JP2020153653A5 - - Google Patents
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- Publication number
- JP2020153653A5 JP2020153653A5 JP2019072318A JP2019072318A JP2020153653A5 JP 2020153653 A5 JP2020153653 A5 JP 2020153653A5 JP 2019072318 A JP2019072318 A JP 2019072318A JP 2019072318 A JP2019072318 A JP 2019072318A JP 2020153653 A5 JP2020153653 A5 JP 2020153653A5
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- pressure
- resistant container
- temperature control
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- 239000007788 liquid Substances 0.000 claims 4
- 239000000463 material Substances 0.000 claims 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 2
- 210000003298 dental enamel Anatomy 0.000 claims 2
- 239000001307 helium Substances 0.000 claims 2
- 229910052734 helium Inorganic materials 0.000 claims 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 238000010422 painting Methods 0.000 claims 2
- 238000007747 plating Methods 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019072318A JP2020153653A (ja) | 2019-03-18 | 2019-03-18 | 液体窒素、液体酸素、液体ヘリウム等の低温物質を使用した冷却温調装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019072318A JP2020153653A (ja) | 2019-03-18 | 2019-03-18 | 液体窒素、液体酸素、液体ヘリウム等の低温物質を使用した冷却温調装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2020153653A JP2020153653A (ja) | 2020-09-24 |
| JP2020153653A5 true JP2020153653A5 (OSRAM) | 2020-11-12 |
Family
ID=72558532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019072318A Pending JP2020153653A (ja) | 2019-03-18 | 2019-03-18 | 液体窒素、液体酸素、液体ヘリウム等の低温物質を使用した冷却温調装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2020153653A (OSRAM) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4822428B1 (OSRAM) * | 1970-10-20 | 1973-07-05 | ||
| JPH05296498A (ja) * | 1992-04-14 | 1993-11-09 | Mitsubishi Heavy Ind Ltd | 空気熱源ヒートポンプ |
| JPH06273024A (ja) * | 1993-03-16 | 1994-09-30 | Maeyama:Kk | 冷却用媒体器、これを用いた流体の冷却方法及び冷蔵室並びに冷蔵方法 |
| JPH08210746A (ja) * | 1995-02-06 | 1996-08-20 | Mitsubishi Heavy Ind Ltd | 携帯冷却装置 |
| JPH09287783A (ja) * | 1996-04-18 | 1997-11-04 | Mitsubishi Electric Corp | 放射空気調和装置 |
| US5960635A (en) * | 1998-03-03 | 1999-10-05 | Dakhil; Farouk | Air conditioning apparatus using liquid nitrogen |
| JP2010231419A (ja) * | 2009-03-26 | 2010-10-14 | Kobe Steel Ltd | 高温対応ｒｆｉｄタグ |
| JP5276507B2 (ja) * | 2009-04-09 | 2013-08-28 | 京セラ株式会社 | 基地局装置 |
| JP2018105612A (ja) * | 2016-12-22 | 2018-07-05 | 雄三 中西 | 液体循環型温度調整装置 |
-
2019
- 2019-03-18 JP JP2019072318A patent/JP2020153653A/ja active Pending
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