JP2018529631A5 - - Google Patents

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Publication number
JP2018529631A5
JP2018529631A5 JP2017568193A JP2017568193A JP2018529631A5 JP 2018529631 A5 JP2018529631 A5 JP 2018529631A5 JP 2017568193 A JP2017568193 A JP 2017568193A JP 2017568193 A JP2017568193 A JP 2017568193A JP 2018529631 A5 JP2018529631 A5 JP 2018529631A5
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JP
Japan
Prior art keywords
composition
monomer
weight
total weight
acrylate copolymer
Prior art date
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JP2017568193A
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English (en)
Japanese (ja)
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JP2018529631A (ja
JP6895395B2 (ja
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Priority claimed from PCT/US2016/039554 external-priority patent/WO2017003923A1/en
Publication of JP2018529631A publication Critical patent/JP2018529631A/ja
Publication of JP2018529631A5 publication Critical patent/JP2018529631A5/ja
Application granted granted Critical
Publication of JP6895395B2 publication Critical patent/JP6895395B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017568193A 2015-07-01 2016-06-27 芽胞を取り除くための組成物 Active JP6895395B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562187372P 2015-07-01 2015-07-01
US62/187,372 2015-07-01
PCT/US2016/039554 WO2017003923A1 (en) 2015-07-01 2016-06-27 Compositions for spore removal

Publications (3)

Publication Number Publication Date
JP2018529631A JP2018529631A (ja) 2018-10-11
JP2018529631A5 true JP2018529631A5 (enExample) 2019-07-25
JP6895395B2 JP6895395B2 (ja) 2021-06-30

Family

ID=56507815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017568193A Active JP6895395B2 (ja) 2015-07-01 2016-06-27 芽胞を取り除くための組成物

Country Status (6)

Country Link
US (1) US10555889B2 (enExample)
EP (1) EP3316855B1 (enExample)
JP (1) JP6895395B2 (enExample)
CN (1) CN107735072B (enExample)
BR (1) BR112018000032B1 (enExample)
WO (1) WO2017003923A1 (enExample)

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CN108472505A (zh) 2015-12-22 2018-08-31 3M创新有限公司 用于孢子移除的方法
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EP3638740B1 (en) 2017-06-16 2024-08-07 Poly Group LLC Polymeric antimicrobial surfactant
US20190230929A1 (en) * 2018-01-30 2019-08-01 W.M. Barr & Company, Inc. Composition for residual sanitization

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