CN104951166A - Transparent conductive film and capacitive touch screen comprising same - Google Patents
Transparent conductive film and capacitive touch screen comprising same Download PDFInfo
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- CN104951166A CN104951166A CN201510404695.4A CN201510404695A CN104951166A CN 104951166 A CN104951166 A CN 104951166A CN 201510404695 A CN201510404695 A CN 201510404695A CN 104951166 A CN104951166 A CN 104951166A
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Abstract
The invention provides a transparent conductive film and a capacitive touch screen comprising the same. The transparent conductive film comprises a transparent substrate layer and ITO (indium tin oxide) layers arranged on the surface of the transparent substrate layer, wherein the ITO layers comprise a first amorphous ITO layer, a crystalline ITO layer and a second amorphous ITO layer; the first amorphous ITO layer is arranged on the surface of the transparent substrate layer; the crystalline ITO layer is arranged on the surface, far from the transparent substrate layer, of the first amorphous ITO layer; the second amorphous ITO layer is arranged on the surface, far from the first amorphous ITO layer, of the crystalline ITO layer. The transparent conductive film has the characteristics of unapparent solid lines, lower impedance, lower cost and simpler production process; meanwhile, the ITO layers have good adherence with the transparent substrate layer and a silver or copper conductive printing layer in a follow-up process, so that good performance of the transparent conductive film is guaranteed, and the continuity of processes for production is improved.
Description
Technical field
The present invention relates to touch-screen field, in particular to a kind of nesa coating and the capacitive touch screen comprising it.
Background technology
Adherence refers to the adhesion of adjacent two layers, adhesion is large, and then adherence is good, in capacitive touch screen, between each layer, good adherence ensure that the normal work of capacitive touch screen, ensure that capacitive touch screen has good performance, adherence is bad, then the performance of capacitive touch screen is affected, ITO layer is caused to peel off, conduct electricity bad, even cisco unity malfunction, therefore, adherence quality between each layer directly affects the performance of capacitive touch screen, especially ITO layer and adjacent with it two-layer between the performance impact of adherence to capacitive touch screen larger.
ITO layer normally crystallization ITO layer in capacitive touch screen of the prior art, crystallization ITO layer is with poor with the adherence of the optical adjustment layer under it, need to do the good adherence of special processing guarantee, simultaneously, crystallization ITO layer and the adherence arranged between silver thereon or copper conductive layer also poor, also to do special processing to ensure the adherence of silver or copper conductive layer and crystallization ITO layer, and then ensure that capacitive touch screen has good performance.
Therefore, need one badly and do not need special processing adherence just reasonable nesa coating and capacitive touch screen.
Summary of the invention
Fundamental purpose of the present invention is to provide a kind of nesa coating and the capacitive touch screen that comprises it, with the three-dimensional line solving nesa coating of the prior art comparatively obviously and the problem of adherence difference.
To achieve these goals, according to an aspect of the present invention, provide a kind of nesa coating, this nesa coating comprises: transparent substrate layer and the ITO layer be arranged on transparent substrate layer surface, wherein, above-mentioned ITO layer comprises: the first noncrystalline ITO layer, crystallization ITO layer and the second noncrystalline ITO layer, and above-mentioned first noncrystalline ITO layer is arranged on the surface of above-mentioned transparent substrate layer; Above-mentioned crystallization ITO layer is arranged on the surface away from above-mentioned transparent substrate layer of above-mentioned first noncrystalline ITO layer; Above-mentioned second noncrystalline ITO layer is arranged on the surface away from above-mentioned first noncrystalline ITO layer of above-mentioned crystallization ITO layer.
Further, in above-mentioned first noncrystalline ITO layer and/or the second noncrystalline ITO layer, the weight content of Sn is 7% ~ 30%, and in further preferred above-mentioned crystallization ITO layer, the weight content of Sn is 1% ~ 7%.
Further, the thickness of above-mentioned first noncrystalline ITO layer between 1 ~ 15nm, preferably between 5 ~ 10nm.
Further, the thickness of above-mentioned crystallization ITO layer between 5 ~ 25nm, preferably between 10 ~ 20nm.
Further, the thickness of above-mentioned second noncrystalline ITO layer between 1 ~ 10nm, preferably between 1 ~ 5nm.
Further, above-mentioned nesa coating also comprises: the first optical adjustment layer and the second optical adjustment layer, and the first optical adjustment layer is arranged between above-mentioned transparent substrate layer and above-mentioned first noncrystalline ITO layer; Second optical adjustment layer is arranged between above-mentioned first optical adjustment layer and above-mentioned first noncrystalline ITO layer.
Further, the refractive index of above-mentioned first optical adjustment layer is between 1.55 ~ 3.00, and preferably between 1.60 ~ 2.80, preferably the thickness of above-mentioned first optical adjustment layer is between 5nm ~ 10 μm further, further preferred between 10nm ~ 5 μm.
Further, the refractive index of above-mentioned second optical adjustment layer is between 1.10 ~ 1.55, and preferably between 1.20 ~ 1.50, the thickness of above-mentioned second optical adjustment layer is between 5 ~ 500nm further, further preferred between 10 ~ 300nm.
Further, above-mentioned first optical adjustment layer is selected from the one in titanium dioxide layer, zirconia layer and niobium pentaoxide layer, and preferably above-mentioned second optical adjustment layer is selected from magnesium fluoride layer, fluoridizes the one in calcium layer and silicon dioxide layer.
Further, above-mentioned nesa coating also comprise be arranged on above-mentioned transparent substrate layer away from the first hardened layer on the surface of the first optical adjustment layer.
Further, the pencil hardness of above-mentioned first hardened layer between 4B ~ 9H, preferably between 2B ~ 5H.
Further, above-mentioned nesa coating also comprises the second hardened layer be arranged between transparent substrate layer and above-mentioned first optical adjustment layer.
Further, the thickness of above-mentioned second hardened layer is between 0.3 ~ 50 μm, preferably between 0.5 ~ 5 μm, large 0.1 ~ 5.0 μm of the thickness of preferred Thickness Ratio second hardened layer of above-mentioned first hardened layer further, further large 0.3 ~ 1.5 μm of the thickness of preferred Thickness Ratio second hardened layer of above-mentioned first hardened layer.
Further, the full light transmission rate of above-mentioned transparent substrate layer is greater than 85%, and the thickness of preferred above-mentioned transparent substrate layer is between 10 ~ 500 μm, preferred between 20 ~ 200 μm further.
Further, the shrinkage factor in the mechanical movement direction of above-mentioned transparent substrate layer is greater than 0 and is less than or equal to 0.5%, and the shrinkage factor perpendicular to mechanical movement direction is greater than 0 and is less than or equal to 0.1%.
To achieve these goals, according to an aspect of the present invention, provide a kind of capacitive touch screen, this capacitive touch screen comprises above-mentioned nesa coating.
Apply technical scheme of the present invention, ITO layer in nesa coating adopts the first noncrystalline ITO layer, the three-decker of the composition of crystallization ITO layer and the second noncrystalline ITO layer replaces individual layer crystallization ITO layer of the prior art, the noncrystalline ITO layer increased is after the heat treatment process in later stage, crystalline state can not be become from non-crystalline, but maintenance non-crystalline, shrinkage factor remains unchanged, make the deformation of noncrystalline ITO layer before and after etching and heating less, stress difference between each layer reduces greatly, on the one hand, alleviate the problem that the three-dimensional line of transparent conductive film is serious, obtain the capacitive touch screen transparent conductive film of low three-dimensional line, on the other hand, the silver in noncrystalline ITO layer and transparent substrate layer and subsequent technique or copper conduct electricity printed layers good adherence, ensure that nesa coating has good performance, improves the continuity of explained hereafter.Meanwhile, the impedance of noncrystalline ITO layer is lower, the demand making it meet touch panel device in prior art to maximize, and extends its application in maximization touch-control produce market; In addition, the manufacture craft of this nesa coating is comparatively simple, reduces manufacturing a finished product of nesa coating.
Accompanying drawing explanation
The Figure of description forming a application's part is used to provide a further understanding of the present invention, and schematic description and description of the present invention, for explaining the present invention, does not form inappropriate limitation of the present invention.In the accompanying drawings:
Fig. 1 shows the cross-sectional view that a kind of exemplary embodiment of the application provides nesa coating; And
Fig. 2 shows the cross-sectional view of the nesa coating that a kind of preferred embodiment of the application provides.
Embodiment
It should be noted that, when not conflicting, the embodiment in the application and the feature in embodiment can combine mutually.Below with reference to the accompanying drawings and describe the present invention in detail in conjunction with the embodiments.
In the typical embodiment of one of the application, provide a kind of nesa coating, as shown in Figure 1, this nesa coating comprises transparent substrate layer 20 and the ITO layer 60 be arranged on transparent substrate layer 20 surface, wherein, ITO layer 60 comprises: the first noncrystalline ITO layer 61, crystallization ITO layer 62 and the noncrystalline ITO layer 61 of the second noncrystalline ITO layer 63, first are arranged on the surface of transparent substrate layer 20; Crystallization ITO layer 62 is arranged on the surface away from transparent substrate layer 20 of the first noncrystalline ITO layer 61; Second noncrystalline ITO layer 63 is arranged on the surface away from the first noncrystalline ITO layer 61 of crystallization ITO layer 62.
Crystallization ITO refers to a kind of ITO that can be become crystalline state in heat treatment process from non-crystalline; Noncrystalline ITO of the present invention refers to a kind of ITO that can not be become crystalline state after heat treatment process from non-crystalline.
ITO layer 60 in above-mentioned nesa coating adopts the first noncrystalline ITO layer 61, the three-decker of the composition of crystallization ITO layer 62 and the second noncrystalline ITO layer 63 replaces individual layer crystallization ITO layer of the prior art, the the first noncrystalline ITO layer 61 increased and the second noncrystalline ITO layer 63 are after the heat treatment process in later stage, crystalline state can not be become from non-crystalline, but maintenance non-crystalline, shrinkage factor remains unchanged, make the deformation of the ITO layer 60 before and after etching and heating less, stress difference between each layer reduces greatly, on the one hand, alleviate the problem that the three-dimensional line of transparent conductive film is serious, obtain the capacitive touch screen transparent conductive film of low three-dimensional line, on the other hand, ITO layer 60 and the silver in transparent substrate layer 20 and subsequent technique or copper conduct electricity printed layers good adherence, ensure that nesa coating has good performance, improves the continuity of explained hereafter.Meanwhile, the impedance of the first noncrystalline ITO layer 61 and the second noncrystalline ITO layer 63 is lower, the demand making it meet touch panel device in prior art to maximize, and extends its application in maximization touch-control produce market; In addition, the manufacture craft of this nesa coating is comparatively simple, reduces manufacturing a finished product of nesa coating.
In order to make nesa coating, there is lower three-dimensional line, better adhesion force and less impedance, the application preferably in above-mentioned first noncrystalline ITO layer 61 and/or the second noncrystalline ITO layer 63 weight content of Sn be 7% ~ 30%, the weight content of the Sn of the one deck namely in the first noncrystalline ITO layer 61 and the second noncrystalline ITO layer 63 be 7% ~ 30% or the two the weight content of Sn be 7% ~ 30% simultaneously.When the weight content of above-mentioned noncrystalline ITO layer (i.e. the first noncrystalline ITO layer 61 and/or the second noncrystalline ITO layer 63) Sn is greater than 7%, further guarantee ITO is non-crystallizable, and nesa coating can reach better low three-dimensional line effect, adhesion force effect; When the weight content of Sn is less than 30%, the impedance of the first noncrystalline ITO layer 61 and the second noncrystalline ITO layer 63 is less, and meanwhile, its penetrability is higher, improves the optical characteristics of nesa coating.In order to ensure low three-dimensional line effect and the optical characteristics of transparent conductive film further, the application further preferably in the first noncrystalline ITO layer 61 and/or the second noncrystalline ITO layer 63 weight content of Sn be 8% ~ 20%, be more preferably 15%.
In order to ensure the permanance of ITO layer 60 further, in the further preferred above-mentioned crystallization ITO layer 60 of the application, the weight content of Sn is 1% ~ 7%.
In another preferred embodiment of the application, the thickness of above-mentioned first noncrystalline ITO layer 61 is between 1 ~ 15nm.When the thickness of the first noncrystalline ITO layer 61 is greater than 1nm, the impedance of this layer is less, can meet the requirement of nesa coating to impedance further; When the thickness of the first noncrystalline ITO layer 61 is less than 15nm, makes the impedance of nesa coating less, and make nesa coating have good outward appearance.In order to obtain the lower and better nesa coating of outward appearance of impedance further, the application further preferably the thickness of above-mentioned first noncrystalline ITO layer 61 at 5 ~ 10nm.
In order to ensure that nesa coating has good permanance further, ensure that lower, the low three-dimensional line effect of impedance is better, adhesion force is better simultaneously, the thickness of the preferred above-mentioned crystallization ITO layer 62 of the application is between 5 ~ 25nm, when the thickness of crystallization ITO layer 62 is greater than 5nm, the permanance of nesa coating can be improved further; When the thickness of crystallization ITO layer 62 is less than 25nm, can ensure that nesa coating has good outward appearance further, the thickness of preferred crystallization ITO layer 62 is between 10 ~ 20nm further.
In the another kind of preferred embodiment of the application, the thickness of the second noncrystalline ITO layer 63 is between 1 ~ 10nm, when the thickness of the second noncrystalline ITO layer 63 is greater than 1nm, the impedance of the second noncrystalline ITO layer 63 is less, can meet the requirement of nesa coating to impedance further; When the thickness of the second noncrystalline ITO layer 63 is less than 10nm, the impedance of nesa coating can be made equally less, and can ensure that it has good outward appearance and optical property further.In order to obtain the lower and better nesa coating of outward appearance of impedance further, preferably the thickness of the second noncrystalline ITO layer 63 is between 1 ~ 5nm.
In order to reduce to etch the optical characteristics difference (comprise within the scope of visible light through the difference with reflection characteristic) produced between rear etched portions and non-etched portions better, and then obtain the nesa coating of low three-dimensional line better effects if, the further three-dimensional line phenomenon improving nesa coating, as shown in Figure 2, the application's preferably clear conducting film comprises the first optical adjustment layer 40 and the second optical adjustment layer 50, wherein, the first optical adjustment layer 40 is arranged between transparent substrate layer 20 and the first amorphism ITO layer 61; Second optical adjustment layer 50 is arranged on the first optical adjustment layer 40 and institute first states between noncrystalline ITO layer 61.When the refractive index of transparent substrate layer 20 is greater than 1.55, the second optical adjustment layer 50 can not be set.
In another preferred embodiment of the application, between the refractive index 1.55 ~ 3.00 of preferred above-mentioned first optical adjustment layer 40, by the refractive index of the first optical adjustment layer 40 is controlled in 1.55 ~ 3, can reduce further optical characteristics between etched portions in ITO layer 60 and non-etched portions (through and reflect) difference.In order to reduce the three-dimensional line in nesa coating further, preferably between 1.60 ~ 2.80, be more preferably between 1.76 ~ 2.80.Preferably the thickness of above-mentioned first optical adjustment layer 40 is between 5nm ~ 10 μm further, further preferred between 10nm ~ 5 μm.
In another preferred embodiment of the application, the refractive index of above-mentioned second optical adjustment layer 50 is between 1.10 ~ 1.55, the low-refraction of such second optical adjustment layer 50 and the high index of refraction of the first optical adjustment layer 40 cooperatively interact, and the etched portions in ITO layer 60 and the aberration between non-etched portions are reduced greatly.In order to obtain the nesa coating of low three-dimensional line better effects if, preferably the refractive index of the second optical adjustment layer 50 is between 1.20 ~ 1.50 further for the application, preferred between 1.34 ~ 1.45 further.
In order to reduce three-dimensional line further, the thickness of preferred above-mentioned second optical adjustment layer 50 of the application is between 5 ~ 500nm, and preferably the thickness of above-mentioned second optical adjustment layer 50 is between 10 ~ 300nm.
In the another kind of preferred embodiment of the application, above-mentioned first optical adjustment layer 40 is selected from the one in titanium dioxide layer, zirconia layer and niobium pentaoxide layer, preferably above-mentioned second optical adjustment layer 50 is selected from magnesium fluoride layer, fluoridize calcium layer, ice crystal rock layers, organic fluoride nitride layer (as Japanese DIC company OP-4002, OP-4003, OP-4004; Daikin Industries UV1000, UV1100, UV2100; Northeast chemical company KD4000 etc.) with silicon dioxide layer (comprising hollow silica layer) in one.
In another preferred embodiment of the application; as shown in Figure 2; above-mentioned nesa coating also comprise be arranged on above-mentioned transparent substrate layer 20 away from the first hardened layer 10 on the surface of the first optical adjustment layer 40; first hardened layer 10 can be protected transparent substrate layer 20, first optical adjustment layer 40, second optical adjustment layer 50 and ITO layer 60, ensures the scratch resistance of nesa coating, scratch-proofness.
In another preferred embodiment of the application, the pencil hardness of above-mentioned first hardened layer 10 is between 4B ~ 9H, and when the hardness of the first hardened layer 10 is greater than 4B, its hardness is comparatively large, can play good protective effect; When its hardness is less than 9H, himself rolling is easier to and can reduces cost of manufacture further.In order to the protective value that ensures the first hardened layer 10 further with maintain lower production cost, further preferably the pencil hardness of the first hardened layer 10 between 2B ~ 5H.
Before optical adjustment layer is set; in order to protect transparent substrate layer 20; above-mentioned nesa coating also comprises the second hardened layer 30; as shown in Figure 2; above-mentioned second hardened layer 30 is arranged between transparent substrate layer 20 and above-mentioned first optical adjustment layer 40, and preferably the refractive index of above-mentioned second hardened layer 30 is between 1.4 ~ 1.6.
In order to ensure the protective value to nesa coating of the second hardened layer 30 further, consider production cost simultaneously, preferably the thickness of the second hardened layer 30 is between 0.3 ~ 50 μm, when the thickness of this layer is greater than 0.3 μm, can play the effect of other layer of protection nesa coating better; And when its thickness is less than 50 μm, its production cost is lower.In order to ensure that the second hardened layer 30 can play a good protection further, meanwhile, ensure that further its production cost is lower, the thickness of preferred the second hardened layer 30 of the application is between 0.5 ~ 5.0 μm.
In another preferred embodiment of the application, large 0.1 ~ 5.0 μm of the thickness of above-mentioned second hardened layer 30 of Thickness Ratio of above-mentioned first hardened layer 10, the large part out of thickness of the first hardened layer 10 to the second hardened layer 30 can balance the stress of the upper and lower surface of transparent substrate layer 20, alleviate the second hardened layer 30, ITO layer 60 formed and subsequent heating process process time the STRESS VARIATION brought, prevent nesa coating warpage, improve the effect of three-dimensional line.
In another preferred embodiment of the application, the full light transmission rate of above-mentioned transparent substrate layer 20 is greater than 85%, and transmitance is greater than 85%, can meet the requirement of client better.Transparent substrate layer 20 in the application refers to and is generally the thin layer of transparent plastic that each manufacturer produces and comprises pet layer, TAC layer, PC layer, PE layer or PP layer, but is not only confined to these transparent substrate layer 20.
In order to guarantee the technique realizability of transparent substrate layer 20 further, consider the rolling performance of layer transparent substrate layer 20 simultaneously, the thickness of the preferred above-mentioned transparent substrate layer 20 of the application is between 10 ~ 500 μm, the THICKNESS CONTROL of transparent substrate layer 20 is within the scope of this, the difficulty further ensuring preparation technology is lower, cost is lower, and the rolling of transparent substrate layer 20 is easier to.After further contemplating existing production status and production cost, the thickness of further preferred above-mentioned transparent substrate layer 20 is between 20 ~ 200 μm.
In the another kind of preferred embodiment of the application, mechanical movement direction (the Machine Direction of above-mentioned transparent substrate layer 20, MD, also claim mechanical stretching direction) shrinkage factor be greater than 0 and be less than or equal to 0.5%, perpendicular to mechanical movement direction (TransverseDirection, TD, also claims perpendicular to mechanical stretching direction) shrinkage factor be greater than 0 and be less than or equal to 0.1%.Shrinkage factor when the mechanical movement direction of transparent substrate layer 20 controls in above-mentioned scope with the shrinkage factor perpendicular to mechanical movement direction, and its percent thermal shrinkage is lower, can improve the three-dimensional line of nesa coating further.In order to make the low three-dimensional line better effects if of nesa coating, can also to transparent substrate layer 20 and the first hardened layer 10 do resistance to thermal treatment.
Aborning, if when the first above-mentioned hardened layer and the second hardened layer occur that coiled strip glues glutinous, surface roughening process can be done to the first hardened layer and the second hardened layer.As protruding in adopted multiple island district, island district height of projection is nanoscale; Or in sclerosis coating fluid, add particle, particle diameter at micron order, the surface roughness Ra after process between 0.3nm ~ 10 μm, further preferably Ra between 0.6nm ~ 2.0 μm.
In the another kind of preferred embodiment of the application, provide a kind of capacitive touch screen, comprise nesa coating, this nesa coating is the above-mentioned nesa coating of any one.
Nesa coating in this capacitive touch screen has low three-dimensional line, the requirement of client can be met, simultaneously because the impedance of the nesa coating in this capacitive touch screen is lower, capacitive touch screen can be realized in large size, and then meet the demand that in prior art, touch panel device maximizes; In addition, the production technology of the nesa coating of this capacitive touch screen is comparatively simple, makes the production cost of capacitive touch screen also lower.
In order to the technical scheme allowing those skilled in the art clearly understand the application, be described below with reference to embodiment and comparative example.
Embodiment 1
Utilize magnetron sputtering technique, the surface of transparent substrate layer 20 obtains the first amorphism ITO layer 61 successively, crystallinity ITO layer 62 and the second amorphism ITO layer 63, form the nesa coating shown in Fig. 1.
Adopt the ITO layer 60 of ink wire mark etching method to nesa coating to etch, then, toast it, baking temperature is 150 DEG C, and the time is 60min.The concrete structure parameter of nesa coating is in table 1.
Embodiment 2
On the surface of transparent substrate layer 20, coating is selected from the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, drying, and the first hardened layer 10 is made in solidification.Then profit in the same way, and the model being selected from Japanese DIC company in the coating of the surface away from above-mentioned first hardened layer 10 of transparent substrate layer 20 is the hardening bath of PC13-1082, makes the second hardened layer 30.
Utilize magnetron sputtering technique, at the second hardened layer 30 away from plated film on the surface of above-mentioned transparent substrate layer 20, obtain the first optical adjustment layer 40 and the second optical adjustment layer 50 and ITO layer 60 successively, form the nesa coating shown in Fig. 2.
Adopt the ITO layer 60 of ink wire mark etching method to nesa coating to etch, then, toast it, baking temperature is 150 DEG C, and the time is 60min.The concrete structure parameter of nesa coating is in table 1.
Embodiment 3
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 4
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 5
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 101 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 6
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 to be the model of Japanese DIC company be PC13-1082's, the concrete structure parameter of nesa coating is in table 1.
Embodiment 7
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 8
Adopt the method identical with embodiment 2 to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, and wherein, transparent substrate layer 20 is toray company model is the pet layer of U483; The hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001; The hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 9
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 10
Adopt the method identical with embodiment 2 to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, and wherein, transparent substrate layer 20 is Di Ren E.I.Du Pont Company model is the pet layer of KEL86W; The hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, and the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 11
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 12
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 13
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 14
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 15
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 16
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 17
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese DIC company is the hardening bath of PC13-1082, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Embodiment 18
The method identical with embodiment 2 is adopted to prepare the nesa coating shown in Fig. 2, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 30 is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Comparative example 1
Be on the surface of the pet layer of U483 in toray company model, the model being coated with Japanese DIC company is the hardening bath of PC13-1082, and drying is solidified, and makes the first hardened layer.Then, in the same way, the model that the surface away from above-mentioned first hardened layer of this PET base material layer is coated with Japanese DIC company is the hardening bath of PC13-1082 to profit, makes the second hardened layer.
Utilize magnetron sputtering technique, at the second hardened layer away from plated film on the surface of transparent substrate layer, form the first optical adjustment layer, the second optical adjustment layer and ITO layer successively.
Adopt the crystallization ITO layer of ink wire mark etching method to above-mentioned nesa coating to etch, then toast, baking temperature is 150 DEG C, and the time is 60min.The structural parameters of the nesa coating prepared in table 1,
Comparative example 2
Be on the surface of the pet layer of U483 in toray company model, the model being coated with Japanese DIC company is the hardening bath of PC13-1082, and drying is solidified, and makes the first hardened layer.Then, in the same way, the model that the surface away from above-mentioned first hardened layer of this PET base material layer is coated with Japanese DIC company is the hardening bath of PC13-1082 to profit, makes the second hardened layer.
Utilize magnetron sputtering technique, at the second hardened layer away from plated film on the surface of transparent substrate layer, form film first optical adjustment layer, the second optical adjustment layer crystallization ITO layer successively.
Adopt the crystallization ITO layer of ink wire mark etching method to above-mentioned nesa coating to etch, then toast, baking temperature is 150 DEG C, and the time is 60min.The structural parameters of the nesa coating prepared are in table 1.
Comparative example 3
Be on the surface of the pet layer of LEL86W in Di Ren E.I.Du Pont Company model, being coated with Japanese Huang Chuan chemical company model is the hardening bath of FZ001, and drying is solidified, and makes the first hardened layer.Then, in the same way, the model that the surface away from above-mentioned first hardened layer of this PET base material layer is coated with Japanese DIC company is the hardening bath of PC13-1082 to profit, makes the second hardened layer.
Utilize magnetron sputtering technique, at the second hardened layer away from plated film on the surface of transparent substrate layer, form film first optical adjustment layer, the second optical adjustment layer and ITO layer successively.
Adopt the crystallization ITO layer of ink wire mark etching method to above-mentioned nesa coating to etch, then toast, baking temperature is 150 DEG C, and the time is 60min.The structural parameters of the nesa coating prepared are in table 1.
Table 1
First, the OCA glue-line of 50 μm of the nesa coating LG chemical company of all embodiments and comparative example and gorilla tempered glass are fit together, second noncrystalline ITO layer contacts with gorilla tempered glass, the visual judgement carrying out the three-dimensional line of nesa coating, the effect of three-dimensional line improves gradually according to the order of A, B, C, D, E; Secondly, four probe method is adopted to test its impedance; Finally, magnetron sputtering technique is utilized to plate the layers of copper that thickness is 50nm on the surface of the second noncrystalline ITO layer of each embodiment and comparative example, cross-cut tester method of testing is adopted to test the adherence of ITO layer and optical adjustment layer and layers of copper in the nesa coating of these embodiments and comparative example, the fine or not degree of adherence is represented with nF, n is larger, adherence is better, and concrete test result is in table 2.
Table 2
Known according to table 2: when in the first noncrystalline ITO layer and/or the second noncrystalline ITO layer, the weight content of Sn is 7% ~ 30%, preferably between 8% ~ 20%, be more preferably 15%, the thickness of the first noncrystalline ITO layer is between 1 ~ 15nm, and the thickness of the second noncrystalline ITO layer is between 1 ~ 10nm; In crystallization ITO layer, the weight content of Sn is 1% ~ 7%, and its thickness is between 5 ~ 25nm; The refractive index of the first optical adjustment layer is between 1.55 ~ 3.00, and thickness is between 5nm ~ 10 μm; The refractive index of the second optical adjustment layer is between 1.10 ~ 1.55, and thickness is between 5 ~ 500nm; The thickness of the second hardened layer is between 0.3 ~ 50 μm; Large 0.1 ~ 5 μm of the thickness of Thickness Ratio second hardened layer of the first hardened layer, the pencil hardness of the first hardened layer is between 4B ~ 9H, the shrinkage factor in its mechanical movement direction is greater than 0 and is less than or equal to 0.5%, and the shrinkage factor perpendicular to mechanical movement direction is greater than 0 and is less than or equal to 0.1%; The full light transmission rate of transparent substrate layer is greater than 85%, its thickness is between 10 ~ 500 μm, the shrinkage factor in its mechanical movement direction is greater than 0 and is less than or equal to 0.5%, and the shrinkage factor perpendicular to mechanical movement direction is greater than 0 when being less than or equal to 0.1%, and the impedance of nesa coating is less; Adherence is better, and its low three-dimensional line effect is also better, and its manufacturing process only needs 3 road techniques, and technique is simple, and production cost is lower.
As can be seen from the above description, the above embodiments of the present invention achieve following technique effect:
ITO layer in the nesa coating of the application adopts the first noncrystalline ITO layer, the three-decker of the composition of crystallization ITO layer and the second noncrystalline ITO layer replaces individual layer crystallization ITO layer of the prior art, the noncrystalline ITO layer increased is after the heat treatment process in later stage, crystalline state can not be become from non-crystalline, but maintenance non-crystalline, shrinkage factor remains unchanged, make the deformation of noncrystalline ITO layer before and after etching and heating less, stress difference between each layer reduces greatly, on the one hand, alleviate the problem that the three-dimensional line of transparent conductive film is serious, obtain the capacitive touch screen transparent conductive film of low three-dimensional line, on the other hand, the silver in noncrystalline ITO layer and transparent substrate layer and subsequent technique or copper conduct electricity printed layers good adherence, ensure that nesa coating has good performance, improves the continuity of explained hereafter.Meanwhile, the impedance of noncrystalline ITO layer is lower, the demand making it meet touch panel device in prior art to maximize, and extends its application in maximization touch-control produce market; In addition, the manufacture craft of this nesa coating is comparatively simple, reduces manufacturing a finished product of nesa coating.
Nesa coating in the capacitive touch screen of the application has low three-dimensional line, the requirement of client can be met, simultaneously because the impedance of the nesa coating in this capacitive touch screen is lower, capacitive touch screen can be realized in large size, and then meet the demand that in prior art, touch panel device maximizes; In addition, the production technology of the nesa coating of this capacitive touch screen is comparatively simple, makes the production cost of capacitive touch screen also lower.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for a person skilled in the art, the present invention can have various modifications and variations.Within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (16)
1. a nesa coating, comprise transparent substrate layer (20) and the ITO layer (60) be arranged on described transparent substrate layer (20) surface, it is characterized in that, described ITO layer (60) comprising:
First noncrystalline ITO layer (61), is arranged on the surface of described transparent substrate layer (20);
Crystallization ITO layer (62), is arranged on the surface away from described transparent substrate layer (20) of described first noncrystalline ITO layer (61); And
Second noncrystalline ITO layer (63), is arranged on the surface away from described first noncrystalline ITO layer (61) of described crystallization ITO layer (62).
2. nesa coating according to claim 1, it is characterized in that, the weight content of described first noncrystalline ITO layer (61) and/or the middle Sn of the second noncrystalline ITO layer (63) is 7% ~ 30%, and in further preferred described crystallization ITO layer (62), the weight content of Sn is 1% ~ 7%.
3. nesa coating according to claim 1 and 2, is characterized in that, the thickness of described first noncrystalline ITO layer (61) between 1 ~ 15nm, preferably between 5 ~ 10nm.
4. nesa coating according to claim 3, is characterized in that, the thickness of described crystallization ITO layer (62) between 5 ~ 25nm, preferably between 10 ~ 20nm.
5. nesa coating according to claim 4, is characterized in that, the thickness of described second noncrystalline ITO layer (63) between 1 ~ 10nm, preferably between 1 ~ 5nm.
6. nesa coating according to claim 1 or 5, it is characterized in that, described nesa coating also comprises:
First optical adjustment layer (40), is arranged between described transparent substrate layer (20) and described first noncrystalline ITO layer (61); And
Second optical adjustment layer (50), is arranged between described first optical adjustment layer (40) and described first noncrystalline ITO layer (61).
7. nesa coating according to claim 6, it is characterized in that, the refractive index of described first optical adjustment layer (40) is between 1.55 ~ 3.00, preferably between 1.60 ~ 2.80, preferably the thickness of described first optical adjustment layer (40) is between 5nm ~ 10 μm further, further preferred between 10nm ~ 5 μm.
8. nesa coating according to claim 6, it is characterized in that, the refractive index of described second optical adjustment layer (50) is between 1.10 ~ 1.55, preferably between 1.20 ~ 1.50, the thickness of described second optical adjustment layer (50) is between 5 ~ 500nm further, further preferred between 10 ~ 300nm.
9. nesa coating according to claim 6, it is characterized in that, described first optical adjustment layer (40) is selected from the one in titanium dioxide layer, zirconia layer and niobium pentaoxide layer, preferably described second optical adjustment layer (50) is selected from magnesium fluoride layer, fluoridizes the one in calcium layer and silicon dioxide layer.
10. nesa coating according to claim 6, it is characterized in that, described nesa coating also comprise be arranged on described transparent substrate layer (20) away from the first hardened layer (10) on the surface of the first optical adjustment layer (40).
11. nesa coatings according to claim 10, is characterized in that, the pencil hardness of described first hardened layer (10) between 4B ~ 9H, preferably between 2B ~ 5H.
12. nesa coatings according to claim 10, is characterized in that, described nesa coating also comprises the second hardened layer (30) be arranged between transparent substrate layer (20) and described first optical adjustment layer (40).
13. nesa coatings according to claim 12, it is characterized in that, the thickness of described second hardened layer (30) is between 0.3 ~ 50 μm, preferably between 0.5 ~ 5 μm, large 0.1 ~ 5.0 μm of the thickness of preferred Thickness Ratio second hardened layer (30) of described first hardened layer (10) further, further large 0.3 ~ 1.5 μm of the thickness of preferred Thickness Ratio second hardened layer (30) of described first hardened layer (10).
14. nesa coatings according to claim 1, it is characterized in that, the full light transmission rate of described transparent substrate layer (20) is greater than 85%, and the thickness of preferred described transparent substrate layer (20) is between 10 ~ 500 μm, preferred between 20 ~ 200 μm further.
15. nesa coatings according to claim 12, it is characterized in that, the shrinkage factor in the mechanical movement direction of described transparent substrate layer (20) is greater than 0 and is less than or equal to 0.5%, and the shrinkage factor perpendicular to described mechanical movement direction is greater than 0 and is less than or equal to 0.1%.
16. 1 kinds of capacitive touch screens, comprise nesa coating, it is characterized in that, the nesa coating of described nesa coating according to any one of claim 1 to 15.
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