JP2017537219A - ナノ粒子コーティング装置 - Google Patents
ナノ粒子コーティング装置 Download PDFInfo
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- JP2017537219A JP2017537219A JP2017515984A JP2017515984A JP2017537219A JP 2017537219 A JP2017537219 A JP 2017537219A JP 2017515984 A JP2017515984 A JP 2017515984A JP 2017515984 A JP2017515984 A JP 2017515984A JP 2017537219 A JP2017537219 A JP 2017537219A
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- 239000002105 nanoparticle Substances 0.000 title claims abstract description 72
- 238000000576 coating method Methods 0.000 title claims abstract description 40
- 239000011248 coating agent Substances 0.000 title claims abstract description 36
- 239000000758 substrate Substances 0.000 claims abstract description 36
- 239000002082 metal nanoparticle Substances 0.000 claims abstract description 25
- 238000000034 method Methods 0.000 claims description 23
- 239000011257 shell material Substances 0.000 claims description 23
- 230000003116 impacting effect Effects 0.000 claims description 2
- 241000238634 Libellulidae Species 0.000 description 9
- 239000002245 particle Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910002546 FeCo Inorganic materials 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 1
- 230000000845 anti-microbial effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/228—Gas flow assisted PVD deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Composite Materials (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
図1に示したような従来の気相ナノ粒子源は、比較的小さい面積(数平方センチメートル)へ堆積物を形成することのみが可能である。しかしながら、書き込みヘッドやウェハなどにナノ粒子コーティングを応用するにあたっては、コーティングを広範囲にわたって均一に施す必要がある。
蒸発金属ナノ粒子源と、
間隔を空けて配列された第1の開口を備えた、第1のプレートと、
第1のプレートに対して整合して配置され、および、間隔を空けて配列された第2の開口を備えた、第2のプレートと、
を有し、
第2のプレートの第2の開口のそれぞれは、第1のプレートの第1の開口のそれぞれに整合して配置される。
蒸発金属ナノ粒子源を準備し、
前記蒸発金属ナノ粒子源を、第1のプレートに配列された第1の開口に通じさせて、蒸発金属ナノ粒子の第1のストリームを発生させ、
前記蒸発金属ナノ粒子の第1のストリームを、第2のプレートに配列された第2の開口に通じさせて、自由ナノ粒子の第2のストリームを発生させ、
基板を前記自由ナノ粒子の第2のストリームに衝突させて、該基板上にナノ粒子コーティングを均一かつ広範囲に堆積させる、
工程を備える。
4 ナノ粒子ガス凝集源
6 第1開口
8 第1ストリーム
10 第2開口
12 単一源ストリーム
20 第1プレート
22 第1開口
24 第2プレート
26 第2開口
28 レンズ
29 スキマー
30 自由ナノ粒子
50 シェル蒸発器
52 チューブ
53 コーティング材料
54 チャネル
55 熱シールド
56 ナノ粒子
Claims (10)
- 基板上にナノ粒子コーティングを均一かつ広範囲に形成するための装置であって、
蒸発金属ナノ粒子源と、
間隔を空けて配列された第1の開口を備えた、第1のプレートと、
第1のプレートに対して整合して配置され、および、間隔を空けて配列された第2の開口を備えた、第2のプレートと、
を有し、
第2のプレートの第2の開口のそれぞれは、第1のプレートの第1の開口のそれぞれに整合して配置される、
装置。 - 複数のレンズをさらに備える、それぞれのレンズは、第1のプレートの第1の開口のそれぞれと関連づけられている、請求項1に記載の装置。
- 前記レンズの1つ以上が、エアロダイナミックレンズからなる、請求項2に記載の装置。
- 第1のプレートは第1のチャンバ内に位置し、かつ、第2のプレートは別のチャンバ内に位置する、請求項1〜3のいずれかに記載の装置。
- 第2のプレートの第2の開口のそれぞれに整合して配置される1つ以上のシェル蒸発器をさらに備える、請求項1〜3のいずれかに記載の装置。
- 基板上にナノ粒子コーティングを均一かつ広範囲に形成するための方法であって、
蒸発金属ナノ粒子源を準備し、
前記蒸発金属ナノ粒子源を、第1のプレートに配列された第1の開口に通じさせて、蒸発金属ナノ粒子の第1のストリームを発生させ、
前記蒸発金属ナノ粒子の第1のストリームを、第2のプレートに配列された第2の開口に通じさせて、自由ナノ粒子の第2のストリームを発生させ、
基板を前記自由ナノ粒子の第2のストリームに衝突させて、該基板上にナノ粒子コーティングを均一かつ広範囲に堆積させる、
工程を備える、方法。 - 第1のプレートおよび第2のプレートの間に、差圧排気する工程をさらに備え、第1のストリームを第2の開口に通じさせる前に、自由ナノ粒子のストリームを発生させる、請求項6に記載の方法。
- 前記金属ナノ粒子源を第1のプレートに配列された第1の開口に通じさせる前において、前記金属ナノ粒子源を集束させる工程をさらに備える、請求項6または7に記載の方法。
- 第1の開口のそれぞれとの整合するように配置される複数のレンズを、それぞれのレンズが、所定の寸法を有するナノ粒子を集束させて、第1の開口に通じさせるための適切な内寸を有するように、選択する工程をさらに備える、請求項8に記載の方法。
- 前記自由ナノ粒子のストリームのそれぞれをシェル蒸発器に通じさせて、該シェル蒸発器内に配置されたシェル材料で、ナノ粒子をコーティングする工程をさらに備える、請求項6〜9のいずれかに記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1417045.0A GB2530562B (en) | 2014-09-26 | 2014-09-26 | Nanoparticle coating apparatus |
GB1417045.0 | 2014-09-26 | ||
PCT/GB2015/052774 WO2016046561A1 (en) | 2014-09-26 | 2015-09-24 | Nanoparticle coating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017537219A true JP2017537219A (ja) | 2017-12-14 |
JP6691911B2 JP6691911B2 (ja) | 2020-05-13 |
Family
ID=51901200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017515984A Active JP6691911B2 (ja) | 2014-09-26 | 2015-09-24 | ナノ粒子コーティング装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US10767254B2 (ja) |
EP (1) | EP3198051B1 (ja) |
JP (1) | JP6691911B2 (ja) |
GB (1) | GB2530562B (ja) |
HK (1) | HK1222891A1 (ja) |
WO (1) | WO2016046561A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3077420B1 (fr) * | 2018-01-30 | 2020-03-20 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Dispositif de depot de particules de taille nanometrique sur un substrat |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004137583A (ja) * | 2002-10-21 | 2004-05-13 | Tohoku Pioneer Corp | 真空蒸着装置 |
JP2006117527A (ja) * | 2005-12-05 | 2006-05-11 | Fujitsu Ltd | カーボンナノチューブ形成装置及び方法 |
JP2010174271A (ja) * | 2009-01-27 | 2010-08-12 | Dainippon Screen Mfg Co Ltd | ナノ粒子堆積装置およびナノ粒子堆積方法 |
US20120164776A1 (en) * | 2010-12-23 | 2012-06-28 | Primestar Solar, Inc. | Non-Wear Shutter Apparatus for a Vapor Deposition Apparatus |
JP2013049911A (ja) * | 2011-08-31 | 2013-03-14 | Hitachi Zosen Corp | クラスター生成方法 |
JP2013524009A (ja) * | 2010-03-30 | 2013-06-17 | ワイズ ソシエタ ア レスポンサビリタ リミタータ | 機能化エラストマー製品の製造方法及びそれにより得られる製品 |
JP2013241683A (ja) * | 2011-03-11 | 2013-12-05 | Sharp Corp | 蒸着粒子射出装置および蒸着装置 |
Family Cites Families (10)
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US4356429A (en) * | 1980-07-17 | 1982-10-26 | Eastman Kodak Company | Organic electroluminescent cell |
US5736073A (en) * | 1996-07-08 | 1998-04-07 | University Of Virginia Patent Foundation | Production of nanometer particles by directed vapor deposition of electron beam evaporant |
AU2001277007A1 (en) * | 2000-07-19 | 2002-01-30 | Regents Of The University Of Minnesota | Apparatus and method for synthesizing films and coatings by focused particle beam deposition |
US6837939B1 (en) * | 2003-07-22 | 2005-01-04 | Eastman Kodak Company | Thermal physical vapor deposition source using pellets of organic material for making OLED displays |
US20060269690A1 (en) * | 2005-05-27 | 2006-11-30 | Asm Japan K.K. | Formation technology for nanoparticle films having low dielectric constant |
CN100434353C (zh) * | 2006-01-24 | 2008-11-19 | 南京大学 | 具有直径和数密度一维梯度的纳米粒子阵列气相合成方法 |
CN101503792B (zh) * | 2009-03-13 | 2010-08-25 | 厦门大学 | 一种尺寸可控的金属和合金纳米粒子气相合成方法与装置 |
GB2481860A (en) * | 2010-07-09 | 2012-01-11 | Mantis Deposition Ltd | Sputtering apparatus for producing nanoparticles |
US20120024478A1 (en) * | 2010-07-29 | 2012-02-02 | Hermes-Epitek Corporation | Showerhead |
GB2509888B (en) | 2012-09-17 | 2016-05-11 | Nano Resources Ltd | Magnetic structures |
-
2014
- 2014-09-26 GB GB1417045.0A patent/GB2530562B/en not_active Expired - Fee Related
-
2015
- 2015-09-24 WO PCT/GB2015/052774 patent/WO2016046561A1/en active Application Filing
- 2015-09-24 US US15/514,450 patent/US10767254B2/en active Active
- 2015-09-24 EP EP15784420.0A patent/EP3198051B1/en active Active
- 2015-09-24 JP JP2017515984A patent/JP6691911B2/ja active Active
-
2016
- 2016-09-22 HK HK16111135.5A patent/HK1222891A1/zh not_active IP Right Cessation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004137583A (ja) * | 2002-10-21 | 2004-05-13 | Tohoku Pioneer Corp | 真空蒸着装置 |
JP2006117527A (ja) * | 2005-12-05 | 2006-05-11 | Fujitsu Ltd | カーボンナノチューブ形成装置及び方法 |
JP2010174271A (ja) * | 2009-01-27 | 2010-08-12 | Dainippon Screen Mfg Co Ltd | ナノ粒子堆積装置およびナノ粒子堆積方法 |
JP2013524009A (ja) * | 2010-03-30 | 2013-06-17 | ワイズ ソシエタ ア レスポンサビリタ リミタータ | 機能化エラストマー製品の製造方法及びそれにより得られる製品 |
US20120164776A1 (en) * | 2010-12-23 | 2012-06-28 | Primestar Solar, Inc. | Non-Wear Shutter Apparatus for a Vapor Deposition Apparatus |
JP2013241683A (ja) * | 2011-03-11 | 2013-12-05 | Sharp Corp | 蒸着粒子射出装置および蒸着装置 |
JP2013049911A (ja) * | 2011-08-31 | 2013-03-14 | Hitachi Zosen Corp | クラスター生成方法 |
Also Published As
Publication number | Publication date |
---|---|
GB2530562A (en) | 2016-03-30 |
GB2530562B (en) | 2016-09-28 |
EP3198051B1 (en) | 2019-05-22 |
HK1222891A1 (zh) | 2017-07-14 |
GB201417045D0 (en) | 2014-11-12 |
EP3198051A1 (en) | 2017-08-02 |
JP6691911B2 (ja) | 2020-05-13 |
US10767254B2 (en) | 2020-09-08 |
WO2016046561A1 (en) | 2016-03-31 |
US20170241010A1 (en) | 2017-08-24 |
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