JP2018511819A5 - - Google Patents
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- Publication number
- JP2018511819A5 JP2018511819A5 JP2017542867A JP2017542867A JP2018511819A5 JP 2018511819 A5 JP2018511819 A5 JP 2018511819A5 JP 2017542867 A JP2017542867 A JP 2017542867A JP 2017542867 A JP2017542867 A JP 2017542867A JP 2018511819 A5 JP2018511819 A5 JP 2018511819A5
- Authority
- JP
- Japan
- Prior art keywords
- hept
- ene
- bicyclo
- oxirane
- units derived
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BEHBBKCBARHMJQ-UHFFFAOYSA-N 5-(2-phenylethyl)bicyclo[2.2.1]hept-2-ene Chemical compound C1C(C=C2)CC2C1CCC1=CC=CC=C1 BEHBBKCBARHMJQ-UHFFFAOYSA-N 0.000 claims description 39
- 229920001577 copolymer Polymers 0.000 claims description 25
- UDOJACSDSIHAAT-UHFFFAOYSA-N 5-benzylbicyclo[2.2.1]hept-2-ene Chemical compound C1C(C=C2)CC2C1CC1=CC=CC=C1 UDOJACSDSIHAAT-UHFFFAOYSA-N 0.000 claims description 17
- CTFCLRQTZHMVEE-UHFFFAOYSA-N 2-[6-(5-bicyclo[2.2.1]hept-2-enyl)hexyl]oxirane Chemical compound C1C(C=C2)CC2C1CCCCCCC1CO1 CTFCLRQTZHMVEE-UHFFFAOYSA-N 0.000 claims description 16
- 229920000642 polymer Polymers 0.000 claims description 10
- KELKBCPSSMHFNT-UHFFFAOYSA-N 1-(1-phenylethyl)-3,4,6,7,8,8a-hexahydro-2H-pyrrolo[1,2-a]pyrimidine Chemical group C1(=CC=CC=C1)C(C)N1C2N(CCC1)CCC2 KELKBCPSSMHFNT-UHFFFAOYSA-N 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 5
- 125000006719 (C6-C10) aryl (C1-C6) alkyl group Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- FNYHTZZXMGYSDC-UHFFFAOYSA-N 2-[4-(5-bicyclo[2.2.1]hept-2-enyl)butyl]oxirane Chemical compound C1C(C=C2)CC2C1CCCCC1CO1 FNYHTZZXMGYSDC-UHFFFAOYSA-N 0.000 description 11
- VTWPBVSOSWNXAX-UHFFFAOYSA-N 5-decylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(CCCCCCCCCC)CC1C=C2 VTWPBVSOSWNXAX-UHFFFAOYSA-N 0.000 description 10
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical compound CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 10
- 229920001897 terpolymer Polymers 0.000 description 7
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 6
- -1 6- (bicyclo [2. 2.1] Hept-5-en-2-yl) hexyl Chemical group 0.000 description 5
- 239000000178 monomer Substances 0.000 description 4
- 239000002318 adhesion promoter Substances 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 description 2
- HYQWHUCTTYCIAU-UHFFFAOYSA-N 1-benzyl-3,4,6,7,8,8a-hexahydro-2h-pyrrolo[1,2-a]pyrimidine Chemical group C1CCN2CCCC2N1CC1=CC=CC=C1 HYQWHUCTTYCIAU-UHFFFAOYSA-N 0.000 description 2
- WMWDGZLDLRCDRG-UHFFFAOYSA-N 5-hexylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(CCCCCC)CC1C=C2 WMWDGZLDLRCDRG-UHFFFAOYSA-N 0.000 description 2
- GOLQZWYZZWIBCA-UHFFFAOYSA-N 5-octylbicyclo[2.2.1]hept-2-ene Chemical compound C1C2C(CCCCCCCC)CC1C=C2 GOLQZWYZZWIBCA-UHFFFAOYSA-N 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 239000010979 ruby Substances 0.000 description 2
- 229910001750 ruby Inorganic materials 0.000 description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- PZHUETTVRMNXHJ-UHFFFAOYSA-N 1-(1-phenylpropyl)-3,4,6,7,8,8a-hexahydro-2H-pyrrolo[1,2-a]pyrimidine Chemical compound C1(=CC=CC=C1)C(CC)N1C2N(CCC1)CCC2 PZHUETTVRMNXHJ-UHFFFAOYSA-N 0.000 description 1
- OKLGIAVJZXLGPC-UHFFFAOYSA-N 1-[1-(2-methylphenyl)ethyl]-3,4,6,7,8,8a-hexahydro-2H-pyrrolo[1,2-a]pyrimidine Chemical compound C1(=C(C=CC=C1)C(C)N1C2N(CCC1)CCC2)C OKLGIAVJZXLGPC-UHFFFAOYSA-N 0.000 description 1
- PHZLMBVFCJEBDN-UHFFFAOYSA-N 1-[1-(4-methylphenyl)ethyl]-3,4,6,7,8,8a-hexahydro-2H-pyrrolo[1,2-a]pyrimidine Chemical compound C1(=CC=C(C=C1)C(C)N1C2N(CCC1)CCC2)C PHZLMBVFCJEBDN-UHFFFAOYSA-N 0.000 description 1
- OKWBVJTYJFUANB-UHFFFAOYSA-N 1-chloro-4-propoxy-1,9a-dihydrothioxanthen-9-one Chemical compound CCCOC1=C2SC3=CC=CC=C3C(=O)C2C(Cl)C=C1 OKWBVJTYJFUANB-UHFFFAOYSA-N 0.000 description 1
- 125000000041 C6-C10 aryl group Chemical group 0.000 description 1
- 101000692872 Homo sapiens Regulator of microtubule dynamics protein 1 Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 102100026432 Regulator of microtubule dynamics protein 1 Human genes 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002431 hydrogen Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004895 liquid chromatography mass spectrometry Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562117769P | 2015-02-18 | 2015-02-18 | |
| US62/117,769 | 2015-02-18 | ||
| PCT/US2016/017654 WO2016133794A1 (en) | 2015-02-18 | 2016-02-12 | Photoimageable compositions containing photobase generators |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018511819A JP2018511819A (ja) | 2018-04-26 |
| JP2018511819A5 true JP2018511819A5 (enExample) | 2018-11-15 |
| JP6442618B2 JP6442618B2 (ja) | 2018-12-19 |
Family
ID=55699781
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017542867A Active JP6442618B2 (ja) | 2015-02-18 | 2016-02-12 | 光塩基発生剤を含有する光イメージ化可能な組成物 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9823565B2 (enExample) |
| JP (1) | JP6442618B2 (enExample) |
| KR (1) | KR20170117103A (enExample) |
| TW (1) | TWI649620B (enExample) |
| WO (1) | WO2016133794A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI649620B (zh) * | 2015-02-18 | 2019-02-01 | 日商住友電木股份有限公司 | 含有光產鹼劑的光可成像組成物 |
| CN111788246B (zh) * | 2018-03-16 | 2022-06-10 | 3M创新有限公司 | 组合物、粘结方法和粘结组件 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6849377B2 (en) | 1998-09-23 | 2005-02-01 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| EP1246013A3 (en) | 2001-03-30 | 2003-11-19 | E.I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| US6737215B2 (en) | 2001-05-11 | 2004-05-18 | Clariant Finance (Bvi) Ltd | Photoresist composition for deep ultraviolet lithography |
| US20060020068A1 (en) * | 2004-07-07 | 2006-01-26 | Edmund Elce | Photosensitive compositions based on polycyclic polymers for low stress, high temperature films |
| US8030425B2 (en) | 2002-07-03 | 2011-10-04 | Promerus Llc | Photosensitive compositions based on polycyclic polymers for low stress, high temperature films |
| JP2008506826A (ja) * | 2004-07-21 | 2008-03-06 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 光活性化方法及び逆転した２段階工程による触媒の使用 |
| JP5521999B2 (ja) * | 2009-11-26 | 2014-06-18 | 住友化学株式会社 | 化学増幅型フォトレジスト組成物及びレジストパターンの製造方法 |
| WO2012053052A1 (ja) * | 2010-10-19 | 2012-04-26 | 住友ベークライト株式会社 | 感光性樹脂組成物および半導体装置 |
| KR101907651B1 (ko) * | 2012-01-16 | 2018-10-15 | 스미토모 베이클리트 컴퍼니 리미티드 | 마이크로전자 및 광전자 디바이스 및 이의 조립체를 위한 열적-산화적으로 안정한 측쇄 폴리에테르 작용화된 폴리노르보르넨 |
| JP5860193B2 (ja) * | 2012-09-25 | 2016-02-16 | プロメラス， エルエルシー | マレイミド含有シクロオレフィンポリマーおよびその利用 |
| TWI649620B (zh) * | 2015-02-18 | 2019-02-01 | 日商住友電木股份有限公司 | 含有光產鹼劑的光可成像組成物 |
-
2016
- 2016-02-02 TW TW105103253A patent/TWI649620B/zh not_active IP Right Cessation
- 2016-02-12 KR KR1020177024736A patent/KR20170117103A/ko not_active Withdrawn
- 2016-02-12 US US15/042,220 patent/US9823565B2/en active Active
- 2016-02-12 JP JP2017542867A patent/JP6442618B2/ja active Active
- 2016-02-12 WO PCT/US2016/017654 patent/WO2016133794A1/en not_active Ceased
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