TWI798289B - Processing device - Google Patents

Abstract

[Problem] Easily maintain the state where the opening of the processing chamber is formed. [Solution] A processing device (1), characterized in that the processing chamber (5) is provided with side plates (51a) ~ side plates (51d) and an upper plate (52), and a door for opening and closing the opening of the upper plate (52) The mechanism (59) is equipped with: the first upper plate (591), one end is supported in the processing chamber (5) via the first hinge (591a), and can rotate toward the outside of the processing chamber (5); the second upper plate (592), one end is supported on the other end of the first upper plate (591) via the second hinge (592a), and can rotate towards the inside of the processing chamber (5); the backrest (593) supports the rotated first The upper plate (591); and the stopper (594) are arranged on the upper end of the side plate (51c) to support the second upper plate (592) that rotates to the inside of the processing chamber (5) by the second hinge (592a). ), the first upper plate (591) is longer than the second upper plate (592), and the surface inside the processing chamber (5) of the first upper plate (591) is connected to the second upper plate (592) ) of the processing chamber (5) inside the surface is aligned, the backrest (593) supports the first upper plate (591) and the other end of the second upper plate (592) is supported by the stopper (594), so that the two upper plates Set upright so that the opening becomes an open state.

Description

Processing device

The present invention relates to a processing apparatus for performing processing such as grinding processing on a workpiece such as a semiconductor wafer.

The grinding device that makes the rotating grinding stone come into contact with the wafer held by the holding platform to perform grinding processing is equipped with: holding the platform to hold the wafer; the grinding mechanism is equipped with the grinding stone The ring-shaped grinding wheel; and the box-shaped processing chamber accommodate the grinding mechanism when the workpiece is being ground.

The above-mentioned processing chamber is for grinding and feeding the grinding mechanism in the vertical direction, and the upper plate constituting the processing chamber is provided with a grinding mechanism inlet port. Moreover, the processing chamber is equipped with a switch mechanism for replacing the grinding wheel from the grinding mechanism after the grinding stone is consumed. The switch mechanism can store the grinding mechanism in the processing chamber. When taking it, open the upper panel. Moreover, in the replacement operation of the grinding wheel, it is necessary to fold the upper plate by the switch mechanism to maintain the opening state in the processing chamber. Therefore, the grinding device is equipped with a locking mechanism to lock the processing chamber. The upper plate is inserted into the fixing member, whereby the upper plate can be fixed (see Patent Document 1).

[Prior Art Literature] [Patent Document]

[Patent Document 1] Japanese Patent Laid-Open No. 2014-065102

However, the mechanism for inserting and locking the upper plate into the fixing member as described in the above-mentioned Patent Document 1 has a problem that manpower is required to maintain the state in which the opening is formed in the processing chamber.

Therefore, in a processing apparatus provided with a processing chamber for accommodating a processing mechanism, there is a problem that the state in which the opening of the processing chamber is formed (the processing chamber is opened) can be more easily maintained.

In order to solve the above-mentioned problems, the present invention provides a processing device, which is equipped with: a holding platform for holding the processed object; a processing mechanism equipped with a processing tool for processing the processed object held by the holding platform; and a box-shaped A processing chamber for accommodating the holding platform and the processing tool. The processing device is characterized in that the processing chamber has a side plate and an upper plate supported by the upper end of the side plate. The upper plate has: a door mechanism, the switch is used to store the holding platform and the processing mechanism from the outside of the processing chamber The opening, the door mechanism, is equipped with: the first upper plate, one end is supported in the processing chamber through the first hinge, and can rotate toward the outside of the processing chamber; the second upper plate, one end is supported by the second hinge The chain is supported on the other end of the first upper plate, and can rotate toward the inner side of the processing chamber; the handle is arranged on the upper surface of the second upper plate; The first upper plate that rotates outside the processing chamber; the stopper is arranged on the upper end of the side plate, and the column that protrudes upward supports the second hinge that rotates to the inside of the processing chamber. The other end of the second upper plate; and the engaging hole are formed through the position where the upper end of the side plate of the first upper plate in the closed state abuts, and are engaged with the stopper, and the first upper plate and the side plate are engaged. The second upper plate, the distance from one end of the second upper plate to the other end is longer than the distance from one end to the other end of the first upper plate, when opened and closed by the door mechanism When the opening is in the open state, the operator holds the handle, pulls up the first upper plate and the second upper plate, keeps the engaging hole away from the stopper, and uses the first hinge as a fulcrum to move The first upper plate is rotated to make the upper surface of the first upper plate abut and supported on the backrest, and the second upper plate is rotated with the second hinge as a fulcrum, so that the first upper plate The surface inside the processing chamber of the second upper plate is opposite to the surface inside the processing chamber of the second upper plate, and the other end of the second upper plate is supported by the stopper, whereby the first upper plate and the second upper plate The state where the upper plate is folded is erected on the processing chamber and the opening is opened.

In the processing device of the present invention, the processing chamber is equipped with a side plate and an upper plate supported by the upper end of the side plate, and the upper plate is provided with: a door mechanism, The switch is used to access the holding platform and the processing mechanism from the outside of the processing chamber. The door mechanism is equipped with: a first upper plate, one end of which is supported in the processing chamber through the first hinge, and can face the processing chamber. External rotation; the second upper plate, one end is supported on the other end of the first upper plate through the second hinge, and can rotate toward the inside of the processing chamber; the handle is arranged on the second upper plate; the backrest, supported The first upper plate that rotates to the outside of the processing chamber by the first hinge; the stopper is arranged on the upper end of the side plate, and supports the direction of the processing chamber by the second hinge with a column that protrudes upward. The other end of the second upper plate rotated inwardly; and the engaging hole is formed through the position where the upper end of the side plate of the first upper plate in the closed state abuts with the stopper, and the first upper plate and the first upper plate are engaged with the stopper. 2. The upper plate is because the distance from one end of the second upper plate to the other end is longer than the distance from one end of the first upper plate to the other end. Therefore, in the state of opening and closing by the door mechanism When the opening is opened, the operator holds the handle without using other tools or another mechanism that generates the driving force of the switch, and pulls up the first upper plate and the second upper plate, so that the engaging hole is away from the stopper, and the first The hinge is used as a fulcrum to rotate the first upper plate to make the upper surface of the first upper plate contact and support the backrest, and the second hinge is used as a fulcrum to rotate the second upper plate to make the first upper plate The surface inside the processing chamber is opposite to the surface inside the processing chamber of the second upper plate, and the other end of the second upper plate is supported by a stopper, whereby the first upper plate and the second upper plate are folded in the processing chamber. It can be set in an upright position to open the opening. Also, the folded upper panel becomes unlikely to collapse, or the formed opening can be easily maintained. In addition, the workability when accessing the holding platform and the processing mechanism from the opening can be improved. Moreover, since the column-shaped stopper protruding upward is fitted in the state of closing the first upper plate And engage with the engaging hole of the first upper plate, therefore, it is not necessary to form the stopper supporting the other end of the second upper plate into a concave shape at the upper end of the side plate as in the past, so the first upper plate can be In the state where the lower surface is in close contact with the upper end of the side plate, the first upper plate is closed. Therefore, the sealing performance of the processing chamber can be improved, and the spray-like processing that occurs in the processing chamber as usual can be prevented. Shavings and the like are accumulated in the recessed stopper, etc. Moreover, since the columnar stopper is inserted and engaged with the engaging hole of the first upper plate in the state of closing the first upper plate, therefore, during processing in the processing chamber, even processing in the horizontal direction Vibration is transmitted to the first upper plate, and the stopper can also limit the horizontal deviation movement or shaking of the first upper plate and the second upper plate, so that the sealing of the processing chamber during the processing can be improved .

1: Processing device

10:Device base

17: Cylinder

30: Hold Platform

300: adsorption part

300a: holding surface

301: frame

39: cover

7: Processing feed mechanism

70: Ball screw

71: guide rail

72: motor

73: Lifting plate

74: bracket

6: Processing mechanism

60: axis of rotation

61: shell

62: motor

63: frame

64:Add tool

640: wheel abutment

641: grinding whetstone

5: Processing room

51a~51d: side panels

52: upper board

58: Fix the upper plate

59: door mechanism

595: The entrance of the processing mechanism

591: The first board

591a: 1st hinge

592: The second upper board

592a: 2nd hinge

593: backrest

594: stop

1A: Processing device

18:Rotary table

5A: Processing room

57: upper board

571: The entrance of the processing mechanism

574: opening

55: door mechanism

551: The first board

552: The second upper board

553: backrest

554: stopper

[ Fig. 1 ] A perspective view showing an example of a processing device.

[ Fig. 2 ] A cross-sectional view showing a state in which a workpiece held on a holding table is ground with a machining tool rotating in a machining chamber.

[Fig. 3] A cross section showing the state where the first upper plate is supported by the backrest and the other end of the second upper plate is supported by the stopper, and the first upper plate and the second upper plate are erected on the processing chamber and the opening is opened picture.

[ Fig. 4 ] A perspective view showing an example of a processing device in a state where a door mechanism is closed.

[Fig. 5] It shows that the first upper plate is supported by the backrest and the other end of the second upper plate is supported by the stopper, so that the first upper plate and the second upper plate are erected on the processing chamber And a perspective view of a part of the processing device with the opening opened.

The processing device 1 shown in FIG. 1 of the present invention is, for example, a grinding processing device, and is provided with: a holding platform 30 for holding the workpiece W; a processing mechanism 6 for the workpiece W held by the holding platform 30 Processing tool 64 for processing (refer to FIG. 2 ); and a box-shaped processing chamber 5 for accommodating and maintaining the platform 30 and the processing tool 64 .

The holding platform 30 arranged on the device base 10 of the processing device 1 is, for example, a circular shape, and includes: an adsorption part 300, which is composed of a porous member, etc., and absorbs the workpiece W; and a frame 301, The suction part 300 is supported. The adsorption part 300 is connected with a suction source not shown in the figure, and the adsorption force generated by the adsorption source will be transmitted to the exposed surface of the adsorption part 300, that is, the horizontal holding surface 300a formed on the same plane as the frame body 301, Thereby, the holding table 30 adsorbs and holds the workpiece W on the holding surface 300a. The holding platform 30 is rotatable around the axis in the Z-axis direction, and is surrounded by a cover 39, and can be arranged under the bellows cover 39a that expands and contracts in the X-axis direction by being arranged on the cover 39 and connected with the cover 39. The X-axis direction movement mechanism (not shown) reciprocates on the device base 10 in the X-axis direction.

On the rear side (+X direction side) on the device base 10, a column 17 is erected, and on the front of the column 17, a processing feed for processing the processing mechanism 6 toward the Z-axis direction is provided. Institution7. The processing feed mechanism 7 is composed of the following: a ball screw 70 having a center in the Z-axis direction; a pair of guide rails 71 arranged parallel to the ball screw 70; a motor 72 connected to the rollers. The ball screw 70 is connected to make the ball screw 70 rotate; the lifting plate 73, the inner nut is screwed with the ball screw 70, and the side part is in sliding contact with the guide rail 71; and the bracket 74 is connected with the lifting plate 73 to maintain processing Mechanism 6, when the motor 72 rotates the ball screw 70, along with this, the lifting plate 73 will be guided to the guide rail 71 and move back and forth in the Z-axis direction, and the processing mechanism 6 held on the bracket 74 will also move Z-axis direction reciprocating movement.

The processing mechanism 6 is provided with: a rotating shaft 60 whose axial direction is a vertical direction (Z-axis direction) perpendicular to the holding surface 300a of the holding platform 30; a housing 61 which supports the rotating shaft 60 rotatably; a motor 62 which rotates Drive the rotating shaft 60; the frame 63 is mounted on the lower end of the rotating shaft 60; and the processing tool 64 shown in FIG. In this embodiment, the processing tool 64 is a grinding wheel, and is provided with: a wheel base 640; under. The grinding whetstone 641 is shaped by fixing diamond abrasive grains and the like with an appropriate binder.

For example, in the inside of the rotating shaft 60, a flow path not shown in the figure that communicates with the grinding water supply source and becomes a passage of the grinding water is formed through the axial direction of the rotating shaft 60 (Z-axis direction), the flow path, An opening is formed on the bottom surface of the processing tool 64 so that grinding water can be sprayed toward the grinding stone 641 .

A processing chamber 5 having a box-like outer shape is arranged, for example, at a position in front of the column 17 on the device base 10 shown in FIG. 1 and below the processing mechanism 6 . The processing chamber 5 is equipped with: a side plate 51a and a side plate 51b erected from both sides of the moving path of the holding platform 30; a side plate 51c and a side plate 51d are connected to the side plate 51a and the side plate 51b; It abuts against the upper ends of the side plates 51a to 51d.

For example, as shown in FIG. 1, the side plate 51c is cut into a substantially rectangular shape at its lower side to form a loading and unloading port, and the holding platform 30 can be accommodated in the processing chamber 5 by passing the holding platform 30 through the loading and unloading port. Inside. The loading and unloading port of the side plate 51c can be opened and closed by a not-shown baffle.

The upper plate 52 is provided with: a door mechanism 59 for opening and closing an opening 520 (see FIG. 3 ) for accessing the holding platform 30 and the processing mechanism 6 from the outside of the processing chamber 5 ; and a fixed upper plate 58 . The door mechanism 59 is equipped with: a first upper plate 591, one end of which is supported in the processing chamber 5 through the first hinge 591a, and can rotate toward the outside of the processing chamber 5; a second upper plate 592, one end of which is passed through the second hinge 592a is supported on the other end of the first upper plate 591, and can rotate towards the inside of the processing chamber 5; the backrest 593 supports the first upper plate 591 that rotates toward the outside of the processing chamber 5 by the first hinge 591a; And the stopper 594 is arranged at the upper end of the side plate 51c, and supports the other end of the second upper plate 592 that is rotated inwardly of the processing chamber 5 by the second hinge 592a.

The fixed upper plate 58 installed on the upper ends of the side plates 51b, 51c, and 51d covers approximately half of the upper part of the processing chamber 5, and is cut into a semicircular shape from the end on the +Y direction side to the center. Also, the second upper plate 592 is cut into a semicircular shape from the other end of the -Y direction side to the center, and as shown in FIG. Circular processing mechanism inlet 595, the processing mechanism 6 enters the processing chamber 5 by fixing the semicircular notch of the upper plate 58 and the semicircular notch of the second upper plate 592. Inside.

As shown in Figure 2, at the connection portion between the first upper plate 591 and the side plate 51a, the first hinge chain 591a is arranged, and again, under the other end side of the first upper plate 591, the first hinge chain 591a is arranged. 2 hinges 592a, one end of the second upper plate 592 and the other end of the first upper plate 591 are connected through the second hinge 592a. At the upper end of the side plate 51c that abuts against the first upper plate 591, as shown in Figures 1 and 2, in the state where the upper plate 52 is closed, an engaging hole that engages with the stopper 594 is formed through it. 591b. Also, on the upper surface of the second upper plate 592, a handle 592d which can be held by an operator is installed.

In addition, in the examples shown in FIGS. 1 and 2, although a long hinged chain formed elongatedly along the axial direction (X-axis direction) is used as the first hinged chain 591a, a plurality of flat twisted chains may also be used. The chains are arranged along the X-axis direction as the first hinge chain 591a.

As shown in Figures 2 and 3, the first upper plate 591 and the second upper plate 592 are set such that the distance from one end to the other end of the second upper plate 592 in the Y-axis direction is greater than the distance from the first upper plate 592. The distance from one end to the other end on the Y-axis direction side of the upper plate 591 is longer.

The backrest portion 593 supporting the first upper plate 591 is, for example, equipped with: a support arm 593a fixed to the upper end of the side plate 51a and extending obliquely upward; 1 The top of the upper plate abuts.

In FIGS. 1 and 2, the stopper 594 engaged with the engaging hole 591b of the first upper plate 591 has, for example, a columnar shape protruding upward from the upper end surface of the side plate 51c, and the second upper plate The front end portion of 592 is in contact with the outer surface from the +Y direction side.

Hereinafter, the explanation about being kept on the holding platform 30 Operation of the processing device 1 when the workpiece W is subjected to grinding processing. The workpiece W shown in FIG. 1 is, for example, a circular plate-shaped semiconductor wafer. In FIG. 1 , the back surface Wb facing upward becomes the surface to be ground. In FIG. 1 , the surface Wa of the workpiece W facing the lower side is protected by forming an element and affixing a protective tape (not shown).

First, the workpiece W is placed on the holding surface 300a of the holding table 300 and sucked and held. Next, an X-axis direction movement mechanism (not shown) moves the holding table 30 holding the workpiece W in the +X direction. Also, the shutter (not shown) of the processing chamber 5 is opened, and after the holding table 30 is carried into the processing chamber 5 through the loading and unloading port of the side plate 51c, the shutter is closed.

As shown in FIG. 2, the positioning is performed in the following manner: the holding platform 30 holding the workpiece W is moved below the processing mechanism 6, so that the rotation center of the processing tool 64 is at +Y relative to the rotation center of the workpiece W. The direction is deviated by a predetermined distance, and the rotation orbit of the grinding stone 641 passes through the rotation center of the workpiece W. As the rotary shaft 60 is driven to rotate by the motor 62 shown in FIG. 1 , the processing tool 64 rotates. Moreover, by the processing feeding mechanism 7 shown in FIG. 1 , the processing mechanism 6 is fed in the -Z direction, and the processing mechanism 6 enters the processing chamber 5 through the processing mechanism inlet 595 of the upper plate 52 . Then, as shown in FIG. 2 , the grinding whetstone 641 of the rotating machining tool 64 comes into contact with the back surface Wb of the workpiece W, whereby grinding is performed. Moreover, since the workpiece W held on the holding surface 300 a rotates as the holding table 30 rotates, the entire back surface Wb of the workpiece W is ground. During the grinding process, grinding water is supplied to the contact portion between the grinding stone 641 and the workpiece W through the flow path in the rotating shaft 60, and cooled. clean contact parts.

As described above, since the grinding stone 641 is used to grind the workpiece W, the grinding stone 641 is worn. Therefore, it is necessary to grind the workpiece W at an appropriate timing (for example, after grinding a plurality of workpieces W). ) to replace the processing tool 64. At this time, the opening 520 of the processing chamber 5 is opened by the door mechanism 59 , so that the operator can access the processing tool 64 of the processing chamber 5 .

First, the operator holds the handle 592d, and in FIG. 2, pulls up the second upper plate 592 and the first upper plate 291 in the closed state, whereby the stopper 594 is lifted from the first upper plate 591. The engaging hole 591b is disengaged. Then, using the first hinge 591a as a fulcrum, the first upper plate 591 is rotated to stand upright as shown in FIG. Then, the second upper plate 592 is rotated and folded inwardly of the processing chamber 5 with the second hinge 592 a as a fulcrum, and the front end of the second upper plate 592 is brought into contact with the outer surface of the stopper 594 . As a result, the surface inside the processing chamber 5 of the first upper plate 591 can be made to face the surface inside the processing chamber 5 of the second upper plate 592, and the first upper plate 591 is supported by the backrest portion 593 and the second upper plate 591 is supported by the stopper 594. 2. On the other end of the upper plate 592, the first upper plate 591 and the second upper plate 592 are erected on the processing chamber 5, and the opening 520 is kept open.

As shown in FIG. 3, the opening 520 is opened, whereby the holding platform 30 and the processing tool 64 in the processing chamber 5 are exposed, so the operator can access the processing tool 64 and Replace with a new one.

Also, since in the previous grinding process, the grinding whetstone 641 and Since the grinding water is supplied to the contact portion of the workpiece W, the grinding water may adhere as water droplets to the surfaces inside the processing chamber 5 of the first upper plate 591 and the second upper plate 592 . As shown in FIG. 3 , the first upper plate 591 and the second upper plate 592 are erected on the processing chamber 5, so that the opening 520 is opened, whereby the water droplets flow along the first upper plate. 591 and the surface inside the processing chamber 5 of the second upper plate 592 flow downward and drip into the processing chamber 5, so the outside of the processing chamber 5 will not be polluted by the water droplets.

In addition, the processing device of the present invention is not limited to the embodiments, and the configurations of the processing device 1 shown in the attached drawings are not limited thereto, and can be performed within the range in which the effects of the present invention can be exhibited. Appropriate changes. For example, the processing device of the present invention is not the processing device 1 that maintains the platform 30 to move linearly in the X-axis direction and is positioned directly below the processing mechanism 6 as in the above-mentioned embodiment, but can also be as shown in Figures 4 and 5. It is the machining device 1A configured to position the holding platform 30 directly under the grinding mechanism by rotating the rotary table 18 in the machining chamber 5A.

4 and 5 are, for example, perspective views of a part of a processing device 1A provided with a processing mechanism (a rough grinding mechanism, a final grinding mechanism, etc.) having a plurality of axes not shown.

On the base 10A of the processing apparatus 1A shown in FIGS. 4 and 5, a processing chamber 5A having a box-like outer shape is arranged. The processing chamber 5A is equipped with: a side plate 56a and a side plate 56b, which are vertically arranged on the base 10A; a side plate 56c, which is connected with the side plate 56a and the side plate 56b;

In the processing chamber 5A, there is a circular rotary table 18 (refer to FIG. 5 ), on the top of the rotary table 18, a plurality of holding platforms 30 are arranged at equal intervals along the circumferential direction. The turntable 18 is rotatable around the axis in the Z-axis direction. By rotating the turntable 18, each holding platform 30 can be revolved, and each holding platform 30 can be sequentially moved to the opening formed on the upper plate 57. The circular processing mechanism enters directly below the opening 571 . Above the machining mechanism inlet 571, a grinding machining mechanism (not shown) is disposed.

The upper plate 57 is equipped with a door mechanism 55 for opening and closing an opening 574 for accessing the holding platform 30 and the processing chamber 5A from the outside (see FIG. 5 ). As shown in Figure 4, at the connecting portion between one end of the first upper plate 551 of the door mechanism 55 and the side plate 56b, the first hinge chain 551a is arranged, and under the other end side of the first upper plate 551, A second hinge 552a is provided. The second hinge 552a connects the other end of the first upper plate 551 and the other end of the second upper plate 552 . An engaging hole 551b for engaging with a stopper 554 is penetratingly formed at the upper end portion of the side plate 56c abutting against the first upper plate 551 (see FIG. 5 ). Also, on the upper surface of the second upper plate 552, a handle 552d that can be held by an operator is installed.

In the position facing the door mechanism 55 in the Y-axis direction, a switch plate 577 constituting the upper plate 57 is provided, and the switch plate 577 can be opened and closed by a hinge 577a. By opening the door mechanism 55 and further opening the switch plate 577, the operator can easily access the inside of the processing chamber 5A.

The first upper plate 551 and the second upper plate 552 are set such that the distance from one end of the second upper plate 552 in the Y-axis direction to the other end is greater than the distance from the first upper plate 551 in the Y-axis direction. from one end to the other The distance is longer.

As shown in FIG. 4, a backrest portion 553 supporting the first upper plate 551 is arranged on the side plate 56b. The stopper 554 having a columnar shape protruding upward from the upper end surface of the side plate 56c functions as follows: the front end portion of the second upper plate 552 folded toward its outer surface abuts from the side in the -Y direction. Then, thereby, the second upper plate 552 is supported.

In the processing device 1A, when the opening 574 of the processing chamber 5A is opened by the door mechanism 55 so that the operator can access the inside of the processing chamber 5A, first, the operator holds the handle 552d, such as As shown in FIG. 4, the closed second upper plate 552 and the first upper plate 551 are pulled upward. Then, using the first hinge 551a as a fulcrum, the first upper plate 551 is rotated toward the outside of the processing chamber 5A to be erected as shown in FIG. And, make the surface of the processing chamber 5A inner side of the first upper plate 551 and the mode of the face of the processing chamber 5A inner side of the second upper plate 552, use the second hinge 552a as a fulcrum, make the second upper plate 552 toward the processing chamber. The inside of the chamber 5A is rotated and folded, and its front end abuts against the outer surface of the stopper 554 . In this way, in the processing apparatus 1A, the first upper plate 551 and the second upper plate 552 can be erected on the processing chamber 5A, and the opening 574 can be easily set in an open state.

1‧‧‧Processing device

5‧‧‧Processing Room

6‧‧‧Processing mechanism

30‧‧‧maintain the platform

51a‧‧‧side panel

51b‧‧‧side panel

51c‧‧‧side panel

52‧‧‧upper board

58‧‧‧Fixing the upper plate

59‧‧‧door institutions

60‧‧‧rotation axis

61‧‧‧Shell

63‧‧‧Frame

64‧‧‧Adding tools

300‧‧‧Adsorption part

300a‧‧‧Retaining surface

301‧‧‧frame

520‧‧‧opening

591‧‧‧1st Upper Board

591a‧‧‧1st hinge

591b‧‧‧Catching hole

592‧‧‧The second upper board

592a‧‧‧2nd hinge

592d‧‧‧handle

593‧‧‧backrest

593a‧‧‧arm

593b‧‧‧contact part

594‧‧‧Stop

640‧‧‧wheel abutment

641‧‧‧Grinding Whetstone

W‧‧‧processed object

Wb‧‧‧back

Claims (1)

A processing device is provided with: a holding platform for holding a processed object; a processing mechanism equipped with a processing tool for processing the processed object held by the holding platform; and a box-shaped processing room for accommodating the holding platform and the processed object. The processing tool and the processing device are characterized in that the processing chamber is provided with a side plate and an upper plate supported by the upper end of the side plate, and the upper plate is provided with: a door mechanism, a switch for accessing from the processing chamber The outer side is an opening for accessing the holding platform and the processing mechanism. The door mechanism is provided with: a first upper plate, one end of which is supported in the processing chamber via a first hinge, and can be directed toward the outside of the processing chamber. Rotation; the second upper plate, one end is supported by the other end of the first upper plate through the second hinge, and can rotate toward the inside of the processing chamber; the handle is arranged on the upper surface of the second upper plate; the backrest , supporting the first upper plate that rotates to the outside of the processing chamber through the first hinge; the stopper is arranged on the upper end of the side plate, and is supported by the second The other end of the second upper plate that is rotated to the inside of the processing chamber by means of a hinge; The stopper is engaged, and the distance between the first upper plate and the second upper plate is from one end of the second upper plate to the other end than the distance from one end of the first upper plate to the other end. The distance is longer, when the opening of the closed state is opened by the door mechanism, the operator Hold the handle, pull up the first upper plate and the second upper plate, keep the engaging hole away from the stopper, and use the first hinge as a fulcrum to rotate the first upper plate to become a The upper surface of the first upper plate is in contact with and supported on the backrest, and the second upper plate is rotated with the second hinge as a fulcrum, so that the surface of the first upper plate on the inner side of the processing chamber is in contact with the The surface of the inner side of the processing chamber of the second upper plate is opposite, and the other end of the second upper plate is supported by the stopper, whereby the first upper plate and the second upper plate are folded in the processing chamber. Set upright on the top to become the state of opening the opening.

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