JP2019114590A - Vacuum suction member - Google Patents

Vacuum suction member Download PDF

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JP2019114590A
JP2019114590A JP2017244691A JP2017244691A JP2019114590A JP 2019114590 A JP2019114590 A JP 2019114590A JP 2017244691 A JP2017244691 A JP 2017244691A JP 2017244691 A JP2017244691 A JP 2017244691A JP 2019114590 A JP2019114590 A JP 2019114590A
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main surface
vacuum suction
base
suction member
substrate
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JP7014590B2 (en
Inventor
北林 徹夫
Tetsuo Kitabayashi
徹夫 北林
誠浩 佐藤
Seihiro Sato
誠浩 佐藤
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Niterra Co Ltd
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NGK Spark Plug Co Ltd
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Abstract

To provide a vacuum suction member capable of improving overall flatness of a base plate including an outer region.SOLUTION: A vacuum suction member comprises: a base body 1; a plurality of convex sections 10 protruded from a main surface 102 of the base body 1; and a ventilation passage 20 which passes through the base body 1 and has an opening section 202 on the main surface 102 of the base body 1. The plurality of convex sections 10 are made up of an inner convex section group 11 arranged in an inner region Son the main surface 102 of the base body 1 and an outer convex section group 12 arranged in an annular outer region Ssurrounding the inner region Son the main surface 102 of the base body 1. A position (a protrusion height H) of an edge face 1220 measured from the main surface 102 of the base body 1 on each of a plurality of designated outer convex sections 122 which is at least a portion of a plurality of outer convex sections 122 constituting the outer convex section group 12 is higher than the position (a protrusion height H) of an edge face 1120 measured from the main surface 102 of the base body 1 on each of a plurality of inner convex sections 112 constituting the inner convex section group 11.SELECTED DRAWING: Figure 1

Description

本発明は、半導体ウエハなど基板を真空吸着保持するために用いられる真空吸着部材に関する。   The present invention relates to a vacuum suction member used to vacuum hold a substrate such as a semiconductor wafer.

半導体ウエハなどの被加工物を吸着保持する吸着面を有するポーラスセラミックスからなる吸着部と、当該吸着部を囲むスポンジ状の弾性部材で形成され、上面高さが吸着面よりも高い環状シール部と、を備えているチャックテーブルが提案されている(例えば、特許文献1参照)。   An adsorption portion made of porous ceramic having an adsorption surface for adsorbing and holding a workpiece such as a semiconductor wafer, and an annular seal portion formed of a sponge-like elastic member surrounding the adsorption portion and having an upper surface height higher than the adsorption surface There has been proposed a chuck table provided with (see, for example, Patent Document 1).

被加工物がチャックテーブルに載置されると、当該被加工物は少なくとも周縁領域において環状シール部に接触した状態となる。この状態で、吸着部の吸着面とは反対側で負圧領域が生成されると、環状シール部および被加工物により画定されている空間に負圧領域が形成される。これに応じて、被加工物に対して吸着面に向かう吸引力が作用し、吸着面に接近する被加工物によって環状シール部の上面高さが吸着面の高さと同一になるまで環状シール部が押しつぶされる。これにより、被加工物の平坦度の向上が図られている。   When the workpiece is placed on the chuck table, the workpiece is in contact with the annular seal at least in the peripheral region. In this state, when a negative pressure region is generated on the side opposite to the suction surface of the suction portion, a negative pressure region is formed in the space defined by the annular seal portion and the workpiece. In response to this, a suction force acting on the work surface acts on the work surface, and the annular seal portion is formed until the height of the upper surface of the annular seal portion becomes the same as the height of the work surface due to the work object approaching the work surface. Is crushed. Thereby, the flatness of the workpiece is improved.

特開2014−072510号公報JP, 2014-072510, A

しかし、基板の周縁領域である外側領域において反り上がっているまたは垂れ下がっている場合がある。この場合、基板の平坦度が内側領域において確保されたとしても外側領域において局所的に低下する。これにより、基板の外側領域に対して、所望の回路形成のためのエッチング処理などの所定の処理を施すことが困難となる。
そこで、本発明は、外側領域を含めて基板の全体的な平坦度の向上を図ることができる真空吸着部材を提供することを目的とする。
However, it may bow or sag in the outer area, which is the peripheral area of the substrate. In this case, even if the flatness of the substrate is ensured in the inner region, it locally decreases in the outer region. As a result, it becomes difficult to perform predetermined processing such as etching processing for forming a desired circuit on the outer region of the substrate.
Then, an object of this invention is to provide the vacuum suction member which can aim at the improvement of the whole planarity of a board | substrate including an outer side area | region.

本発明の真空吸着部材は、基体と、前記基体の主面から突出している複数の凸部と、前記基体の内部を通り、前記基体の主面に開口を有する真空吸引経路と、前記複数の凸部が、前記基体の主面において内側領域に配置されている内側凸部群と、前記基体の主面において前記内側領域を取り囲む環状の外側領域に配置されている外側凸部群と、により構成され、前記外側凸部群のうち少なくとも一部を構成する複数の指定外側凸部のそれぞれの前記基体の主面を基準とする端面位置が、前記内側凸部群を構成する複数の内側凸部のそれぞれの前記基体の主面を基準とする端面位置よりも高く、かつ、当該複数の指定外側凸部のそれぞれの一部が残りの部分よりも弾性率が低い弾性素材により構成されていることを特徴とする。   The vacuum suction member of the present invention comprises a substrate, a plurality of convex portions projecting from the main surface of the substrate, a vacuum suction path having an opening in the main surface of the substrate passing through the inside of the substrate, and a plurality of the plurality An inner convex group disposed in an inner area of the main surface of the base and an outer convex group disposed in an annular outer area surrounding the inner area of the main surface of the base An end surface position based on the main surface of the base of each of the plurality of designated outer convex portions constituting at least a part of the outer convex portion group is constituted by a plurality of inner convex portions constituting the inner convex portion group And a part of each of the plurality of designated outer convex parts is made of an elastic material having a lower elastic modulus than the remaining parts, which is higher than the end face position based on the main surface of the base of each part It is characterized by

本発明の真空吸着部材によれば、基体の主面側において基板が真空吸着部材に載置されることにより、基体の主面から突出する複数の凸部のうち少なくとも一部の凸部により基板が支持される。各指定外側凸部の端面位置(面の「位置」という記載は、「基体の主面を基準とする当該面の位置」を意味する。)が、各内側凸部の端面位置よりも高いため、基板の外側領域の少なくとも一部に反り上がりまたは垂れ下がりがあっても、当該基板の外側領域の少なくとも一部が対応する指定外側凸部により支持されうる。この際、指定外側凸部の一部を構成する弾性素材が、当該指定外側凸部の端面位置を下げるように弾性変形することにより、基板の外側領域の少なくとも一部が指定外側凸部から受ける抗力が緩和されうる。   According to the vacuum suction member of the present invention, the substrate is mounted on the vacuum suction member on the main surface side of the substrate, whereby at least a part of the plurality of convex portions protruding from the main surface of the substrate is the substrate Is supported. Because the end surface position of each designated outer convex portion (description of “position of surface” means “position of the surface with reference to the main surface of the base”) is higher than the end surface position of each inner convex portion Even if at least a portion of the outer region of the substrate is warped or sagging, at least a portion of the outer region of the substrate can be supported by the corresponding designated outer convex portion. At this time, at least a portion of the outer region of the substrate is received from the designated outer convex portion by elastically deforming an elastic material constituting a portion of the designated outer convex portion so as to lower the end surface position of the designated outer convex portion. Drag can be mitigated.

この状態で、基体の主面および基板の裏面により挟まれた空間から通気経路を介して空気が排出されることにより、当該空間に負圧領域が形成される。その結果、基板の内側領域が内側凸部群により支持される一方、基板の外側領域が外側凸部群のうち少なくとも一部を構成する複数の指定外側凸部により支持される。基板の外側領域の少なくとも一部に反り上がりまたは垂れ下がりがあっても、指定外側凸部の一部を構成する弾性素材が、当該指定外側凸部の端面位置を内側凸部の端面位置に一致させるように弾性変形することができる。また、指定外側凸部の一部が残りの部分よりも弾性率が低い弾性素材により構成されているため、指定外側凸部の全部が当該弾性素材により構成されている場合よりも、弾性素材の弾性変形による指定外側凸部の端面位置の変化量が制限される。よって、前記のような形状の基板であっても、基板表面の全体的な平坦度の向上が図られるように当該基板が真空吸着保持されうる。   In this state, air is discharged from the space sandwiched between the main surface of the base and the back surface of the substrate through the ventilation path to form a negative pressure region in the space. As a result, the inner region of the substrate is supported by the inner convex group, and the outer region of the substrate is supported by the plurality of designated outer convex portions constituting at least a part of the outer convex group. Even if at least a part of the outer region of the substrate is warped or drooping, the elastic material forming a part of the designated outer convex portion causes the end face position of the designated outer convex portion to coincide with the end face position of the inner convex portion. Can be elastically deformed. In addition, since a part of the designated outer convex part is made of an elastic material having a lower elastic modulus than the remaining part, it is more elastic than in the case where all of the designated outer convex parts are made of the elastic material. The amount of change in the end surface position of the designated outer convex portion due to elastic deformation is limited. Therefore, even in the case of the substrate having the above-mentioned shape, the substrate can be held by vacuum suction so as to improve the overall flatness of the substrate surface.

本発明の真空吸着部材において、前記複数の指定外側凸部のそれぞれが、前記基体の主面から突出している第1要素と、前記第1要素の端面に連続して設けられている前記弾性素材により構成されている第2要素と、を備え、前記第2要素の前記基体の主面を基準とする端面位置が前記複数の内側凸部のそれぞれの前記基体の主面を基準とする端面位置よりも高いことが好ましい。   In the vacuum suction member according to the present invention, the elastic material wherein each of the plurality of designated outer convex portions is provided continuously to a first element protruding from the main surface of the base and an end face of the first element And an end surface position of the second element with respect to the main surface of the base is an end surface position with respect to the main surface of the base of each of the plurality of inner protrusions. Higher than is preferable.

当該構成の真空吸着部材によれば、基板の外側領域の少なくとも一部に反り上がりまたは垂れ下がりがあっても、指定外側凸部の一部を構成する第2要素が、当該指定外側凸部の端面位置ひいては第2要素の端面位置を内側凸部の端面位置に一致させるように弾性変形することができる。また、指定外側凸部の一部である第2要素が弾性素材により構成されている一方、残りの部分である第1要素は第2要素よりも弾性率が高いため、弾性素材の弾性変形による指定外側凸部の端面位置の変化量が抑制される。よって、前記のような形状の基板であっても、基板表面の全体的な平坦度の向上が図られるように当該基板が真空吸着保持されうる。   According to the vacuum suction member of the configuration, the second element constituting a part of the designated outer convex part is an end face of the designated outer convex part even if at least a part of the outer region of the substrate is warped or sagging. The position can be elastically deformed so as to make the end surface position of the second element coincide with the end surface position of the inner convex portion. Also, while the second element which is a part of the designated outer convex portion is made of an elastic material, the first element which is the remaining part has a higher elastic modulus than the second element, so the elastic deformation of the elastic material The amount of change in the end surface position of the designated outer convex portion is suppressed. Therefore, even in the case of the substrate having the above-mentioned shape, the substrate can be held by vacuum suction so as to improve the overall flatness of the substrate surface.

本発明の真空吸着部材において、前記弾性素材の弾性率E[Pa]、前記弾性素材の前記基体の主面の垂線方向についての長さL[m]および前記弾性素材の前記基体の主面に平行な断面における断面積S[m2]が、4[MPa]≦Eおよび1.0×10-7≦L/(E×S)≦5.0×10-6により表わされる条件を満足することが好ましい。 In the vacuum suction member according to the present invention, the elastic modulus E [Pa] of the elastic material, the length L [m] of the elastic material in the direction perpendicular to the main surface of the substrate and the main surface of the elastic material The cross-sectional area S [m 2 ] in parallel cross sections satisfies the condition represented by 4 [MPa] ≦ E and 1.0 × 10 −7 ≦ L / (E × S) ≦ 5.0 × 10 −6 Is preferred.

当該構成の真空吸着部材によれば、指定外側凸部の一部を構成する弾性素材の弾性率E、長さLおよび断面積Sが、外側領域の少なくとも一部に反り上がりまたは垂れ下がりがある基板の平坦度の向上を図る観点から適当に設計されている。   According to the vacuum suction member having the above configuration, the elastic modulus E, the length L, and the cross-sectional area S of the elastic material constituting a part of the designated outer convex portion are substrates having a warp or sag in at least a part of the outer region. It is designed appropriately from the viewpoint of improving the flatness of the

本発明の真空吸着部材において、前記複数の指定外側凸部のそれぞれが、前記基体とは別個に構成されている第1要素と、前記基体に支持された状態で前記第1要素を端部で支持している前記弾性要素により構成されている第2要素と、を備え、前記第1要素の端面位置が前記複数の内側凸部のそれぞれの端面位置よりも高いことが好ましい。   In the vacuum suction member according to the present invention, each of the plurality of designated outer convex portions is a first element which is configured separately from the base, and the first element is supported by the base at an end It is preferable that a second element configured of the supporting elastic element is provided, and an end surface position of the first element is higher than an end surface position of each of the plurality of inner convex portions.

当該構成の真空吸着部材によれば、基板の外側領域の少なくとも一部に反り上がりまたは垂れ下がりがあっても、指定外側凸部の一部を構成する第2要素が、当該指定外側凸部の端面位置ひいては第1要素の端面位置を内側凸部の端面位置に一致させるように弾性変形することができる。また、指定外側凸部の一部である第2要素が弾性素材により構成されている一方、残りの部分である第1要素は第2要素よりも弾性率が高いため、弾性素材の弾性変形による指定外側凸部の端面位置の変化量が抑制される。よって、前記のような形状の基板であっても、基板表面の全体的な平坦度の向上が図られるように当該基板が真空吸着保持されうる。   According to the vacuum suction member of the configuration, the second element constituting a part of the designated outer convex part is an end face of the designated outer convex part even if at least a part of the outer region of the substrate is warped or sagging. The position can be elastically deformed so as to make the end surface position of the first element coincide with the end surface position of the inner convex portion. Also, while the second element which is a part of the designated outer convex portion is made of an elastic material, the first element which is the remaining part has a higher elastic modulus than the second element, so the elastic deformation of the elastic material The amount of change in the end surface position of the designated outer convex portion is suppressed. Therefore, even in the case of the substrate having the above-mentioned shape, the substrate can be held by vacuum suction so as to improve the overall flatness of the substrate surface.

本発明の真空吸着部材において、前記基体の主面から窪んで設けられている凹部をさらに備え、前記第1要素が前記凹部に部分的に変位可能に挿入され、前記第2要素が前記凹部の内部に収容されて前記凹部の底部により支持された状態で前記第1要素を支持していることが好ましい。   In the vacuum suction member according to the present invention, the vacuum suction member further comprises a recess provided recessed from the main surface of the base, the first element being partially displaceably inserted in the recess, and the second element being the recess It is preferable that the first element is supported while being accommodated inside and supported by the bottom of the recess.

当該構成の真空吸着部材によれば、第2要素の弾性変形に伴って第1要素を凹部により案内しながら変位させ、これにより指定外側凸部の端面位置ひいては第1要素の端面位置が高精度で調節されうる。   According to the vacuum suction member of the configuration, the first element is displaced while being guided by the recess along with the elastic deformation of the second element, whereby the end face position of the designated outer convex part and hence the end face position of the first element is highly accurate It can be adjusted with

本発明の真空吸着部材において、前記複数の凸部のそれぞれを囲むように、前記基体の主面から突出する環状凸部をさらに備え、前記環状凸部の前記基体の主面を基準とする端面位置が、前記複数の指定外側凸部のそれぞれの前記基体の主面を基準とする端面位置よりも低いまたは前記複数の指定外側凸部のそれぞれの前記基体の主面を基準とする端面位置と同一であることが好ましい。   The vacuum suction member of the present invention further includes an annular convex portion protruding from the main surface of the base so as to surround each of the plurality of convex portions, and an end face of the annular convex portion with respect to the main surface of the base An end surface position relative to the main surface of the base of each of the plurality of designated outer convex portions, or a position lower than an end surface position relative to the main surface of the base of each of the plurality of designated outer convex portions; Preferably they are identical.

当該構成の真空吸着部材によれば、少なくとも一部の凸部により支持された状態の基板の裏面と、基体の主面とにより挟まれた空間が周囲を環状凸部により囲まれている分だけ、当該空間においてより強い負圧領域が形成されうる。このため、当該空間に負圧領域が形成された際、基板の裏面と複数の内側凸部および複数の指定外側凸部のそれぞれの端面とを確実に当接させることができる。また、環状凸部の端面と基板の裏面との間に間隙が存在する場合、当該空間に負圧領域が形成される際、当該間隙を通じて当該空間に流れ込む空気の流速が局所的に高くなり、基板の外側領域に対してベルヌーイ力を作用させることができる。このため、当該空間に負圧領域が形成された際、基板の裏面と複数の指定外側凸部のそれぞれの端面とをさらに確実に当接させることができる。   According to the vacuum suction member of the configuration, the space between the back surface of the substrate supported by at least a part of the convex portion and the main surface of the base is surrounded by the annular convex portion. A stronger negative pressure region may be formed in the space. Therefore, when the negative pressure region is formed in the space, the end face of the back surface of the substrate can be reliably brought into contact with the end faces of the plurality of inner protrusions and the plurality of designated outer protrusions. Further, when a gap exists between the end face of the annular convex portion and the back surface of the substrate, when a negative pressure region is formed in the space, the flow velocity of air flowing into the space through the gap locally increases. Bernoulli force can be exerted on the outer area of the substrate. Therefore, when the negative pressure region is formed in the space, the back surface of the substrate can be more reliably brought into contact with the end surfaces of the plurality of designated outer convex portions.

本発明の第1実施形態としての真空吸着部材の上面図。The top view of the vacuum suction member as a 1st embodiment of the present invention. 図1のII−II線に沿った真空吸着部材の縦断面図。The longitudinal cross-sectional view of the vacuum suction member which followed the II-II line of FIG. 本発明の第1実施形態としての真空吸着部材の機能に関する説明図。Explanatory drawing regarding the function of the vacuum suction member as a 1st embodiment of the present invention. 本発明の第1実施形態としての真空吸着部材の機能に関する説明図。Explanatory drawing regarding the function of the vacuum suction member as a 1st embodiment of the present invention. 本発明の第1実施形態としての真空吸着部材の機能に関する説明図。Explanatory drawing regarding the function of the vacuum suction member as a 1st embodiment of the present invention. 本発明の第2実施形態としての真空吸着部材の図2に対応する縦断面図。The longitudinal cross-sectional view corresponding to FIG. 2 of the vacuum suction member as 2nd Embodiment of this invention. 本発明の第2実施形態としての真空吸着部材の機能に関する説明図。Explanatory drawing regarding the function of the vacuum suction member as a 2nd embodiment of the present invention. 本発明の第2実施形態としての真空吸着部材の機能に関する説明図。Explanatory drawing regarding the function of the vacuum suction member as a 2nd embodiment of the present invention. 本発明の第2実施形態としての真空吸着部材の機能に関する説明図。Explanatory drawing regarding the function of the vacuum suction member as a 2nd embodiment of the present invention. 本発明の第3実施形態としての真空吸着部材の図2に対応する縦断面図。The longitudinal cross-sectional view corresponding to FIG. 2 of the vacuum suction member as 3rd Embodiment of this invention.

(第1実施形態)
(構成)
図1および図2に示されている本発明の第1実施形態としての真空吸着部材は、基体1と、基体1の主面102から突出する複数の凸部10と、複数の凸部10を取り囲むように延在して基体1の主面10から突出する環状凸部14と、基体1の内部を通り、基体1の主面102に開口部202を有する通気経路20と、を備えている。
First Embodiment
(Constitution)
The vacuum suction member according to the first embodiment of the present invention shown in FIGS. 1 and 2 comprises a base 1, a plurality of projections 10 projecting from the main surface 102 of the base 1, and a plurality of projections 10. An annular convex portion 14 extending so as to surround and project from the main surface 10 of the base 1 and a ventilation path 20 having an opening 202 in the main surface 102 of the base 1 through the inside of the base 1 .

基体1は、例えば略平板状のSiC、AlN、Al23等のセラミックス焼結体からなる。複数の凸部10、環状凸部14および通経路20のそれぞれは、研削加工、ブラスト加工、ミリング加工もしくはレーザー加工またはこれらの組み合わせにより形成される。基体1の主面102は略平面状に形成されている。 The substrate 1 is made of, for example, a substantially flat plate-like sintered body of ceramic such as SiC, AlN, Al 2 O 3 or the like. Each of the plurality of protrusions 10, the annular protrusion 14 and the passage 20 is formed by grinding, blasting, milling, laser processing, or a combination thereof. The main surface 102 of the base 1 is formed in a substantially planar shape.

複数の凸部10は、基体1の主面102において三角格子もしくは正方格子等の格子様に配置されるほか、複数の同心円のそれぞれに沿って配置され、あるいは、中心から延在する複数の放射線のそれぞれに沿って規則的に配置される等、規則的に配置されてもよく、不規則的に配置されていてもよい。各凸部10は、略柱状、略錘台状、柱状体または錘台状体の端面または上底に、小面積の底面または下底を有する柱状体、半球、半楕円球または錘台状体が乗ったような複数の段差付きの略柱状など、様々な形状に形成されていてもよい。   The plurality of convex portions 10 are arranged in a lattice form such as a triangular lattice or a square lattice on the main surface 102 of the base body 1, and are arranged along each of a plurality of concentric circles or a plurality of radiations extending from the center They may be regularly arranged, such as regularly arranged along each of the two, or may be irregularly arranged. Each convex portion 10 is a columnar body, a hemisphere, a semi-elliptic sphere or a frustum having a bottom or a lower base of a small area on the end face or upper bottom of a substantially columnar, substantially frustum shape, columnar body or frustum shape It may be formed in various shapes, such as a substantially columnar shape with a plurality of steps, such as the ones on which it rides.

真空吸着部材の縦断面図において環状凸部14の形状が略矩形状のほか、略台形状、半楕円形状、真円形状、または、矩形と当該矩形の一辺を直径とする半円形とが組み合わせられた形状など、様々な形状であってもよい。なお、環状凸部14が省略されてもよい。   In the longitudinal sectional view of the vacuum suction member, in addition to the substantially rectangular shape, the shape of the annular convex portion 14 is a substantially trapezoidal shape, a semielliptical shape, a perfect circle shape, or a combination of a rectangle and a semicircle having one side of the rectangle as a diameter The shape may be various, such as the shape that has been made. The annular convex portion 14 may be omitted.

複数の凸部10は、内側凸部群11および外側凸部群12により構成されている。内側凸部群11は、基体1の主面102において中心から半径R1の円形状の内側領域S1に配置されている複数の内側凸部112により構成されている。外側凸部群12は、基体1の主面102において内側領域S1を取り囲む、中心から半径R2の外縁を有する環状の外側領域S2に配置されている複数の外側凸部122により構成されている。外側領域S2の外縁および環状凸部14の内縁とは一致している。 The plurality of convex portions 10 are configured by the inner convex portion group 11 and the outer convex portion group 12. Inner convex portion group 11 is composed of a plurality of inner protrusions 112 are arranged from the center in the main surface 102 of the substrate 1 to the circular inner area S 1 of radius R 1. The outer convex group 12 is constituted by a plurality of outer convex parts 122 disposed in an annular outer area S 2 having an outer edge of radius R 2 from the center and surrounding the inner area S 1 on the main surface 102 of the base 1 ing. It is coincident with the inner edge of the outer edge and the annular convex portion 14 of the outer region S 2.

内側領域S1および外側領域S2の合計面積(=πR2 2)に対する、外側領域S2の面積(=π(R2 2−R1 2))の比率(=1−R1 2/R2 2)は、例えば0.03〜0.20の範囲に含まれるように内側領域S1および外側領域S2が定義されている。内側領域S1の外縁は円環状に限られず、円環に沿って延在する波線状またはジグザグ線状であってもよい。外側領域S2の外縁は円環状に限られず、円環に沿って延在する波線状またはジグザグ線状であってもよい。 To the total area of the inner region S 1 and the outer region S 2 (= πR 2 2) , the area of the outer region S 2 (= π (R 2 2 -R 1 2)) Ratio of (= 1-R 1 2 / R 2 2), the inner region S 1 and the outer area S 2 are defined to be within the scope of example 0.03 to 0.20. The outer edge of the inner area S 1 is not limited to the annular shape, or may be a wavy or zigzag line shape extending along the torus. The outer edge of the outer region S 2 is not limited to the annular shape, or may be a wavy or zigzag line shape extending along the torus.

基体1の主面102において、複数の内側凸部112の配置態様と複数の外側凸部122の配置態様とが同一であってもよく、複数の内側凸部112が三角格子様に配置される一方で、複数の外側凸部122が一の円または複数の同心円に沿って配列されるなど相違していてもよい。各内側凸部112の形状と各外側凸部122の形状とが同一であっても相違していてもよい。   In the main surface 102 of the base 1, the arrangement of the plurality of inner projections 112 and the arrangement of the plurality of outer projections 122 may be the same, and the plurality of inner projections 112 are arranged in a triangular lattice shape. On the other hand, the plurality of outer projections 122 may be arranged to be arranged along one circle or a plurality of concentric circles. The shape of each inner protrusion 112 and the shape of each outer protrusion 122 may be the same or different.

外側凸部群12のうち少なくとも一部を構成する複数の指定外側凸部122の基体1の主面102を基準とする端面1220の位置(突出高さH2)が、内側凸部群11を構成する複数の内側凸部112のそれぞれの基体1の主面102を基準とする端面1120の位置(突出高さH1)よりも高い。本実施形態では、外側凸部群12の「全部」を構成する複数の外側凸部122が「指定外側凸部」に該当するが、他の実施形態として外側凸部群12の「一部のみ」を構成する複数の外側凸部122が「指定外側凸部」に該当していてもよい。 The position (protruding height H 2 ) of the end face 1220 based on the major surfaces 102 of the plurality of designated outer convex portions 122 constituting at least a part of the outer convex portion group 12 with respect to the inner convex portion group 11 It is higher than the position (protruding height H 1 ) of the end face 1120 based on the main surface 102 of the base 1 of each of the plurality of inner projections 112 to be configured. In the present embodiment, the plurality of outer protrusions 122 that constitute "all" of the outer protrusion group 12 correspond to "designated outer protrusions", but as another embodiment, "only a part of the outer protrusion group 12 is A plurality of outside convex parts 122 which constitute "" may correspond to a "designated outside convex part".

複数の指定外側凸部122のそれぞれの端面1220の位置と、複数の内側凸部112のそれぞれの端面1120の位置と、の高さの差H2−H1は、例えば2μm〜20μmの範囲に含まれている。環状凸部14の基体1の主面102を基準とする端面140の位置(突出高さH4)が、複数の指定外側凸部122のそれぞれの基体1の主面102を基準とする端面1220の位置(突出高さH2)よりも低いまたは当該端面1220の位置(突出高さH2)と同一である。本実施形態では、複数の指定外側凸部122のそれぞれの端面1220の少なくとも一部と、複数の内側凸部112のそれぞれの端面1120の少なくとも一部と、が基体1の主面102に対して平行である。 The height difference H 2 −H 1 between the positions of the end surfaces 1220 of the plurality of designated outer convex portions 122 and the positions of the end surfaces 1120 of the plurality of inner convex portions 112 is, for example, in the range of 2 μm to 20 μm. include. The position (protruding height H 4 ) of the end surface 140 of the annular convex portion 14 with respect to the main surface 102 of the base 1 is the end surface 1220 with respect to the main surface 102 of each of the plurality of designated outer convex portions 122. position the position (protruding height H 2) lower or the end surface 1220 than (protruding height H 2) to be identical. In the present embodiment, at least a portion of each of the end surfaces 1220 of the plurality of designated outer convex portions 122 and at least a portion of each of the end surfaces 1120 of each of the plurality of inner convex portions 112 It is parallel.

各指定外側凸部122の一部が残りの部分よりも弾性率が低い弾性素材により構成されている。具体的には、各指定外側凸部122は、基体1の主面102から突出している第1要素1221と、第1要素1221の端面に連続して設けられている弾性素材により構成されている第2要素1222と、を備えている。第1要素1221は、基体1と一体的に形成されていてもよく、基体1に対して取り付けられている別個の部材により構成されていてもよい。第1要素1221がSiC等のセラミックス焼結体により構成されている場合、第2要素1222が例えばシリコン樹脂、フッ素樹脂(PFA)もしくはポリイミド樹脂、金属製バネまたは窒化ケイ素製バネなど、当該セラミックス焼結体よりも弾性率が低い素材またはバネ定数が低い部材により構成されている。   A portion of each designated outer convex portion 122 is made of an elastic material having a lower elastic modulus than the remaining portion. Specifically, each designated outer convex portion 122 is constituted by a first element 1221 projecting from the main surface 102 of the base body 1 and an elastic material provided continuously to an end face of the first element 1221. And a second element 1222. The first element 1221 may be integrally formed with the base 1 or may be constituted by a separate member attached to the base 1. When the first element 1221 is formed of a ceramic sintered body such as SiC, the second element 1222 is made of, for example, silicon resin, fluorine resin (PFA) or polyimide resin, metal spring or silicon nitride spring, etc. It is comprised by the raw material whose elasticity modulus is lower than a body, or the member whose spring constant is low.

第1要素1221の端面位置(突出高さH21)は、各内側凸部112の端面1120の位置(突出高さH1)より低く、各内側凸部112の端面1120の位置(突出高さH1)と同一であってもよい。第2要素1222の端面位置(突出高さH21+H22)、すなわち指定外側凸部122の端面1220の位置(突出高さH2)は、各内側凸部112の端面1120の位置(突出高さH1)よりも高い。 The end face position (protruding height H 21 ) of the first element 1221 is lower than the position (protruding height H 1 ) of the end face 1120 of each inner convex portion 112, and the position (protruding height) of the end face 1120 of each inner convex portion 112 It may be the same as H 1 ). The end surface position (projecting height H 21 + H 22 ) of the second element 1222, that is, the position (projecting height H 2 ) of the end surface 1220 of the designated outer convex portion 122 is the position (projecting height) of the end surface 1120 of each inner convex portion 112 H 1 ) higher than.

第2要素1222を構成する弾性素材の弾性率E[Pa]、弾性素材の基体1の主面102の垂線方向についての長さL[m](図2のH22参照)および弾性素材の基体1の主面102に平行な断面における断面積S[m2]の組み合わせが、関係式(1)および(2)により表わされる条件を満足する。 Modulus of elastic material constituting the second element 1222 E [Pa], the length of the perpendicular direction of the main surface 102 of the substrate 1 of elastic material L [m] (see H 22 in FIG. 2) and the substrate of the elastic material The combination of the cross-sectional area S [m 2 ] in the cross section parallel to the main surface 102 of 1 satisfies the conditions represented by the relational expressions (1) and (2).

4[MPa]≦E ‥(1)。   4 [MPa] E E .. (1).

1.0×10-7≦L/(E×S)≦5.0×10-6 ‥(2)。 1.0 × 10 −7 ≦ L / (E × S) ≦ 5.0 × 10 −6 .. (2).

通気経路20は、基体1の主面102における開口部202とは異なる開口部(主面102とは反対側の面における開口部)を通じて、通気経路20の気圧を調整する圧力調整装置または真空吸引装置(図示略)に接続されている。   A pressure adjusting device or vacuum suction which adjusts the air pressure of the ventilation passage 20 through the opening (opening in the surface opposite to the main surface 102) different from the opening 202 in the main surface 102 of the base 1 It is connected to a device (not shown).

なお、図1および図2では真空吸着部材が概略的に表されており、当該真空吸着部材の構成要素のアスペクト比、間隔、個数などは、原則的に実際の設計値とは異なっている。これは、すべての実施形態において同様である。   1 and 2 schematically show the vacuum suction member, and the aspect ratio, interval, number, etc. of the components of the vacuum suction member are basically different from the actual design values. This is the same in all embodiments.

(機能)
本発明の第1実施形態としての真空吸着部材によれば、基体1の主面102の側において基板Wが真空吸着部材に載置されることにより、少なくとも一部の凸部10により基板Wが支持される(図3Aおよび図3B参照)。各指定外側凸部122の端面1220の位置が、各内側凸部112の端面1120の位置よりも高い(図2参照)。このため、基板Wが外側領域X2の少なくとも一部において反り上がっている場合でも、当該基板Wの外側領域X2の少なくとも一部が対応する指定外側凸部122により支持されうる(図3A参照)。一方、基板Wが外側領域X2の少なくとも一部において垂れ下がっている場合でも、当該基板Wの外側領域X2の少なくとも一部が対応する指定外側凸部122により支持されうる(図3B参照)。この際、指定外側凸部122の一部を構成する第2要素1222(弾性素材)が、当該指定外側凸部122の端面1220の位置を下げるように弾性変形することにより、基板Wの外側領域X2の少なくとも一部が指定外側凸部122から受ける抗力が緩和されうる。
(function)
According to the vacuum suction member as the first embodiment of the present invention, the substrate W is mounted on the vacuum suction member on the main surface 102 side of the substrate 1 so that the substrate W is at least partially projected by the convex portion 10. Supported (see FIGS. 3A and 3B). The position of the end face 1220 of each designated outer convex portion 122 is higher than the position of the end face 1120 of each inner convex portion 112 (see FIG. 2). Therefore, even when the substrate W is warped in at least a part of the outer region X 2, it may be supported by specified outer projection 122 which at least part of the outer region X 2 of the substrate W corresponding (see FIG. 3A ). On the other hand, even when the substrate W is hanging at least a part of the outer region X 2, at least a portion of the outer region X 2 of the substrate W can be supported by the corresponding designated outer projection 122 (see FIG. 3B). Under the present circumstances, the 2nd element 1222 (elastic material) which constitutes a part of designated outside convex part 122 elastically deforms so that the position of end face 1220 of the designated outside convex part 122 concerned may fall, and the outside field of substrate W The resistance that at least a part of X 2 receives from the designated outer protrusion 122 can be alleviated.

この状態で、基体1の主面102および基板Wの裏面W2により挟まれた空間から通気経路20を介して空気が排出されることにより、当該空間に負圧領域が形成され、基板Wに対して基体1の主面102に向かう力が作用する(図3Aおよび図3B白矢印参照)。その結果、基板Wの内側領域X1が複数の内側凸部112により支持される一方、基板Wの外側領域X2が複数の指定外側凸部122により支持される。 In this state, the air is discharged from the space between the back surface W 2 of the main surface 102 and the substrate W of the substrate 1 through the vent path 20, a negative pressure region is formed in the space, the substrate W On the other hand, a force acts on the main surface 102 of the substrate 1 (see white arrows in FIGS. 3A and 3B). As a result, while the inner region X 1 of the substrate W is supported by a plurality of inner convex portion 112, the outer region X 2 of the substrate W is supported by a plurality of specified outer projection 122.

基板Wの外側領域X2の少なくとも一部に反り上がりまたは垂れ下がりがあっても、指定外側凸部122の一部を構成する第2要素1222(弾性素材)が、当該指定外側凸部122の端面1220の位置を内側凸部112の端面1120の位置に一致させるように弾性変形することができる(図3A、図3B→図3C参照)。また、第2要素1222が第1要素1221よりも弾性率が低い弾性素材により構成されているため、指定外側凸部122の全部が当該弾性素材により構成されている場合よりも、弾性素材の弾性変形による指定外側凸部122の端面1220の位置の変化量が制限される。 Even if upward warping or sagging on at least a portion of the outer region X 2 of the substrate W, the second element 1222 which constitutes a part of the designated outer protrusions 122 (elastic material), the end face of the designated outer projection 122 It can be elastically deformed so as to match the position of 1220 with the position of the end face 1120 of the inner protrusion 112 (see FIGS. 3A and 3B → FIG. 3C). Further, since the second element 1222 is made of an elastic material having a lower elastic modulus than the first element 1221, the elasticity of the elastic material is greater than when all of the designated outer convex portions 122 are made of the elastic material. The amount of change in the position of the end face 1220 of the designated outer convex portion 122 due to the deformation is limited.

よって、前記のような形状の基板Wであっても、基板Wの表面W1の全体的な平坦度の向上が図られるように当該基板Wが真空吸着保持されうる。そして、基板Wの表面W1において、内側領域X1のみならず外側領域X2においても、所望のパターンの回路形成のためのエッチング処理など、所定の処理が実施されうる。 Therefore, even in the substrate W having a shape as described above, the substrate W can be held vacuum suction as improving the overall flatness of the surface W 1 of the substrate W can be achieved. Then, the surface W 1 of the substrate W, even in the outer region X 2 not only the inner region X 1, such as an etching process for circuit formation of the desired pattern, the predetermined processing may be performed.

(第2実施形態)
(構成)
図4に示されている本発明の第2実施形態としての真空吸着部材においては、各指定外側凸部122が、基体1とは別個に構成されている第1要素1221と、基体1に支持された状態で第1要素1221を端部で支持している弾性要素により構成されている第2要素122と、を備えている。第1要素1221の端面位置、すなわち指定外側凸部122の端面1220の位置は、各内側凸部112の端面1120の位置よりも高い。具体的には、真空吸着部材が、基体1の主面102から略柱状に窪んで設けられている凹部104を備えている。略柱状の第1要素1221が凹部104に部分的に変位可能に挿入されている。第2要素1222が凹部104の内部に収容されて凹部104の底部により支持された状態で第1要素1221を支持している。
Second Embodiment
(Constitution)
In the vacuum suction member according to the second embodiment of the present invention shown in FIG. 4, each designated outer convex portion 122 is supported by the first element 1221 configured separately from the base 1 and the base 1. And a second element 122 constituted by an elastic element supporting the first element 1221 at its end in the closed state. The end surface position of the first element 1221, that is, the position of the end surface 1220 of the designated outer convex portion 122 is higher than the position of the end surface 1120 of each inner convex portion 112. Specifically, the vacuum suction member includes a concave portion 104 which is provided in a substantially columnar shape and recessed from the main surface 102 of the base 1. A substantially columnar first element 1221 is partially displaceably inserted in the recess 104. The second element 1222 is accommodated inside the recess 104 and supports the first element 1221 while being supported by the bottom of the recess 104.

指定外側凸部122の構成を除く他の構成は、第1実施形態の真空吸着部材と同様なので、同一の符号を用いるとともに説明を省略する。   The configuration other than the configuration of the designated outer convex portion 122 is the same as that of the vacuum suction member of the first embodiment, so the same reference numerals are used and the description is omitted.

(機能)
本発明の第2実施形態としての真空吸着部材によれば、基体1の主面102の側において基板Wが真空吸着部材に載置されることにより、少なくとも一部の凸部10により基板Wが支持される(図5Aおよび図5B参照)。各指定外側凸部122の端面1220の位置が、各内側凸部112の端面1120の位置よりも高い(図4参照)。このため、基板Wが外側領域X2の少なくとも一部において反り上がっている場合でも、当該基板Wの外側領域X2の少なくとも一部が対応する指定外側凸部122により支持されうる(図5A参照)。一方、基板Wが外側領域X2の少なくとも一部において垂れ下がっている場合でも、当該基板Wの外側領域X2の少なくとも一部が対応する指定外側凸部122により支持されうる(図5B参照)。この際、指定外側凸部122の一部を構成する第2要素1222(弾性素材)が、当該指定外側凸部122の端面1220の位置を下げるように弾性変形することにより、基板Wの外側領域X2の少なくとも一部が指定外側凸部122から受ける抗力が緩和されうる。
(function)
According to the vacuum suction member as the second embodiment of the present invention, the substrate W is mounted on the vacuum suction member on the main surface 102 side of the substrate 1 so that the substrate W is at least partially projected by the convex portion 10. Supported (see FIGS. 5A and 5B). The position of the end face 1220 of each designated outer convex portion 122 is higher than the position of the end face 1120 of each inner convex portion 112 (see FIG. 4). Therefore, even when the substrate W is warped in at least a part of the outer region X 2, it may be supported by specified outer projection 122 which at least part of the outer region X 2 of the substrate W corresponding (see FIG. 5A ). On the other hand, even when the substrate W is hanging at least a part of the outer region X 2, at least a portion of the outer region X 2 of the substrate W can be supported by the corresponding designated outer projection 122 (see FIG. 5B). Under the present circumstances, the 2nd element 1222 (elastic material) which constitutes a part of designated outside convex part 122 elastically deforms so that the position of end face 1220 of the designated outside convex part 122 concerned may fall, and the outside field of substrate W The resistance that at least a part of X 2 receives from the designated outer protrusion 122 can be alleviated.

この状態で、基体1の主面102および基板Wの裏面W2により挟まれた空間から通気経路20を介して空気が排出されることにより、当該空間に負圧領域が形成され、基板Wに対して基体1の主面102に向かう力が作用する(図5Aおよび図5B白矢印参照)。その結果、基板Wの内側領域X1が複数の内側凸部112により支持される一方、基板Wの外側領域X2が複数の指定外側凸部122により支持される。 In this state, the air is discharged from the space between the back surface W 2 of the main surface 102 and the substrate W of the substrate 1 through the vent path 20, a negative pressure region is formed in the space, the substrate W On the other hand, a force acts on the main surface 102 of the substrate 1 (see white arrows in FIGS. 5A and 5B). As a result, while the inner region X 1 of the substrate W is supported by a plurality of inner convex portion 112, the outer region X 2 of the substrate W is supported by a plurality of specified outer projection 122.

基板Wの外側領域X2の少なくとも一部に反り上がりまたは垂れ下がりがあっても、指定外側凸部122の一部を構成する第2要素1222(弾性素材)が、当該指定外側凸部122の端面1220の位置を内側凸部112の端面1120の位置に一致させるように弾性変形することができる(図5A、図5B→図5C参照)。また、第2要素1222が第1要素1221よりも弾性率が低い弾性素材またはバネ定数が低い部材により構成されているため、指定外側凸部122の全部が当該弾性素材により構成されている場合よりも、弾性素材の弾性変形による指定外側凸部122の端面1220の位置の変化量が制限される。 Even if upward warping or sagging on at least a portion of the outer region X 2 of the substrate W, the second element 1222 which constitutes a part of the designated outer protrusions 122 (elastic material), the end face of the designated outer projection 122 It can be elastically deformed so as to match the position of 1220 with the position of the end face 1120 of the inner convex portion 112 (see FIGS. 5A and 5B → FIG. 5C). In addition, since the second element 1222 is made of an elastic material having a lower elastic modulus than the first element 1221 or a member having a low spring constant, it is more preferable than the case where the entire designated outer convex portion 122 is made of the elastic material. Also, the amount of change in the position of the end face 1220 of the designated outer convex portion 122 due to the elastic deformation of the elastic material is limited.

よって、前記のような形状の基板Wであっても、基板Wの表面W1の全体的な平坦度の向上が図られるように当該基板Wが真空吸着保持されうる。そして、基板Wの表面W1において、内側領域X1のみならず外側領域X2においても、所望のパターンの回路形成のためのエッチング処理など、所定の処理が実施されうる。 Therefore, even in the substrate W having a shape as described above, the substrate W can be held vacuum suction as improving the overall flatness of the surface W 1 of the substrate W can be achieved. Then, the surface W 1 of the substrate W, even in the outer region X 2 not only the inner region X 1, such as an etching process for circuit formation of the desired pattern, the predetermined processing may be performed.

(第3実施形態)
(構成)
図6に示されている本発明の第3実施形態としての真空吸着部材においては、第2要素1222が基体1の主面102に固定され、第2要素1221の端面に第1要素1221が固定されている。指定外側凸部122の構成を除く他の構成は、第1実施形態の真空吸着部材と同様なので、同一の符号を用いるとともに説明を省略する。
Third Embodiment
(Constitution)
In the vacuum suction member according to the third embodiment of the present invention shown in FIG. 6, the second element 1222 is fixed to the main surface 102 of the base 1 and the first element 1221 is fixed to the end face of the second element 1221. It is done. The configuration other than the configuration of the designated outer convex portion 122 is the same as that of the vacuum suction member of the first embodiment, so the same reference numerals are used and the description is omitted.

(機能)
本発明の第3実施形態としての真空吸着部材によれば、本発明の第2実施形態としての真空吸着部材と同様に、前記のように外側領域X2において反り上がっているまたは垂れ下がっている基板Wであっても、基板Wの表面W1の全体的な平坦度の向上が図られるように当該基板Wが真空吸着保持されうる(図5A〜図5C参照)。そして、基板Wの表面W1において、内側領域X1のみならず外側領域X2においても、所望のパターンの回路形成のためのエッチング処理など、所定の処理が実施されうる。
(function)
According to the vacuum suction member according to a third embodiment of the present invention, similarly to the vacuum suction member according to the second embodiment of the present invention, the substrate is drooping or are warped in the outer region X 2 as Even in the case of W, the substrate W can be held by vacuum suction so as to improve the overall flatness of the surface W 1 of the substrate W (see FIGS. 5A to 5C). Then, the surface W 1 of the substrate W, even in the outer region X 2 not only the inner region X 1, such as an etching process for circuit formation of the desired pattern, the predetermined processing may be performed.

(実施例)
(実施例1)
第1実施形態にしたがって実施例1の真空吸着部材が作製された(図1参照)。外径φ300[mm]、厚み1.2[mm]の略円盤状の炭化珪素(SiC)セラミックス焼結体により基体1が作製された。
(Example)
Example 1
The vacuum suction member of Example 1 was produced according to the first embodiment (see FIG. 1). A substrate 1 was produced from a substantially disk-shaped silicon carbide (SiC) ceramic sintered body having an outer diameter of 300 mm and a thickness of 1.2 mm.

基体1の主面102のφ292[mm]の内側領域S1において、ピッチ3.5[mm]の三角格子の各格子点に配置された径φ1.0[mm]、突出高さH1=150[μm]の略円柱状の複数の突起が、複数の内側凸部112として形成された。 In the inner region S 1 of φ292 [mm] of the main surface 102 of the substrate 1, the diameter was placed on each lattice point of a triangular lattice of pitch 3.5 [mm] φ1.0 [mm] , the protruding height H 1 = A plurality of 150 [μm] substantially cylindrical projections are formed as the plurality of inner protrusions 112.

基体1の主面102の内径φ292[mm]、外径φ299[mm]の環状の外側領域S2においてピッチ3.5[mm]の三角格子の各格子点に配置された径φ1.0[mm]、突出高さH21=150[μm]の略円柱状の複数の突起が第1要素1221として形成された。当該突起の端面に固定された径φ1.0[mm]、高さH22=10[μm]の略円柱状の複数のシリコン樹脂製の突起が第2要素1222として形成された。すなわち、基体1の主面102の外側領域S2において、径φ1.0[mm]、突出高さH2=160[μm]の略円柱状の複数の外側凸部122がピッチ3.5[mm]の三角格子の各格子点に配置された。第2要素1222は、第1要素1221に対して成膜することにより固定されている。指定外側凸部122の密度(外側領域S2の面積に対する、複数の指定外側凸部122の端面の面積の合計の割合)が6.43%である。 Inner diameter φ292 of the main surface 102 of the substrate 1 [mm], the outer diameter φ299 diameter located at each lattice point of a triangular lattice of pitch 3.5 [mm] in the outer region S 2 of the annular [mm] φ1.0 [ A plurality of substantially cylindrical protrusions having a projection height H 21 = 150 μm] are formed as the first element 1221. A plurality of substantially cylindrical protrusions made of silicon resin and having a diameter of φ1.0 [mm] and a height of H 22 = 10 [μm] fixed to the end face of the protrusion are formed as the second element 1222. That is, in the outer region S 2 of the main surface 102 of the substrate 1, the diameter ø1.0 [mm], the protruding height H 2 = 160 substantially cylindrical plurality of outer projection 122 of the [[mu] m] is a pitch 3.5 [ mm] were placed at each grid point of the triangular grid. The second element 1222 is fixed by depositing on the first element 1221. Density of the specified outer projection 122 (to the area of the outer region S 2, the total percentage of the area of the end faces of the plurality of specified outer projection 122) is 6.43%.

弾性素材である硬度70(タイプAデュロメータ(JIS K6253)により硬度を意味する。以下同じ。)の弾性率E(ヤング率)は40.3[MPa]であり、関係式(1)で表わされる条件を満たしている。第2要素1222の長さL(高さH22)が1.0×10-5[m]であり、横断面積Sが7.85×10-7[m2]であるため、L/(E×S)=3.16×10-7であり、関係式(2)で表わされる条件を満たしている。 The elastic modulus E (Young's modulus) of hardness 70 (meaning hardness according to type A durometer (JIS K6253) which is an elastic material. The same applies hereinafter) is 40.3 [MPa] and is represented by the relational expression (1) The conditions are met. Since the length L (height H 22 ) of the second element 1222 is 1.0 × 10 −5 [m] and the cross-sectional area S is 7.85 × 10 −7 [m 2 ], L / ( 2 ) E × S) = 3.16 × 10 −7 , which satisfies the condition represented by the relational expression (2).

基体1の主面102において、外径φ299[mm]、幅0.5[mm]、突出高さH4=147[μm]の円環状の凸部が環状凸部14として形成された。基体1において主面102の中心にφ3.0[mm]の厚さ方向に貫通する1個の貫通孔が通気経路20として形成された。 On the main surface 102 of the base 1, an annular convex having an outer diameter of 299 [mm], a width of 0.5 [mm], and a protruding height H 4 = 147 [μm] is formed as the annular convex part 14. In the base 1, one through hole penetrating in the thickness direction of φ 3.0 [mm] at the center of the main surface 102 was formed as the ventilation path 20.

(実施例2)
第2要素1222の長さL(高さH22)が2.0×10-5[m]であるほかは、実施例1と同様に実施例2の真空吸着部材が作製された。
(Example 2)
A vacuum suction member of Example 2 was produced in the same manner as Example 1 except that the length L (height H 22 ) of the second element 1222 was 2.0 × 10 −5 [m].

(実施例3)
第2要素1222の長さL(高さH22)が3.0×10-5[m]であるほかは、実施例1と同様に実施例3の真空吸着部材が作製された。
(Example 3)
The vacuum suction member of Example 3 was produced in the same manner as Example 1 except that the length L (height H 22 ) of the second element 1222 was 3.0 × 10 −5 [m].

(実施例4)
第2要素1222の長さL(高さH22)が4.0×10-5[m]であるほかは、実施例1と同様に実施例4の真空吸着部材が作製された。
(Example 4)
A vacuum suction member of Example 4 was produced in the same manner as Example 1, except that the length L (height H 22 ) of the second element 1222 was 4.0 × 10 −5 [m].

(実施例5)
第2要素1222の長さL(高さH22)が5.0×10-5[m]であるほかは、実施例1と同様に実施例5の真空吸着部材が作製された。
(Example 5)
The vacuum suction member of Example 5 was produced in the same manner as Example 1 except that the length L (height H 22 ) of the second element 1222 was 5.0 × 10 −5 [m].

(実施例6)
第1要素1221および第2要素1222のそれぞれの径φが1.2[mm]であり、指定外側凸部122の密度が9.26%であるほかは、実施例2と同様に実施例6の真空吸着部材が作製された。
(Example 6)
Example 6 is the same as Example 2 except that the diameter φ of each of the first element 1221 and the second element 1222 is 1.2 [mm], and the density of the designated outer convex portion 122 is 9.26%. The vacuum suction member of

(実施例7)
第1要素1221および第2要素1222のそれぞれの径φが1.4[mm]であり、指定外側凸部122の密度が12.6%であるほかは、実施例2と同様に実施例7の真空吸着部材が作製された。
(Example 7)
Example 7 is the same as Example 2 except that the diameter φ of each of the first element 1221 and the second element 1222 is 1.4 [mm], and the density of the designated outer convex portion 122 is 12.6%. The vacuum suction member of

(実施例8)
第1要素1221および第2要素1222のそれぞれの径φが1.6[mm]であり、指定外側凸部122の密度が16.5%であるほかは、実施例2と同様に実施例8の真空吸着部材が作製された。
(Example 8)
Example 8 is the same as Example 2 except that the diameter φ of each of the first element 1221 and the second element 1222 is 1.6 [mm], and the density of the designated outer convex portion 122 is 16.5%. The vacuum suction member of

(実施例9)
第1要素1221および第2要素1222のそれぞれの径φが1.8[mm]であり、指定外側凸部122の密度が20.8%であるほかは、実施例2と同様に実施例9の真空吸着部材が作製された。
(Example 9)
Example 9 is the same as Example 2 except that the diameter φ of each of the first element 1221 and the second element 1222 is 1.8 [mm], and the density of the designated outer convex portion 122 is 20.8%. The vacuum suction member of

(実施例10)
第2要素1222が、弾性率Eが5.4[MPa]である硬度30のシリコン樹脂により形成されたほかは、実施例2と同様に実施例10の真空吸着部材が作製された。
(Example 10)
A vacuum suction member of Example 10 was produced in the same manner as in Example 2 except that the second element 1222 was formed of a silicone resin having a hardness of 30 and an elastic modulus E of 5.4 [MPa].

(実施例11)
第2要素1222が、弾性率Eが8.9[MPa]である硬度40のシリコン樹脂により形成されたほかは、実施例2と同様に実施例11の真空吸着部材が作製された。
(Example 11)
A vacuum suction member of Example 11 was produced in the same manner as Example 2 except that the second element 1222 was formed of a silicone resin having a hardness of 40 and an elastic modulus E of 8.9 [MPa].

(実施例12)
第2要素1222が、弾性率Eが14.2[MPa]である硬度50のシリコン樹脂により形成されたほかは、実施例2と同様に実施例12の真空吸着部材が作製された。
(Example 12)
A vacuum suction member of Example 12 was produced in the same manner as in Example 2 except that the second element 1222 was formed of a silicon resin of hardness 50 having an elastic modulus E of 14.2 [MPa].

(実施例13)
第2要素1222が、弾性率Eが28.1[MPa]である硬度60のシリコン樹脂により形成されたほかは、実施例2と同様に実施例13の真空吸着部材が作製された。
(Example 13)
A vacuum suction member of Example 13 was produced in the same manner as in Example 2 except that the second element 1222 was formed of a silicone resin having a hardness of 60 and an elastic modulus E of 28.1 [MPa].

(実施例14)
第1要素1221および第2要素1222のそれぞれの径φが2.0[mm]であり、指定外側凸部122の密度が25.7%であり、かつ、第2要素1222が、弾性率Eが4[MPa]である硬度20のシリコン樹脂により形成されたほかは、実施例2と同様に実施例14の真空吸着部材が作製された。
(Example 14)
The diameter φ of each of the first element 1221 and the second element 1222 is 2.0 [mm], the density of the designated outer convex portion 122 is 25.7%, and the second element 1222 has an elastic modulus E A vacuum suction member of Example 14 was produced in the same manner as in Example 2 except that it was formed of a silicone resin having a hardness of 20 and a pressure of 4 MPa.

(実施例15)
第1要素1221および第2要素1222のそれぞれの径φが0.5[mm]であり、指定外側凸部122の密度が1.61%であり、かつ、第2要素1222が、弾性率Eが350[MPa]であるフッ素樹脂(FPA)により形成されたほかは、実施例5と同様に実施例15の真空吸着部材が作製された。
(Example 15)
The diameter φ of each of the first element 1221 and the second element 1222 is 0.5 mm, the density of the designated outer convex portion 122 is 1.61%, and the second element 1222 has an elastic modulus E The vacuum suction member of Example 15 was produced in the same manner as in Example 5 except that it was formed of a fluorine resin (FPA) of 350 [MPa].

(実施例16)
第1要素1221および第2要素1222のそれぞれの径φが1.0[mm]であるほかは、実施例15と同様に実施例16の真空吸着部材が作製された。
(Example 16)
The vacuum suction member of Example 16 was produced in the same manner as in Example 15 except that the diameter φ of each of the first element 1221 and the second element 1222 was 1.0 [mm].

(実施例17)
第1要素1221および第2要素1222のそれぞれの径φが0.5[mm]であり、第2要素1222が、弾性率Eが3000[MPa]であるポリイミド樹脂により形成された。第2要素1222の長さL(高さH22)が7.0×10-5[m]である。指定外側凸部122の密度が格子ピッチの調整により0.80%に設定された。これらのほかは、実施例1と同様に実施例17の真空吸着部材が作製された。
(Example 17)
The diameter φ of each of the first element 1221 and the second element 1222 was 0.5 [mm], and the second element 1222 was formed of a polyimide resin having an elastic modulus E of 3000 [MPa]. The length L (height H 22 ) of the second element 1222 is 7.0 × 10 −5 [m]. The density of the designated outer convex portion 122 was set to 0.80% by adjusting the grating pitch. A vacuum suction member of Example 17 was manufactured in the same manner as Example 1 except for these.

(比較例)
(比較例1)
第1要素1221および第2要素1222のそれぞれの径φが1.0[mm]であるほかは、実施例14と同様に比較例1の真空吸着部材が作製された。
(Comparative example)
(Comparative example 1)
The vacuum suction member of Comparative Example 1 was produced in the same manner as in Example 14 except that the diameter φ of each of the first element 1221 and the second element 1222 was 1.0 [mm].

(比較例2)
第1要素1221および第2要素1222のそれぞれの径φが1.0[mm]であり、第2要素1222の長さL(高さH22)が1.0×10-5[m]であるほかは、実施例15と同様に比較例2の真空吸着部材が作製された。
(Comparative example 2)
The diameter φ of each of the first element 1221 and the second element 1222 is 1.0 [mm], and the length L (height H 22 ) of the second element 1222 is 1.0 × 10 −5 [m]. A vacuum suction member of Comparative Example 2 was produced in the same manner as Example 15 except for the above.

(比較例3)
第1要素1221および第2要素1222のそれぞれの径φが1.0[mm]であり、指定外側凸部122の密度が3.22%に設定され、かつ、第2要素1222の長さL(高さH22)が2.0×10-5[m]であるほかは、実施例17と同様に比較例3の真空吸着部材が作製された。
(Comparative example 3)
The diameter φ of each of the first element 1221 and the second element 1222 is 1.0 [mm], the density of the designated outer convex portion 122 is set to 3.22%, and the length L of the second element 1222 A vacuum suction member of Comparative Example 3 was produced in the same manner as in Example 17 except that the (height H 22 ) was 2.0 × 10 −5 [m].

(評価)
実施例および比較例のそれぞれの真空吸着部材の基体1の主面102の側に径φ300mm、厚さt0.7mmの基板W(シリコンウエハ)が載置された。非接触式のレーザー干渉計(ZYGO社製 GPI Hs)を用いて測定された基板Wの表面W1の平坦度(ローカルフラットネス)20[mm]×20[mm]のPV値の最大値は0.5μmであった。その後、基板Wの裏面W2および基体1の主面102により挟まれた空間が通気経路20を通じて真空吸引装置により減圧された。これによって真空吸着部材に基板Wが保持された。この状態で、基板Wの表面W1において20[mm]×20[mm]のPV値が非接触式のレーザー干渉計を用いて測定された。
(Evaluation)
A substrate W (silicon wafer) with a diameter of 300 mm and a thickness of 0.7 mm was placed on the main surface 102 side of the base 1 of the vacuum suction member of each of the example and the comparative example. The maximum value of the PV value of the flatness (local flatness) of the surface W 1 of the substrate W (local flatness) 20 [mm] x 20 [mm] measured using a non-contact type laser interferometer (GPI Hs manufactured by ZYGO) It was 0.5 μm. Thereafter, the space sandwiched by the back surface W 2 of the substrate W and the main surface 102 of the base 1 was depressurized by the vacuum suction device through the ventilation path 20. Thus, the substrate W was held by the vacuum suction member. In this state, PV value of the surface W 1 of the substrate W 20 [mm] × 20 [ mm] was measured using a laser interferometer of the non-contact type.

これらの測定結果が、指定外側凸部122の特徴的な設計項目とともに表1にまとめて示されている。   These measurement results are shown together in Table 1 together with the characteristic design items of the designated outer convex portion 122.

表1から、各実施例の真空吸着部材によれば、各比較例の真空吸着部材よりも基板Wの表面W1の全体的な平坦度の向上が図られていることがわかる。 From Table 1, according to the vacuum suction member of each Example, it can be seen that the improvement in the overall flatness of the surface W 1 of the substrate W is achieved than vacuum suction member of each comparative example.

1‥基体、10‥凸部、11‥内側凸部群、12‥外側凸部群、14‥環状凸部、20‥通気経路、102‥基体の主面、104‥凹部、112‥内側凸部、122‥外側凸部(指定外側凸部)、202‥開口部、1120‥内側凸部の端面、1220‥外側凸部の端面、1221‥第1要素、1222‥第2要素、S1‥主面の内側領域、S2‥主面の外側領域、W‥基板(ウエハ)、W1‥基板表面、W2‥基板裏面、X1‥基板の内側領域、X2‥基板の外側領域。 1. base body 10. convex portion 11. inner convex portion group 12. outer convex portion group 14. annular convex portion 20 ventilating path 102 main surface of base 104 concave portion 112 inner convex portion , 122 .. outer protrusion (designated outer protrusion), 202 .. opening, 1120 .. end surface of inner protrusion, 1220 .. end surface of outer protrusion, 1221 .. first element, 1222 .. second element, S 1 .. main Substrate inner area, S 2 .. Principal surface outer area, W .. Substrate (wafer), W 1 .. Substrate surface, W 2 .. Substrate back surface, X 1 .. Substrate inner area, X 2 .. Substrate outer area.

Claims (6)

基体と、
前記基体の主面から突出している複数の凸部と、
前記基体の内部を通り、前記基体の主面に開口を有する真空吸引経路と、
前記複数の凸部が、前記基体の主面において内側領域に配置されている内側凸部群と、前記基体の主面において前記内側領域を取り囲む環状の外側領域に配置されている外側凸部群と、により構成され、
前記外側凸部群のうち少なくとも一部を構成する複数の指定外側凸部のそれぞれの前記基体の主面を基準とする端面位置が、前記内側凸部群を構成する複数の内側凸部のそれぞれの前記基体の主面を基準とする端面位置よりも高く、かつ、当該複数の指定外側凸部のそれぞれの一部が残りの部分よりも弾性率が低い弾性素材により構成されていることを特徴とする真空吸着部材。
A substrate,
A plurality of projections projecting from the main surface of the substrate;
A vacuum suction path having an opening in the main surface of the substrate passing through the inside of the substrate;
The plurality of convex portions are an inner convex group arranged in an inner area on the main surface of the base, and an outer convex group arranged in an annular outer area surrounding the inner area on the main surface of the base And consists of
The end surface position based on the main surface of the above-mentioned base of each of a plurality of specified outside convex parts which constitute at least one copy among the above-mentioned outside convex part group is each of a plurality of inner convex parts which constitute the above-mentioned inner convex part group. And a part of each of the plurality of designated outer convex parts is made of an elastic material having a lower elastic modulus than the remaining part. Vacuum suction member to be.
請求項1記載の真空吸着部材において、
前記複数の指定外側凸部のそれぞれが、前記基体の主面から突出している第1要素と、前記第1要素の端面に連続して設けられている前記弾性素材により構成されている第2要素と、を備え、
前記第2要素の前記基体の主面を基準とする端面位置が前記複数の内側凸部のそれぞれの前記基体の主面を基準とする端面位置よりも高いことを特徴とする真空吸着部材。
In the vacuum suction member according to claim 1,
Each of the plurality of designated outer protrusions is a first element protruding from the main surface of the base, and a second element formed of the elastic material continuously provided on the end face of the first element. And
An end surface position based on the main surface of the base of the second element is higher than an end surface position based on the main surface of the base of each of the plurality of inner protrusions.
請求項1または2記載の真空吸着部材において、
前記弾性素材の弾性率E[Pa]、前記弾性素材の前記基体の主面の垂線方向についての長さL[m]および前記弾性素材の前記基体の主面に平行な断面における断面積S[m2]が、4[MPa]≦Eおよび1.0×10-7≦L/(E×S)≦5.0×10-6により表わされる条件を満足することを特徴とする真空吸着部材。
In the vacuum suction member according to claim 1 or 2,
The elastic modulus E [Pa] of the elastic material, the length L [m] of the elastic material in the direction perpendicular to the main surface of the base, and the cross-sectional area S [in elastic cross section parallel to the main surface of the base Vacuum adsorption member characterized in that m 2 ] satisfies the conditions represented by 4 [MPa] ≦ E and 1.0 × 10 −7 ≦ L / (E × S) ≦ 5.0 × 10 −6. .
請求項1記載の真空吸着部材において、
前記複数の指定外側凸部のそれぞれが、前記基体とは別個に構成されている第1要素と、前記基体に支持された状態で前記第1要素を端部で支持している前記弾性要素により構成されている第2要素と、を備え、
前記第1要素の端面位置が前記複数の内側凸部のそれぞれの端面位置よりも高いことを特徴とする真空吸着部材。
In the vacuum suction member according to claim 1,
Each of the plurality of designated outer protrusions is a first element configured separately from the base, and the elastic element supporting the first element at an end while being supported by the base And a second element being configured;
A vacuum suction member characterized in that an end surface position of the first element is higher than an end surface position of each of the plurality of inner convex portions.
請求項4記載の真空吸着部材において、
前記基体の主面から窪んで設けられている凹部をさらに備え、
前記第1要素が前記凹部に部分的に変位可能に挿入され、前記第2要素が前記凹部の内部に収容されて前記凹部の底部により支持された状態で前記第1要素を支持していることを特徴とする真空吸着部材。
In the vacuum suction member according to claim 4,
The semiconductor device further comprises a recess recessed from the main surface of the base,
The first element is partially displaceably inserted in the recess, and the second element is accommodated in the recess and supported by the bottom of the recess. Vacuum suction member characterized by
請求項1〜5のうちいずれか1つに記載の真空吸着部材において、
前記複数の凸部のそれぞれを囲むように、前記基体の主面から突出する環状凸部をさらに備え、
前記環状凸部の前記基体の主面を基準とする端面位置が、前記複数の指定外側凸部のそれぞれの前記基体の主面を基準とする端面位置よりも低いまたは前記複数の指定外側凸部のそれぞれの前記基体の主面を基準とする端面位置と同一であることを特徴とする真空吸着部材。
In the vacuum suction member according to any one of claims 1 to 5,
An annular convex portion protruding from the main surface of the base body is further provided to surround each of the plurality of convex portions,
The end surface position of the annular convex portion based on the main surface of the base is lower than the end surface position based on the main surface of the base of each of the plurality of designated outer convex portions or the plurality of designated outer convex portions The vacuum suction member characterized in that it is the same as the end face position based on the main surface of each of the substrates.
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Publication number Priority date Publication date Assignee Title
JP2001060618A (en) * 1999-08-20 2001-03-06 Canon Inc Substrate suction holding method, substrate suction holding device, aligner using the substrate suction holding device and manufacturing method the device
JP2001176957A (en) * 1999-12-20 2001-06-29 Ngk Spark Plug Co Ltd Suction plate and evacuator
JP2004228453A (en) * 2003-01-27 2004-08-12 Renesas Technology Corp Method of manufacturing semiconductor device
JP2004259792A (en) * 2003-02-25 2004-09-16 Nikon Corp Sticking device, sheet therefor, grinding device, semiconductor device and method for manufacturing same
JP2006054379A (en) * 2004-08-13 2006-02-23 Komatsu Electronic Metals Co Ltd Suction tool and polishing apparatus
JP2008103703A (en) * 2006-09-20 2008-05-01 Canon Inc Substrate retaining unit, exposure apparatus provided with substrate retaining unit, and device manufacturing method
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