JP2018081307A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2018081307A5 JP2018081307A5 JP2017206450A JP2017206450A JP2018081307A5 JP 2018081307 A5 JP2018081307 A5 JP 2018081307A5 JP 2017206450 A JP2017206450 A JP 2017206450A JP 2017206450 A JP2017206450 A JP 2017206450A JP 2018081307 A5 JP2018081307 A5 JP 2018081307A5
- Authority
- JP
- Japan
- Prior art keywords
- acetate
- forming method
- liquid
- pattern forming
- formation method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 24
- 239000007788 liquid Substances 0.000 claims 19
- 230000007261 regionalization Effects 0.000 claims 9
- 238000009835 boiling Methods 0.000 claims 6
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 claims 4
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 claims 4
- MLFHJEHSLIIPHL-UHFFFAOYSA-N isoamyl acetate Chemical compound CC(C)CCOC(C)=O MLFHJEHSLIIPHL-UHFFFAOYSA-N 0.000 claims 4
- 239000003960 organic solvent Substances 0.000 claims 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims 3
- 239000002904 solvent Substances 0.000 claims 3
- NKIZSFXAIKPBCL-UHFFFAOYSA-N 2,5-dichloro-3,6-dimethylpyrazine Chemical compound CC1=NC(Cl)=C(C)N=C1Cl NKIZSFXAIKPBCL-UHFFFAOYSA-N 0.000 claims 2
- XHIUFYZDQBSEMF-UHFFFAOYSA-N 2-methylbutyl acetate Chemical compound CCC(C)COC(C)=O XHIUFYZDQBSEMF-UHFFFAOYSA-N 0.000 claims 2
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 claims 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- 229940072049 amyl acetate Drugs 0.000 claims 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 claims 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 claims 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims 2
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 claims 2
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 claims 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical group CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 2
- 229940117955 isoamyl acetate Drugs 0.000 claims 2
- 150000002576 ketones Chemical class 0.000 claims 2
- TWSRVQVEYJNFKQ-UHFFFAOYSA-N pentyl propanoate Chemical compound CCCCCOC(=O)CC TWSRVQVEYJNFKQ-UHFFFAOYSA-N 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- GQKZRWSUJHVIPE-UHFFFAOYSA-N sec-amyl acetate Natural products CCCC(C)OC(C)=O GQKZRWSUJHVIPE-UHFFFAOYSA-N 0.000 claims 2
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 claims 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims 1
- 229940043232 butyl acetate Drugs 0.000 claims 1
- XUPYJHCZDLZNFP-UHFFFAOYSA-N butyl butanoate Chemical compound CCCCOC(=O)CCC XUPYJHCZDLZNFP-UHFFFAOYSA-N 0.000 claims 1
- JSLCOZYBKYHZNL-UHFFFAOYSA-N butylisobutyrate Chemical compound CCCCOC(=O)C(C)C JSLCOZYBKYHZNL-UHFFFAOYSA-N 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000004821 distillation Methods 0.000 claims 1
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- BGYICJVBGZQOCY-UHFFFAOYSA-N heptyl propanoate Chemical compound CCCCCCCOC(=O)CC BGYICJVBGZQOCY-UHFFFAOYSA-N 0.000 claims 1
- ZOCHHNOQQHDWHG-UHFFFAOYSA-N hexan-3-ol Chemical compound CCCC(O)CC ZOCHHNOQQHDWHG-UHFFFAOYSA-N 0.000 claims 1
- GOKKOFHHJFGZHW-UHFFFAOYSA-N hexyl propanoate Chemical compound CCCCCCOC(=O)CC GOKKOFHHJFGZHW-UHFFFAOYSA-N 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical group CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 claims 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106137910A TWI749094B (zh) | 2016-11-07 | 2017-11-02 | 處理液及圖案形成方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016217600 | 2016-11-07 | ||
| JP2016217600 | 2016-11-07 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018081307A JP2018081307A (ja) | 2018-05-24 |
| JP2018081307A5 true JP2018081307A5 (enrdf_load_stackoverflow) | 2019-04-11 |
| JP6759174B2 JP6759174B2 (ja) | 2020-09-23 |
Family
ID=62198025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017206450A Active JP6759174B2 (ja) | 2016-11-07 | 2017-10-25 | 処理液及びパターン形成方法 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6759174B2 (enrdf_load_stackoverflow) |
| TW (1) | TWI749094B (enrdf_load_stackoverflow) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020040034A1 (ja) * | 2018-08-20 | 2020-02-27 | 富士フイルム株式会社 | 薬液収容体 |
| CN112752746B (zh) * | 2018-09-28 | 2023-07-28 | 株式会社德山 | 氢氧化季铵的有机溶剂溶液的制造方法 |
| KR102837395B1 (ko) * | 2018-10-03 | 2025-07-23 | 후지필름 가부시키가이샤 | 약액 및 약액 수용체 |
| JP7221027B2 (ja) * | 2018-11-12 | 2023-02-13 | 東京応化工業株式会社 | レジスト組成物及びレジストパターン形成方法 |
| CN114080571B (zh) * | 2019-07-11 | 2025-04-04 | 默克专利股份有限公司 | 光致抗蚀剂去除剂组合物 |
| KR102724840B1 (ko) * | 2019-08-29 | 2024-11-01 | 후지필름 가부시키가이샤 | 패턴 형성 방법, 전자 디바이스의 제조 방법 |
| JP2021081545A (ja) * | 2019-11-18 | 2021-05-27 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ | レジストパターン間置換液、およびそれを用いたレジストパターンの製造方法 |
| IL310053A (en) * | 2021-07-14 | 2024-03-01 | Fujifilm Corp | A method for creating a template and a method for manufacturing an electronic device |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8900802B2 (en) * | 2013-02-23 | 2014-12-02 | International Business Machines Corporation | Positive tone organic solvent developed chemically amplified resist |
| CN107111253A (zh) * | 2014-12-26 | 2017-08-29 | 富士胶片株式会社 | 有机系处理液及图案形成方法 |
| JP2018072358A (ja) * | 2015-03-02 | 2018-05-10 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物及び感活性光線性又は感放射線性膜 |
-
2017
- 2017-10-25 JP JP2017206450A patent/JP6759174B2/ja active Active
- 2017-11-02 TW TW106137910A patent/TWI749094B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2018081307A5 (enrdf_load_stackoverflow) | ||
| JP2015055844A5 (enrdf_load_stackoverflow) | ||
| JP7053625B2 (ja) | 感活性光線性または感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 | |
| JP2020122985A5 (enrdf_load_stackoverflow) | ||
| AT413103B (de) | Iodoniumsalze als latente säurespender | |
| JP7029462B2 (ja) | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法 | |
| TW201239536A (en) | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device and electronic device | |
| JP2012208432A5 (enrdf_load_stackoverflow) | ||
| JP7076473B2 (ja) | 感活性光線性又は感放射線性樹脂組成物、レジスト膜、パターン形成方法、電子デバイスの製造方法、化合物 | |
| JP2019101417A (ja) | パターン形成方法 | |
| JP2009053657A5 (enrdf_load_stackoverflow) | ||
| JP2008268931A5 (enrdf_load_stackoverflow) | ||
| JP2008309879A5 (enrdf_load_stackoverflow) | ||
| JP2018081306A5 (enrdf_load_stackoverflow) | ||
| WO2010061977A3 (en) | Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method | |
| TW200715058A (en) | Positive resist composition and pattern-forming method using the same | |
| DE102013007913A1 (de) | Photosäureerzeuger, Photolack, der den Photosäureerzeuger umfasst, und beschichteter Gegenstand, der diesen umfasst | |
| JP2009042748A5 (enrdf_load_stackoverflow) | ||
| JP6898770B2 (ja) | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法 | |
| JP2003280202A5 (enrdf_load_stackoverflow) | ||
| JP2021076784A5 (enrdf_load_stackoverflow) | ||
| JP5611907B2 (ja) | ポジ型レジスト組成物及びパターン形成方法 | |
| JP2018189759A (ja) | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、パターン形成方法、及び電子デバイスの製造方法 | |
| WO2020261885A1 (ja) | 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、レジスト膜、電子デバイスの製造方法 | |
| CN108292097A (zh) | 图案形成方法、电子器件的制造方法、层叠膜及上层膜形成用组合物 |