JP2019090757A - Processing device, inspection device and processing method - Google Patents

Abstract

To calculate a Q value that enables improvement in inspection accuracy in a quality inspection of a measurement object using the Q value.SOLUTION: A processing device comprises: a first measurement unit 11 that measures a DC resistance value Rd1 of a measurement object by a four-terminal method; a second measurement unit 12 that implements second measurement processing for measuring a DC resistance value Rd2 of the measurement object by a two-terminal method, and third measurement processing for measuring an AC resistance value Ra and inductance value L of the measurement object by the two-terminal method, respectively; and a processing unit 17 that calculates a Q value of the measurement object on the basis of the DC resistance value Rd1, the DC resistance value Rd2, the AC resistance value Ra and the inductance value L. The processing unit 17 is configured to implement any one of first processing for calculating the Q value using a correction resistance value obtained by correcting the AC resistance value Ra by use of the DC resistance value Rd2 and the DC resistance value Rd1, second processing for calculating the Q value using the AC resistance value Ra, and third processing for notifying to the effect that the Q value is not calculated, in accordance with a change state in each DC resistance value Rd2 measured by a plurality of times of second measurement processing.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a processing apparatus that executes calculation processing for calculating a Q value of a measurement target, an inspection method for inspecting the measurement target based on the Q value, and a processing method that executes a calculation processing for calculating a Q value of the measurement target. It is a thing.

  As a processing apparatus of this type, an impedance measuring apparatus disclosed by the applicant in Patent Document 1 below is known. The impedance measuring device includes a controller, a first measuring unit, and a second measuring unit, and is configured to calculate the Q value of the inductor element and to determine the quality of the inductor element based on the Q value. In this case, the first measurement means measures the DC resistance value Rdc4 of the inductor element by a four-terminal measurement method using a DC signal. The second measurement means measures the DC resistance value Rdc2 of the inductor element by a two-terminal measurement method using a DC signal, and also measures the effective resistance value Rs and the inductance value of the inductor element by a two-terminal measurement method using a high frequency signal. Measure L Further, the controller controls the first measurement means and the second measurement means, and determines the quality of the inductor element based on the Q value calculated using each of the measured values Rdc4, Rdc2, Rs, and L. In this impedance measuring device, in order to reduce the influence of the contact resistance value Rc of the probe for measurement when the second measurement means performs measurement by the two-terminal measurement method, the difference value between Rdc2 and Rdc4 is set to the contact resistance value Rc ( Rc = Rdc2-Rdc4), the effective resistance value Rs is corrected by the contact resistance value Rc, and the Q value is calculated using the correction value Rs ′ (Rs ′ = Rs−Rc).

JP, 2015-125135, A (page 5-8, FIG. 1-2)

  However, the above-mentioned impedance measuring device has the following problems to be improved. Specifically, in the above-mentioned impedance measuring apparatus, the second measuring means executes the measurement of the direct current resistance value Rdc2 only once either before or after the measurement of the effective resistance value Rs, and the direct current resistance value thereof The effective resistance value Rs is corrected with the contact resistance value Rc obtained from Rdc2. In this case, when the contact resistance value Rc at the measurement time of the DC resistance value Rdc2 is different from the contact resistance value Rc at the measurement time of the effective resistance value Rs, that is, when the contact resistance value Rc changes between both measurement times The effective resistance value Rs is corrected with a contact resistance value Rc different from the actual contact resistance value Rc. At this time, it becomes difficult to accurately calculate the Q value. In particular, when the contact resistance value Rc at the measurement time of the effective resistance value Rs is smaller than the contact resistance value Rc at the measurement time of the DC resistance value Rdc2, the correction is made more than the actual effective resistance value Rs not including the contact resistance value Rc. As the value Rs '(effective resistance value Rs after correction) becomes smaller and the Q value (ωL / Rs') becomes larger than the actual value, the inspection of the inductor element based on the Q value is actually performed. There is a possibility that a defective inductor element having a small Q value may be determined as a non-defective product.

  The present invention has been made in view of the problem to be improved, and a processing apparatus, an inspection apparatus, and a processing method capable of calculating a Q value capable of improving the inspection accuracy in the quality inspection of a measurement object using the Q value. The main purpose is to provide.

  In order to achieve the above object, the processing apparatus according to claim 1 comprises: a first measurement unit that executes a first measurement process of measuring a direct current resistance value of an object to be measured as a first direct current resistance value by a four-terminal method; A second measurement process of measuring the DC resistance value of the second DC resistance value by the two-terminal method, and a third measurement process of measuring the AC resistance value and the inductance value of the measurement object by the two-terminal method A process comprising: a measurement unit; and a processing unit capable of executing a process of calculating the Q value of the object to be measured based on the first DC resistance value, the second DC resistance value, the AC resistance value, and the inductance value. In the apparatus, the second measurement unit executes the second measurement process a plurality of times, and the processing unit specifies a change state of each of the second DC resistance values measured by the second measurement processes. And the second direct current The Q value is calculated using the correction resistance value obtained by executing the correction processing for correcting the AC resistance value using the difference value between the third DC resistance value defined based on the value and the first DC resistance value. Any one of a first process of calculating, a second process of calculating the Q value using the AC resistance value, and a third process of notifying that the Q value is not calculated without calculating the Q value. According to the change state.

  The processing apparatus according to claim 2 is the processing apparatus according to claim 1, wherein the processing unit is a difference between a maximum value and a minimum value of the second direct current resistance values as the change state. The first process is performed by defining the third DC resistance value based on the respective second DC resistance values in the first state where the fluctuation range is equal to or less than the first threshold value set in advance. The second process is performed when the fluctuation range is larger than the threshold.

  The processing apparatus according to claim 3 is the processing apparatus according to claim 1, wherein the processing unit is a difference between a maximum value and a minimum value of the second DC resistance values as the change state. The first process is performed by defining the third DC resistance value based on the respective second DC resistance values in the first state where the fluctuation range is equal to or less than the first threshold value set in advance. The third process is performed when the fluctuation range is larger than the threshold.

  A processing apparatus according to claim 4 is the processing apparatus according to any one of claims 1 to 3, wherein the processing unit defines the minimum value of the second direct current resistance values as the third direct current resistance value. Do.

  Further, in the processing apparatus according to claim 5, in the processing apparatus according to claim 1, the plurality of processing units are a part of the respective second DC resistance values as the change state and are mutually adjacent in time. The second direct current resistance value measured after the second state where the second fluctuation range, which is the difference between the maximum value and the minimum value of the second direct current resistance value, is equal to or less than a preset second threshold value When the third process is performed by defining the third DC resistance value based on the first process and the second measurement process by the second measurement unit is not completed. The second process is performed.

  A processing apparatus according to claim 6 is the processing apparatus according to claim 1, wherein the processing unit is a part of each of the second DC resistance values as the change state, and a plurality of the processing units are temporally adjacent to each other. The second direct current resistance value measured after the second state where the second fluctuation range, which is the difference between the maximum value and the minimum value of the second direct current resistance value, is equal to or less than a preset second threshold value When the third process is performed by defining the third DC resistance value based on the first process and the second measurement process by the second measurement unit is not completed. The third process is performed.

  A processing apparatus according to claim 7 is the processing apparatus according to claim 5 or 6, wherein the processing unit measures the minimum value of the second DC resistance values measured after the second state is reached. It defines as said 3rd DC resistance value.

  A processing apparatus according to claim 8 is the processing apparatus according to any one of claims 1 to 7, wherein the processing unit is a coefficient defined between 0 and 1 as the difference value in the correction process. The AC resistance value is corrected by subtracting the value obtained by multiplying the AC resistance value.

  The processing apparatus according to claim 9 is the processing apparatus according to any one of claims 1 to 8, wherein the processing unit performs the first processing when the difference value is larger than a preset setting value. Is executed, and either the second process or the third process is executed when the difference value is equal to or less than the set value.

  The inspection apparatus according to claim 10 is the processing apparatus according to any one of claims 1 to 9, and an inspection unit for inspecting the quality of the object to be measured based on the Q value calculated by the processing apparatus. Equipped.

  In the processing method according to claim 11, a first measurement process of measuring the direct current resistance value of the measurement object as the first direct current resistance value by the four-terminal method, and setting the direct current resistance value of the measurement object as the second direct current resistance value 2 The second measurement process to be measured by the terminal method, and the third measurement process to measure the AC resistance value and the inductance value of the object to be measured by the two-terminal method, respectively, and the first DC resistance value and the second DC resistance value A processing method for executing a process of calculating a Q value of the object to be measured based on the AC resistance value and the inductance value, wherein the second measurement process is performed a plurality of times, and measurement is performed by each of the second measurement processes. The AC resistance is specified using a difference value between a third DC resistance value defined based on the second DC resistance value and the first DC resistance value, while specifying a change state of each of the second DC resistance values. Correct the value A first process of calculating the Q value using a corrected resistance value obtained by performing a positive process, a second process of calculating the Q value using the AC resistance value, and a process of calculating the Q value Any one of the third processes for notifying that the Q value is not calculated is executed according to the change state.

  In the processing apparatus according to claim 1, the inspection apparatus according to claim 10, and the processing method according to claim 11, a change state of each second DC resistance value measured by the plurality of second measurement processes is specified, The first process of calculating the Q value using the corrected resistance value obtained by correcting the AC resistance value, the second process of calculating the Q value using the AC resistance value, and the fact that the Q value is not calculated without calculating the Q value Is executed according to the change state of each second DC resistance value. In this case, the contact resistance value included in the second DC resistance value is included in the alternating current resistance value when the contact state of the measurement probe with respect to the measurement object is defective and the contact resistance value changes with the passage of time. When the resistance value is larger than the resistance value, the correction resistance value corrected using the second DC resistance value may be smaller than the actual AC resistance value to be measured, and the calculation is performed using this correction resistance value. As a result of the calculated Q value becoming a larger value than the actual Q value of the measurement object, the measurement object of a defect having a small Q value may be erroneously determined as a non-defective product. On the other hand, in this processing apparatus, inspection apparatus and processing method, the corrected correction resistance value to be measured is an object to be measured in order to properly use the first processing, the second processing and the third processing according to the change state of each second DC resistance value. By performing the first process of calculating the Q value using the corrected resistance value only when the possibility of becoming a value smaller than the actual alternating current resistance value of is low, the calculated Q value is the actual Q value of the measuring object It becomes possible to reliably prevent a situation in which a measurement target of a defect having a larger Q value and a small Q value is erroneously determined as a non-defective product. Therefore, according to the processing apparatus, the inspection apparatus, and the processing method, it is possible to calculate the Q value that can sufficiently improve the inspection accuracy in the quality inspection of the measurement target using the Q value.

  In the processing apparatus according to claim 2 and the inspection apparatus according to claim 10, the first process is executed when the first fluctuation range of each second DC resistance value is equal to or less than the first threshold, and the first fluctuation range The second process is performed when is larger than the first threshold. Therefore, according to this processing apparatus, inspection apparatus and processing method, the first variation width of the second DC resistance value is equal to or less than the first threshold, and the temporal change in the contact resistance value is small. Since the first process is performed only when the resistance value is unlikely to be smaller than the actual alternating current resistance value to be measured, the calculated Q value calculated using the correction resistance value is the actual value to be measured Therefore, it is possible to prevent more reliably the situation where a measurement target of a defect having a small Q value is actually determined as a non-defective product.

  In the processing device according to claim 3 and the inspection device according to claim 10, the first processing is executed when the first fluctuation range of each second DC resistance value is equal to or less than the first threshold, and the first fluctuation range The third process is executed when the value is larger than the first threshold. Therefore, according to this processing apparatus, inspection apparatus and processing method, the first variation width of the second DC resistance value is equal to or less than the first threshold, and the temporal change in the contact resistance value is small. Since the first process is performed only when the resistance value is unlikely to be smaller than the actual alternating current resistance value to be measured, the calculated Q value calculated using the correction resistance value is the actual value to be measured Therefore, it is possible to prevent more reliably the situation where a measurement target of a defect having a small Q value is actually determined as a non-defective product. Further, according to the processing apparatus, the inspection apparatus, and the processing method, when the first fluctuation range is larger than the first threshold, the third measurement process, the process of calculating the Q value, and the process of determining the quality of the measurement object are performed. In order to execute the third process without needing, it is unnecessary to calculate a Q value larger than the actual Q value of the measurement object, or the measurement object of a defect with a small Q value may be erroneously determined as a non-defective product. Processing time can be reduced by preventing waste of time for processing.

  Further, according to the processing apparatus of claim 4 and the inspection apparatus of claim 10, the first process is executed by using the minimum value of each second DC resistance value as the third DC resistance value. The corrected resistance value corrected using the DC resistance value can be more reliably prevented from becoming smaller than the actual AC resistance value of the object to be measured.

  Further, in the processing apparatus according to claim 5 and the inspection apparatus according to claim 10, the second fluctuation range which is the difference between the maximum value and the minimum value of the plurality of second DC resistance values adjacent to each other in time is the The first processing is executed using the second DC resistance value measured after the threshold value becomes 2 or less, and the second processing is executed when the second variation width does not become less than the second threshold. Therefore, according to the processing apparatus, the inspection apparatus, and the processing method, the correction process is performed using the second DC resistance value measured after the contact state between the measuring object and the measuring probe is stabilized in a good state. In order to execute, the calculated Q value calculated using the correction resistance value becomes larger than the actual Q value of the measuring object, and in fact the measuring object of the defect having the small Q value is erroneously determined as the non-defective product Can be prevented more reliably.

  Further, in the processing apparatus according to claim 6 and the inspection apparatus according to claim 10, the second fluctuation range which is the difference between the maximum value and the minimum value of the plurality of second DC resistance values adjacent to each other in time is the The first processing is executed using the second DC resistance value measured after the threshold value becomes 2 or less, and the third processing is executed when the second variation width does not become less than the second threshold. Therefore, according to the processing apparatus, the inspection apparatus, and the processing method, the correction process is performed using the second DC resistance value measured after the contact state between the measuring object and the measuring probe is stabilized in a good state. In order to execute, the calculated Q value calculated using the correction resistance value becomes larger than the actual Q value of the measuring object, and in fact the measuring object of the defect having the small Q value is erroneously determined as the non-defective product Can be prevented more reliably. Further, according to the processing apparatus, the inspection apparatus, and the processing method, the third measurement process, the process of calculating the Q value, and the process of determining the quality of the measurement object are performed when the second fluctuation range is not smaller than the second threshold. In order to execute the third process without execution, a Q value larger than the actual Q value of the measurement object is calculated, or a measurement object of a defect whose Q value is actually smaller is erroneously determined as a non-defective product It is possible to prevent the waste of time for unnecessary processing and shorten the processing time for that.

  Further, according to the processing device of claim 7 and the inspection device of claim 10, the minimum value of the second DC resistance value measured after the second fluctuation range becomes equal to or less than the second threshold value By executing the first process using three DC resistance values, it is possible to more reliably prevent the corrected resistance value corrected using the third DC resistance value from becoming smaller than the actual AC resistance value of the object to be measured. can do.

  Further, in the processing apparatus according to claim 8 and the inspection apparatus according to claim 10, in the correction processing, an AC resistance value is obtained by subtracting a value obtained by multiplying the difference value by a coefficient of 0 or more and 1 or less. to correct. In this case, the corrected resistance value corrected by the value obtained by multiplying the coefficient does not become smaller than the corrected resistance value corrected by the difference value. For this reason, according to this processing apparatus, inspection apparatus and processing method, it is possible to reliably avoid that the correction resistance value becomes smaller than the actual alternating current resistance value of the measurement object, and as a result, the calculated value of Q value Can be more reliably prevented from becoming larger than the actual Q value.

  Further, in the processing apparatus according to claim 9 and the inspection apparatus according to claim 10, the first process is executed when the difference value is larger than the preset setting value, and when the difference value is less than the setting value 2) Execute one of the processing and the third processing. Therefore, according to the processing apparatus, the inspection apparatus, and the processing method, for example, the upper limit value of the contact resistance value that normally occurs when a probe for measurement in a good state is used is set as the setting value. Is larger than the set value, and the correction process is executed only when the necessity for correcting the AC resistance value is high, and when the difference value is less than the set value and the necessity for correcting the AC resistance value is low, the correction process is not performed. Or, it is possible not to calculate the Q value itself. Therefore, according to this processing apparatus, inspection apparatus, and processing method, the Q value larger than the actual Q value is calculated by the execution of the correction processing which is less necessary, and the defect measuring object having the small Q value is actually good. Can be reliably prevented.

FIG. 1 is a block diagram showing the configuration of an inspection apparatus 1; It is an explanatory view explaining the 1st measurement processing. It is an explanatory view explaining the 2nd measurement processing and the 3rd measurement processing. 5 is a flowchart of inspection processing 50. 7 is a flowchart of calculation processing 70. FIG. It is a flow chart of inspection processing 50A. It is a flow chart of calculation processing 70A. It is a flow chart of inspection processing 50B. It is a flowchart of calculation processing 70B. It is a flow chart of inspection processing 50C. It is a flowchart of 70 C of calculation processes.

  Hereinafter, embodiments of a processing apparatus, an inspection apparatus, and a processing method will be described with reference to the attached drawings.

  First, the configuration of the inspection apparatus 1 shown in FIG. 1 will be described. The inspection apparatus 1 is an example of an inspection apparatus, and is configured to be able to inspect the quality of the inductor element 100 based on the calculated value Qc of the Q value while calculating the Q value of the inductor element 100 as an example of the measurement target. ing. Specifically, the inspection apparatus 1 includes a first measurement unit 11, a second measurement unit 12, an operation unit 13, a storage unit 14, a display unit 15, a transport mechanism 16, and a processing unit 17, as shown in the figure. Is configured. In this case, the processing apparatus is configured by a portion of the inspection apparatus 1 excluding an inspection function to be described later.

  The first measurement unit 11 includes a movement mechanism (not shown) for moving the probes 31 a to 31 d, and a current output unit 11 a and a voltage detection unit 11 b (see FIG. 2). A first measurement process of measuring the DC resistance value Rd1 (corresponding to a first DC resistance value) of the element 100 by a four-terminal method is performed. Specifically, in the first measurement process, as shown in the figure, the movement mechanism of the first measurement unit 11 brings the probes 31a and 31c into contact with the terminal 101a of the inductor element 100 transported to the measurement position P1. The probes 31b and 31d are brought into contact with the terminal 101b of the inductor element 100, and the current output unit 11a outputs a direct current and supplies it to the inductor element 100 via the probes 31a and 31b, and the voltage detection unit 11b receives the terminal 101a. , 101b are detected via the probes 31c, 31d. In addition, the first measurement unit 11 measures the direct current resistance value Rd1 based on the detected voltage value and the current value of the supplied direct current.

  The second measurement unit 12 includes a movement mechanism (not shown) for moving the probes 32 a and 32 b, and a current output unit 12 a and a voltage detection unit 12 b (see FIG. 3). A second measurement process of measuring a direct current resistance value Rd2 (corresponding to a second direct current resistance value) of the element 100 by a two-terminal method, and an alternating current resistance value Ra (effective resistance value) of the inductor element 100 and an inductance value L of 2 Execute the third measurement process to measure by the terminal method. Specifically, in the second measurement process, as shown in the figure, the movement mechanism of the second measurement unit 12 causes the probes 32a and 32b to be connected to the terminals 101a and 101b of the inductor element 100 transported to the measurement position P2. The current output unit 12a outputs a direct current and supplies the direct current to the inductor element 100 through the probes 32a and 32b, and the voltage detection unit 11b converts the voltage value between the terminals 101a and 101b through the probes 32a and 32b. To detect. The second measurement unit 12 also measures the DC resistance value Rd2 based on the detected voltage value and the current value of the supplied DC current.

  In the third measurement process, the movement mechanism of the second measurement unit 12 maintains the state in which the probes 32a and 32b are in contact with the terminals 101a and 101b of the inductor element 100 (see FIG. 3). However, the alternating current is output and supplied to the inductor element 100 through the probes 32a and 32b, and the voltage detection unit 12b detects an alternating voltage value between the terminals 101a and 101b through the probes 32a and 32b. In addition, the second measurement unit 12 determines the AC resistance value based on the AC voltage value (voltage effective value), the AC current value (current effective value) of the supplied AC current, and the phase difference between the AC voltage and the AC current. Measure Ra and inductance value L.

  The operation unit 13 includes various buttons and keys, and outputs an operation signal when these are operated.

  The storage unit 14 stores the direct current resistance value Rd1 measured by the first measurement unit 11, and stores the direct current resistance value Rd2, the alternating current resistance value Ra, and the inductance value L measured by the second measurement unit 12. In addition, the storage unit 14 stores the calculated value Qc of the Q value calculated in the later-described inspection process 50 executed by the processing unit 17. The storage unit 14 also uses the threshold Rt1 (corresponding to the first threshold) used in the inspection process 50, the reference value Qr of the Q value, and the set value Rr and the coefficient Kc used in the calculation process 70 executed in the inspection process 50. Remember.

  The display unit 15 calculates the Q value Qc calculated in the inspection process 50 executed by the processing unit 17 under the control of the processing unit 17, and the inspection result of the quality of the inductor element 100 inspected in the inspection process 50. indicate.

  The transport mechanism 16 is a supply position where the inductor device 100 is supplied by the supply device (not shown) under the control of the processing unit 17, and a measurement position P1 where the first measurement process is performed by the first measurement unit 11 (see FIG. 2). , A measurement position P2 at which the second measurement process and the third measurement process are executed by the second measurement unit 12 (see FIG. 3), and the inductor element 100 for which each measurement process and inspection have been completed The inductor element 100 is conveyed to the unloading position.

  The processing unit 17 controls each component of the inspection apparatus 1 in accordance with the operation signal output from the operation unit 13. Further, the processing unit 17 executes the calculation process 70 shown in FIG. 5 to calculate the Q value of the inductor element 100 based on the direct current resistance values Rd1 and Rd2, the alternating current resistance value Ra and the inductance value L. The processing unit 17 also functions as an inspection unit, and has an inspection function of executing inspection processing 50 shown in FIG. 4 to inspect the quality of the inductor element 100 based on the calculated value Qc of the Q value.

  Next, a processing method for calculating the Q value of the inductor element 100 as a measurement object using the inspection apparatus 1 and an inspection method for inspecting the quality of the inductor element 100 based on the calculated value Qc of the Q value will be described with reference to the drawings. Explain.

  First, the operation unit 13 is operated to instruct the start of the examination. At this time, the operation unit 13 outputs an operation signal, and the processing unit 17 executes the inspection process 50 shown in FIG. 4 according to the operation signal. In the inspection process 50, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 supplied to the supply position by the supply device (not shown) to the measurement position P1 shown in FIG. 2 (step 51).

  Next, the processing unit 17 controls the first measurement unit 11 to execute the first measurement process (step 52). In the first measurement process, the first measurement unit 11 operates the movement mechanism (not shown) to move the probes 31a to 31d, and as shown in FIG. 2, the terminal of the inductor element 100 transported to the measurement position P1. The probes 31a and 31c are brought into contact with 101a, and the probes 31b and 31d are brought into contact with the terminal 101b of the inductor element 100.

  Subsequently, the current output unit 11a of the first measurement unit 11 outputs a direct current and supplies the direct current to the inductor element 100 via the probes 31a and 31b. Next, the voltage detection unit 11b of the first measurement unit 11 detects the voltage value between the terminals 101a and 101b via the probes 31c and 31d. Subsequently, the first measurement unit 11 measures the direct current resistance value Rd1 of the inductor element 100 based on the detected voltage value and the current value of the supplied direct current. Next, the processing unit 17 stores the measured DC resistance value Rd1 in the storage unit 14.

  In this case, in the resistance measurement by the four probe method using four probes 31a to 31d as described above, the influence of the contact resistance generated at the contact portion between the probes 31a to 31d and the terminals 101a and 101b can be sufficiently suppressed. It is possible to measure a direct-current resistance value Rd1 which does not (or almost does not contain) the value of the contact resistance (hereinafter also referred to as "contact resistance value Rc").

  Subsequently, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P1 to the measurement position P2 shown in FIG. 3 (step 53).

  Next, the processing unit 17 controls the second measurement unit 12 to execute the second measurement process a plurality of times (for example, ten times) at predetermined time intervals (step 54). In the second measurement process, the second measurement unit 12 operates the movement mechanism (not shown) to move the probes 32a and 32b, and as shown in FIG. 3, the terminal of the inductor element 100 transported to the measurement position P2. Probes 32a and 32b are brought into contact with 101a and 101b, respectively.

  Subsequently, the current output unit 12a of the second measurement unit 12 outputs a direct current and supplies the direct current to the inductor element 100 via the probes 32a and 32b. Next, the voltage detection unit 12b of the current output unit 12a detects the voltage value between the terminals 101a and 101b via the probes 32a and 32b. Subsequently, the second measurement unit 12 measures the DC resistance value Rd2 of the inductor element 100 based on the detected voltage value and the current value of the supplied DC current. Further, the processing unit 17 stores the measured DC resistance value Rd2 in the storage unit 14.

  In this case, in the resistance measurement by the two-terminal method using two probes 32a and 32b as described above, the influence of the contact resistance generated at the contact portion between the probes 32a and 32b and the terminals 101a and 101b can not be suppressed. The resistance value Rd2 includes the contact resistance value Rc.

  Next, the processing unit 17 controls the second measurement unit 12 to execute the third measurement process (step 55). In the third measurement process, as shown in FIG. 3, the second measurement unit 12 causes the current output unit 12 a to generate an alternating current while the probes 32 a and 32 b are in contact with the terminals 101 a and 101 b of the inductor element 100. To the inductor element 100 via the probes 32a and 32b. Subsequently, the voltage detection unit 12b detects an AC voltage value between the terminals 101a and 101b via the probes 32a and 32b. Next, the second measurement unit 12 generates the inductor element 100 based on the alternating voltage value (voltage effective value), the alternating current value (effective current value) of the supplied alternating current, and the phase difference between the alternating voltage and the alternating current. The alternating current resistance value Ra and the inductance value L are measured. Subsequently, the processing unit 17 causes the storage unit 14 to store the measured AC resistance value Ra and the inductance value L.

  Next, the processing unit 17 executes a calculation process 70 (step 56). In this calculation processing 70, as shown in FIG. 5, the processing unit 17 reads out the DC resistance value Rd2 stored in the storage unit 14, and changes the fluctuation width Rw1 (corresponding to the first fluctuation width) of each DC resistance value Rd2. Specifically, the difference value between the maximum value and the minimum value of each DC resistance value Rd2 is specified (step 71).

  Subsequently, the processing unit 17 reads the threshold Rt1 stored in the storage unit 14 and determines whether the fluctuation range Rw1 is equal to or less than the threshold Rt1 (step 72). In this case, the maximum value and the minimum value of each DC resistance value Rd2 measured by executing the second measurement process a sufficient number of times in a state where the probes 32a and 32b are in reliable contact with the terminals 101a and 101b in the nondefective inductor element 100 A difference value (a fluctuation range of each DC resistance value Rd2) with the value is set in advance as the threshold value Rt1.

  When the processing unit 17 determines in step 72 that the fluctuation range Rw1 is equal to or less than the threshold value Rt1 (corresponding to the first state), the minimum value of each DC resistance value Rd2 read in step 71 described above (third DC This corresponds to the resistance value, and hereinafter, it is also referred to as “DC resistance value Rd2s”) (step 73).

  Next, the processing unit 17 reads the direct current resistance value Rd1 stored in the storage unit 14 and calculates the difference value Rm (Rd2s−Rd1) between the direct current resistance value Rd2s and the direct current resistance value Rd1 (step 74). In this case, as described above, the direct current resistance value Rd2s includes the contact resistance value Rc, and the direct current resistance value Rd1 does not include the contact resistance value Rc, so the difference value Rm corresponds to the contact resistance value Rc. Do.

  Subsequently, the processing unit 17 reads the set value Rr stored in the storage unit 14 and determines whether the difference value Rm is larger than the set value Rr (step 75). In this case, the upper limit value of the contact resistance value Rc which normally occurs when the probes 32a and 32b in a good state in which the tip end portion is not worn or oxidized is previously set as the set value Rr.

  When the processing unit 17 determines in step 75 that the difference value Rm is larger than the set value Rr, the processing unit 17 reads the coefficient Kc stored in the storage unit 14 and multiplies the difference value Rm by the coefficient Kc to obtain a correction value Rm. Calculate '(Rm × Kc) (step 76). In this case, the coefficient Kc is arbitrarily defined in the range of 0 or more and 1 or less. Incidentally, by defining the coefficient Kc to 1 (that is, by setting the correction value Rm 'to the difference value Rm), the difference value Rm can be used as it is to correct the AC resistance value Ra described later, and the coefficient Kc can be calculated. The correction of the AC resistance value Ra can be not performed by specifying 0 (that is, setting the correction value Rm ′ to 0).

  Next, the processing unit 17 executes the correction processing of reading out the AC resistance value Ra stored in the storage unit 14 and subtracting the correction value Rm ′ from the AC resistance value Ra to calculate a corrected resistance value Ra ′. (Step 77). In this case, since the correction value Rm 'is a value obtained by multiplying the difference value Rm corresponding to the contact resistance value Rc by the coefficient Kc, as described above, by subtracting the correction value Rm' from the AC resistance value Ra, A resistance value corresponding to the contact resistance value Rc or a resistance value smaller than the contact resistance value Rc can be excluded from the AC resistance value Ra.

  Subsequently, the processing unit 17 executes a first process of calculating the Q value of the inductor element 100 using the correction resistance value Ra ′ (step 78). In this case, assuming that the calculated value of the Q value is Qc, the angular frequency of the alternating current in the third measurement process is ω, and the inductance value of the inductor element 100 is L, Qc = ωL / Ra ′.

  Here, for example, when the contact state of the probes 32a and 32b with the terminals 101a and 101b of the inductor element 100 is defective (unstable) and the contact resistance value Rc changes with the passage of time, the AC resistance value Ra is measured. Since the time (the time when the third measurement process is performed) and the time when the DC resistance value Rd2 is measured (the time when the second measurement process is performed) are different, the contact resistance value Rc and the AC resistance included in the DC resistance value Rd2 The contact resistance value Rc included in the value Ra will be different. In this case, the AC resistance Ra is set to a correction value Rm ′ based on the difference value Rm between the DC resistance value Rd2 including the contact resistance value Rc larger than the contact resistance value Rc included in the AC resistance value Ra and the DC resistance value Rd1. When the correction is performed, the corrected resistance value Ra ′ after correction by the execution of the correction process may be a value smaller than the actual alternating current resistance value Ra of the inductor element 100 not including the contact resistance value Rc. The calculated value Qc of the Q value calculated using the resistance value Ra ′ is a value larger than the actual Q value of the inductor element 100. Therefore, in the configuration and method using the DC resistance value Rd2 measured by executing the second measurement process only once, the contact resistance value in which the contact resistance value Rc included in the DC resistance value Rd2 is included in the AC resistance value Ra When it is larger than Rc, the calculated Q value Qc becomes larger than the actual Q value of the inductor element 100, and there is a possibility that the defective inductor element 100 having a small Q value may be erroneously determined as a non-defective product.

  On the other hand, in the inspection apparatus 1, as described above, when the change width Rw1 of the direct current resistance value Rd2 is equal to or less than the threshold value Rt1 and the temporal change of the contact resistance value Rc is small, that is, by executing the correction process. The correction processing is performed when the possibility that the correction resistance value Ra ′ becomes a value smaller than the actual alternating current resistance value Ra of the inductor element 100 is low. For this reason, in this inspection apparatus 1, the Q value calculated value Qc calculated using the correction resistance value Ra 'becomes a value larger than the actual Q value of the inductor element 100, and the defective inductor having a small Q value in practice. It is possible to reliably prevent a situation in which the element 100 is erroneously determined as a non-defective product.

  On the other hand, when the processing unit 17 determines that the fluctuation range Rw1 is larger than the threshold value Rt1 in the above-described step 72, the inductor element is performed using the AC resistance value Ra before the correction processing without performing steps 73 to 77. A second process of calculating the Q value of 100 is performed (step 78). That is, in the inspection apparatus 1, the fluctuation width Rw1 is larger than the threshold Rt1 corresponding to the fluctuation width of each DC resistance value Rd2 in a state where the probes 32a and 32b are in contact with the terminals 101a and 101b of the nondefective inductor element 100 with certainty. Is large and the correction resistance value Ra ′ may become smaller than the actual alternating current resistance value Ra by performing the correction processing, the inductor element 100 is performed using the AC resistance value Ra without performing the correction processing. A configuration and method are employed to calculate the Q value of.

  When the processing unit 17 determines that the difference value Rm is equal to or less than the set value Rr in step 75 described above, the processing unit 17 does not execute steps 76 and 77, and uses the AC resistance value Ra before the correction processing to perform the inductor. A second process of calculating the Q value of the element 100 is performed (step 78). That is, in this inspection apparatus 1, the difference value is more than the set value Rr which is the contact resistance value Rc when the variation width Rw1 of each DC resistance value Rd2 is equal to or less than the threshold Rt1 and the probes 32a and 32b in a good condition are used. The correction process is executed only when Rm is large and the necessity to correct the AC resistance value Ra is high, and even if the fluctuation range Rw1 is equal to or less than the threshold value Rt1, the AC resistance value Ra is calculated with the difference value Rm equal to or less than the set value Rr. Arrangements and methods are employed in which the correction process is not performed when the need for correction is low.

  Next, the processing unit 17 causes the storage unit 14 to store the calculated Q value Qc in the storage unit 14 and causes the display unit 15 to display the calculated value Qc, and ends the calculation process 70. Subsequently, step 57 of the inspection process 50 shown in FIG. Run. In step 57, the processing unit 17 reads the calculated value Qc and the reference value Qr stored in the storage unit 14, and compares the calculated value Qc with the reference value Qr. In this case, the processing unit 17 determines that the inductor element 100 is non-defective when the calculated value Qc is equal to or greater than the reference value Qr, and determines that the inductor element 100 is defective when the calculated value Qc is less than the reference value Qr. Next, the processing unit 17 causes the display unit 15 to display the inspection result (determination result).

  Subsequently, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the carry-out position (step 58), and ends the inspection processing 50.

  Next, a configuration and method will be described in which the processing unit 17 executes the inspection process 50A and the calculation process 70A shown in FIGS. 6 and 7 respectively, instead of the inspection process 50 and the calculation process 70 described above. In the inspection process 50A and the calculation process 70A, the description of the same steps as the steps of the inspection process 50 and the calculation process 70 will be omitted.

  In the inspection process 50A, the processing unit 17 executes steps 51A to 54A (see FIG. 6) similar to the steps 51 to 54 in the inspection process 50, and then the respective DC resistances as in step 71 of the calculation process 70 described above. The fluctuation range Rw1 of the value Rd2 is specified (step 55A), and then it is determined whether or not the fluctuation range Rw1 is equal to or less than the threshold Rt1 as in step 72 of the calculation process 70 (step 56A).

  When it is determined in step 56A that the fluctuation range Rw1 is equal to or smaller than the threshold Rt1, the processing unit 17 controls the second measurement unit 12 to execute the third measurement processing as in step 55 of the inspection processing 50 Step 57A) Then, the calculation process 70A shown in FIG. 7 is executed (step 58A). In the calculation process 70A, the processing unit 17 reads the direct current resistance value Rd2 stored in the storage unit 14, and then, as in step 73 of the calculation process 70, the minimum value of each direct current resistance value Rd2 (third direct current resistance (Corresponding to the value) is identified (step 71A). Subsequently, steps 72A to 76A similar to steps 74 to 78 of the calculation process 70 are executed to calculate the Q value (execution of the first process).

  Next, the processing unit 17 causes the storage unit 14 to store the calculated Q value Qc in the storage unit 14 and causes the display unit 15 to display the calculated value Qc, and ends the calculation process 70A. Subsequently, step 59A of the inspection process 50A shown in FIG. Run. In step 59A, the processing unit 17 compares the calculated value Qc with the reference value Qr to execute the process of judging the quality of the inductor element 100 as in step 57 of the inspection process 50 described above, and the inspection result (judgment result ) Is displayed on the display unit 15. Next, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the unloading position (step 60A), and ends the inspection processing 50A.

  On the other hand, when the processing unit 17 determines that the fluctuation range Rw1 is larger than the threshold Rt1 in the above-described step 56A, the processing unit 17 does not execute steps 57A to 59A, that is, the third measurement process (step 57A), the calculation process 70A. And (h) displaying (notifying) on the display unit 15 that the Q value is not calculated without executing the process of determining the quality of the inductor element 100 (step 59A) and that the process of determining the quality of the inductor element 100 is not performed. 3 Execute the process (step 61A). Subsequently, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the carry-out position (step 60A), and ends the inspection processing 50A.

  In the configuration and method for executing the inspection process 50A, when the variation width Rw1 of the DC resistance value Rd2 is equal to or less than the threshold value Rt1 and the temporal change in the contact resistance value Rc is small, that is, the correction resistance value Ra ′ is obtained by executing the correction process. The correction process is performed when the possibility that the value of Rc becomes smaller than the actual alternating current resistance value Ra of the inductor element 100 is low. Therefore, also in this configuration and method, the calculated value Qc of the Q value calculated using the correction resistance value Ra ′ is higher than the actual Q value of the inductor element 100 as in the configuration and method of executing the inspection process 50. It becomes possible to reliably prevent a situation where a defective inductor element 100 having a large Q value and a small Q value is erroneously determined as a non-defective product.

  Further, in the configuration and method for executing the inspection process 50A, when the fluctuation range Rw1 is larger than the threshold Rt1, the third measurement process (step 57A), the calculation process 70A, and the process of judging quality of the inductor element 100 (step 59A) It informs that effect without executing it. Therefore, the time for unnecessary processing such that the calculated value Qc larger than the actual Q value of the inductor element 100 is calculated, or the defective inductor element 100 having a small Q value in practice is erroneously determined as a non-defective product. It is possible to prevent the waste of time and to shorten the processing time for that.

  Next, a configuration and method will be described in which the processing unit 17 executes the inspection process 50B and the calculation process 70B shown in FIGS. 8 and 9, respectively, instead of the inspection process 50 and the calculation process 70 described above. In the inspection process 50B and the calculation process 70B, the description of the same steps as the steps of the inspection process 50 and the calculation process 70 will be omitted.

  In the inspection process 50B, the processing unit 17 executes the calculation process 70B shown in FIG. 9 after executing steps 51B to 55B (see FIG. 8) similar to the steps 51 to 55 in the inspection process 50 (step 56B). . In this calculation processing 70B, as shown in the figure, the processing unit 17 reads out each DC resistance value Rd2 stored in the storage unit 14, and changes the fluctuation width Rw2 (second fluctuation width) of each DC resistance value Rd2. Corresponding) is identified (step 71B). In this case, the processing unit 17 is, for example, a difference between the maximum value and the minimum value of a plurality of (two as an example) DC resistance values Rd2 that are part of the respective DC resistance values Rd2 and are mutually adjacent in time. Is executed by changing the combination of two DC resistance values Rd2.

  Next, the processing unit 17 reads the threshold Rt2 (corresponding to the second threshold) from the storage unit 14, and determines whether or not there is a fluctuation range Rw2 smaller than or equal to the threshold Rt2 (step 72B). In this case, as an example, the direct-current resistance value Rd2 measured first when the direct-current resistance value Rd2 is measured at a constant period immediately after the probes 32a and 32b are reliably brought into contact with the terminals 101a and 101b in the non-defective inductor element 100. A value of 20% of the difference between the DC resistance value Rd2 measured next and the DC resistance value Rd2 measured next is set as the threshold value Rt2. That is, when the terminals 101a and 101b and the probes 32a and 32b come into contact reliably and the state becomes stable with the passage of time (the supply state of the direct current supplied to the inductor element 100 through the probes 32a and 32b is The upper limit value of the fluctuation range Rw2 at the time of stabilization) is set as the threshold value Rt2.

  When the processing unit 17 determines that the fluctuation range Rw2 equal to or less than the threshold Rt2 is present (corresponding to the second state) in step 72B, the DC resistance measured after the fluctuation range Rw2 becomes equal to or less than the threshold Rt2 The minimum value (corresponding to the third DC resistance value) of the value Rd2 is specified (step 73B). Subsequently, the processing unit 17 executes steps 74B to 78B (see FIG. 9) similar to steps 74 to 78 of the calculation process 70 to calculate the Q value (execution of the first process).

  Next, the processing unit 17 causes the storage unit 14 to store the calculated Q value Qc in the storage unit 14 and causes the display unit 15 to display the Q value and to end the calculation process 70B. Subsequently, step 57B of the inspection process 50B shown in FIG. Run. In step 57B, the processing unit 17 compares the calculated value Qc with the reference value Qr and executes the process of judging the quality of the inductor element 100 as in step 57 of the inspection process 50 described above. ) Is displayed on the display unit 15. Next, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the discharge position (step 58B), and ends the inspection processing 50B.

  On the other hand, when the processing unit 17 determines that the fluctuation range Rw2 smaller than the threshold Rt2 does not exist in step 72B of the calculation processing 70B described above, the AC resistance value Ra before the correction processing is not performed without executing steps 73B to 77B. A second process of calculating the Q value of the inductor element 100 is executed by using (step 78B). Subsequently, the processing unit 17 causes the storage unit 14 to store the calculated Q value Qc in the storage unit 14 and causes the display unit 15 to display the calculated Q value Qc, and ends the calculation process 70B. Similarly, steps 57B and 58B of the inspection process 50B shown in FIG. 8 are executed to end the inspection process 50B.

  In the configuration and method for executing the inspection process 50B, after the fluctuation width Rw2 of the direct current resistance value Rd2 becomes equal to or less than the threshold value Rt2, the contact state between the terminals 101a and 101b and the probes 32a and 32b is stabilized in a good state. The correction process is executed using the direct current resistance value Rd2 measured after that time. Therefore, also in this configuration and method, the calculated value Qc of the Q value calculated using the correction resistance value Ra ′ is the actual Q value of the inductor element 100 as in the configuration and method of executing the inspection processing 50 and 50A. It becomes possible to reliably prevent a situation in which a defective inductor element 100 having a larger Q value and a small Q value is actually erroneously determined as a non-defective product.

  Further, in the configuration and method for executing the inspection process 50B, the second process of calculating the Q value of the inductor element 100 using the AC resistance value Ra before the correction process is performed when the fluctuation range Rw2 smaller than the threshold Rt2 does not exist. Do. Therefore, in this configuration and method, in a state where the contact state between the terminals 101a and 101b and the probes 32a and 32b is unstable, the Q value of the inductor element 100 is not calculated using the AC resistance value Ra. The calculated Q value Qc calculated using the correction resistance value Ra ′ becomes a larger value than the actual Q value of the inductor element 100, and the defective inductor element 100 having a small Q value is actually good. It is possible to more reliably prevent the situation that is erroneously determined.

  Next, a configuration and method will be described in which the processing unit 17 executes the inspection process 50C and the calculation process 70C shown in FIGS. 10 and 11, respectively, instead of the inspection process 50 and the calculation process 70 described above. In the inspection process 50C and the calculation process 70C, the description of the same steps as the steps of the inspection process 50 and the calculation process 70 will be omitted.

  In the inspection process 50C, the processing unit 17 executes steps 51C to 54C (see FIG. 10) similar to the steps 51 to 54 in the inspection process 50, and then the respective DC resistances as in step 71B of the calculation process 70B described above. The fluctuation range Rw1 of the value Rd2 is specified (step 55C), and then it is determined whether or not the fluctuation range Rw2 smaller than the threshold Rt2 exists (step 56C) as in step 72B of the calculation processing 70B.

  When it is determined in step 56C that the fluctuation range Rw2 equal to or smaller than the threshold Rt2 is present in step 56C, the processing unit 17 controls the second measurement unit 12 to execute the third measurement process as in step 55 of the inspection process 50 Step 57C) and then the calculation process 70C shown in FIG. 11 are executed (step 58C). In the calculation process 70C, the processing unit 17 reads the DC resistance value Rd2 stored in the storage unit 14 and subsequently, when the fluctuation range Rw2 becomes equal to or less than the threshold value Rt2 as in step 73B of the calculation process 70B. The minimum value (corresponding to the third direct current resistance value) of the direct current resistance value Rd2 measured in step (b) is specified (step 71C). Next, steps 72C to 76C similar to steps 74 to 78 of the calculation process 70 are executed to calculate the Q value (execution of the first process).

  Subsequently, the processing unit 17 causes the storage unit 14 to store the calculated Q value Qc in the storage unit 14 and causes the display unit 15 to display the calculated value Qc, and ends the calculation process 70C. Similarly, steps 59C and 60C of the inspection process 50C shown in FIG. 10 are executed, and the inspection process 50C ends.

  On the other hand, when the processing unit 17 determines that the fluctuation range Rw2 equal to or smaller than the threshold Rt2 does not exist in step 56C described above, the third measurement process (step 57C), calculation process is not performed without executing steps 57C to 59C. The display unit 15 displays (notifies) that the Q value is not calculated and that the process of the quality determination of the inductor element 100 is not performed without executing the process of determining the quality of the 70C and the inductor element 100 (step 59C). The third process is performed (step 61C). Subsequently, the processing unit 17 controls the transport mechanism 16 to transport the inductor element 100 from the measurement position P2 to the unloading position (step 60C) as in step 58 of the inspection process 50, and ends the inspection process 50C. .

  In the configuration and method for executing the inspection process 50C, after the fluctuation width Rw2 of the direct current resistance value Rd2 becomes equal to or less than the threshold value Rt2, the contact state between the terminals 101a and 101b and the probes 32a and 32b is stable in a good state. The correction process is executed using the direct current resistance value Rd2 measured after that time. Therefore, also in this configuration and method, the calculated value Qc of the Q value calculated using the correction resistance value Ra ′ is the actual value of the inductor element 100 as in the configuration and method of executing the inspection process 50, 50A, 50B. It becomes possible to reliably prevent a situation in which a defective inductor element 100 having a value larger than the Q value and in fact having a small Q value is erroneously determined as a non-defective product.

  Further, in the configuration and method for executing the inspection process 50C, the third measurement process (step 57C), the calculation process 70C, and the process for determining the quality of the inductor element 100 (step 59C) when the fluctuation range Rw2 smaller than the threshold Rt2 does not exist. In order to notify that effect without executing the process, the calculated value Qc larger than the actual Q value of the inductor element 100 is calculated, or the defective inductor element 100 having a small Q value is actually erroneously determined as a non-defective product. It is possible to prevent the waste of time for such unnecessary processing and to shorten the processing time for that.

  As described above, in the processing apparatus, the inspection apparatus 1 and the processing method, the change state of each DC resistance value Rd2 measured by the plurality of second measurement processes is specified, and the correction resistance value Ra obtained by correcting the AC resistance value Ra. A first process of calculating the Q value using ', a second process of calculating the Q value using the alternating current resistance value Ra, and a third process of notifying that the Q value is not calculated without calculating the Q value Any one of them is executed according to the change state of each DC resistance value Rd2. In this case, when the contact state of the probes 32a and 32b with the terminals 101a and 101b of the inductor element 100 is defective and the contact resistance value Rc changes with the passage of time, the contact resistance value Rc included in the DC resistance value Rd2 is When it is larger than the contact resistance value Rc included in the alternating current resistance value Ra, the corrected resistance value Ra ′ corrected using the direct current resistance value Rd2 becomes a value smaller than the actual alternating current resistance value Ra of the inductor element 100 As a result of the calculated Q value Qc calculated using this corrected resistance value Ra 'becoming a value larger than the actual Q value of the inductor element 100, the defective inductor element 100 having a small Q value is actually There is a risk that the product will be judged as non-defective. On the other hand, in the processing apparatus, the inspection apparatus 1 and the processing method, since the first process, the second process and the third process are properly used according to the change state of each DC resistance value Rd2, the corrected correction resistance value Ra 'is The calculated value Qc calculated by performing the first process of calculating the Q value using the corrected resistance value Ra ′ only when the possibility of becoming a value smaller than the actual alternating current resistance value Ra of the inductor element 100 is low. The value is larger than the actual Q value of the inductor element 100, and it is possible to reliably prevent a situation where a defective inductor element 100 having a small Q value is erroneously determined as a non-defective product. Therefore, according to this processing apparatus, inspection apparatus 1 and processing method, it is possible to calculate a Q value that can sufficiently improve the inspection accuracy in the quality inspection of inductor element 100 using the Q value.

  Further, in the processing apparatus, the inspection apparatus 1 and the processing method, the first process is executed when the fluctuation width Rw1 of each DC resistance value Rd2 is equal to or less than the threshold Rt1, and the second processing is performed when the fluctuation width Rw1 is larger than the threshold Rt1. Execute the process Therefore, according to the processing apparatus, the inspection apparatus 1 and the processing method, the correction resistance value can be corrected by performing the correction process with a small temporal change of the contact resistance value Rc when the fluctuation width Rw1 of the DC resistance value Rd2 is equal to or less than the threshold value Rt1. Since the first process is performed only when there is a low possibility that Ra ′ will be a value smaller than the actual alternating current resistance value Ra of inductor element 100, the calculated Q value Qc of Q value calculated using correction resistance value Ra ′ Since the Q value of the inductor element 100 is larger than the actual Q value of the inductor element 100, it is possible to more reliably prevent the defective inductor element 100 having a small Q value from being erroneously determined as a non-defective product.

  Further, in the processing apparatus, the inspection apparatus 1 and the processing method, the first process is executed when the fluctuation width Rw1 of each DC resistance value Rd2 is equal to or less than the threshold Rt1, and the third processing is performed when the fluctuation width Rw1 is larger than the threshold Rt1. Execute the process Therefore, according to the processing apparatus, the inspection apparatus 1 and the processing method, the correction resistance value can be corrected by performing the correction process with a small temporal change of the contact resistance value Rc when the fluctuation width Rw1 of the DC resistance value Rd2 is equal to or less than the threshold value Rt1. Since the first process is performed only when there is a low possibility that Ra ′ will be a value smaller than the actual alternating current resistance value Ra of inductor element 100, the calculated Q value Qc of Q value calculated using correction resistance value Ra ′ Since the Q value of the inductor element 100 is larger than the actual Q value of the inductor element 100, it is possible to more reliably prevent the defective inductor element 100 having a small Q value from being erroneously determined as a non-defective product. Further, according to the processing apparatus, the inspection apparatus 1 and the processing method, when the fluctuation range Rw1 is larger than the threshold Rt1, the third measurement process, the process of calculating the Q value, and the process of determining the quality of the inductor element 100 are performed. In order to execute the third process without calculation, the calculated value Qc larger than the actual Q value of the inductor element 100 may be calculated, or the defective inductor element 100 having a small Q value may be erroneously determined as a non-defective product. It is possible to prevent the waste of time for unnecessary processing and shorten the processing time for that.

  Further, according to the processing apparatus, the inspection apparatus 1 and the processing method, the correction resistance value Ra corrected using the third DC resistance value by executing the first process using the minimum value of each DC resistance value Rd2. It can be more reliably prevented that 'is smaller than the actual alternating current resistance value Ra of the inductor element 100.

  Further, in the processing apparatus, the inspection apparatus 1 and the processing method, after the fluctuation range Rw2 which is the difference between the maximum value and the minimum value of the plurality of DC resistance values Rd2 adjacent to each other in time becomes equal to or less than the threshold Rt2. The first process is performed using the measured DC resistance value Rd2, and the second process is performed when the fluctuation range Rw2 does not fall below the threshold value Rt2. Therefore, according to the processing apparatus, the inspection apparatus 1 and the processing method, the direct current resistance value Rd2 measured after the contact state between the terminals 101a and 101b of the inductor element 100 and the probes 32a and 32b stabilizes in a good state. Since the correction process is performed using the following equation, the calculated Q value Qc calculated using the correction resistance value Ra ′ becomes a value larger than the actual Q value of the inductor element 100, and the defect having a small Q value is actually The situation in which the inductor element 100 is erroneously determined to be a non-defective product can be more reliably prevented.

  Further, in the processing apparatus, the inspection apparatus 1 and the processing method, after the fluctuation range Rw2 which is the difference between the maximum value and the minimum value of the plurality of DC resistance values Rd2 adjacent to each other in time becomes equal to or less than the threshold Rt2. The first process is performed using the measured DC resistance value Rd2, and the third process is performed when the fluctuation range Rw2 does not fall below the threshold Rt2. Therefore, according to the processing apparatus, the inspection apparatus 1 and the processing method, the direct current resistance value Rd2 measured after the contact state between the terminals 101a and 101b of the inductor element 100 and the probes 32a and 32b stabilizes in a good state. Since the correction process is performed using the following equation, the calculated Q value Qc calculated using the correction resistance value Ra ′ becomes a value larger than the actual Q value of the inductor element 100, and the defect having a small Q value is actually The situation in which the inductor element 100 is erroneously determined to be a non-defective product can be more reliably prevented. Further, according to the processing apparatus, the inspection apparatus 1 and the processing method, the third measurement process, the process of calculating the Q value, and the process of determining the quality of the inductor element 100 are performed when the fluctuation range Rw2 does not become smaller than the threshold Rt2. In order to execute the third process without execution, a calculated value Qc larger than the actual Q value of the inductor element 100 is calculated, or a defective inductor element 100 having a small Q value is actually erroneously determined as a good product. It is possible to prevent the waste of time for unnecessary processing and shorten the processing time for that.

  Further, according to the processing apparatus, the inspection apparatus 1 and the processing method, the first processing is performed by using the minimum value of the direct current resistance value Rd2 measured after the fluctuation range Rw2 becomes equal to or less than the threshold value Rt2. It is possible to more reliably prevent the correction resistance value Ra ′ corrected using the third DC resistance value from becoming a value smaller than the actual AC resistance value Ra of the inductor element 100.

  Further, in this processing device, inspection device 1 and processing method, in the correction processing, the AC resistance value Ra is obtained by subtracting the correction value Rm ′ obtained by multiplying the difference value Rm by the coefficient Kc of 0 or more and 1 or less. Correct the In this case, the corrected resistance value Ra ′ corrected by the correction value Rm ′ does not become smaller than the corrected resistance value Ra ′ corrected by the difference value Rm. Therefore, according to the processing apparatus, the inspection apparatus 1 and the processing method, it is possible to reliably avoid that the correction resistance value Ra ′ becomes smaller than the actual alternating current resistance value Ra of the inductor element 100, The situation where the calculated value Qc of the Q value becomes larger than the actual Q value can be further reliably prevented.

  Further, in the processing apparatus, inspection apparatus 1 and processing method, the first process is executed when the difference value Rm is larger than the preset set value Rr, and the second process is performed when the difference value Rm is less than the set value Rr. (Or, as described later, the third process is executed instead of the second process, that is, either one of the second process and the third process is executed). Therefore, according to the processing apparatus, the inspection apparatus 1 and the processing method, for example, by setting the upper limit value of the contact resistance value Rc which normally occurs when the probes 32a and 32b in a good state are used, as the set value Rr. The correction process is executed only when the difference value Rm is larger than the set value Rr and the necessity to correct the AC resistance value Ra is high, and the difference value Rm is required to correct the AC resistance value Ra with the set value Rr or less. When is low, it is possible not to execute the correction process or to not calculate the Q value itself. Therefore, according to this processing apparatus, inspection apparatus 1 and processing method, the calculation value Qc larger than the actual Q value is calculated by execution of the correction processing with low necessity, and the defective inductor element having a small Q value in practice It is possible to reliably prevent a situation in which 100 is misjudged as a non-defective product.

  In addition, a processing apparatus, the inspection apparatus 1, and the processing method are not limited to said structure and method. For example, although an example using the minimum value of the DC resistance value Rd2 of interest as the third DC resistance value has been described above, it is also possible to adopt a configuration and method using the average value of the DC resistance value Rd2 of interest as the third DC resistance value. it can.

  In addition, although the above description has been given of the example in which the difference between the maximum value and the minimum value of two DC resistance values Rd2 adjacent to each other in time is set as the fluctuation width Rw2, three or more DC resistance values Rd2 adjacent to each other in time are It is also possible to adopt a configuration and a method in which the difference between the maximum value and the minimum value is the fluctuation range Rw2.

  Also, although the first process is executed when the difference value Rm is larger than the set value Rr, and the second process is performed when the difference value Rm is less than or equal to the set value Rr, the difference value Rm is the set value. A configuration and method may be adopted in which the third process is executed instead of the second process when R r or less.

  Further, in the calculation process 70, although the difference value Rm is multiplied by the coefficient Kc to calculate the correction value Rm ′ and the alternating current resistance value Ra is corrected with the correction value Rm ′, the process of multiplying the coefficient Kc is described above. It is also possible to adopt a configuration and a method of correcting the AC resistance value Ra by using the difference value Rm as it is without performing.

  In addition, in the calculation processes 70 to 70C, it is determined whether or not the difference value Rm is larger than the set value Rr, and the configuration and method described above are described to execute the correction process only when the difference value Rm is larger than the set value Rr. However, it is also possible to adopt a configuration and method in which correction processing is always performed without performing this determination processing.

  Further, although the example applied to the inspection apparatus 1 having the transport mechanism 16 and automatically transporting the inductor element 100 has been described above, the inspection apparatus for testing the inductor element 100 manually transported without the transport mechanism 16 is described It can also be applied. In addition, although the first measurement unit 11 and the second measurement unit 12 have the moving mechanism, the example in which the probes 31a to 31d and the probes 32a and 32b are brought into contact with the terminals 101a and 101b of the inductor element 100 by the moving mechanism has been described above. A configuration and method may be employed in which the probes 31a to 31d and the probes 32a and 32b are manually brought into contact with the terminals 101a and 101b.

  Further, although the example applied to the inspection apparatus 1 for inspecting the inductor element 100 based on the Q value has been described above, application to a processing apparatus not having the inspection function (having only the function to calculate the Q value) it can.

  Further, the object to be measured is not limited to the above-described inductor element 100, and various electronic components that use Q values for quality inspection can be objects to be measured.

DESCRIPTION OF SYMBOLS 1 inspection apparatus 11 first measurement unit 12 second measurement unit 17 processing unit 100 inductor element Kc coefficient L inductance value Qc calculated value Ra alternating current resistance value Ra ′ corrected resistance value Rd1 direct current resistance value Rd2 direct current resistance value Rd2s direct current resistance value Rm difference Value Rr Set value Rt1 Threshold Rt2 Threshold Rw1 Fluctuation Rw2 Fluctuation

Claims (11)

A first measurement unit that executes a first measurement process that measures the DC resistance value of the measurement object as the first DC resistance value by the four-terminal method, and the two-terminal method determines the DC resistance value of the measurement object as the second DC resistance value A second measurement unit for performing a second measurement process to be measured, and a third measurement process for measuring an AC resistance value and an inductance value of the object to be measured by the two-terminal method; A processing unit capable of executing a process of calculating a Q value of the measurement target based on a resistance value, the alternating current resistance value, and the inductance value,
The second measurement unit executes the second measurement process multiple times,
The processing unit specifies a change state of each of the second direct current resistance values measured by the respective second measurement processes, and a third direct current resistance value defined based on the second direct current resistance value and the first direct current resistance value. A first process of calculating the Q value using a correction resistance value obtained by executing a correction process for correcting the AC resistance value using a difference value with a DC resistance value, the Q process using the AC resistance value A processing apparatus that executes one of a second process of calculating a value and a third process of notifying that the Q value is not calculated without calculating the Q value, according to the change state.   The processing unit is configured such that a first variation range, which is a difference between the maximum value and the minimum value of each of the second direct current resistance values as the change state, is a first state where the first variation range is equal to or less than a preset first threshold. The first process is performed by defining the third DC resistance value based on each second DC resistance value, and the second process is performed when the first fluctuation range is larger than the threshold. Processing apparatus as described.   The processing unit is configured such that a first variation range, which is a difference between the maximum value and the minimum value of each of the second direct current resistance values as the change state, is a first state where the first variation range is equal to or less than a preset first threshold. The first process is performed by defining the third DC resistance value based on each second DC resistance value, and the third process is performed when the first fluctuation range is larger than the threshold. Processing apparatus as described.   The processing apparatus according to any one of claims 1 to 3, wherein the processing unit defines the minimum value of each of the second DC resistance values as the third DC resistance value.   The processing unit is a part of each of the second DC resistance values as the change state, and a second variation that is a difference between a maximum value and a minimum value of a plurality of second DC resistance values adjacent to each other in time. Defining the third direct current resistance value based on the second direct current resistance value measured after the second state where the width is equal to or less than a preset second threshold value and executing the first process; The processing apparatus according to claim 1, wherein the second processing is executed when the second state is not reached by the end of the plurality of second measurement processings by the second measurement unit.   The processing unit is a part of each of the second DC resistance values as the change state, and a second variation that is a difference between a maximum value and a minimum value of a plurality of second DC resistance values adjacent to each other in time. Defining the third direct current resistance value based on the second direct current resistance value measured after the second state where the width is equal to or less than a preset second threshold value and executing the first process; The processing apparatus according to claim 1, wherein the third processing is executed when the second state is not reached by the end of the plurality of second measurement processings by the second measurement unit.   7. The processing apparatus according to claim 5, wherein the processing unit defines a minimum value of the second DC resistance value measured after the second state is reached as the third DC resistance value.   The processing unit corrects the AC resistance value by subtracting a value obtained by multiplying the difference value by a coefficient defined in advance between 0 and 1 in the correction processing from the AC resistance value. The processing apparatus according to any one of the above.   The processing unit executes the first process when the difference value is larger than a preset setting value, and when the difference value is less than the setting value, any one of the second process and the third process. 9. A processing apparatus according to any one of the preceding claims, wherein one is performed.   The inspection apparatus provided with the processing apparatus in any one of Claims 1-9, and the test | inspection part which test | inspects the quality of the said measuring object based on the said Q value calculated by the said processing apparatus. A first measurement process in which the DC resistance value of the measurement object is measured as the first DC resistance value by the four-terminal method, a second measurement process in which the DC resistance value of the measurement object is measured by the two-terminal method as the second DC resistance value; A third measurement process of measuring the AC resistance value and the inductance value of the object to be measured by the two-terminal method is performed, and based on the first DC resistance value, the second DC resistance value, the AC resistance value, and the inductance value A processing method for calculating the Q value of the object to be measured,
Execute the second measurement process multiple times,
While specifying the change state of each said 2nd direct current resistance value measured by said each 2nd measurement processing, between the 3rd direct current resistance value prescribed based on said 2nd direct current resistance value, and said 1st direct current resistance value A first process of calculating the Q value using a correction resistance value obtained by performing a correction process for correcting the AC resistance value using a difference value, and a method of calculating the Q value using the AC resistance value A processing method for executing any one of a second process and a third process notifying that the Q value is not calculated without calculating the Q value according to the change state.

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