JP2017538036A5 - - Google Patents

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Publication number
JP2017538036A5
JP2017538036A5 JP2017527320A JP2017527320A JP2017538036A5 JP 2017538036 A5 JP2017538036 A5 JP 2017538036A5 JP 2017527320 A JP2017527320 A JP 2017527320A JP 2017527320 A JP2017527320 A JP 2017527320A JP 2017538036 A5 JP2017538036 A5 JP 2017538036A5
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JP
Japan
Prior art keywords
holding device
cvd
pvd coating
gas inlet
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2017527320A
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English (en)
Japanese (ja)
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JP6647301B2 (ja
JP2017538036A (ja
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Publication date
Priority claimed from DE102014116991.3A external-priority patent/DE102014116991A1/de
Application filed filed Critical
Publication of JP2017538036A publication Critical patent/JP2017538036A/ja
Publication of JP2017538036A5 publication Critical patent/JP2017538036A5/ja
Application granted granted Critical
Publication of JP6647301B2 publication Critical patent/JP6647301B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2017527320A 2014-11-20 2015-11-18 大面積基板コーティング用ｃｖｄ又はｐｖｄ反応炉 Active JP6647301B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014116991.3 2014-11-20
DE102014116991.3A DE102014116991A1 (de) 2014-11-20 2014-11-20 CVD- oder PVD-Reaktor zum Beschichten großflächiger Substrate
PCT/EP2015/076972 WO2016079184A1 (de) 2014-11-20 2015-11-18 Cvd- oder pvd-reaktor zum beschichten grossflächiger substrate

Publications (3)

Publication Number Publication Date
JP2017538036A JP2017538036A (ja) 2017-12-21
JP2017538036A5 true JP2017538036A5 (OSRAM) 2018-03-29
JP6647301B2 JP6647301B2 (ja) 2020-02-14

Family

ID=54703945

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017527320A Active JP6647301B2 (ja) 2014-11-20 2015-11-18 大面積基板コーティング用ｃｖｄ又はｐｖｄ反応炉

Country Status (8)

Country Link
US (1) US10822701B2 (OSRAM)
EP (1) EP3221490B1 (OSRAM)
JP (1) JP6647301B2 (OSRAM)
KR (1) KR20170084278A (OSRAM)
CN (1) CN107109649B (OSRAM)
DE (1) DE102014116991A1 (OSRAM)
TW (1) TWI684482B (OSRAM)
WO (1) WO2016079184A1 (OSRAM)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015118765A1 (de) 2014-11-20 2016-06-09 Aixtron Se Vorrichtung zum Beschichten eines großflächigen Substrats
DE102015101461A1 (de) 2015-02-02 2016-08-04 Aixtron Se Vorrichtung zum Beschichten eines großflächigen Substrats
GB201513339D0 (en) * 2015-07-29 2015-09-09 Pilkington Group Ltd Coating apparatus
DE102017105374A1 (de) 2017-03-14 2018-09-20 Aixtron Se Vorrichtung zum Abscheiden einer strukturierten Schicht auf einem Substrat sowie Verfahren zum Einrichten der Vorrichtung
DE102017105379A1 (de) 2017-03-14 2018-09-20 Aixtron Se Substrathalteranordnung mit Maskenträger
DE102017120529A1 (de) 2017-09-06 2019-03-07 Aixtron Se Vorrichtung zum Abscheiden einer strukturierten Schicht auf einem Substrat unter Verwendung einer Maske
JP7406503B2 (ja) 2018-04-30 2023-12-27 アイクストロン、エスイー 炭素含有コーティングにより基板をコーティングするための装置
CN112342529B (zh) * 2020-09-24 2022-12-06 杭州盾源聚芯半导体科技有限公司 一种具有连接头的喷射管
CN116288232B (zh) * 2023-03-09 2025-04-11 株洲三一硅能技术有限公司 泵盖组件及其pvd真空设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA735383B (en) * 1972-12-15 1975-03-26 Ppg Industries Inc Coating composition vaporizer
US3970037A (en) * 1972-12-15 1976-07-20 Ppg Industries, Inc. Coating composition vaporizer
JP3729939B2 (ja) * 1996-07-12 2005-12-21 松下電器産業株式会社 プラズマ処理方法及び装置
EP1193751B1 (en) * 1999-04-06 2006-05-17 Tokyo Electron Limited Electrode and method of manufacturing an electrode
JP5027667B2 (ja) 2004-11-24 2012-09-19 エリコン・ソーラー・アクチェンゲゼルシャフト，トリュープバッハ 超大面積基板用真空処理チャンバ
JP4749785B2 (ja) * 2005-07-19 2011-08-17 東京エレクトロン株式会社 ガス処理装置
US20080317973A1 (en) * 2007-06-22 2008-12-25 White John M Diffuser support
US20090098220A1 (en) * 2007-10-12 2009-04-16 Lance Ashworth Liquid pharmaceutical preparation comprising forskolin for promoting lean body mass
US8673080B2 (en) * 2007-10-16 2014-03-18 Novellus Systems, Inc. Temperature controlled showerhead
JP2010182729A (ja) * 2009-02-03 2010-08-19 Fuji Electric Holdings Co Ltd プラズマｃｖｄ装置
CN102953050B (zh) * 2011-08-26 2014-06-18 杭州士兰明芯科技有限公司 大直径mocvd反应器的喷淋头
DE102013101534A1 (de) 2013-02-15 2014-08-21 Aixtron Se Gasverteiler für einen CVD-Reaktor

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