JP2018063406A5 - - Google Patents
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- JP2018063406A5 JP2018063406A5 JP2016203033A JP2016203033A JP2018063406A5 JP 2018063406 A5 JP2018063406 A5 JP 2018063406A5 JP 2016203033 A JP2016203033 A JP 2016203033A JP 2016203033 A JP2016203033 A JP 2016203033A JP 2018063406 A5 JP2018063406 A5 JP 2018063406A5
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- JP
- Japan
- Prior art keywords
- reflective surface
- concave
- optical system
- projection optical
- convex
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003287 optical Effects 0.000 claims description 26
- 239000000758 substrate Substances 0.000 claims 3
- 238000005286 illumination Methods 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000005499 meniscus Effects 0.000 claims 1
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016203033A JP6635904B2 (ja) | 2016-10-14 | 2016-10-14 | 投影光学系、露光装置及び物品の製造方法 |
| TW106132027A TWI639063B (zh) | 2016-10-14 | 2017-09-19 | 投影光學系統、曝光裝置及物品製造方法 |
| TW107127048A TWI695232B (zh) | 2016-10-14 | 2017-09-19 | 投影光學系統、曝光裝置及物品製造方法 |
| KR1020170123990A KR102115279B1 (ko) | 2016-10-14 | 2017-09-26 | 투영 광학계, 노광 장치 및 물품 제조 방법 |
| US15/728,631 US10067325B2 (en) | 2016-10-14 | 2017-10-10 | Projection optical system, exposure apparatus, and article manufacturing method |
| CN202010697850.7A CN111665688A (zh) | 2016-10-14 | 2017-10-10 | 投影光学系统、曝光装置及物品制造方法 |
| CN201710934813.1A CN107957658B (zh) | 2016-10-14 | 2017-10-10 | 投影光学系统、曝光装置及物品制造方法 |
| US16/051,937 US10578846B2 (en) | 2016-10-14 | 2018-08-01 | Projection optical system, exposure apparatus, and article manufacturing method |
| KR1020200060144A KR102266723B1 (ko) | 2016-10-14 | 2020-05-20 | 투영 광학계, 노광 장치 및 물품 제조 방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016203033A JP6635904B2 (ja) | 2016-10-14 | 2016-10-14 | 投影光学系、露光装置及び物品の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019169552A Division JP2019211798A (ja) | 2019-09-18 | 2019-09-18 | 投影光学系、露光装置及び物品の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018063406A JP2018063406A (ja) | 2018-04-19 |
| JP2018063406A5 true JP2018063406A5 (US06195213-20010227-M00001.png) | 2019-05-16 |
| JP6635904B2 JP6635904B2 (ja) | 2020-01-29 |
Family
ID=61903819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016203033A Active JP6635904B2 (ja) | 2016-10-14 | 2016-10-14 | 投影光学系、露光装置及び物品の製造方法 |
Country Status (5)
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6635904B2 (ja) * | 2016-10-14 | 2020-01-29 | キヤノン株式会社 | 投影光学系、露光装置及び物品の製造方法 |
| US11754822B2 (en) | 2018-08-01 | 2023-09-12 | Samsung Electro-Mechanics Co., Ltd. | Optical imaging system |
| JP2021015141A (ja) * | 2019-07-10 | 2021-02-12 | キヤノン株式会社 | 光学装置、投影光学系、露光装置、および、物品の製造方法 |
| KR102258458B1 (ko) * | 2019-07-20 | 2021-05-28 | 한남대학교 산학협력단 | 주간과 야간에 동시에 사용할 수 있으며 배율변화가 가능한 전방위 줌 광학계 |
| JP7332415B2 (ja) * | 2019-10-01 | 2023-08-23 | キヤノン株式会社 | 投影光学系、走査露光装置および物品製造方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3748015A (en) * | 1971-06-21 | 1973-07-24 | Perkin Elmer Corp | Unit power imaging catoptric anastigmat |
| JPS6039205B2 (ja) | 1975-07-02 | 1985-09-05 | キヤノン株式会社 | 反射光学系 |
| US4812028A (en) * | 1984-07-23 | 1989-03-14 | Nikon Corporation | Reflection type reduction projection optical system |
| US4711535A (en) * | 1985-05-10 | 1987-12-08 | The Perkin-Elmer Corporation | Ring field projection system |
| DE69121133T2 (de) * | 1990-04-20 | 1996-12-12 | Dainippon Screen Mfg | Objektivlinsensystem zur Anwendung in einem Mikroskop |
| US5078502A (en) | 1990-08-06 | 1992-01-07 | Hughes Aircraft Company | Compact afocal reimaging and image derotation device |
| JPH0553057A (ja) * | 1991-08-26 | 1993-03-05 | Nikon Corp | 反射光学系 |
| JP3348467B2 (ja) | 1993-06-30 | 2002-11-20 | 株式会社ニコン | 露光装置及び方法 |
| US6072852A (en) | 1998-06-09 | 2000-06-06 | The Regents Of The University Of California | High numerical aperture projection system for extreme ultraviolet projection lithography |
| DE19910724A1 (de) * | 1999-03-11 | 2000-09-14 | Zeiss Carl Fa | Mikrolithographie-Projektionsobjektiveinrichtung sowie Projektionsbelichtungsanlage |
| JP2002329655A (ja) * | 2001-05-01 | 2002-11-15 | Canon Inc | 反射型縮小投影光学系、露光装置及びデバイス製造方法 |
| JP2003243277A (ja) * | 2002-02-13 | 2003-08-29 | Canon Inc | 反射型縮小投影光学系、露光装置及びデバイス製造方法 |
| JP2004029625A (ja) * | 2002-06-28 | 2004-01-29 | Nikon Corp | 投影光学系、露光装置及び露光方法 |
| JP3938040B2 (ja) * | 2002-12-27 | 2007-06-27 | キヤノン株式会社 | 反射型投影光学系、露光装置及びデバイス製造方法 |
| KR101647934B1 (ko) * | 2003-05-06 | 2016-08-11 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
| EP1513019B1 (en) * | 2003-09-02 | 2012-07-25 | Canon Kabushiki Kaisha | Projection optical system, exposure apparatus and device fabricating method |
| GB0423595D0 (en) * | 2004-10-23 | 2004-11-24 | Qinetiq Ltd | Scanning imaging apparatus |
| US7470033B2 (en) * | 2006-03-24 | 2008-12-30 | Nikon Corporation | Reflection-type projection-optical systems, and exposure apparatus comprising same |
| JP5196869B2 (ja) | 2007-05-15 | 2013-05-15 | キヤノン株式会社 | 投影光学系、露光装置及びデバイス製造方法 |
| JP5654735B2 (ja) | 2008-05-15 | 2015-01-14 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結像光学器械及びその結像光学器械を含む投影露光装置 |
| DE102010004827A1 (de) * | 2009-01-21 | 2010-09-30 | Carl Zeiss Smt Ag | Katadioptrische Pupillen-Relaysysteme |
| JP2011039172A (ja) * | 2009-08-07 | 2011-02-24 | Canon Inc | 露光装置およびデバイス製造方法 |
| US8743342B2 (en) * | 2009-11-17 | 2014-06-03 | Nikon Corporation | Reflective imaging optical system, exposure apparatus, and method for producing device |
| JP5782336B2 (ja) | 2011-08-24 | 2015-09-24 | キヤノン株式会社 | 投影光学系、露光装置及びデバイス製造方法 |
| CN103135356B (zh) * | 2011-11-23 | 2015-04-15 | 上海微电子装备有限公司 | 反射式光刻投影物镜 |
| JP6635904B2 (ja) * | 2016-10-14 | 2020-01-29 | キヤノン株式会社 | 投影光学系、露光装置及び物品の製造方法 |
-
2016
- 2016-10-14 JP JP2016203033A patent/JP6635904B2/ja active Active
-
2017
- 2017-09-19 TW TW107127048A patent/TWI695232B/zh active
- 2017-09-19 TW TW106132027A patent/TWI639063B/zh active
- 2017-09-26 KR KR1020170123990A patent/KR102115279B1/ko active IP Right Grant
- 2017-10-10 CN CN201710934813.1A patent/CN107957658B/zh active Active
- 2017-10-10 US US15/728,631 patent/US10067325B2/en not_active Expired - Fee Related
- 2017-10-10 CN CN202010697850.7A patent/CN111665688A/zh active Pending
-
2018
- 2018-08-01 US US16/051,937 patent/US10578846B2/en active Active
-
2020
- 2020-05-20 KR KR1020200060144A patent/KR102266723B1/ko active IP Right Grant
