JP2018156945A - Laminate, conductive pattern substrate for touch panel, and method of manufacturing laminate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a laminate having a transparent conductive layer with low sheet resistance.SOLUTION: A laminate includes a support medium and a transparent conductive layer composed of an ITO formed on one side of the support medium. An X ray is incident on one side of the laminate to generate a diffraction peak, and when the diffraction peak is measured by in-plane measurement, P/Pis 3.6 or more, if Pis a height of the diffraction peak based on a (222) face of an ITO crystal in the transparent conductive layer and Pis a height of the diffraction peak based on a (400) face of the ITO crystal in the transparent conductive layer.SELECTED DRAWING: Figure 10

Description

  The present invention relates to a laminate and a conductive pattern substrate for a touch panel.

  A transparent conductive layer having conductivity and exhibiting translucency, for example, a transparent conductive layer made of indium tin oxide (hereinafter referred to as ITO), is used for detection in transparent electrodes in liquid crystal display devices and organic EL display devices, and touch panel sensors. It is used as a transparent conductive pattern.

  In order to improve the characteristics of the transparent electrode and the transparent conductive pattern, it is expected to reduce the sheet resistance of the transparent conductive layer. It is known that the sheet resistance of a transparent conductive layer made of ITO is lower when ITO is crystallized than when it is in an amorphous state. In consideration of such characteristics, Patent Document 1 proposes that the ITO layer formed on the base material is subjected to annealing treatment, thereby promoting crystallization of the ITO layer.

Japanese Patent Laid-Open No. 2003-16858

  By the way, the sheet resistance of the ITO layer can be lowered as the thickness of the ITO layer is increased. However, when the thickness of the ITO layer is increased, the translucency of the ITO layer is deteriorated or the ITO layer is colored. Therefore, generally, the thickness of the ITO layer is about several tens of nm. In order to lower the sheet resistance in such a thin ITO layer, it is not sufficient to promote the crystallization of the ITO layer, and further improvement to the ITO layer is considered necessary.

  An object of this invention is to provide the laminated body and the conductive pattern base material for touchscreens which can solve such a subject effectively.

The present invention is a laminate including a support and a transparent conductive layer made of ITO formed on one surface of the support, and an X-ray is formed on one surface of the laminate. The height of the diffraction peak based on the (222) plane of the ITO crystal of the transparent conductive layer when the measurement of the diffraction peak generated by the incident is carried out by In-Plane measurement is defined as PI _{ITO (222).} when the height of the diffraction peak based on the (400) plane of the ITO crystals of the transparent conductive layer and the _{P ITO (400),} is P ITO _{(222) / P ITO (400)} is 3.6 or more, a laminated body is there.

  For example, in the laminate of the present invention, the weight ratio of tin oxide to indium tin oxide in the transparent conductive layer is 93: 7.

  For example, in the laminate of the present invention, the support includes one or more layers, and the layer in contact with the transparent conductive layer of the support includes polysiloxane.

  This invention is a conductive pattern base material for touchscreens obtained by processing the laminated body described above.

According to the present invention, the (222) plane of the ITO crystal of the transparent conductive layer when the measurement of the diffraction peak generated by making X-rays incident on the surface on one side of the laminate is performed by In-Plane measurement. when the height of the diffraction peak based on the _{P ITO (222),} the height of the diffraction peak based on the (400) plane of the ITO crystals of the transparent conductive layer and _{P ITO (400), P ITO} (222) / P _{ITO (400)} is 3.6 or more. Thereby, a transparent conductive layer having a low sheet resistance can be realized.

FIG. 1 is a cross-sectional view showing a laminated body according to the first embodiment of the present invention. FIG. 2 is a cross-sectional view showing a support used to produce the laminate of FIG. FIG. 3 is a cross-sectional view showing a modification of the laminate of FIG. 4 is a cross-sectional view showing a support used for producing the laminate of FIG. FIG. 5A is a view for explaining a method of manufacturing the support shown in FIG. FIG. 5B is a view for explaining a method of manufacturing the support shown in FIG. FIG. 6 is a plan view showing a conductive pattern substrate for a touch panel obtained by processing the laminate shown in FIG. 3. 7 is a cross-sectional view of the conductive pattern substrate of FIG. 6 taken along line VII-VII. FIG. 8 is a diagram showing a crystal structure of ITO. FIG. 9 is a diagram showing a diffraction peak obtained from the laminate of Sample 5. FIG. FIG. 10 is a diagram showing the relationship between _{PITO (222)} / _{PITO (400)} in the laminate of each sample and the sheet resistance of the transparent conductive layer. FIG. 11 is a diagram showing the relationship between _{PITO (222)} / _{PITO (400)} in the laminate of each sample and the surface free energy of the support of each sample.

  Hereinafter, embodiments of the present invention will be described with reference to FIGS. As shown in FIG. 1, the stacked body 10 includes a support 11 and a first transparent conductive layer 16 a provided on a surface 11 a on one side of the support 11. First, the support 11 will be described, and then the first transparent conductive layer 16a will be described.

(Support)
As shown in FIGS. 1 and 2, the support 11 includes a base 12, a first hard coat layer 13 a and a first index matching layer 14 a that are sequentially provided on the surface 12 a on one side of the base 12. , Including. Hereinafter, the substrate 12, the first hard coat layer 13a, and the first index matching layer 14a will be described.

(Base material)
As the substrate 12, a film or glass having sufficient translucency is used. Examples of the material constituting the film used for the substrate 12 include polyethylene terephthalate (PET), cycloolefin polymer (COP), cyclic olefin copolymer (COC), polycarbonate (PC), triacetyl cellulose (TAC), poly Examples thereof include methyl methacrylate (PMMA). The thickness of the base material 12 is in the range of, for example, 25 to 200 μm.

(Hard coat layer)
The first hard coat layer 13a is a layer provided for the purpose of preventing scratches and for the purpose of preventing the low molecular weight polymer (oligomer) from being precipitated and appearing cloudy in the interface between the layers. As the first hard coat layer 13a, for example, an acrylic resin is used. As shown in FIGS. 1 and 2, a second hard coat layer 13 b made of the same material as the first hard coat layer 13 a may be further provided on the other surface 12 b of the substrate 12. The thickness of the hard coat layers 13a and 13b is, for example, in the range of 0.1 to 10 μm.

(Index matching layer)
The first index matching layer 14 a is a layer provided between the base material 12 and the first transparent conductive layer 16 a for the purpose of adjusting the light transmittance and reflectance in the stacked body 10. In the present embodiment, the first index matching layer 14a includes a first high-refractive index layer made of a material having a higher refractive index than that of the material constituting the substrate 12. Further, the first index matching layer 14a of the present embodiment is made of a material having a lower refractive index than the material constituting the substrate 12 between the first high refractive index layer and the first transparent conductive layer 16a. The first low refractive index layer is included.

  As a material constituting the first low refractive index layer, for example, silicon oxide or magnesium fluoride is used. As a material constituting the first high refractive index layer, for example, niobium oxide or zirconium is used. The thicknesses of the first high-refractive index layer and the first low-refractive index layer are appropriately set according to the material used so that desired transmittance and reflectance can be achieved.

  In the present embodiment, an example in which the above-described first index matching layer 14a is included in the stacked body 10 will be described. However, the first index matching layer 14a is not necessarily provided. Similarly, the hard coat layers 13a and 13b are also optionally provided as necessary. Therefore, the 1st transparent conductive layer 16a may be provided so that the surface 12a of one side of the base material 12 and the surface of one side of the 1st hard-coat layer 13a may be contact | connected directly. Furthermore, when the base material 12, the hard coat layers 13a and 13b, and the first index matching layer 14a are made of a material that generates so-called outgas containing oxygen or the like, the ITO of the first transparent conductive layer 16a is outgassed. In order to prevent crystallization from being hindered, a barrier layer that blocks outgas may be provided on one side of the substrate 12, the hard coat layers 13a, 13b, or the first index matching layer 14a. As a material constituting the barrier layer, for example, silica is used.

(Transparent conductive layer)
As the material constituting the first transparent conductive layer 16a, a material that has conductivity and exhibits translucency is used, and in this embodiment, indium tin oxide (ITO) is used. Here, ITO means a metal oxide containing 89 to 99% by weight of indium, 1 to 11% by weight of tin, and 0.5% by weight or less of other additive elements or inevitable impurities. Yes. The thickness of the first transparent conductive layer 16a is, for example, in the range of 18 to 50 nm.

  In general, it is expected that the transparent conductive layer made of ITO is formed so that the sheet resistance is lowered without increasing the thickness. In this regard, the present inventors have conducted extensive research and found that the sheet resistance of the transparent conductive layer varies depending on the film forming conditions of the transparent conductive layer, the structure of the support on which the transparent conductive layer is formed, and the like. It was. As a result of investigating the crystal structure of the first transparent conductive layer 16a made of ITO in order to investigate the cause, the ratio of the predetermined crystal plane of the ITO crystal of the first transparent conductive layer 16a is sufficient as shown in the examples described later. It has been found that the sheet resistance of the first transparent conductive layer 16a is sufficiently low.

  Specifically, the crystal structure of ITO is a Bixbyte structure as shown in FIG. 8, and the measurement of a diffraction peak generated by making X-rays incident on one surface of the laminate 10 is performed. When the In-Plane measurement is performed, a diffraction peak based on the (222) plane, (400) plane, (440) plane, etc. of the ITO crystal of the first transparent conductive layer 16a appears. Here, the In-Plane measurement means that X-rays are incident on the surface of the first transparent conductive layer 16a of the multilayer body 10, and the X-ray diffraction generated at this time is observed, whereby the first transparent conductive layer 16a. This is a method for measuring the crystal plane of the ITO crystal. In this method, the orientation of the crystal plane extending parallel to the normal direction of the first transparent conductive layer 16a is measured. According to the In-Plane measurement, it is possible to suppress signals caused by the base material 12, the first hard coat layer 13a, and the first index matching layer 14a, compared to the θ / 2θ measurement that has been generally used conventionally. The crystal information on the surface of the first transparent conductive layer 16a can be measured with high sensitivity.

And according to the results of the present inventors' research, the height of the diffraction peak based on the (222) plane of the ITO crystal of the first transparent conductive layer 16a obtained by performing the above-described In-Plane measurement is determined. and P _{ITO (222),} when the height of the diffraction peak based on the (400) plane of the ITO crystals of the first transparent conductive layer 16a and _{P ITO (400), P ITO} (222) / P ITO (400) is If it is sufficiently high, the sheet resistance of the first transparent conductive layer 16a is sufficiently low.
If _{PITO (222)} / _{PITO (400)} is 3.6 or more, the sheet resistance of the first transparent conductive layer 16a is lowered to a practically sufficient level as a conductive pattern substrate for a touch panel. Specifically, it has been found that it is 140Ω / □ or less.

The method of controlling the orientation of the ITO crystal so that the diffraction peak height _{PITO (222)} based on the (222) plane of the ITO crystal of the first transparent conductive layer 16a is not particularly limited, As a result of repeated trial and error by the inventors, it has been found that the following method can be adopted. That is, as supported by the examples described later, by sufficiently increasing the surface free energy on the surface 11a on one side of the support 11, the ITO crystal of the first transparent conductive layer 16a formed on the surface 11a. The orientation of _{PITO (222)} / _{PITO (400)} can be controlled to be sufficiently high. Specifically, when the surface free energy on the surface 11a is 60 mJ / m ² or more, PITO ₍₂₂₂₎ / PITO ₍₄₀₀₎ is 3.6 or more, more preferably 3.8 or more, and still more preferably. Can control the orientation of the ITO crystal so that it becomes 4.4 or more.

  The method for increasing the surface free energy on the surface of the support 11 is not particularly limited. For example, the surface of the support 11 is subjected to plasma treatment, or the outermost layer of the support 11 is made of a material containing polysiloxane. , Can be employed. Here, the reason why the surface free energy on the surface can be increased by performing plasma treatment on the surface of the support 11 or by configuring the outermost layer of the support 11 with a material containing polysiloxane is particularly limited. For example, the following reasons can be considered. That is, by performing plasma treatment on the surface of the support 11, OH groups in the support 11 are exposed on the surface of the support 11. Further, when the outermost layer of the support 11 is made of a material containing polysiloxane, OH groups exist on the surface of the support 11. The presence of OH groups on the surface of the support 11 contributes to increasing the surface free energy on the surface.

  The surface free energy on the surface of the support 11 can be examined using the water contact angle, diiodomethane contact angle, ethylene glycol contact angle, etc. on the surface of the support 11.

  In addition, it is considered that the material used for forming the first transparent conductive layer 16a also affects the orientation of the ITO crystal of the first transparent conductive layer 16a.

  Next, the operation and effect of the present embodiment having such a configuration will be described. Here, first, a method for manufacturing the above-described support 11 and a method for manufacturing the laminate 10 using the support 11 will be described. Next, the manufacturing method of the conductive pattern base material for touchscreens obtained by processing the laminated body 10 is demonstrated.

The manufacturing method Introduction of the support, as shown in FIG. 5A, providing a substrate 12. Next, as shown to FIG. 5B, the coating liquid containing an acrylic resin is applied to the both sides of the base material 12 using a coater. Thereby, hard coat layers 13 a and 13 b are formed on both sides of the base material 12. Next, a coating liquid containing organic resin and particles of a high refractive index material dispersed in the organic resin, for example, zirconium particles, is applied onto the first hard coat layer 13a using a coater. As a result, the first high refractive index layer is formed on the first hard coat layer 13a. Thereafter, an organic resin and a coating solution containing particles of a low refractive index material dispersed in the organic resin, for example, silicon oxide particles, are applied onto the first high refractive index layer using a coater. Thereby, the first low refractive index layer is formed on the first high refractive index layer. Thus, the 1st index matching layer 14a is formed on the 1st hard-coat layer 13a, and the support body 11 shown in FIG. 2 can be obtained.

Method for producing a laminate Next, in this embodiment, to increase the surface free energy of the one surface 11a of the support 11 the first transparent conductive layer 16a is formed, plasma treatment on the first index matching layer 14a Apply. Subsequently, the first transparent conductive layer 16a is formed on the first index matching layer 14a by using a vacuum film formation method such as a sputtering method. In this embodiment, sputtering is performed using a target having a weight ratio of tin oxide to indium tin oxide of 93: 7 (within a range of 92.5: 7.5 to 93.5: 6.5). Then, the first transparent conductive layer 16a is formed. Thereafter, in order to further promote crystallization of ITO in the first transparent conductive layer 16a, the first transparent conductive layer 16a may be annealed. Thus, the laminated body 10 shown in FIG. 1 can be obtained.

Method for Producing Conductive Pattern Substrate for Touch Panel Next, as an example of the use of the laminate 10, a conductive pattern substrate for a touch panel obtained by processing the laminate 10 will be described. The conductive pattern substrate 60 for a touch panel is provided on the viewer side of a display panel such as a liquid crystal display panel or an organic EL display panel, and includes a transparent conductive pattern for detecting a contact position of a detection target such as a human body. It is a sensor. As the conductive pattern base material 60 for a touch panel, a touch location is detected based on a resistance film type touch panel sensor that detects a touch location based on pressure from the detection target or static electricity from a detection target such as a human body. Various types such as a capacitive touch panel sensor are known. Here, the laminate 10 is patterned to form a conductive pattern substrate 60 for a touch panel as a capacitive touch panel sensor. An example of this will be described with reference to FIGS. 6 is a plan view showing the conductive pattern substrate 60 for touch panel, and FIG. 7 is a cross-sectional view taken along the line VII-VII of the conductive pattern substrate 60 for touch panel shown in FIG. 6 and 7 show the laminate 10 produced using the support 11 including the index matching layers 14a and 14b arranged on one side and the other side of the substrate 12 shown in FIG. As shown in FIG. 3, the touch panel sensor 60 is manufactured by using the laminated body 10 including the transparent conductive layers 16 a and 16 b disposed on one side and the other side of the support 11.

  As shown in FIG. 6, the conductive pattern base material 60 for touch panels includes transparent conductive patterns 62a and 62b for detecting a change in capacitance caused by the approach of an external conductor such as a finger. The transparent conductive patterns 62a and 62b are disposed on one side of the substrate 12, and are disposed on the other side of the first transparent conductive pattern 62a extending in the lateral direction of FIG. 6 and the longitudinal direction of FIG. And a second transparent conductive pattern 62b extending in the direction. In FIG. 6, the second transparent conductive pattern 62b provided on the lower side is represented by a dotted line. As shown in FIG. 7, the transparent conductive patterns 62 a and 62 b are obtained by patterning the transparent conductive layers 16 a and 16 b of the multilayer body 10. As a method for patterning the transparent conductive layers 16a and 16b, for example, a photolithography method is used.

  As shown in FIG. 6, the conductive pattern base material 60 for the touch panel is connected to the extraction patterns 64 a and 64 b connected to the transparent conductive patterns 62 a and 62 b and to the extraction patterns 64 a and 64 b, respectively. Terminal portions 65a and 65b for taking out signals from 62a and 62b to the outside may be further included. The extraction patterns 64a and 64b and the terminal portions 65a and 65b are arranged in a region where the image light from the display panel does not pass, that is, a so-called frame region, of the touch panel conductive pattern substrate 60. For this reason, the material which comprises extraction pattern 64a, 64b and terminal part 65a, 65b does not need to have transparency. Therefore, the extraction patterns 64a and 64b and the terminal portions 65a and 65b are generally made of a metal material having a higher electric conductivity than the transparent conductive material constituting the transparent conductive patterns 62a and 62b.

  The method of forming such extraction patterns 64a and 64b and terminal portions 65a and 65b is not particularly limited, and a photolithography method or a printing method is appropriately used. For example, first, a metal material layer (not shown) is formed on the transparent conductive layer 16 of the laminate 10, and then the metal material layer and the transparent conductive layers 16 a and 16 b are sequentially or simultaneously etched using a photolithography method. Thereby, the extraction patterns 64a and 64b, the terminal portions 65a and 65b, and the transparent conductive patterns 62a and 62b may be formed. In this case, as shown in FIG. 7, transparent conductive patterns 62a and 62b may be interposed between the extraction patterns 64a and 64b and the index matching layers 14a and 14b. As a result, the electrical resistance when taking out signals from the transparent conductive patterns 62a and 62b can be further reduced. In the etching for removing the metal material layer remaining on the transparent conductive patterns 62a and 62b in the region where the image light from the display panel passes, only the metal material layer is selectively dissolved as an etchant. An etchant is used.

According to the present embodiment, when the conductive pattern base material 60 for a touch panel is subjected to measurement of a diffraction peak generated by making X-rays incident on the surface on one side of the laminate 10 by In-Plane measurement. The height of the diffraction peak based on the (222) plane of the ITO crystal of the transparent conductive layers 16a and 16b is defined as PI _{ITO (222),} and the diffraction peak based on the (400) plane of the ITO crystal of the transparent conductive layers 16a and 16b When the height is _{PITO (400)} , the laminate 10 is manufactured by processing that _{PITO (222)} / _{PITO (400)} is 3.6 or more. As a result, it is possible to obtain a conductive pattern substrate 60 for a touch panel having transparent conductive patterns 62a and 62b having a sheet resistance sufficiently low, specifically 140Ω / □ or less, more preferably 130Ω / □ or less. It is.

  EXAMPLES Next, although an Example demonstrates this invention further more concretely, this invention is not limited to description of a following example, unless the summary is exceeded.

  Samples 1 to 7 of the laminate were produced under various production conditions. Below, the sample 1-7 of the support body prepared in order to produce the sample 1-7 of a laminated body is demonstrated first, and the sample 1-7 of the laminated body produced using each support body next. Will be described.

(Support)
Samples 1 to 1 of the support 11 including a base 12 and a first hard coat layer 13a and a first index matching layer 14a provided in order on one side of the base 12.
Was made. The first index matching layer 14a is composed of a first high refractive index layer formed on the first hard coat layer 13a and a first low refractive index layer formed on the first high refractive index layer. . The first low refractive index layer that is the outermost layer of each support 11 was formed by applying a coating liquid containing the following materials on the first high refractive index layer. The coating liquid was applied using a spin coater manufactured by Mikasa.
[Sample 1] Alkoxy metal-based material (manufactured by Nippon Sheet Laboratory Co., Ltd .: Ceramica G-90 A, B)
[Sample 2] Silicone material (manufactured by Shin-Etsu Chemical Co., Ltd .: KS-3601 / CAT-PL-56)
[Sample 3] Silazane material (manufactured by AZ ELECTRONIC MATERIALS: NL-120A-20)
[Sample 4] Organic-inorganic hybrid material (manufactured by JSR Corporation: Glasca HPC7506A)
[Sample 5] Siloxane-based material (Colcoat Co., Ltd .: Colcoat N-103X)
[Sample 6] Siloxane-based material (Colcoat Co., Ltd .: Colcoat PX)
[Sample 7] Siloxane material (Colcoat SS-C1 manufactured by Colcoat Co., Ltd.)

[Evaluation 1 Surface Free Energy of Support]
Subsequently, a water contact angle, a diiodomethane contact angle, and an ethylene glycol contact angle on the surface 11a of the first low refractive index layer of each support 11 thus obtained are measured, and the surface free energy on the surface 11a is measured. Was measured. The measurement conditions for each contact angle and the measurement / analysis conditions for the surface free energy are shown below.
<Measurement conditions for contact angle>
Measuring device: Contact angle meter manufactured by Kyowa Interface Science Co., Ltd. Drop amount of water, diiodomethane and ethylene glycol: 1.0 microliter <Measurement and analysis conditions for surface free energy>
Software used for surface free energy measurement analysis: KYOWA interFAce Measurement and Analysis System (FAMAS)
Surface free energy theory name: Owens-Wendt

Thus, the surface free energy in the surface 11a of each support body 11 measured in this way was as follows.
<Surface free energy>
[Sample 1] 62.1 mJ / m ²
[Sample 2] 25.3 mJ / m ²
[Sample 3] 19.3 mJ / m ²
[Sample 4] 26.2 mJ / m ²
[Sample 5] 63.2 mJ / m ²
[Sample 6] 62.0 mJ / m ²
[Sample 7] 66.0 mJ / m ²

(Laminate)
Then, the 1st transparent conductive layer 16a was formed on the surface 11a of each support body 11 by sputtering method, and the samples 1-7 of the laminated body 10 were formed. The thickness of the first transparent conductive layer 16a of each laminate 10 was about 30 nm. The weight ratio of tin oxide and indium tin oxide in the target used for forming the first transparent conductive layer 16a of each laminate 10 was as follows.
<Weight ratio (tin oxide: indium tin oxide)>
[Sample 1] 95: 5
[Sample 2] 93: 7
[Sample 3] 90:10
[Sample 4] 93: 7
[Sample 5] 93: 7
[Sample 6] 93: 7
[Sample 7] 93: 7

[Evaluation 2: Sheet resistance of transparent conductive layer]
Thus, the sheet resistance of the 1st transparent conductive layer 16a of each laminated body 10 obtained was measured. The measurement conditions of sheet resistance are shown below.
<Measurement conditions>
Measuring device: Lorester manufactured by Mitsubishi Chemical Corporation Measuring method: 4-terminal method

The sheet resistance of the first transparent conductive layer 16a of each laminate 10 thus measured was as follows.
<Measurement results>
[Sample 1] 159Ω / □
[Sample 2] 140Ω / □
[Sample 3] 169Ω / □
[Sample 4] 140Ω / □
[Sample 5] 125Ω / □
[Sample 6] 128Ω / □
[Sample 7] 129Ω / □

[Evaluation 3 Diffraction peak]
Thereafter, X-rays were made incident on the surface on one side of each laminate 10, and the diffraction peak of the ITO crystal contained in the first transparent conductive layer 16a was measured. The measurement was performed under the following conditions so that the diffraction peak of the ITO crystal could be obtained with high accuracy even for a transparent conductive layer having a thickness of about 30 nm.
Measuring device: Rigaku SmartLab
Measurement method: In-Plane measurement X-ray: Tube voltage 45 kV, tube current 200 mA
Measurement range: 10 ° to 70 °
Scan axis: 2θχ / φ
Incident angle ω: 0.43 °
Fixed angle 2θ: 0.43 °

  FIG. 9 shows diffraction peaks obtained in Sample 5 of the laminate. In FIG. 9, the vertical axis represents the intensity (cps: count per sec.) Of the detected diffraction X-ray, and the horizontal axis represents the fixed angle 2θ.

  In FIG. 9, the diffraction peak in the vicinity of 2θ = 30.5 ° is a diffraction peak based on the (222) plane of the ITO crystal. The diffraction peak near 2θ = 35 ° is a diffraction peak based on the (400) plane of the ITO crystal.

_{PITO (222)} / _{PITO (400)} of the first transparent conductive layer 16a of each laminate 10 thus measured was as follows.
[Sample 1] 2.8
[Sample 2] 3.0
[Sample 3] 2.9
[Sample 4] 3.3
[Sample 5] 4.4
[Sample 6] 3.8
[Sample 7] 3.6

In FIG. 10, the relationship between _{PITO (222)} / _{PITO (400)} and sheet resistance in the 1st transparent conductive layer 16a of each laminated body 10 is shown. In FIG. 10, the vertical axis represents _{PITO (222)} / _{PITO (400)} , and the horizontal axis represents the sheet resistance (Ω / □) of the first transparent conductive layer 16a. As can be seen from FIG. 10, if _{PITO (222)} / _{PITO (400)} is sufficiently high, the sheet resistance of the transparent conductive layer is sufficiently low. When _{PITO (222)} / _{PITO (400)} was 3.6 or more, the sheet resistance of the transparent conductive layer formed on the surface was reduced to a practically sufficient level. That is, it was reduced to 140Ω / □ or less, more specifically 130Ω / □ or less. In addition, when _{PITO (222)} / _{PITO (400)} is higher, for example, 3.8 or more, more preferably 4.4 or more, the sheet resistance of the transparent conductive layer formed on the surface is further increased. Reduced.

Moreover, in FIG. 11, the surface free energy in the surface 11a of the samples 1-7 of the support body 11, and _{PIITO (222)} / _{PITO (400) of} the 1st transparent conductive layer 16a formed in the said surface 11a, The relationship is shown. In FIG. 11, the vertical axis represents _{PITO (222)} / _{PITO (400)} , and the horizontal axis represents the sheet resistance value. As can be seen from FIG. 11, if the surface free energy on the surface of the support is sufficiently high, it is found that _{PITO (222)} / _{PITO (400) of the} transparent conductive layer formed on the surface is sufficiently high. .
And when surface free energy was 60 mJ / m < ² > or more, PITO ₍₂₂₂₎ / PITO ₍₄₀₀₎ became 3.6 or more.

DESCRIPTION OF SYMBOLS 10 Laminated body 11 Support body 12 Base material 13 Hard-coat layer 14 Index matching layer 16 Transparent conductive layer 60 Touch panel sensor 62 Transparent conductive pattern 64 Extraction pattern 65 Terminal part

The present invention relates to a laminate , a conductive pattern substrate for a touch panel, and a method for producing the laminate .

Claims (5)

A support;
A transparent conductive layer made of ITO formed on one side of the support,
A laminate comprising:
A diffraction peak based on the (222) plane of the ITO crystal of the transparent conductive layer when a diffraction peak generated by making X-rays incident on one surface of the laminate is measured by In-Plane measurement. the height and _{P ITO (222),} when the height of the diffraction peak based on the (400) plane of the ITO crystals of the transparent conductive layer and _{P ITO (400), P ITO} (222) / P ITO (400 ₎ Is 3.6 or more. The laminate according to claim 1, wherein a weight ratio of tin oxide and indium tin oxide in the transparent conductive layer is 93: 7. The support includes one or more layers;
The laminated body of Claim 1 or 2 in which the layer which contact | connects the said transparent conductive layer of the said support body contains polysiloxane.   The said laminated body is a laminated body as described in any one of Claims 1 thru | or 3 which is a laminated body used in order to produce the conductive pattern base material for touchscreens.   The conductive pattern base material for touchscreens obtained by processing the laminated body of Claim 1.