JP2018505561A5 - - Google Patents
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- Publication number
- JP2018505561A5 JP2018505561A5 JP2017541608A JP2017541608A JP2018505561A5 JP 2018505561 A5 JP2018505561 A5 JP 2018505561A5 JP 2017541608 A JP2017541608 A JP 2017541608A JP 2017541608 A JP2017541608 A JP 2017541608A JP 2018505561 A5 JP2018505561 A5 JP 2018505561A5
- Authority
- JP
- Japan
- Prior art keywords
- elongated features
- radially aligned
- outer edge
- processing chamber
- electrostatic chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 2
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/616,647 | 2015-02-06 | ||
| US14/616,647 US20160230269A1 (en) | 2015-02-06 | 2015-02-06 | Radially outward pad design for electrostatic chuck surface |
| PCT/US2016/012362 WO2016126360A1 (en) | 2015-02-06 | 2016-01-06 | Radially outward pad design for electrostatic chuck surface |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018505561A JP2018505561A (ja) | 2018-02-22 |
| JP2018505561A5 true JP2018505561A5 (cg-RX-API-DMAC7.html) | 2019-02-14 |
| JP6711838B2 JP6711838B2 (ja) | 2020-06-17 |
Family
ID=56564492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017541608A Active JP6711838B2 (ja) | 2015-02-06 | 2016-01-06 | 静電チャック表面の半径方向外側パッド設計 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20160230269A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP3254307B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6711838B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR102619126B1 (cg-RX-API-DMAC7.html) |
| CN (2) | CN107208261A (cg-RX-API-DMAC7.html) |
| TW (1) | TWI685916B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2016126360A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9646843B2 (en) * | 2014-12-08 | 2017-05-09 | Applied Materials, Inc. | Tunable magnetic field to improve uniformity |
| KR102669903B1 (ko) | 2016-08-30 | 2024-05-28 | 주성엔지니어링(주) | 기판 처리 장치 |
| US20180148835A1 (en) | 2016-11-29 | 2018-05-31 | Lam Research Corporation | Substrate support with varying depths of areas between mesas and corresponding temperature dependent method of fabricating |
| JP7208168B2 (ja) | 2017-06-16 | 2023-01-18 | チュソン エンジニアリング カンパニー，リミテッド | 基板処理装置及び真空回転電気コネクタ |
| KR102359591B1 (ko) * | 2017-06-16 | 2022-02-08 | 주성엔지니어링(주) | 진공용 회전 전기 커넥터 |
| CN108538776B (zh) * | 2018-03-29 | 2021-11-16 | 北京北方华创微电子装备有限公司 | 静电卡盘及其制造方法 |
| KR102862930B1 (ko) * | 2018-06-22 | 2025-09-19 | 어플라이드 머티어리얼스, 인코포레이티드 | 반도체 웨이퍼 프로세싱에서 웨이퍼 후면 손상을 최소화하는 방법들 |
| JP7134826B2 (ja) * | 2018-10-11 | 2022-09-12 | 東京エレクトロン株式会社 | 静電チャックの生産方法 |
| CN110158029B (zh) * | 2019-07-05 | 2020-07-17 | 北京北方华创微电子装备有限公司 | 掩膜结构和fcva设备 |
| KR20240021679A (ko) * | 2021-06-14 | 2024-02-19 | 램 리써치 코포레이션 | 기판 운동 방지를 위한 전면 및 후면 압력 모니터링 |
| IL310565A (en) * | 2021-08-13 | 2024-03-01 | Shine Technologies Llc | Magnetic rotation device for high vacuum applications such as ion and isotope production |
| CA3232793A1 (en) | 2021-10-01 | 2023-04-06 | Sarko Cherekdjian | Ion production system with fibrous lattice for ion collection |
| KR20250120977A (ko) * | 2022-10-03 | 2025-08-11 | 엘리베이티드 머티어리얼스 저머니 게엠베하 | 통합형 정전기 클램핑을 구비한 통기식 냉각 드럼 및 웹 코팅 방법 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5646814A (en) * | 1994-07-15 | 1997-07-08 | Applied Materials, Inc. | Multi-electrode electrostatic chuck |
| US5825607A (en) * | 1996-05-08 | 1998-10-20 | Applied Materials, Inc. | Insulated wafer spacing mask for a substrate support chuck and method of fabricating same |
| JP3805134B2 (ja) * | 1999-05-25 | 2006-08-02 | 東陶機器株式会社 | 絶縁性基板吸着用静電チャック |
| JP3859937B2 (ja) * | 2000-06-02 | 2006-12-20 | 住友大阪セメント株式会社 | 静電チャック |
| US7161121B1 (en) * | 2001-04-30 | 2007-01-09 | Lam Research Corporation | Electrostatic chuck having radial temperature control capability |
| KR100422444B1 (ko) * | 2001-05-29 | 2004-03-12 | 삼성전자주식회사 | 정전 척에 설치되는 웨이퍼 공간 지지장치 및 그 제조방법 |
| US6946403B2 (en) * | 2003-10-28 | 2005-09-20 | Axcelis Technologies, Inc. | Method of making a MEMS electrostatic chuck |
| US7663860B2 (en) * | 2003-12-05 | 2010-02-16 | Tokyo Electron Limited | Electrostatic chuck |
| US7697260B2 (en) * | 2004-03-31 | 2010-04-13 | Applied Materials, Inc. | Detachable electrostatic chuck |
| JP5069452B2 (ja) * | 2006-04-27 | 2012-11-07 | アプライド マテリアルズ インコーポレイテッド | 二重温度帯を有する静電チャックをもつ基板支持体 |
| US8422193B2 (en) * | 2006-12-19 | 2013-04-16 | Axcelis Technologies, Inc. | Annulus clamping and backside gas cooled electrostatic chuck |
| JP2010521820A (ja) * | 2007-03-12 | 2010-06-24 | 東京エレクトロン株式会社 | 基板内での処理の均一性を改善するための動的な温度背面ガス制御 |
| US7576018B2 (en) * | 2007-03-12 | 2009-08-18 | Tokyo Electron Limited | Method for flexing a substrate during processing |
| US7667944B2 (en) * | 2007-06-29 | 2010-02-23 | Praxair Technology, Inc. | Polyceramic e-chuck |
| TWI475594B (zh) * | 2008-05-19 | 2015-03-01 | Entegris Inc | 靜電夾頭 |
| CN102160167B (zh) * | 2008-08-12 | 2013-12-04 | 应用材料公司 | 静电吸盘组件 |
| US8861170B2 (en) * | 2009-05-15 | 2014-10-14 | Entegris, Inc. | Electrostatic chuck with photo-patternable soft protrusion contact surface |
| NL2009189A (en) * | 2011-08-17 | 2013-02-19 | Asml Netherlands Bv | Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method. |
| WO2014149182A1 (en) * | 2013-03-15 | 2014-09-25 | Applied Materials, Inc. | Methods and apparatus for electrostatic chuck repair and refurbishment |
-
2015
- 2015-02-06 US US14/616,647 patent/US20160230269A1/en not_active Abandoned
-
2016
- 2016-01-06 CN CN201680004654.9A patent/CN107208261A/zh active Pending
- 2016-01-06 WO PCT/US2016/012362 patent/WO2016126360A1/en not_active Ceased
- 2016-01-06 JP JP2017541608A patent/JP6711838B2/ja active Active
- 2016-01-06 KR KR1020177024969A patent/KR102619126B1/ko active Active
- 2016-01-06 CN CN202210254455.0A patent/CN114686834A/zh active Pending
- 2016-01-06 EP EP16746928.7A patent/EP3254307B1/en active Active
- 2016-01-08 TW TW105100585A patent/TWI685916B/zh active