KR20140058062A - Transparent conductive substrate and touch panel having the same - Google Patents
Transparent conductive substrate and touch panel having the same Download PDFInfo
- Publication number
- KR20140058062A KR20140058062A KR1020120124612A KR20120124612A KR20140058062A KR 20140058062 A KR20140058062 A KR 20140058062A KR 1020120124612 A KR1020120124612 A KR 1020120124612A KR 20120124612 A KR20120124612 A KR 20120124612A KR 20140058062 A KR20140058062 A KR 20140058062A
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- KR
- South Korea
- Prior art keywords
- transparent conductive
- thin film
- conductive film
- substrate
- crystalline
- Prior art date
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
Abstract
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent conductive substrate and a touch panel including the transparent conductive substrate. More particularly, the present invention relates to a transparent conductive substrate having a transparent conductive film formed on a substrate and a touch panel including the transparent conductive substrate.
Generally, the touch panel is installed on the surface of a display device such as a CRT, LCD, PDP, EL (electroluminescence), etc., and when a user touches the touch panel with an input device such as a finger or a stylus, And has been widely used in various electronic apparatuses such as personal digital assistants (PDA), notebook computers, OA devices, medical devices, and car navigation systems.
Such a method of implementing the touch panel includes a resistance film method, a capacitance method, an ultrasonic method, and an infrared method depending on the method of position detection.
In the resistive type, two substrates having a transparent electrode layer (ITO film) coated thereon are bonded together with a dot spacer therebetween so that the transparent electrode layers face each other. A signal for detecting the position is applied when the upper substrate is contacted with a finger or a pen, and an electrical signal is detected when the upper substrate contacts the transparent electrode layer of the lower substrate to determine the position. This method has the disadvantage of high durability and high risk of breakage while high response speed and economical efficiency.
In the electrostatic capacity type, a conductive metal material is coated on one surface of a base film constituting a touch screen sensor to form a transparent electrode, and a certain amount of current flows on the glass surface. When the user touches the screen, the portion where the amount of current is changed is recognized using the capacitance in the human body, and the size is calculated to determine the position. It has a disadvantage in that it is difficult to operate by a hand with a pen or glove because it uses the electrostatic capacity of the human body while having excellent durability and transmittance.
In the ultrasonic method, a piezoelectric element using a piezoelectric effect is used to alternately generate the surface waves generated in the touch panel contact in the X and Y directions, and the position is determined by calculating the distances to the respective input points. Although the resolution and light transmittance are high, there is a drawback that the sensor is susceptible to contamination and liquids.
In the infrared system, a plurality of light emitting elements and light receiving elements are arranged around the panel to form a matrix structure. When the light beam is blocked by the user, the X and Y coordinates of the blocked portion are obtained and the input coordinates are determined. It has a high light transmittance and a strong durability against external impact or scratching, while it has a disadvantage in that it has a low discrimination ability and a slow response time for bulky and inaccurate touches.
Of these, resist film type or capacitive type is most widely used in recent years. In these methods, a crystalline transparent conductive thin film such as indium tin oxide (ITO) is used for detecting a touch position.
The crystalline transparent conductive thin film is patterned to detect the touch position. Such a patterning causes a difference in reflectance between the pattern portion and the non-pattern portion, so that the shape of the pattern is visually revealed. As a result, There arises a problem that the appearance is deteriorated. In order to reduce the reflectance difference between the pattern portion and the non-pattern portion, an index matching layer consisting of a middle refraction thin film layer made of Nb 2 O 5 and a low refraction thin film layer made of SiO 2 is inserted between the window glass and the crystalline transparent electroconductive thin film .
On the other hand, in recent years, various flexible displays have been developed. Accordingly, polymer thin film or flexible glass is used as a window glass.
However, when an index matching layer and a crystalline transparent conductive thin film are coated on such a flexible substrate, a crack is generated in the transparent conductive thin film having crystallinity due to flexure due to the flexibility of the flexible substrate.
SUMMARY OF THE INVENTION The present invention has been made in order to solve the problems of the conventional art as described above, and it is an object of the present invention to provide a transparent conductive base material capable of preventing a crack of a transparent conductive film formed on a substrate, and a touch panel including the same .
To this end, the invention comprises a substrate; A first thin film layer formed on the substrate and having a refractive index of 2.2 to 2.7 at a wavelength of 550 nm; A second thin film layer formed on the first thin film layer and having a refractive index of 1.4 to 1.5 at a wavelength of 550 nm; And a transparent conductive layer formed on the second thin film layer, wherein the transparent conductive layer comprises: a crystalline transparent conductive film; And an amorphous transparent conductive film formed on at least one of the upper surface and the lower surface of the crystalline transparent conductive film.
Here, the crystalline transparent conductive film and the amorphous transparent conductive film are preferably made of the same material, and the crystalline transparent conductive film may be made of crystalline ITO (Indium Tin Oxide), the amorphous transparent conductive film may be made of amorphous ITO, The transparent conductive film and the amorphous transparent conductive film may have a thickness of 30 to 40 nm.
Also, the first thin film layer may include Nb 2 O 5 , and the first thin film layer may have a thickness of 4 to 10 nm.
Also, the second thin film layer may include SiO 2 , and the second thin film layer may have a thickness of 40 to 50 nm.
The substrate may be a flexible glass.
Further, the present invention provides a touch panel comprising the above-mentioned transparent conductive base material.
According to the present invention, the transparent conductive layer is formed of an amorphous transparent conductive film and a crystalline transparent conductive film, so that generation of cracks in the transparent conductive layer can be suppressed.
Further, according to the present invention, the adhesion of the transparent conductive layer to the film of at least one of the upper and lower transparent conductive layers can be improved.
Further, according to the present invention, when the transparent conductive layer is etched, the etching rate can be improved.
1 is a schematic cross-sectional view of a transparent conductive substrate according to an embodiment of the present invention;
Hereinafter, a transparent conductive substrate according to an embodiment of the present invention and a touch panel including the transparent conductive substrate will be described in detail with reference to the accompanying drawings.
In the following description of the present invention, detailed description of known functions and configurations incorporated herein will be omitted when it may make the subject matter of the present invention rather unclear.
1 is a schematic cross-sectional view of a transparent conductive substrate according to an embodiment of the present invention.
1, a transparent conductive substrate according to the present invention includes a substrate 100, a first thin film layer 200, a second thin film layer 300, and a crystalline transparent conductive film 410 and an amorphous transparent conductive film 420 And a transparent conductive layer 400 including the transparent conductive layer 400.
The substrate 100 serves as a cover glass of the touch panel and may be made of glass. Preferably, the substrate 100 may be made of a flexible glass having a thickness of 100 mu m or less. The glass has a stronger heat resistance than the polymer film and is excellent in moisture permeability and has the advantage of coating various coating materials under various thermal conditions.
The first thin film layer 200 is formed on the substrate 100 and has a refractive index of 2.2 to 2.7 at a wavelength of 550 nm.
The first thin film layer 200 may be made of Nb 2 O 5 , in which case the first thin film layer 200 will have a thickness of 4 to 10 nm, preferably 4 nm.
The second thin film layer 300 is formed on the first thin film layer 200 and has a refractive index of 1.4 to 1.5 at a wavelength of 550 nm.
The second thin film layer 300 may be made of SiO 2 , in which case the second thin film layer 300 will have a thickness of 40 to 50 nm, preferably 45 nm.
The first thin film layer 200 and the second thin film layer 300 reduce the reflectance of the visible light and improve the visibility of the display device. In addition, when the transparent conductive layer 400 to be described later is patterned, the shape of the pattern formed on the transparent conductive layer 400 is prevented from being visually recognized.
The transparent conductive layer 400 is formed on the second thin film layer 300 and includes an amorphous transparent conductive film formed on at least one of the upper surface and the lower surface of the crystalline transparent conductive film 410 and the crystalline transparent conductive film 410 420). The crystalline transparent conductive film 410 has a lower resistivity and a higher transmittance than the amorphous transparent conductive film 420.
The crystalline transparent conductive film 410 and the amorphous transparent conductive film 420 may be made of the same material. Preferably, the crystalline transparent conductive film 410 is made of crystalline ITO (Indium Tin Oxide) (420) may be made of amorphous ITO.
When the transparent conductive substrate according to the present invention is used in a touch panel, the transparent conductive layer 400 is etched and patterned to form an X-axis or Y-axis sensor for touch position detection. The patterning process of the transparent conductive layer 400 is performed by firstly laminating a dry film photoresist on the transparent conductive layer 400, placing a pattern film in which a certain pattern is continuously crossed, irradiating ultraviolet rays to form a dry film photoresist region And then peeling off only the dry film photoresist region irradiated with ultraviolet rays using an acidic or alkaline etching solution.
When the crystalline transparent conductive film 410 is made of crystalline ITO, the crystalline transparent conductive film 410 preferably has a thickness of 30 to 40 nm. Crystalline ITO can be formed by coating ITO at a high temperature of 250 캜 or higher.
When the amorphous transparent conductive film 420 is made of amorphous ITO, the amorphous transparent conductive film 420 preferably has a thickness of 30 to 40 nm. Amorphous ITO can be formed by coating ITO at a low temperature of 100 DEG C or less.
It is possible to suppress the occurrence of cracks in the crystalline transparent conductive film 410 by forming the amorphous transparent conductive film 420 on at least one of the upper surface and the lower surface of the crystalline transparent conductive film 410. Generally, in the case of a crystalline thin film, since the crystal has a directionality, cracks easily occur in the thin film when bending or twisting due to external force is applied to the crystalline thin film. Accordingly, the present invention provides an amorphous transparent conductive film (420) having a physical property similar to that of the crystalline transparent conductive film (410) on at least one of the upper surface and the lower surface of the crystalline transparent conductive film (410) The occurrence of cracks in the film 410 can be suppressed.
When the amorphous transparent conductive film 420 is positioned on the upper surface of the crystalline transparent conductive film 410, the transparent conductive layer 400 and the electrode portion (not shown) formed on the transparent conductive layer 400 in the manufacturing process of the touch panel Can be improved. In addition, when the amorphous transparent conductive film 420 is located on the lower surface of the crystalline transparent conductive film 410, the adhesion between the transparent conductive layer 400 and the second thin film layer 300 can be improved. This is because both the electrode portion (not shown) and the second thin film layer 300 have amorphous characteristics.
In addition, when the transparent conductive layer 400 is patterned to form an X-axis or Y-axis sensor for touch position detection in manufacturing a touch panel, the etching rate can be improved. This is because the amorphous transparent conductive film 420 is easier to etch than the crystalline transparent conductive film 410 and the etching speed is faster.
Meanwhile, the coating of the crystalline transparent conductive film 410 and the amorphous transparent conductive film 420 may be performed by a sputtering deposition method.
Particularly, when the substrate 100 is a flexible substrate, the crystalline transparent conductive film 410 and the amorphous transparent conductive film 420 can be formed on the substrate 100 through a roll-to-roll sputtering apparatus .
At this time, the crystalline transparent conductive film 410 is formed in a coating chamber of a high-temperature atmosphere, and the amorphous transparent conductive film 420 is formed in a coating chamber of a low-temperature atmosphere. When the amorphous transparent conductive film 420 is formed on the first thin film layer 200 and the second thin film layer 300, that is, on the lower surface of the crystalline transparent conductive film 410, The amorphous transparent conductive film 420 and the first thin film layer 200 and the second thin film layer 300 may be formed in the same chamber.
While the invention has been shown and described with reference to certain preferred embodiments thereof, it will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. This is possible.
Therefore, the scope of the present invention should not be limited by the described embodiments, but should be determined by the scope of the appended claims as well as the appended claims.
100: substrate 200: first thin film layer
300: second thin film layer 400: transparent conductive layer
410: crystalline transparent conductive film 420: amorphous transparent conductive film
Claims (10)
A first thin film layer formed on the substrate and having a refractive index of 2.2 to 2.7 at a wavelength of 550 nm;
A second thin film layer formed on the first thin film layer and having a refractive index of 1.4 to 1.5 at a wavelength of 550 nm; And
And a transparent conductive layer formed on the second thin film layer,
Wherein the transparent conductive layer
A crystalline transparent conductive film; And
And an amorphous transparent conductive film formed on at least one of the upper surface and the lower surface of the crystalline transparent conductive film.
Wherein the crystalline transparent conductive film and the amorphous transparent conductive film are made of the same material.
Wherein the crystalline transparent conductive film is made of crystalline ITO (Indium Tin Oxide), and the amorphous transparent conductive film is made of amorphous ITO.
Wherein the crystalline transparent conductive film and the amorphous transparent conductive film have a thickness of 30 to 40 nm.
Wherein the first thin film layer comprises Nb 2 O 5 .
Wherein the first thin film layer has a thickness of 4 to 10 nm.
Wherein the second thin film layer comprises SiO 2 .
Wherein the second thin film layer has a thickness of 40 to 50 nm.
Wherein the substrate is a flexible glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020120124612A KR20140058062A (en) | 2012-11-06 | 2012-11-06 | Transparent conductive substrate and touch panel having the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020120124612A KR20140058062A (en) | 2012-11-06 | 2012-11-06 | Transparent conductive substrate and touch panel having the same |
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| Publication Number | Publication Date |
|---|---|
| KR20140058062A true KR20140058062A (en) | 2014-05-14 |
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| Application Number | Title | Priority Date | Filing Date |
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| KR1020120124612A KR20140058062A (en) | 2012-11-06 | 2012-11-06 | Transparent conductive substrate and touch panel having the same |
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| KR (1) | KR20140058062A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104951166A (en) * | 2015-07-10 | 2015-09-30 | 张家港康得新光电材料有限公司 | Transparent conductive film and capacitive touch screen comprising same |
| CN104951165A (en) * | 2015-07-10 | 2015-09-30 | 张家港康得新光电材料有限公司 | Transparent conductive film and capacitive touch screen comprising same |
-
2012
- 2012-11-06 KR KR1020120124612A patent/KR20140058062A/en not_active Application Discontinuation
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104951166A (en) * | 2015-07-10 | 2015-09-30 | 张家港康得新光电材料有限公司 | Transparent conductive film and capacitive touch screen comprising same |
| CN104951165A (en) * | 2015-07-10 | 2015-09-30 | 张家港康得新光电材料有限公司 | Transparent conductive film and capacitive touch screen comprising same |
| CN104951166B (en) * | 2015-07-10 | 2018-08-28 | 张家港康得新光电材料有限公司 | Transparent conductive film and the capacitive touch screen comprising it |
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