JP2019093458A - Processing device - Google Patents

Processing device Download PDF

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JP2019093458A
JP2019093458A JP2017222548A JP2017222548A JP2019093458A JP 2019093458 A JP2019093458 A JP 2019093458A JP 2017222548 A JP2017222548 A JP 2017222548A JP 2017222548 A JP2017222548 A JP 2017222548A JP 2019093458 A JP2019093458 A JP 2019093458A
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upper plate
processing chamber
processing
hinge
plate
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JP7049813B2 (en
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徹雄 久保
Tetsuo Kubo
徹雄 久保
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Disco Corp
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Disco Abrasive Systems Ltd
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Priority to JP2017222548A priority Critical patent/JP7049813B2/en
Priority to KR1020180135794A priority patent/KR102582193B1/en
Priority to CN201811357513.2A priority patent/CN109822413B/en
Priority to TW107140980A priority patent/TWI798289B/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Auxiliary Devices For Machine Tools (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

To easily maintain a state where an opening of a processing chamber is formed.SOLUTION: A processing chamber 5 comprises side plates 51a-51d and an upper plate 52. Door means 59 for opening and closing an opening of the upper plate 52 comprises: a first upper plate 591, whose one end is supported on the processing chamber 5 through a first hinge 591a, which can rotate to outside of the processing chamber 5; a second upper plate 592, whose one end is supported on the other end of the first upper plate 591 through a second hinge 592a, which can rotate to inside of the processing chamber 5; a backrest part 593 that supports the rotated first upper plate 591; and a stopper 594, arranged at an upper end of the side plate 51c, which supports the other end of the second upper plate 592 rotated through the second hinge 592a to the inside of the processing chamber 5, where the first upper plate 591 is longer than the second upper plate 592. A surface near the inside of the processing chamber 5 of the first upper plate 591 is joined to a surface near the inside of the processing chamber 5 of the second upper plate 592, the first upper plate 591 is supported by the backrest part 593 and the other end of the second upper plate 592 is supported by the stopper 594, so that both upper plates are erected and openings thereof are opened.SELECTED DRAWING: Figure 3

Description

本発明は、半導体ウェーハ等の被加工物に研削加工等の加工を施す加工装置に関する。   The present invention relates to a processing apparatus that performs processing such as grinding on a workpiece such as a semiconductor wafer.

保持テーブルが保持したウェーハに回転する研削砥石を接触させて研削加工を施す研削装置は、ウェーハを保持する保持テーブルと、研削砥石を環状に配設した研削ホイールを装着した研削手段と、被加工物の研削を行う際に研削手段を収容する箱状の加工室とを備えている。   A grinding apparatus which performs grinding by bringing a rotating grinding wheel into contact with a wafer held by a holding table performs grinding processing includes a holding table for holding a wafer, a grinding means equipped with a grinding wheel on which a grinding wheel is annularly disposed, And a box-like processing chamber for accommodating the grinding means when grinding an object.

上記加工室は、研削手段を上下方向に研削送りするために、加工室を構成する上板に研削手段進入口を備えている。さらに、加工室は、研削砥石が消耗したら研削手段から研削ホイールを交換する作業を行うことができるようにするべく、加工室内の研削手段にアクセスする際に上板を開くことができる開閉機構を備える。さらに、研削ホイールの交換作業においては、開閉機構によって上板を折りたたむことで加工室に開口を形成した状態を維持する必要があるため、加工室の上板を固定部材に差し込むことで上板を固定できるロック機構（例えば、特許文献１参照）を研削装置は備えている。   The processing chamber is provided with a grinding means inlet on the upper plate constituting the processing chamber in order to feed the grinding means vertically in the grinding direction. Furthermore, the processing chamber has an opening / closing mechanism that can open the upper plate when accessing the grinding means in the processing chamber so that the grinding means can perform the work of replacing the grinding wheel when the grinding wheel is exhausted. Prepare. Furthermore, in the grinding wheel replacement operation, the upper plate needs to be maintained by forming the opening in the processing chamber by folding the upper plate by the opening / closing mechanism. Therefore, the upper plate is inserted into the fixing member in the processing chamber. The grinding device is provided with a lock mechanism (see, for example, Patent Document 1) that can be fixed.

特開２０１４−０６５１０２号公報JP, 2014-065102, A

しかし、上記特許文献１に記載されているような上板を固定部材に差し込ませてロックする機構は、加工室に開口が形成された状態を維持できた状態にするのに手間が掛かるという問題がある。
よって、加工手段を収容する加工室を備える加工装置においては、加工室の開口が形成された状態（加工室が開かれた状態）をより容易に維持できるようにするという課題がある。 However, the mechanism for inserting the upper plate into the fixing member and locking as described in Patent Document 1 takes a lot of time to maintain the state in which the opening is formed in the processing chamber. There is.
Therefore, in the processing apparatus provided with the processing chamber which accommodates the processing means, there is a problem that the state in which the opening of the processing chamber is formed (the processing chamber is opened) can be easily maintained.

上記課題を解決するための本発明は、被加工物を保持する保持テーブルと、該保持テーブルが保持した被加工物を加工する加工具を装着した加工手段と、該保持テーブルと該加工具とを収容する箱状の加工室と、を備える加工装置であって、該加工室は、側板と、上板と、を備え、該上板は、該保持テーブルと該加工手段とに該加工室の外側からアクセスするための開口を開閉する扉手段を備え、該扉手段は、一端が該加工室に第１のヒンジを介して支持され該加工室の外側に向かって回転可能である第１の上板と、一端が該第１の上板の他端に第２のヒンジを介して支持され該加工室の内側に向かって回転可能である第２の上板と、該第１のヒンジにより該加工室の外側に回転された該第１の上板を支える背もたれ部と、該側板の上端に配設され該第２のヒンジにより該加工室の内側に回転された該第２の上板の他端を支えるストッパと、を備え、該第１の上板と該第２の上板とは、該第１の上板の一端から他端までの距離より該第２の上板の一端から他端までの距離が長く、該第１のヒンジと該第２のヒンジとで該第１の上板の該加工室内側の面と該第２の上板の加工室内側の面とを向かい合わせて、該第１の上板を該背もたれ部で支え、該第２の上板の他端を該ストッパで支え、該第１の上板と該第２の上板とを該加工室上で立設させて該開口を開いた状態とする加工装置である。   The present invention for solving the above problems comprises a holding table for holding a workpiece, a processing means equipped with a processing tool for processing the workpiece held by the holding table, the holding table, and the processing tool A processing chamber including a box-like processing chamber for housing the processing chamber, the processing chamber including a side plate and an upper plate, the upper plate processing the processing chamber into the holding table and the processing means A door means for opening and closing an opening for access from the outside of the housing, the door means having one end supported by the processing chamber via the first hinge and rotatable toward the outside of the processing chamber An upper plate, a second upper plate supported at one end on the other end of the first upper plate via a second hinge and rotatable toward the inside of the processing chamber, and the first hinge A backrest supporting the first upper plate, which is rotated to the outside of the processing chamber, and an upper end of the side plate A stopper for supporting the other end of the second upper plate rotated to the inside of the processing chamber by the second hinge, the first upper plate and the second upper plate being The distance from the one end to the other end of the second upper plate is longer than the distance from the one end to the other end of the first upper plate, and the first upper plate is formed by the first hinge and the second hinge. And the first upper plate is supported by the backrest portion with the second inner side of the second upper plate facing the second inner side of the second upper plate. The processing apparatus is supported by a stopper, and the first upper plate and the second upper plate are erected on the processing chamber to open the opening.

本発明に係る加工装置は、加工室が、側板と、上板と、を備え、上板は、保持テーブルと加工手段とに加工室の外側からアクセスするための開口を開閉する扉手段を備え、扉手段は、一端が加工室に第１のヒンジを介して支持され加工室の外側に向かって回転可能である第１の上板と、一端が第１の上板の他端に第２のヒンジを介して支持され加工室の内側に向かって回転可能である第２の上板と、第１のヒンジにより加工室の外側に回転された第１の上板を支える背もたれ部と、側板の上端に配設され第２のヒンジにより加工室の内側に回転された第２の上板の他端を支えるストッパと、を備え、第１の上板と第２の上板とは、第１の上板の一端から他端までの距離より第２の上板の一端から他端までの距離が長くなっているため、第１のヒンジと第２のヒンジとで第１の上板の加工室内側の面と第２の上板の加工室内側の面とを向かい合わせて上板を折りたたんで開口を形成するとともに、第１の上板を背もたれ部で支え、第２の上板の他端をストッパで支え、第１の上板と第２の上板とを加工室上で立設させて開口を開いた状態とすることができる。そして、折りたたまれた上板が倒れなくなり、形成された開口を容易に維持することが可能となる。また、開口から保持テーブル及び加工手段にアクセスする際の作業性を向上させることができる。   In the processing apparatus according to the present invention, the processing chamber includes a side plate and an upper plate, and the upper plate includes door means for opening and closing an opening for accessing the holding table and the processing means from the outside of the processing chamber. The door means has a first upper plate, one end of which is supported by the processing chamber via the first hinge and is rotatable toward the outside of the processing chamber, and one end of the second upper plate at the other end of the first upper plate. A second upper plate supported via a hinge and rotatable toward the inside of the processing chamber, a backrest supporting the first upper plate rotated to the outside of the processing chamber by the first hinge, and a side plate A stopper for supporting the other end of the second upper plate disposed at the upper end of the second upper plate and rotated to the inside of the processing chamber by the second hinge, the first upper plate and the second upper plate Since the distance from the one end to the other end of the second upper plate is longer than the distance from the one end to the other end of the upper plate 1, the first The upper plate is folded to form an opening, with the surface of the first upper plate facing the processing chamber facing the surface of the second upper plate facing the processing chamber facing each other by the hinge and the second hinge. Support the upper plate with the backrest, support the other end of the second upper plate with the stopper, stand the first upper plate and the second upper plate on the processing chamber, and keep the opening open. Can. Then, the folded upper plate does not fall down, and the formed opening can be easily maintained. In addition, the workability in accessing the holding table and the processing means from the opening can be improved.

加工装置の一例を示す斜視図である。It is a perspective view showing an example of a processing device. 保持テーブルに保持された被加工物を加工室内において回転する加工具で研削している状態を示す断面図である。It is sectional drawing which shows the state which is grinding with the processing tool which rotates the to-be-processed object hold | maintained at the holding table in the processing chamber. 第１の上板を背もたれ部で支え、第２の上板の他端をストッパで支え、第１の上板と第２の上板とを加工室上で立設させて開口を開いた状態を示す断面図である。A state in which the first upper plate is supported by the backrest, the other end of the second upper plate is supported by the stopper, and the first upper plate and the second upper plate are erected on the processing chamber to open the opening It is sectional drawing which shows. 扉手段が閉じられた状態の加工装置の一部を示す斜視図である。It is a perspective view showing a part of processing device in the state where the door means was closed. 第１の上板が背もたれ部で支えられ、第２の上板の他端がストッパで支えられ、第１の上板と第２の上板とが加工室上で立設され開口が開かれた状態の加工装置の一部を示す斜視図である。The first upper plate is supported by the backrest, the other end of the second upper plate is supported by the stopper, and the first upper plate and the second upper plate are erected in the processing chamber and the opening is opened. It is a perspective view which shows a part of processing apparatus of a state.

本発明に係る図１に示す加工装置１は、例えば研削加工装置であり、被加工物Ｗを保持する保持テーブル３０と、保持テーブル３０が保持した被加工物Ｗを加工する加工具６４（図２参照）を装着した加工手段６と、保持テーブル３０と加工具６４とを収容する箱状の加工室５と、を備える。   The processing apparatus 1 shown in FIG. 1 according to the present invention is, for example, a grinding processing apparatus, and a holding table 30 for holding a workpiece W and a processing tool 64 for processing the workpiece W held by the holding table 30 2) and a box-like processing chamber 5 for accommodating the holding table 30 and the processing tool 64.

加工装置１の装置ベース１０上に配設された保持テーブル３０は、例えば、その外形が円形状であり、ポーラス部材等からなり被加工物Ｗを吸着する吸着部３００と、吸着部３００を支持する枠体３０１とを備える。吸着部３００は図示しない吸引源に連通し、吸引源が吸引することで生み出された吸引力が、吸着部３００の露出面であり枠体３０１と面一に形成された水平な保持面３００ａに伝達されることで、保持テーブル３０は保持面３００ａ上で被加工物Ｗを吸引保持する。保持テーブル３０は、Ｚ軸方向の軸心周りに回転可能であると共に、カバー３９によって周囲から囲まれており、カバー３９及びカバー３９に連結されＸ軸方向に伸縮する蛇腹カバー３９ａの下に配設された図示しないＸ軸方向移動手段によって、装置ベース１０上をＸ軸方向に往復移動可能となっている。   The holding table 30 disposed on the device base 10 of the processing device 1 has, for example, a circular outer shape, and is made of a porous member or the like, and has a suction portion 300 for holding the workpiece W and a suction portion 300 And a frame body 301. The suction unit 300 is in communication with a suction source (not shown), and a suction force generated by suction by the suction source is an exposed surface of the suction unit 300 and on a horizontal holding surface 300 a formed flush with the frame 301. By being transmitted, the holding table 30 sucks and holds the workpiece W on the holding surface 300a. The holding table 30 is rotatable about an axis in the Z-axis direction, and is surrounded from the periphery by the cover 39, and is disposed under the bellows cover 39a connected to the cover 39 and the cover 39 and expanding and contracting in the X-axis direction. The apparatus base 10 can be reciprocated in the X-axis direction by means of an X-axis direction moving means (not shown) provided.

装置ベース１０上の後方側（＋Ｘ方向側）には、コラム１７が立設されており、コラム１７の前面には、加工手段６をＺ軸方向に加工送りする加工送り手段７が配設されている。加工送り手段７は、Ｚ軸方向の軸心を有するボールネジ７０と、ボールネジ７０と平行に配設された一対のガイドレール７１と、ボールネジ７０に連結しボールネジ７０を回動させるモータ７２と、内部のナットがボールネジ７０に螺合し側部がガイドレール７１に摺接する昇降板７３と、昇降板７３に連結され加工手段６を保持するホルダ７４とから構成され、モータ７２がボールネジ７０を回動させると、これに伴い昇降板７３がガイドレール７１にガイドされてＺ軸方向に往復移動し、ホルダ７４に支持された加工手段６もＺ軸方向に往復移動する。   On the rear side (+ X direction side) on the apparatus base 10, a column 17 is erected, and on the front surface of the column 17, processing feed means 7 for processing and feeding the processing means 6 in the Z axis direction is disposed ing. The processing feed means 7 includes a ball screw 70 having an axial center in the Z-axis direction, a pair of guide rails 71 disposed parallel to the ball screw 70, a motor 72 coupled to the ball screw 70 and rotating the ball screw 70, The motor 72 rotates the ball screw 70. The motor 72 rotates the ball screw 70. The motor 72 rotates the ball screw 70. Then, the lift plate 73 is guided by the guide rails 71 to reciprocate in the Z-axis direction, and the processing means 6 supported by the holder 74 also reciprocates in the Z-axis direction.

加工手段６は、軸方向が保持テーブル３０の保持面３００ａに直交する鉛直方向（Ｚ軸方向）である回転軸６０と、回転軸６０を回転可能に支持するハウジング６１と、回転軸６０を回転駆動するモータ６２と、回転軸６０の下端に取り付けられたマウント６３と、マウント６３に着脱可能に接続された図２に示す加工具６４とを備える。加工具６４は、本実施形態においては研削ホイールであり、ホイール基台６４０と、略直方体形状の外形を備えホイール基台６４０の下面に複数環状に配設された研削砥石６４１とを備えている。研削砥石６４１は、適宜のボンド剤でダイヤモンド砥粒等が固着されて成形されている。   The processing means 6 rotates a rotating shaft 60 whose axial direction is a vertical direction (Z-axis direction) perpendicular to the holding surface 300 a of the holding table 30, a housing 61 rotatably supporting the rotating shaft 60, and a rotating shaft 60. It comprises a motor 62 to be driven, a mount 63 attached to the lower end of the rotation shaft 60, and a processing tool 64 shown in FIG. 2 detachably connected to the mount 63. The processing tool 64 is a grinding wheel in the present embodiment, and includes a wheel base 640 and a plurality of grinding wheels 641 having a substantially rectangular parallelepiped outer shape and disposed on the lower surface of the wheel base 640 in a plurality of rings. . The grinding wheel 641 is formed by adhering diamond abrasive grains or the like with an appropriate bonding agent.

例えば、回転軸６０の内部には、研削水供給源に連通し研削水の通り道となる図示しない流路が、回転軸６０の軸方向（Ｚ軸方向）に貫通して形成されており、流路は加工具６４の底面において研削砥石６４１に向かって研削水を噴出できるように開口している。   For example, a flow passage (not shown) communicating with the grinding water supply source and passing through the grinding water is formed in the rotation shaft 60 in the axial direction (Z-axis direction) of the rotation shaft 60 and flows The passage is opened at the bottom surface of the processing tool 64 so that the grinding water can be jetted toward the grinding wheel 641.

図１に示す装置ベース１０上のコラム１７の前方かつ加工手段６の下方となる位置には、例えば、箱状の外形を備えた加工室５が配設されている。加工室５は、保持テーブル３０の移動経路の両脇から立設する側板５１ａ及び側板５１ｂと、側板５１ａ及び側板５１ｂと連結された側板５１ｃ及び側板５１ｄと、側板５１ａ〜側板５１ｄの上端に下面が当接する上板５２とを備えている。   At a position forward of the column 17 and below the processing means 6 on the apparatus base 10 shown in FIG. 1, a processing chamber 5 having a box-like outer shape, for example, is disposed. The processing chamber 5 is provided with side plates 51a and 51b standing from both sides of the movement path of the holding table 30, side plates 51c and 51d connected to the side plates 51a and 51b, and lower surfaces at upper ends of the side plates 51a to 51d. And the upper plate 52 with which it abuts.

例えば、図１に示すように、側板５１ｃはその下部側が略長方形状に切り欠かれて搬入出口が形成されており、この搬入出口を保持テーブル３０が通過することで、保持テーブル３０を加工室５内に収容することができる。側板５１ｃの搬入出口は図示しないシャッターによって開閉可能となっている。   For example, as shown in FIG. 1, the lower side of the side plate 51c is cut out in a substantially rectangular shape to form a loading / unloading port, and the holding table 30 passes through the loading / unloading port to process the holding table 30 in the processing chamber. 5 can be accommodated. The loading / unloading port of the side plate 51c can be opened and closed by a shutter (not shown).

上板５２は、保持テーブル３０と加工手段６とに加工室５の外側からアクセスするための開口５２０（図３参照）を開閉する扉手段５９と固定上板５８とを備えている。扉手段５９は、一端が加工室５に第１のヒンジ５９１ａを介して支持され加工室５の外側に向かって回転可能である第１の上板５９１と、一端が第１の上板５９１の他端に第２のヒンジ５９２ａを介して支持され加工室５の内側に向かって回転可能である第２の上板５９２と、第１のヒンジ５９１ａにより加工室５の外側に回転された第１の上板５９１を支える背もたれ部５９３と、側板５１ｃの上端に配設され第２のヒンジ５９２ａにより加工室５の内側に向かって回転された第２の上板５９２の他端を支えるストッパ５９４とを備えている。   The upper plate 52 is provided with a door means 59 for opening and closing an opening 520 (see FIG. 3) for accessing the holding table 30 and the processing means 6 from the outside of the processing chamber 5 and a fixed upper plate 58. The door means 59 has a first upper plate 591 which is supported at one end by the processing chamber 5 via the first hinge 591 a and which is rotatable toward the outside of the processing chamber 5, and one end of the door means 59 is of the first upper plate 591. A second upper plate 592 supported at the other end via a second hinge 592a and rotatable toward the inside of the processing chamber 5, and a first hinge rotated to the outside of the processing chamber 5 by a first hinge 591a. A backrest 593 for supporting the upper plate 591 and a stopper 594 for supporting the other end of the second upper plate 592 disposed at the upper end of the side plate 51c and rotated toward the inside of the processing chamber 5 by the second hinge 592a. Is equipped.

側板５１ｂ、５１ｃ、及び５１ｄの上端に取り付けられた固定上板５８は、加工室５の上方の約半分を覆っており、その＋Ｙ方向側の端から中腹にかけて半円形状に切り欠かれている。また、第２の上板５９２は、−Ｙ方向側の他端から中腹にかけて半円形状に切り欠かれており、図１に示すように扉手段５９が閉じた状態において、固定上板５８の半円形状の切り欠き部分及び第２の上板５９２の半円形状の切り欠き部分によって加工手段６を加工室５内に進入させる円形状の加工手段進入口５９５が加工手段６の直下に形成される。   The fixed upper plate 58 attached to the upper ends of the side plates 51b, 51c and 51d covers about half of the upper side of the processing chamber 5, and is cut out in a semicircular shape from the end on the + Y direction side to the middle . In addition, the second upper plate 592 is notched in a semicircular shape from the other end on the -Y direction side to the middle and belly, and as shown in FIG. A circular processing means inlet 595 for allowing the processing means 6 to enter the processing chamber 5 is formed immediately below the processing means 6 by the semicircular cut portion and the semicircular cut portion of the second upper plate 592. Be done.

図２に示すように、第１の上板５９１と側板５１ａとの連結部分には第１のヒンジ５９１ａが配設されており、また第１の上板５９１の他端側の下面には第２のヒンジ５９２ａが配設されており、第２のヒンジ５９２ａを介して第２の上板５９２の一端と第１の上板５９１の他端とが連結されている。第１の上板５９１の側板５１ｃの上端に当接する箇所には、図１、２に示すように上板５２を閉じた状態において、ストッパ５９４が係合する係合孔５９１ｂが貫通形成されている。また、第２の上板５９２の上面には、作業者が把持する取っ手５９２ｄが取り付けられている。
なお、図１、２に示す例においては、軸方向（Ｘ軸方向）に長く形成された長蝶番を第１のヒンジ５９１ａとして１つ使用しているが、第１のヒンジ５９１ａとして平蝶番を複数個Ｘ軸方向に並列させてもよい。 As shown in FIG. 2, a first hinge 591 a is disposed at a connection portion between the first upper plate 591 and the side plate 51 a, and a lower surface at the other end of the first upper plate 591 is provided with a first hinge. Two hinges 592a are disposed, and one end of the second upper plate 592 and the other end of the first upper plate 591 are connected via the second hinge 592a. In a state in which the upper plate 52 is closed as shown in FIGS. 1 and 2, an engagement hole 591b engaged with the stopper 594 is formed at a location in contact with the upper end of the side plate 51c of the first upper plate 591. There is. In addition, a handle 592d held by the operator is attached to the upper surface of the second upper plate 592.
In the example shown in FIGS. 1 and 2, one long hinge formed long in the axial direction (X-axis direction) is used as the first hinge 591a, but a flat hinge is used as the first hinge 591a. Plural pieces may be arranged in parallel in the X-axis direction.

図２、３に示すように、第１の上板５９１と第２の上板５９２とは、第１の上板５９１のＹ軸方向側の一端から他端までの距離より第２の上板５９２のＹ軸方向側の一端から他端までの距離が長く設定されている。
第１の上板５９１を支える背もたれ部５９３は、例えば側板５１ａの上端に固定され斜め上方に延在するアーム５９３ａと、アーム５９３ａの先端に固定され第１の上板の上面が当接する当接部５９３ｂとを備えている。
図１、２において第１の上板５９１の係合孔５９１ｂに係合しているストッパ５９４は、例えば側板５１ｃの上端面から上方に向かって突出する柱状の外形を備えており、その外側面に第２の上板５９２の先端部分が＋Ｙ方向側から当接する。 As shown in FIGS. 2 and 3, the first upper plate 591 and the second upper plate 592 are the second upper plate from the distance from one end to the other end of the first upper plate 591 in the Y-axis direction. The distance from one end of the Y-axis direction 592 to the other end is set to be long.
The backrest 593 supporting the first upper plate 591 is, for example, an arm 593a fixed to the upper end of the side plate 51a and extending obliquely upward, and an abutment fixed to the tip of the arm 593a and the upper surface of the first upper plate abuts And 593b.
The stopper 594 engaged with the engagement hole 591b of the first upper plate 591 in FIGS. 1 and 2 has, for example, a columnar outer shape projecting upward from the upper end surface of the side plate 51c, and the outer surface thereof The tip portion of the second upper plate 592 abuts from the + Y direction side.

以下に、保持テーブル３０に保持された被加工物Ｗを研削加工する場合の加工装置１の動作について説明する。図１に示す被加工物Ｗは、例えば、外形が円形板状の半導体ウェーハであり、図１において上側を向いている裏面Ｗｂが被研削面となる。図１において下側を向いている被加工物Ｗの表面Ｗａは、デバイスが形成されており、図示しない保護テープが貼着されて保護されている。   The operation of the processing apparatus 1 in the case of grinding the workpiece W held on the holding table 30 will be described below. The workpiece W shown in FIG. 1 is, for example, a semiconductor wafer having a circular plate-like outer shape, and the back surface Wb facing upward in FIG. 1 is the surface to be ground. A device is formed on a surface Wa of the workpiece W facing downward in FIG. 1, and a protective tape (not shown) is adhered and protected.

まず、被加工物Ｗは保持テーブル３０の保持面３００ａに載置され吸引保持される。次いで、図示しないＸ軸方向移動手段が、被加工物Ｗを保持した保持テーブル３０を＋Ｘ方向へ移動させる。また、加工室５の図示しないシャッターが開き、保持テーブル３０が側板５１ｃの搬入出口を通り加工室５内に搬入された後、シャッターが閉じられる。   First, the workpiece W is placed on the holding surface 300 a of the holding table 30 and held by suction. Next, an X-axis direction moving unit (not shown) moves the holding table 30 holding the workpiece W in the + X direction. Further, after the shutter (not shown) of the processing chamber 5 is opened and the holding table 30 is carried into the processing chamber 5 through the loading / unloading port of the side plate 51c, the shutter is closed.

図２に示すように、被加工物Ｗを保持した保持テーブル３０が加工手段６の下まで移動して、加工具６４の回転中心が被加工物Ｗの回転中心に対して所定の距離だけ＋Ｙ方向にずれ、研削砥石６４１の回転軌道が被加工物Ｗの回転中心を通るように位置付けられる。図１に示すモータ６２により回転軸６０が回転駆動されるのに伴って、加工具６４が回転する。また、加工手段６が図１に示す加工送り手段７により−Ｚ方向へと送られ、加工手段６が上板５２の加工手段進入口５９５を通り加工室５内に進入していく。そして、図２に示すように、回転する加工具６４の研削砥石６４１が被加工物Ｗの裏面Ｗｂに当接することで研削加工が行われる。また、保持テーブル３０が回転することに伴い保持面３００ａ上に保持された被加工物Ｗも回転するので、被加工物Ｗの裏面Ｗｂの全面が研削される。研削加工中は、研削水を回転軸６０中の流路を通して研削砥石６４１と被加工物Ｗとの接触部位に対して供給して、接触部位を冷却・洗浄する。   As shown in FIG. 2, the holding table 30 holding the workpiece W moves below the processing means 6, and the rotation center of the processing tool 64 is a predetermined distance + Y from the rotation center of the workpiece W Shifting in the direction, the rotation trajectory of the grinding wheel 641 is positioned to pass through the rotation center of the workpiece W. As the rotating shaft 60 is rotationally driven by the motor 62 shown in FIG. 1, the processing tool 64 rotates. Further, the processing means 6 is fed in the −Z direction by the processing feed means 7 shown in FIG. 1, and the processing means 6 enters the processing chamber 5 through the processing means inlet 595 of the upper plate 52. Then, as shown in FIG. 2, the grinding stone 641 of the rotating processing tool 64 abuts on the back surface Wb of the workpiece W, whereby the grinding process is performed. Further, since the workpiece W held on the holding surface 300a is also rotated as the holding table 30 rotates, the entire back surface Wb of the workpiece W is ground. During grinding, grinding water is supplied to the contact portion between the grinding wheel 641 and the workpiece W through the flow path in the rotating shaft 60 to cool and clean the contact portion.

上記のように被加工物Ｗに対して研削砥石６４１で研削加工を施していくことで、研削砥石６４１は磨耗していくため、適宜のタイミング（例えば、複数枚の被加工物Ｗを研削した後）で加工具６４の交換を行う必要がある。その際に、扉手段５９によって加工室５の開口５２０を開いた状態にして、作業者が加工室５内の加工具６４にアクセスできるようにする。   As described above, since the grinding wheel 641 wears by grinding the workpiece W with the grinding wheel 641, an appropriate timing (for example, a plurality of the workpieces W are ground) It is necessary to replace the processing tool 64 later). At this time, the door 520 opens the opening 520 of the processing chamber 5 so that the operator can access the processing tool 64 in the processing chamber 5.

まず、作業者が取っ手５９２ｄを把持して、図２においては閉じられた状態の第２の上板５９２及び第１の上板５９１を上側に引き上げることで、ストッパ５９４が第１の上板５９１の係合孔５９１ｂからはずれる。そして、第１の上板５９１を、第１のヒンジ５９１ａを支点として回転させて図３に示すように立設させた状態にしつつ、その上面を背もたれ部５９３の当接部５９３ｂに当接させる。さらに、第２の上板５９２を、第２のヒンジ５９２ａを支点として加工室５内側に回転させて折りたたみ、かつ、その先端をストッパ５９４の外側面に当接させる。その結果、第１の上板５９１の加工室内５側の面と第２の上板５９２の加工室５内側の面とを向かい合わせて、第１の上板５９１を背もたれ部５９３で支え、第２の上板５９２の他端をストッパ５９４で支え、第１の上板５９１と第２の上板５９２とを加工室５上で立設させて開口５２０を開いた状態で維持することが可能となる。   First, the operator holds the handle 592d and pulls up the second upper plate 592 and the first upper plate 591 in the closed state in FIG. 2 so that the stopper 594 is the first upper plate 591. Out of the engagement hole 591b of Then, while making the first upper plate 591 rotate with the first hinge 591a as a fulcrum as shown in FIG. 3, the upper surface thereof is brought into contact with the contact portion 593b of the backrest 593. . Further, the second upper plate 592 is rotated to the inside of the processing chamber 5 with the second hinge 592a as a fulcrum and folded, and its tip is brought into contact with the outer surface of the stopper 594. As a result, the surface of the first upper plate 591 on the processing chamber 5 side faces the surface of the second upper plate 592 on the inner side of the processing chamber 5 to support the first upper plate 591 with the backrest 593 The other end of the upper plate 592 of 2 can be supported by the stopper 594, and the first upper plate 591 and the second upper plate 592 can be erected on the processing chamber 5, and the opening 520 can be maintained in the open state. It becomes.

図３に示すように、開口５２０が開かれた状態とすることで、加工室５内にある保持テーブル３０及び加工具６４が露出した状態になるため、作業者が加工具６４にアクセスして新しいものと交換することができる。
また、先の研削加工中においては、研削水を研削砥石６４１と被加工物Ｗとの接触部位に対して供給しているため、第１の上板５９１及び第２の上板５９２の加工室５内側の面には研削水が水滴として付着している場合がある。図３に示すように、第１の上板５９１と第２の上板５９２とを加工室５上で立設させて開口５２０を開いた状態とすることで、該水滴は、第１の上板５９１及び第２の上板５９２の加工室５内側の面を伝って下方に流れていき、加工室５内に流れ落ちるため、該水滴によって加工室５外部が汚されてしまうことが無い。 Since the holding table 30 and the processing tool 64 in the processing chamber 5 are exposed by opening the opening 520 as shown in FIG. 3, the operator accesses the processing tool 64. It can be exchanged for a new one.
In addition, since grinding water is supplied to the contact portion between the grinding wheel 641 and the workpiece W during the previous grinding process, the processing chamber for the first upper plate 591 and the second upper plate 592 5 Grinding water may be attached as water droplets on the inner surface. As shown in FIG. 3, by making the first upper plate 591 and the second upper plate 592 stand upright on the processing chamber 5 and leaving the opening 520 open, the water droplets form the first upper plate. The plate 591 and the second upper plate 592 flow downward along the inner surface of the processing chamber 5 and flow down into the processing chamber 5, so that the outside of the processing chamber 5 is not soiled by the water droplets.

なお、本発明に係る加工装置は上記実施形態に限定されるものではなく、また、添付図面に図示されている加工装置１の各構成についても、これに限定されず、本発明の効果を発揮できる範囲内で適宜変更可能である。例えば、本発明に係る加工装置は、上記実施形態のような保持テーブル３０がＸ軸方向に直動して加工手段６の直下に位置付けられる加工装置１ではなく、図４、５に示すような、加工室５Ａ内をターンテーブル１８が回転することで、図示しない研削加工手段の直下に保持テーブル３０が位置付けられる構成の加工装置１Ａであってもよい。   In addition, the processing apparatus according to the present invention is not limited to the above embodiment, and each configuration of the processing apparatus 1 illustrated in the attached drawings is not limited to this either, and the effects of the present invention are exhibited. It can change suitably within the limits which can be done. For example, the processing apparatus according to the present invention is not the processing apparatus 1 in which the holding table 30 linearly moves in the X-axis direction as in the above embodiment and is positioned directly below the processing means 6 as shown in FIGS. The processing apparatus 1A may be configured such that the holding table 30 is positioned immediately below the grinding means (not shown) by rotating the turntable 18 in the processing chamber 5A.

図４、５は、例えば、図示しない複数軸の加工手段（粗研削加工手段及び仕上げ研削加工手段等）を備える加工装置１Ａの一部を抜き出して示した斜視図である。
図４、５に示す加工装置１Ａのベース１０Ａ上には、箱状の外形を備えた加工室５Ａが配設されている。加工室５Ａは、ベース１０Ａ上に立設する側板５６ａ及び側板５６ｂと、側板５６ａ及び側板５６ｂと連結された側板５６ｃと、側板５６ａ〜側板５６ｃの上端に下面が当接する上板５７とを備えている。 FIGS. 4 and 5 are perspective views showing, for example, a part of a processing apparatus 1A including processing means (rough grinding processing means, finish grinding processing means, etc.) of a plurality of axes (not shown).
A processing chamber 5A having a box-like outer shape is disposed on a base 10A of the processing apparatus 1A shown in FIGS. The processing chamber 5A includes a side plate 56a and a side plate 56b erected on the base 10A, a side plate 56c connected to the side plate 56a and the side plate 56b, and an upper plate 57 whose lower surface abuts on upper ends of the side plates 56a to 56c. ing.

加工室５Ａ内には円形状のターンテーブル１８（図５参照）が配設されており、ターンテーブル１８の上面には、複数の保持テーブル３０が周方向に等間隔を空けて配設されている。ターンテーブル１８は、Ｚ軸方向の軸心周りに回転可能となっており、ターンテーブル１８が回転することで、各保持テーブル３０を公転させ、各保持テーブル３０を上板５７に貫通形成された円形の加工手段進入口５７１の直下に順次移動させることができる。加工手段進入口５７１の上方には、図示しない研削加工手段が配設されている。   A circular turntable 18 (see FIG. 5) is disposed in the processing chamber 5A, and a plurality of holding tables 30 are disposed on the upper surface of the turntable 18 at equal intervals in the circumferential direction. There is. The turn table 18 is rotatable around an axis in the Z-axis direction, and when the turn table 18 rotates, each holding table 30 is revolved and each holding table 30 is formed to penetrate the upper plate 57. It can be sequentially moved immediately below the circular processing means inlet 571. Grinding means (not shown) is disposed above the processing means inlet 571.

上板５７は、保持テーブル３０と加工室５Ａ内に外側からアクセスするための開口５７４（図５参照）を開閉する扉手段５５を備えている。図４に示すように、扉手段５５を構成する第１の上板５５１の一端と側板５６ｂとの連結部分には第１のヒンジ５５１ａが配設されており、第１の上板５５１の他端側の下面には第２のヒンジ５５２ａが配設されている。第２のヒンジ５５２ａは、第１の上板５５１の他端と第２の上板５５２の他端とを連結している。第１の上板５５１の側板５６ｃの上端に当接する箇所には、ストッパ５５４が係合する係合孔５５１ｂ（図５参照）が貫通形成されている。また、第２の上板５５２の上面には、作業者が把持する取っ手５５２ｄが取り付けられている。
扉手段５５とＹ軸方向において対向する位置には、上板５７を構成する開閉板５７７が配設されており、開閉板５７７はヒンジ５７７ａによって開閉可能となっている。扉手段５５を開き、さらに開閉板５７７を開いた状態とすることで、作業者が加工室５Ａ内によりアクセスしやすい状態とすることができる。 The upper plate 57 is provided with a door means 55 for opening and closing the holding table 30 and an opening 574 (see FIG. 5) for accessing the inside of the processing chamber 5A from the outside. As shown in FIG. 4, a first hinge 551 a is disposed at the connecting portion between one end of the first upper plate 551 constituting the door means 55 and the side plate 56 b, and other than the first upper plate 551. A second hinge 552a is disposed on the lower surface on the end side. The second hinge 552 a connects the other end of the first upper plate 551 and the other end of the second upper plate 552. An engagement hole 551b (see FIG. 5), which is engaged with the stopper 554, is formed at a position in contact with the upper end of the side plate 56c of the first upper plate 551. Further, a handle 552 d held by the operator is attached to the upper surface of the second upper plate 552.
An open / close plate 577 constituting the upper plate 57 is disposed at a position facing the door means 55 in the Y-axis direction, and the open / close plate 577 can be opened and closed by a hinge 577a. By opening the door means 55 and further opening the opening / closing plate 577, the operator can be more easily accessed in the processing chamber 5A.

第１の上板５５１と第２の上板５５２とは、第１の上板５５１のＹ軸方向側の一端から他端までの距離より第２の上板５５２のＹ軸方向側の一端から他端までの距離が長く設定されている。
図４に示すように、側板５６ｂ上には第１の上板５５１を支える背もたれ部５５３が配設されている。側板５６ｃの上端面から上方に向かって突出する柱状の外形を備えたストッパ５５４は、その外側面に折りたたまれた第２の上板５５２の先端部分が−Ｙ方向側から当接することで、第２の上板５５２を支える役割を果たす。 The first upper plate 551 and the second upper plate 552 are from the one end of the second upper plate 552 in the Y-axis direction from the distance from the one end of the first upper plate 551 in the Y-axis direction to the other end. The distance to the other end is set long.
As shown in FIG. 4, a backrest 553 supporting the first upper plate 551 is disposed on the side plate 56b. The stopper 554 having a columnar outer shape protruding upward from the upper end surface of the side plate 56c is abutted from the −Y direction side by the tip end portion of the second upper plate 552 folded to the outer side surface thereof. It plays a role of supporting the upper plate 552 of FIG.

加工装置１Ａにおいて、扉手段５５によって加工室５Ａの開口５７４を開いた状態にして作業者が加工室５Ａ内にアクセスできるようにする場合には、まず、作業者が取っ手５５２ｄを把持して、図４に示すように閉じた状態の第２の上板５５２及び第１の上板５５１を上側に引き上げる。そして、第１の上板５５１を、第１のヒンジ５５１ａを支点として加工室５Ａの外側に向けて回転させて図５に示すように立設させた状態にしつつ、その上面を背もたれ部５５３に当接させる。さらに、第１の上板５５１の加工室内５Ａ側の面と第２の上板５５２の加工室５Ａ内側の面とを向かい合わせるように、第２の上板５５２を第２のヒンジ５５２ａを支点として加工室５Ａ内側に回転させて折りたたみ、かつ、その先端をストッパ５５４の外側面に当接させる。このように、加工装置１Ａは、第１の上板５５１と第２の上板５５２とを加工室５Ａ上で立設させて開口５７４が開いた状態に簡単にセットすることができる。   In the processing apparatus 1A, when the operator is allowed to access the processing chamber 5A by opening the opening 574 of the processing chamber 5A by the door means 55, the operator first grips the handle 552d and As shown in FIG. 4, the second upper plate 552 and the first upper plate 551 in the closed state are pulled up. Then, while the first upper plate 551 is rotated toward the outside of the processing chamber 5A with the first hinge 551a as a fulcrum to stand upright as shown in FIG. Let it abut. Furthermore, the second upper plate 552 is pivoted on the second hinge 552a so that the surface on the processing chamber 5A side of the first upper plate 551 faces the surface on the inner side of the processing chamber 5A of the second upper plate 552 The inner side of the processing chamber 5A is rotated and folded, and its tip is brought into contact with the outer surface of the stopper 554. As described above, the processing apparatus 1A can easily set the first upper plate 551 and the second upper plate 552 on the processing chamber 5A so that the opening 574 is open.

１：加工装置 １０：装置ベース １７：コラム
３０：保持テーブル ３００：吸着部 ３００ａ：保持面 ３０１：枠体 ３９：カバー
７：加工送り手段 ７０：ボールネジ ７１：ガイドレール ７２：モータ ７３：昇降板 ７４：ホルダ
６：加工手段 ６０：回転軸 ６１：ハウジング ６２：モータ ６３：マウント
６４：加工具 ６４０：ホイール基台 ６４１：研削砥石
５：加工室 ５１ａ〜５１ｄ：側板 ５２：上板 ５８：固定上板
５９：扉手段 ５９５：加工手段進入口
５９１：第１の上板 ５９１ａ：第１のヒンジ
５９２：第２の上板 ５９２ａ：第２のヒンジ
５９３：背もたれ部 ５９４：ストッパ
１Ａ：加工装置 １８：ターンテーブル ５Ａ：加工室 ５７：上板 ５７１：加工手段進入口 ５７４：開口
５５：扉手段 ５５１：第１の上板 ５５２：第２の上板 ５５３：背もたれ部 ５５４：ストッパ 1: Processing device 10: Device base 17: Column 30: Holding table 300: Adsorption section 300a: Holding surface 301: Frame body 39: Cover 7: Processing feed means 70: Ball screw 71: Guide rail 72: Motor 73: Lifting plate 74 : Holder 6: Processing means 60: Rotary shaft 61: Housing 62: Motor 63: Mount 64: Processing tool 640: Wheel base 641: Grinding stone 5: Processing chamber 51a to 51d: Side plate 52: Upper plate 58: Fixed upper plate 59: door means 595: processing means inlet 591: first upper plate 591a: first hinge 592: second upper plate 592a: second hinge 593: backrest 594: stopper 1A: processing device 18: turn Table 5A: processing chamber 57: upper plate 571: processing means inlet 574: opening 55: door means 551: first upper plate 552: second Top plate 553: Back portion 554: Stopper

Claims (1)

被加工物を保持する保持テーブルと、該保持テーブルが保持した被加工物を加工する加工具を装着した加工手段と、該保持テーブルと該加工具とを収容する箱状の加工室と、を備える加工装置であって、
該加工室は、側板と、上板と、を備え、
該上板は、該保持テーブルと該加工手段とに該加工室の外側からアクセスするための開口を開閉する扉手段を備え、
該扉手段は、一端が該加工室に第１のヒンジを介して支持され該加工室の外側に向かって回転可能である第１の上板と、一端が該第１の上板の他端に第２のヒンジを介して支持され該加工室の内側に向かって回転可能である第２の上板と、該第１のヒンジにより該加工室の外側に回転された該第１の上板を支える背もたれ部と、該側板の上端に配設され該第２のヒンジにより該加工室の内側に回転された該第２の上板の他端を支えるストッパと、を備え、
該第１の上板と該第２の上板とは、該第１の上板の一端から他端までの距離より該第２の上板の一端から他端までの距離が長く、
該第１のヒンジと該第２のヒンジとで該第１の上板の該加工室内側の面と該第２の上板の加工室内側の面とを向かい合わせて、該第１の上板を該背もたれ部で支え、該第２の上板の他端を該ストッパで支え、該第１の上板と該第２の上板とを該加工室上で立設させて該開口を開いた状態とする加工装置。 A holding table for holding a workpiece, a processing means equipped with a processing tool for processing the workpiece held by the holding table, and a box-like processing chamber for containing the holding table and the processing tool A processing device comprising:
The processing chamber includes a side plate and a top plate,
The upper plate includes door means for opening and closing an opening for accessing the holding table and the processing means from the outside of the processing chamber,
The door means has a first upper plate, one end of which is supported by the processing chamber via a first hinge and is rotatable toward the outside of the processing chamber, and one end of the other is the other end of the first upper plate. A second upper plate supported via a second hinge and rotatable toward the inside of the processing chamber, and the first upper plate rotated to the outside of the processing chamber by the first hinge And a stopper for supporting the other end of the second upper plate disposed at the upper end of the side plate and rotated to the inside of the processing chamber by the second hinge.
The first upper plate and the second upper plate have a longer distance from one end to the other end of the second upper plate than a distance from one end to the other end of the first upper plate,
With the first hinge and the second hinge, the surface on the processing chamber side of the first upper plate and the surface on the processing chamber side of the second upper plate face each other. The plate is supported by the backrest, the other end of the second upper plate is supported by the stopper, and the first upper plate and the second upper plate are erected on the processing chamber to open the opening. Processing device to be in the open state.
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