JP2019119086A JP 2019119086 A JP2019119086 A JP 2019119086A JP 2017254137 A JP2017254137 A JP 2017254137A JP 2017254137 A JP2017254137 A JP 2017254137A JP 2019119086 A JP2019119086 A JP 2019119086A
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- metal oxide
- thin film
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- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/26—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with at least one layer which influences the bonding during the lamination process, e.g. release layers or pressure equalising layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
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- Laminated Bodies (AREA)
- Lining Or Joining Of Plastics Or The Like (AREA)
- Joining Of Glass To Other Materials (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
「透明基板」とは、可視光を含む光の透過率が高い基板をいう。例えば可視光線透過率が90%以上であってもよい。「透明基板」は、SiO2を含むガラス、強化ガラス、高分子などを基材とし又は含む基板であってもよい。本開示に含まれる基板の接合方法は、多数の利点を有するが、一つの利点として、透過性を損ねる又は大きく低下させえることなく接合することがこれまでできなかったSiO2を含む基板も、高い光透過率を維持しつつ接合できる。
金属酸化物の金属は、典型金属のアルカリ金属:Li、Na、K、Rb、Cs又はアルカリ土類金属:Ca、Sr、Ba、Ra、マグネシウム族元素:Be、Mg、Zn、Cd、Hg、アルミニウム族元素:Al、Ga、In、希土類元素:Y、La、Ce、Pr、Nd、Sm、Eu、スズ族元素:Ti、Zr、Sn、Hf、Pb、Th、鉄族元素:Fe、Co、Ni、土酸元素:V、Nb、Ta、クロム族元素:Cr、Mo、W、U、マンガン族元素:Mn、Re、貴金属:Cu、Ag、Au、白金族元素:Ru、Rh、Pd、Os、Ir、Ptから選択されてもよい。当該金属は一種類の金属からなっていてもよく、複数の金属を含んでいてもよく、合金でもよい。金属は、Siであってもよく、いわゆる金属シリコンであってもよい。金属は、シリコン以外の金属であってもよい。
金属酸化物の薄膜を基板の接合表面に形成することは、プラズマCVD法、スパッタ法、蒸着法、ALD(原子層堆積)法、(リアクティブイオンエッチ)RIE法によってなされてもよい。しかし、金属酸化物の薄膜を形成すことは、これらの方法に限られず、他の方法を用いて行ってもよい。
表面活性化処理は、エネルギー粒子を金属の酸化物の表面に対して照射することを含んでいてもよい。
貼り合わせは、表面活性化された金属酸化物の薄膜を介して、基板の接合面を互いに接触させることを含んでいてもよい。接触させる際に基板の接合面と反対側又は接合面以外の面から、基板に対して力を加えてもよい。例えば、接合面に垂直方向の力を基板の外側から加えてもよい。ある実施形態では、加圧は、接触した接合面全体に実質的に均等になるように力を加えてもよい。別の実施形態では、加圧は、接触した接合面の異なる面に対してそれぞれのタイミングで行われてもよい。加圧の際の、力の強さは時間的に一定であってもよく、可変であってもよい。加圧は、接合面の各部位に対して異なるタイミングで行ってもよい。接触した基板に対して、加圧装置をスライドさせて動かすことで、接合面に対して順次加圧してもよい。当該加圧装置は、ローラ状の加圧部を有していてもよい。
本開示に含まれる基板の接合方法は、貼り合わせの後に、積層体に対して加熱することを更に含んでいてもよい。加熱の温度は、100℃、200℃であってもよく、100℃以上の値であってもよく、210℃、220℃以下又は未満の値であってもよい。加熱の温度は、100℃又は150℃の温度以上またはこれより高くてもよい。加熱の温度は、400℃、300℃、250℃、225℃、220℃、210℃、200℃、又は150℃の温度以下又は未満であってもよい。加熱の温度は、実質的に100℃、150℃、200℃であってもよい。加熱は、基板全体に対して同時行ってもよく、基板の部分ごとに行ってもよい。
本開示に含まれる基板の接合方法は、成膜前に基板の接合表面に対してエネルギー粒子を照射することを更に含んでいてもよい。エネルギー粒子の照射により、基板の接合表面を活性化することで、当該接合表面とその上に形成される薄膜との接合強度を上げることができる。
本開示に係る方法を用いて、ガラス基板を接合し、その光透過率と接合強度を評価した。
本開示に係る方法を用いて、高分子基板を接合した。
上記のように、基板が貼り合わされてできた基板積層体を、更に100℃、150℃又は200℃で加熱した。加熱後の接合強度は、加熱なしの接合強度に比べ一般に上昇することが確認された。加熱処理での雰囲気は、大気であってもよく、窒素やアルゴンなどの不活性ガスであってもよい。
Claims (17)
- 少なくとも一方が透明基板である一対の基板の両方又はいずれか一方の接合表面に金属酸化物の薄膜を形成することと、
前記金属酸化物の薄膜を介して、前記一対の基板の接合面を互いに接触させることを備える、基板の接合方法。 - 前記接合表面に金属酸化物の薄膜を形成することは、イオンビームスパッタ法による、請求項1に記載の基板の接合方法。
- 金属酸化物の薄膜を基板の接合表面に形成することは、金属をターゲットとし、実質的に不活性ガスと酸素とからなる混合ガスで行うスパッタ法により成膜することを含む、請求項1又は2に記載の基板の接合方法。
- 前記接合表面に金属酸化物の薄膜を形成することは、ALD法による、請求項1に記載の基板の接合方法。
- 接合表面に金属酸化物の薄膜を形成することの前に、前記基板の接合表面に対して、エネルギー粒子を照射することを更に備える、請求項1から4のいずれか一項に記載の基板の接合方法。
- 前記金属酸化物の薄膜の表面に対して、エネルギー粒子を照射することを更に備える、請求項1から5のいずれか一項に記載の基板の接合方法。
- 前記金属酸化物の薄膜の表面に対して、エネルギー粒子を照射することとは、実質的に不活性ガスと酸素ガスとからなる混合ガスのエネルギー粒子を照射することを含む、請求項1から6のいずれか一項に記載の基板の接合方法。
- 少なくとも、前記金属酸化物の薄膜を形成することから、接合面を接触させることまでを真空中で行う、請求項1から7のいずれか一項に記載の基板の接合方法。
- 前記基板を貼り合わせることの後に、加熱処理を行うことを更に備える、請求項1から8のいずれか一項に記載の基板の接合方法。
- 加熱処理は200℃以下で行う、請求項9に記載の基板の接合方法。
- 貼り合わされる基板の両方又はいずれか一方は透明なガラス基板である、請求項1から10のいずれか一項に記載の基板の接合方法。
- 貼り合わされる基板の一方の基板は透明なガラス基板であり、他方の基板は光学素子を含む基板である、請求項1から10のいずれか一項に記載の基板の接合方法。
- 前記接合される基板の少なくとも一方の接合面が実質的に高分子材料からなる請求項1から10のいずれか一項に記載の基板の接合方法。
- 請求項1から13のいずれか一項に記載の基板の接合方法により形成された基板積層体を備えるデバイス。
- 透明基板と、
光学素子を含む基板と、
前記透明基板と前記光学素子を含む基板との間に介在する金属酸化物と、
から実質的になる基板積層体であって、
前記基板積層体における、前記透明基板を通過して前記光学素子への光透過率が、前記透明基板と前記光学素子を含む基板を重ね合わせた場合の、前記透明基板を通過して前記光学素子への光透過率の97%以上である基板積層体を備えるデバイス。 - 第一の透明基板と、
第二の透明基板と、
前記第一の透明基板と第二の透明基板との間に介在する金属酸化物と、
から実質的になる透明基板積層体であって、
前記透明基板積層体の光透過率が、一対の透明基板を重ね合わせた場合の光透過率の97%以上である、透明基板積層体。 - 請求項16の透明基板積層体を備えるデバイス。
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EP4026644A4 (en) * | 2019-09-05 | 2023-09-27 | Tohoku University | CHEMICAL BONDING METHOD AND BONDED STRUCTURE |
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Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004337927A (ja) * | 2003-05-15 | 2004-12-02 | Tadatomo Suga | 基板接合方法および基板接合装置 |
JP2008207221A (ja) * | 2007-02-27 | 2008-09-11 | Takehito Shimazu | 常温接合方法 |
JP2009199902A (ja) * | 2008-02-21 | 2009-09-03 | Seiko Epson Corp | 有機発光装置および電子機器 |
WO2013154107A1 (ja) * | 2012-04-10 | 2013-10-17 | ランテクニカルサービス株式会社 | 高分子フィルムと高分子フィルムとを接合する方法、高分子フィルムと無機材料基板とを接合する方法、高分子フィルム積層体及び高分子フィルムと無機材料基板との積層体 |
WO2013187500A1 (ja) * | 2012-06-15 | 2013-12-19 | ランテクニカルサービス株式会社 | 電子素子の封止方法及び基板接合体 |
JP2014123514A (ja) * | 2012-12-21 | 2014-07-03 | Ran Technical Service Kk | 電子素子の封止方法及び封止構造 |
JP2015207615A (ja) * | 2014-04-18 | 2015-11-19 | 日亜化学工業株式会社 | 半導体発光装置およびその製造方法 |
JP2017157611A (ja) * | 2016-02-29 | 2017-09-07 | 日亜化学工業株式会社 | 発光装置及びその製造方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008094063A (ja) * | 2006-10-16 | 2008-04-24 | Asahi Kasei Chemicals Corp | 金属酸化物積層体 |
KR20150023312A (ko) * | 2012-05-29 | 2015-03-05 | 아사히 가라스 가부시키가이샤 | 유리 적층체 및 전자 디바이스의 제조 방법 |
CN102941712B (zh) * | 2012-10-23 | 2015-07-22 | 江南大学 | 一种高分子材料-金属氧化物薄膜复合材料及其制备方法 |
US9703011B2 (en) * | 2013-05-07 | 2017-07-11 | Corning Incorporated | Scratch-resistant articles with a gradient layer |
JP6387780B2 (ja) * | 2013-10-28 | 2018-09-12 | 日亜化学工業株式会社 | 発光装置及びその製造方法 |
JP6282142B2 (ja) * | 2014-03-03 | 2018-02-21 | 日東電工株式会社 | 赤外線反射基板およびその製造方法 |
-
2017
- 2017-12-28 JP JP2017254137A patent/JP7045186B2/ja active Active
-
2018
- 2018-12-21 KR KR1020207021853A patent/KR20200105868A/ko active IP Right Grant
- 2018-12-21 WO PCT/JP2018/047204 patent/WO2019131490A1/ja unknown
- 2018-12-21 US US16/958,955 patent/US20210017075A1/en active Pending
- 2018-12-21 EP EP18897427.3A patent/EP3736134A4/en active Pending
- 2018-12-21 CN CN201880087846.XA patent/CN111655490B/zh active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004337927A (ja) * | 2003-05-15 | 2004-12-02 | Tadatomo Suga | 基板接合方法および基板接合装置 |
JP2008207221A (ja) * | 2007-02-27 | 2008-09-11 | Takehito Shimazu | 常温接合方法 |
JP2009199902A (ja) * | 2008-02-21 | 2009-09-03 | Seiko Epson Corp | 有機発光装置および電子機器 |
WO2013154107A1 (ja) * | 2012-04-10 | 2013-10-17 | ランテクニカルサービス株式会社 | 高分子フィルムと高分子フィルムとを接合する方法、高分子フィルムと無機材料基板とを接合する方法、高分子フィルム積層体及び高分子フィルムと無機材料基板との積層体 |
WO2013187500A1 (ja) * | 2012-06-15 | 2013-12-19 | ランテクニカルサービス株式会社 | 電子素子の封止方法及び基板接合体 |
JP2015111596A (ja) * | 2012-06-15 | 2015-06-18 | 須賀 唯知 | 電子素子の封止方法及び基板接合体 |
JP2014123514A (ja) * | 2012-12-21 | 2014-07-03 | Ran Technical Service Kk | 電子素子の封止方法及び封止構造 |
JP2015207615A (ja) * | 2014-04-18 | 2015-11-19 | 日亜化学工業株式会社 | 半導体発光装置およびその製造方法 |
JP2017157611A (ja) * | 2016-02-29 | 2017-09-07 | 日亜化学工業株式会社 | 発光装置及びその製造方法 |
Non-Patent Citations (1)
Title |
---|
"Room-temerature Bonding of Oxide Wafers by Ar-beam Sirface Activation", ECS TRANSACTIONS, vol. Volume 16, Issue 8, JPN7021002987, 3 October 2008 (2008-10-03), US, pages 531 - 537, ISSN: 0004582295 * |
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