CN104951169A - Transparent conductive film and capacitive touch screen comprising same - Google Patents
Transparent conductive film and capacitive touch screen comprising same Download PDFInfo
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- CN104951169A CN104951169A CN201510404993.3A CN201510404993A CN104951169A CN 104951169 A CN104951169 A CN 104951169A CN 201510404993 A CN201510404993 A CN 201510404993A CN 104951169 A CN104951169 A CN 104951169A
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Abstract
The invention provides a transparent conductive film and a capacitive touch screen comprising the same. The transparent conductive film comprises a first hardened layer, a transparent substrate layer, a second hardened layer and an amorphous ITO (indium tin oxide) layer, wherein the transparent substrate layer is arranged on the surface of the first hardened layer, the shrinkage of the transparent substrate layer in the machine direction is larger than 0 and smaller than or equal to 0.5%, and the shrinkage in the transverse direction is larger than 0 and smaller than or equal to 0.1%; the second hardened layer is arranged on the surface, far from the first hardened layer, of the transparent substrate layer; the amorphous ITO layer is arranged on the surface, far from the transparent substrate layer, of the second hardened layer. The transparent conductive film has the characteristics of low solid lines, low impedance, low cost, simple preparation process and the like.
Description
Technical field
The present invention relates to touch-screen field, in particular to a kind of nesa coating and the capacitive touch screen comprising it.
Background technology
Existing capacitive touch screen nesa coating, after etching and thermal treatment, there will be three-dimensional line, cannot meet the demand of part high-end customer
Three-dimensional line producing cause mainly because: the etching part of (1) ITO layer (indium tin oxide layer) and non-etched part create optical characteristics difference (comprise within the scope of visible light through and reflection characteristic, referred to as aberration), thus produce solid grain, (2) in the Technology for Heating Processing in later stage, difference because of the percent thermal shrinkage of each layer there will be painting inter-laminar stress and does not mate phenomenon, this is because the composition comparison in difference between ITO layer and transparent substrate layer and hardened layer is large, the stress existed each other is larger, especially ITO layer becomes the crystalline state after heating from the non-crystalline before heating, the stress between ITO layer and transparent substrate layer and hardened layer can be caused to increase, and then cause the stress between etching part and transparent substrate layer and hardened layer and the stress difference between non-etched part and organic layer to increase further, thus cause increasing the weight of of three-dimensional line.
Existing patent and document mainly use hardened layer that percent thermal shrinkage is less and transparent substrate layer to form nesa coating, be further used as the making material of capacitive touch screen, but, after ITO layer etching, nesa coating still can produce three-dimensional line, makes capacitive touch screen be not enough to meet the demand of client.
Therefore, a kind of nesa coating of low three-dimensional line is needed badly.
Summary of the invention
Fundamental purpose of the present invention is to provide a kind of nesa coating and the capacitive touch screen comprising it, to solve the problem more serious with the three-dimensional line of the capacitive touch screen comprising it of nesa coating in prior art.
To achieve these goals, according to an aspect of the present invention, provide a kind of nesa coating, this nesa coating comprises: the first hardened layer, transparent substrate layer, the second hardened layer and noncrystalline ITO layer.Wherein, above-mentioned transparent substrate layer is arranged on the surface of above-mentioned first hardened layer, and the shrinkage factor in the mechanical movement direction of above-mentioned transparent substrate layer is greater than 0 and is less than or equal to 0.5%, and the shrinkage factor perpendicular to above-mentioned mechanical movement direction is greater than 0 and is less than or equal to 0.1%; Second hardened layer is arranged on the surface away from above-mentioned first hardened layer of above-mentioned transparent substrate layer; Noncrystalline ITO layer, is arranged on the surface away from above-mentioned transparent substrate layer of above-mentioned second hardened layer.
Further, in above-mentioned noncrystalline ITO layer, the weight content of Sn is 7% ~ 30%, is preferably 8% ~ 20%, is more preferably 15%.
Further, the thickness of above-mentioned noncrystalline ITO layer between 10 ~ 100nm, preferably between 15 ~ 40nm.
Further, the refractive index of above-mentioned second hardened layer is between 1.59 ~ 1.80.
Further, the pencil hardness of above-mentioned second hardened layer between 3B ~ 4H, preferably between B ~ 3H.
Further, the thickness of above-mentioned second hardened layer between 0.3 ~ 10 μm, preferably between 0.5 ~ 3.0 μm.
Further, the pencil hardness of above-mentioned first hardened layer (10) between 3B ~ 4H, preferably between B ~ 3H.
Further, large 0.1 ~ 0.5 μm of the thickness of above-mentioned second hardened layer of the Thickness Ratio of above-mentioned first hardened layer.
Further, the full light transmission rate of above-mentioned transparent substrate layer is greater than 85%, and the thickness of preferred above-mentioned transparent substrate layer is between 10 ~ 500 μm, preferred between 20 ~ 200 μm further.
According to a further aspect in the invention, provide a kind of capacitive touch screen, this capacitive touch screen comprises above-mentioned nesa coating.
Apply technical scheme of the present invention, nesa coating replaces crystallization ITO layer of the prior art by adopting noncrystalline ITO layer, after the heat treatment process in later stage, noncrystalline ITO layer can not become crystalline state from non-crystalline, but maintenance non-crystalline, the shrinkage factor of noncrystalline ITO layer is remained unchanged, and then the stress difference etching and heat between each layer in front and back is reduced greatly, simultaneously, adopt the transparent substrate layer compared with low-shrinkage, further reduce the stress difference between each layer before and after etching and heating, effectively alleviate the problem that the three-dimensional line of transparent conductive film is serious, obtain the capacitive touch screen transparent conductive film of low three-dimensional line, further, the impedance of noncrystalline ITO layer is lower, the demand making it meet touch panel device in prior art to maximize, and extends its application in maximization touch-control produce market, in addition, the manufacture craft of this nesa coating is comparatively simple, reduces manufacturing a finished product of nesa coating.
Accompanying drawing explanation
The Figure of description forming a application's part is used to provide a further understanding of the present invention, and schematic description and description of the present invention, for explaining the present invention, does not form inappropriate limitation of the present invention.In the accompanying drawings:
Fig. 1 shows the cross-sectional view that a kind of exemplary embodiment of the application according to the present invention provides nesa coating.
Embodiment
It should be noted that, when not conflicting, the embodiment in the application and the feature in embodiment can combine mutually.Below with reference to the accompanying drawings and describe the present invention in detail in conjunction with the embodiments.
The typical embodiment of one of the application provides a kind of nesa coating, and as shown in Figure 1, this nesa coating comprises: the first hardened layer 10, transparent substrate layer 30, second hardened layer 50 and noncrystalline ITO layer 70.Wherein, above-mentioned transparent substrate layer 30 is arranged on the surface of above-mentioned first hardened layer 10, and the shrinkage factor in the mechanical movement direction of above-mentioned transparent substrate layer 30 is greater than 0 and is less than or equal to 0.5%, and the shrinkage factor perpendicular to mechanical movement direction is greater than 0 and is less than or equal to 0.1%; Second hardened layer 50 is arranged on the surface away from above-mentioned first hardened layer 10 of above-mentioned transparent substrate layer 30; Noncrystalline ITO layer 70 is arranged on the surface away from above-mentioned transparent substrate layer 30 of above-mentioned second hardened layer 50.
Crystallization ITO refers to a kind of ITO that can be become crystalline state in heat treatment process from non-crystalline; Noncrystalline ITO of the present invention refers to a kind of ITO that can not be become crystalline state after heat treatment process from non-crystalline.
Above-mentioned nesa coating replaces crystallization ITO layer of the prior art by adopting noncrystalline ITO layer 70, after the heat treatment process in later stage, noncrystalline ITO layer 70 can not become crystalline state from non-crystalline, but maintenance non-crystalline, the shrinkage factor of noncrystalline ITO layer 70 is remained unchanged, and then the stress difference etching and heat between each layer in front and back is reduced greatly, simultaneously, mechanical movement direction (the Machine Direction of transparent substrate layer 30, MD, also claim mechanical stretching direction) shrinkage factor be greater than 0 and be less than or equal to 0.5%, perpendicular to mechanical movement direction (Transverse Direction, TD, also claim perpendicular to mechanical stretching direction) shrinkage factor be greater than 0 and be less than or equal to 0.1%, adopt the transparent substrate layer 30 compared with low-shrinkage, the stress difference between each layer before and after etching and heating can be further reduced, effectively alleviate the problem that the three-dimensional line of transparent conductive film is serious, obtain the capacitive touch screen transparent conductive film of low three-dimensional line, further, the impedance of noncrystalline ITO layer 70 is lower, the demand making it meet touch panel device in prior art to maximize, and extends its application in maximization touch-control produce market, in addition, the manufacture craft of this nesa coating is comparatively simple, reduces manufacturing a finished product of nesa coating.
In order to make nesa coating have lower three-dimensional line, in the preferred above-mentioned noncrystalline ITO layer 70 of the application, the weight content of Sn is 7% ~ 30%.When the weight content of the Sn in noncrystalline ITO layer 70 is greater than 7%, can ensure that ITO is non-crystallizable further, thus make nesa coating reach better low three-dimensional line effect; When the weight content of the Sn in noncrystalline ITO layer 70 is less than 30%, the impedance of noncrystalline ITO layer 70 is less, and meanwhile, its penetrability is higher, improves the optical characteristics of nesa coating.In order to ensure low three-dimensional line effect and the optical characteristics of transparent conductive film further, in the further preferred noncrystalline ITO layer 70 of the application, the weight content of Sn is 8% ~ 20%, and more preferably in noncrystalline ITO layer 70, the weight content of Sn is 15%.
In the another kind of preferred embodiment of the application, the thickness of above-mentioned noncrystalline ITO layer 70 is between 10 ~ 100nm, when the thickness of noncrystalline ITO layer 70 is greater than 10nm, the impedance of noncrystalline ITO layer 70 is less, can meet the requirement of nesa coating to impedance better; When the thickness of noncrystalline ITO layer 70 is less than 100nm, the impedance of nesa coating can be made equally less, and the outward appearance of nesa coating is better.In order to obtain the lower and better nesa coating of outward appearance of impedance further, the thickness of the further preferred above-mentioned noncrystalline ITO layer 70 of the application is at 15 ~ 40nm.
In order to reduce to etch the optical characteristics difference (comprise within the scope of visible light through the difference with reflection characteristic) produced between rear etched portions and non-etched portions, the further three-dimensional line phenomenon improving nesa coating, and then obtaining the nesa coating of lower three-dimensional line, the refractive index of preferred above-mentioned second hardened layer 50 of the application is between 1.59 ~ 1.80.The refractive index of the second hardened layer 50 is within the scope of this, the effect better reducing aberration can be reached, and the material of refractive index within the scope of this is easy to obtain, in order to improve the three-dimensional line phenomenon of nesa coating further, preferably the refractive index of above-mentioned second hardened layer 50 is between 1.59 ~ 1.75.
In another preferred embodiment of the application, the pencil hardness of above-mentioned second hardened layer 50 is between 3B ~ 4H, and when the hardness of the second hardened layer 50 is greater than 3B, its hardness is comparatively large, can play a protective role better; When its hardness is less than 4H, himself rolling is easier to and cost of manufacture is lower.In order to the protective value that ensures the second hardened layer 50 further with maintain lower production cost, further preferably the pencil hardness of the second hardened layer 50 between B ~ 3H.
In order to ensure the protective value to nesa coating of the second hardened layer 50 further, consider production cost simultaneously, preferably the thickness of the second hardened layer 50 is between 0.3 ~ 10 μm, and when the thickness of this layer is greater than 0.3 μm, it can play the effect of other layer of protection nesa coating preferably; And when its thickness is less than 10 μm, production cost can be reduced further.In order to ensure that the second hardened layer 50 can play a good protection further, meanwhile, ensure that further its production cost is lower, the thickness of preferred the second hardened layer 50 of the application is between 0.5 ~ 3.0 μm.
In another preferred embodiment of the application, large 0.1 ~ 0.5 μm of the thickness of above-mentioned second hardened layer 50 of Thickness Ratio of above-mentioned first hardened layer 10, in order to alleviate the second hardened layer 50, the STRESS VARIATION brought when the formation of amorphism ITO layer and subsequent heating process process, utilize the large part out of the thickness of the first hardened layer 10 to the second hardened layer 50 can balance the stress of the upper and lower surface of transparent substrate layer 30, nesa coating warpage can be prevented, improve the effect of three-dimensional line further.
Equally, in order to ensure that the first hardened layer 10 can play a protective role to other layer in nesa coating further, ensure that its production cost is lower simultaneously, the pencil hardness of preferred above-mentioned first hardened layer 10 of the application between 3B ~ 4H, preferably between B ~ 3H.
In another preferred embodiment of the application, large 0.5 ~ 3 μm of the thickness of Thickness Ratio second hardened layer 50 of the first hardened layer 10 of above-mentioned nesa coating, just can play the effects such as high temperature resistant, the damage resistant of high temperature protection film without coated with high temperature diaphragm in such plated film and etching process; Meanwhile, this nesa coating does not need coated with high temperature diaphragm, simplifies technological process, reduces production cost, can meet the demand of numerous clients.
In another preferred embodiment of the application, the full light transmission rate of above-mentioned transparent substrate layer 30 is greater than 85%, and transmitance is greater than 85%, can meet the requirement of client better.Transparent substrate layer 30 in the application refers to and is generally the thin layer of transparent plastic that each manufacturer produces and comprises pet layer, TAC layer, PC layer, PE layer or PP layer, but is not only confined to these transparent substrate layer 30.
In order to guarantee the technique realizability of transparent substrate layer 30 further, consider the rolling performance of layer transparent substrate layer 30 simultaneously, the thickness of the preferred above-mentioned transparent substrate layer 30 of the application is between 10 ~ 500 μm, the THICKNESS CONTROL of transparent substrate layer 30 is within the scope of this, the difficulty further ensuring preparation technology is lower, cost is lower, and the rolling of transparent substrate layer 30 is easier to.After further contemplating existing production status and production cost, the thickness of further preferred above-mentioned transparent substrate layer 30 is between 20 ~ 200 μm.
In the another kind of preferred embodiment of the application, in order to make the low three-dimensional line better effects if of nesa coating, can also to transparent substrate layer 30 and the first hardened layer 10 do resistance to thermal treatment.
In another preferred embodiment of the application, provide a kind of capacitive touch screen, this capacitive touch screen comprises nesa coating, and this nesa coating is above-mentioned nesa coating.
Nesa coating in this capacitive touch screen has low three-dimensional line, the requirement of client can be met, simultaneously because the impedance of the nesa coating in this capacitive touch screen is lower, capacitive touch screen can be realized in large size, and then meet the demand that in prior art, touch panel device maximizes; In addition, the production technology of the nesa coating of this capacitive touch screen is comparatively simple, makes the production cost of capacitive touch screen also lower.
In order to the technical scheme allowing those skilled in the art clearly understand the application, be described below with reference to embodiment and comparative example.
Embodiment 1
On the surface of transparent substrate layer 30, coating is selected from the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, drying, and the first hardened layer 10 is made in solidification.Then profit in the same way, and the model being selected from Japanese DIC company in the coating of the surface away from above-mentioned first hardened layer 10 of transparent substrate layer 30 is the hardening bath of PC13-1082, makes the second hardened layer 50.
Utilize magnetron sputtering technique, at the second hardened layer 50 away from plated film on the surface of above-mentioned transparent substrate layer 30, obtain amorphism ITO layer, formed the nesa coating shown in Fig. 1.
Adopt the noncrystalline ITO layer 70 of ink wire mark etching method to nesa coating to etch, then, toast it, baking temperature is 150 DEG C, and the time is 60min.The concrete structure parameter of nesa coating is in table 1.
Embodiment 2
The method identical with embodiment 1 is adopted to prepare the nesa coating shown in Fig. 1, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, and the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661.The concrete structure parameter of nesa coating is in table 1.
Embodiment 3
The method identical with embodiment 1 is adopted to prepare the nesa coating shown in Fig. 1, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 4
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 5
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 6
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 7
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 8
Adopt the method identical with embodiment 1 to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, and wherein, transparent substrate layer 30 is Di Ren E.I.Du Pont Company model is the pet layer of KEL86W; The hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001; The hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 9
Adopt the method identical with embodiment 1 to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, and wherein, transparent substrate layer 30 is Di Ren E.I.Du Pont Company model is the pet layer of KEL86W; The hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, and the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 10
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath of cloth first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 11
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 12
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 13
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese DIC company is the hardening bath of PC13-1082, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Embodiment 14
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the hardening bath being coated with the first hardened layer 10 is the model of Japanese DIC company is the hardening bath of PC13-1082, the hardening bath being coated with the second hardened layer 50 is the model of Japanese JSR company is the hardening bath of KZ6661, forms the nesa coating shown in Fig. 1.The concrete structure parameter of nesa coating is in table 1.
Comparative example 1
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, it is the pet layer of U483 that transparent substrate layer is selected from toray company model, the hardening bath being coated with the first hardened layer is the model of Japanese DIC company is the hardening bath of PC13-1082, the hardening bath being coated with the second hardened layer is the model of Japanese DIC company is the hardening bath of PC13-1082, and the concrete structure parameter of nesa coating is in table 1.
Comparative example 2
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, the model that transparent substrate layer is selected from Di Ren E.I.Du Pont Company is the pet layer of KEL86W, the hardening bath being coated with the first hardened layer is the model of Japanese DIC company is the hardening bath of PC13-1082, the hardening bath being coated with the second hardened layer is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, and the concrete structure parameter of nesa coating is in table 1.
Comparative example 3
The method identical with embodiment 1 is adopted to prepare nesa coating, the structural parameters of the nesa coating prepared are in table 1, wherein, it is the pet layer of U483 that transparent substrate layer is selected from toray company model, the hardening bath being coated with the first hardened layer is the model of Japanese Huang Chuan chemical company is the hardening bath of FZ001, the hardening bath being coated with the second hardened layer is the model of Japanese JSR company is the hardening bath of KZ6661, and the concrete structure parameter of nesa coating is in table 1.
Table 1
The OCA glue-line of 50 μm of the nesa coating LG chemical company of all embodiments and comparative example and gorilla tempered glass are fit together, noncrystalline ITO layer contacts with gorilla tempered glass, the visual judgement carrying out the three-dimensional line of nesa coating, adopts four probe method to test its impedance.Concrete test result is in table 2, and wherein, the effect of three-dimensional line improves gradually according to the order of A, B, C.
Table 2
Known according to table 2: when the weight content of Sn is 7% ~ 30% in noncrystalline ITO layer, preferably between 8% ~ 20%, be more preferably 15%, its thickness is between 10 ~ 100nm; The refractive index of the second hardened layer is between 1.59 ~ 1.80, and its pencil hardness is between 3B ~ 4H, and its thickness is between 0.3 ~ 10 μm; Large 0.1 ~ 0.5 μm of the thickness of Thickness Ratio second hardened layer of the first hardened layer, the pencil hardness of the first hardened layer is between 3B ~ 4H; The full light transmission rate of transparent substrate layer is greater than 85%, its thickness is between 10 ~ 500 μm, the shrinkage factor in its mechanical movement direction is greater than 0 and is less than or equal to 0.5%, shrinkage factor perpendicular to mechanical movement direction is greater than 0 when being less than or equal to 0.1%, the impedance of nesa coating is less, and its low three-dimensional line effect is also better, and its manufacturing process only needs 3 road techniques, technique is simple, and production cost is lower.
As can be seen from the above description, the above embodiments of the present invention achieve following technique effect:
Above-mentioned nesa coating replaces crystallization ITO layer of the prior art by adopting noncrystalline ITO layer, noncrystalline ITO layer is after the heat treatment process in later stage, crystalline state can not be become from non-crystalline, but maintenance non-crystalline, and then the shrinkage factor of noncrystalline ITO layer is remained unchanged, and then the stress difference etching and heat between each layer in front and back is reduced greatly, simultaneously, adopt the transparent substrate layer compared with low-shrinkage, further reduce the stress difference between each layer before and after etching and heating, effectively alleviate the problem that the three-dimensional line of transparent conductive film is serious, obtain the capacitive touch screen transparent conductive film of low three-dimensional line, further, the impedance of noncrystalline ITO layer is lower, the demand making it meet touch panel device in prior art to maximize, and extends its application in maximization touch-control produce market, in addition, the manufacture craft of this nesa coating is comparatively simple, reduces manufacturing a finished product of nesa coating.
Nesa coating in this capacitive touch screen has low three-dimensional line, the requirement of client can be met, simultaneously because the impedance of the nesa coating in this capacitive touch screen is lower, capacitive touch screen can be realized in large size, and then meet the demand that in prior art, touch panel device maximizes; In addition, the production technology of the nesa coating of this capacitive touch screen is comparatively simple, makes the production cost of capacitive touch screen also lower.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for a person skilled in the art, the present invention can have various modifications and variations.Within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (10)
1. a nesa coating, is characterized in that, described nesa coating comprises:
First hardened layer (10);
Transparent substrate layer (30), be arranged on the surface of described first hardened layer (10), the shrinkage factor in the mechanical movement direction of described transparent substrate layer (30) is greater than 0 and is less than or equal to 0.5%, and the shrinkage factor perpendicular to described mechanical movement direction is greater than 0 and is less than or equal to 0.1%;
Second hardened layer (50), is arranged on the surface away from described first hardened layer (10) of described transparent substrate layer (30); And
Noncrystalline ITO layer (70), is arranged on the surface away from described transparent substrate layer (30) of described second hardened layer (50).
2. nesa coating according to claim 1, is characterized in that, in described noncrystalline ITO layer (70), the weight content of Sn is 7% ~ 30%, is preferably 8% ~ 20%, is more preferably 15%.
3. nesa coating according to claim 1 and 2, is characterized in that, the thickness of described noncrystalline ITO layer (70) between 10 ~ 100nm, preferably between 15 ~ 40nm.
4. nesa coating according to claim 3, is characterized in that, the refractive index of described second hardened layer (50) is between 1.59 ~ 1.80.
5. the nesa coating according to claim 1 or 4, is characterized in that, the pencil hardness of described second hardened layer (50) between 3B ~ 4H, preferably between B ~ 3H.
6. nesa coating according to claim 5, is characterized in that, the thickness of described second hardened layer (50) between 0.3 ~ 10 μm, preferably between 0.5 ~ 3.0 μm.
7. the nesa coating according to claim 1 or 6, is characterized in that, the pencil hardness of described first hardened layer (10) between 3B ~ 4H, preferably between B ~ 3H.
8. nesa coating according to claim 7, is characterized in that, large 0.1 ~ 0.5 μm of the thickness of the second hardened layer (50) described in the Thickness Ratio of described first hardened layer (10).
9. the nesa coating according to claim 1 or 8, it is characterized in that, the full light transmission rate of described transparent substrate layer (30) is greater than 85%, and the thickness of preferred described transparent substrate layer (30) is between 10 ~ 500 μm, preferred between 20 ~ 200 μm further.
10. a capacitive touch screen, comprises nesa coating, it is characterized in that, the nesa coating of described nesa coating according to any one of right 1 to 9.
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| CN112992408A (en) * | 2021-01-28 | 2021-06-18 | 中国乐凯集团有限公司 | Flexible composite transparent conductive film and preparation method and device thereof |
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| TW201510145A (en) * | 2013-06-28 | 2015-03-16 | Nitto Denko Corp | Pressure-sensitive adhesive composition, pressure-sensitive adhesive layer for transparent conductive layer, laminate, and image display device |
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| CN112992408A (en) * | 2021-01-28 | 2021-06-18 | 中国乐凯集团有限公司 | Flexible composite transparent conductive film and preparation method and device thereof |
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| CN104951169B (en) | 2019-03-15 |
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