JP2017535028A - 電磁波照射による導電性パターン形成用組成物、これを用いた導電性パターン形成方法と、導電性パターンを有する樹脂構造体 - Google Patents
電磁波照射による導電性パターン形成用組成物、これを用いた導電性パターン形成方法と、導電性パターンを有する樹脂構造体 Download PDFInfo
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- JP2017535028A JP2017535028A JP2017513795A JP2017513795A JP2017535028A JP 2017535028 A JP2017535028 A JP 2017535028A JP 2017513795 A JP2017513795 A JP 2017513795A JP 2017513795 A JP2017513795 A JP 2017513795A JP 2017535028 A JP2017535028 A JP 2017535028A
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Abstract
Description
本出願は、2014年10月23日付韓国特許出願第10−2014−0144490号に基づいた優先権の利益を主張し、当該韓国特許出願の文献に開示されたすべての内容は、本明細書の一部として組み込まれる。
[数式1]
レーザ敏感度Ls=Re−1.4×wt×Iaa
前記数式1で、
Reは、電磁波吸収性無機添加剤のBET比表面積A(m2/g)と、密度B(g/cm3)から、Re=300/[A(m2/g)×B(g/cm3)]の式により算出された前記電磁波吸収性無機添加剤の有効半径を示し、
wtは、前記導電性パターン形成用組成物の全体含有量(重量)を1とする時、前記電磁波吸収性無機添加剤の含有量(重量)を全体組成物に対する重量分率で示す値であり、
Iaaは、前記電磁波吸収性無機添加剤に対して、UV−vis−IRスペクトルを用いて測定された所定の赤外線領域の波長を有する電磁波に対する吸光度IR(%)から、Iaa=(1−IR)2/2IRの式により算出された前記電磁波吸収性無機添加剤の有効光線吸収率を示す。
[数式1]
レーザ敏感度Ls=Re−1.4×wt×Iaa
前記数式1で、
Reは、電磁波吸収性無機添加剤のBET比表面積A(m2/g)と、密度B(g/cm3)から、Re=300/[A(m2/g)×B(g/cm3)]の式により算出された前記電磁波吸収性無機添加剤の有効半径を示し、
wtは、前記導電性パターン形成用組成物の全体含有量(重量)を1とする時、前記電磁波吸収性無機添加剤の含有量(重量)を全体組成物に対する重量分率で示す値であり、
Iaaは、前記電磁波吸収性無機添加剤に対して、UV−vis−IRスペクトルを用いて測定された所定の赤外線領域の波長を有する電磁波に対する吸光度IR(%)から、Iaa=(1−IR)2/2IRの式により算出された前記電磁波吸収性無機添加剤の有効光線吸収率を示す。
CuCrO2の球形非導電性金属化合物粉末をポリカーボネート樹脂と共に用いた。追加的に、工程および安定化のための添加剤である熱安定化剤(IR1076、PEP36)、UV安定剤(UV329)、滑剤(EP184)、および衝撃補強剤(S2001)を共に用いて電磁波照射による導電性パターン形成用組成物を製造した。
(Laser condition 1)
波長:1064nm
周波数:40kHz
スキャン速度:2m/s
パターン間の間隔:35μm
ビーム直径:15〜20μm
パルス間隔:220ns
1.クラス0等級:導電性パターンの剥離面積が評価対象導電性パターン面積の0%
2.クラス1等級:導電性パターンの剥離面積が評価対象導電性パターン面積の0%超過5%以下
3.クラス2等級:導電性パターンの剥離面積が評価対象導電性パターン面積の5%超過15%以下
4.クラス3等級:導電性パターンの剥離面積が評価対象導電性パターン面積の15%超過35%以下
5.クラス4等級:導電性パターンの剥離面積が評価対象導電性パターン面積の35%超過65%以下
6.クラス5等級:導電性パターンの剥離面積が評価対象導電性パターン面積の65%超過
非導電性金属化合物の種類、BET比表面積(粒径変更)およびその含有量(wt)を下記表1に整理されたとおり変更したことを除き、実施例1と同様な方法で導電性パターンを形成し、前記非導電性金属化合物および導電性パターンの諸般物性(Iaa、wt、Reおよび−log(Ls)と、良好な導電性パターン形成のために必要なレーザ電磁波の最小パワー条件)を下記表1に共に整理して示した。
レーザ照射条件を下記のLaser condition 2の条件で変更したことを除き、実施例1乃至17と同一の組成および方法で導電性パターンを形成した。
(Laser condition 2)
波長:1064nm
周波数:50kHz
スキャン速度:2m/s
パターン間の間隔:50μm
ビーム直径:30〜35μm
パルス間隔:55ns
実施例1乃至17に1重量%のカーボンブラックを追加し、その分、ポリカーボネート樹脂の含有量を減らしたことを除き、実施例1乃至17と同一の組成および方法で導電性パターンを形成した。
実施例17に5重量%の二酸化チタンを追加し、その分、ポリカーボネート樹脂の含有量を減らしたことを除き、実施例17と同一の組成および方法で導電性パターンを形成した。
Claims (18)
- ポリカーボネート樹脂を含む高分子樹脂と、
赤外線領域の波長を有する電磁波を吸収し、下記数式1で定義されるレーザ敏感度Lsが1.6<−log(Ls)<6.0である特性を満たす電磁波吸収性無機添加剤と、を含む電磁波照射による導電性パターン形成用組成物であって、
[数式1]
レーザ敏感度Ls=Re−1.4×wt×Iaa
であり、前記数式1で、
Reは、電磁波吸収性無機添加剤のBET比表面積A(m2/g)と、密度B(g/cm3)から、Re=300/[A(m2/g)×B(g/cm3)]の式により算出された前記電磁波吸収性無機添加剤の有効半径を示し、
wtは、前記導電性パターン形成用組成物の全体含有量(重量)を1とする時、前記電磁波吸収性無機添加剤の含有量(重量)を全体組成物に対する重量分率で示す値であり、
Iaaは、前記電磁波吸収性無機添加剤に対して、UV−vis−IRスペクトルを用いて測定された所定の赤外線領域の波長を有する電磁波に対する吸光度IR(%)から、Iaa=(1−IR)2/2IRの式により算出された前記電磁波吸収性無機添加剤の有効光線吸収率を示す、電磁波照射による導電性パターン形成用組成物。 - 前記高分子樹脂は、ABS樹脂、ポリアルキレンテレフタレート樹脂、ポリプロピレン樹脂およびポリフタルアミド樹脂からなる群より選択された1種以上の樹脂をさらに含む、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 前記電磁波吸収性無機添加剤は、1種以上の導電性金属元素を含有し、陽イオンと陰イオンが含まれてこれらが互いに化学的に結合された形態の非導電性金属化合物を含む、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 前記電磁波吸収性無機添加剤は、CuCrO2、NiCrO2、AgCrO2、CuMoO2、NiMoO2、AgMoO2、NiMnO2、AgMnO2、NiFeO2、AgFeO2、CuWO2、AgWO2、NiWO2、AgSnO2、NiSnO2、CuSnO2、CuAlO2、CuGaO2、CuInO2、CuTlO2、CuYO2、CuScO2、CuLaO2、CuLuO2、NiAlO2、NiGaO2、NiInO2、NiTlO2、NiYO2、NiScO2、NiLaO2、NiLuO2、AgAlO2、AgGaO2、AgInO2、AgTlO2、AgYO2、AgScO2、AgLaO2、AgLuO2、CuSn2(PO4)3、CuI、CuCl、CuBr、CuF、AgI、CuSO4、Cu2P2O7、Cu3P2O8、Cu4P2O9、Cu5P2O10およびCu2P4O12からなる群より選択された1種以上の非導電性金属化合物を含む、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 前記電磁波吸収性無機添加剤は、前記レーザ敏感度Lsが1.6<−log(Ls)<5.6である特性を満たし、前記赤外線領域の波長を有する電磁波を吸収して前記導電性金属元素またはそのイオンを含む金属核を発生させる、請求項3に記載の電磁波照射による導電性パターン形成用組成物。
- 前記電磁波吸収性無機添加剤は、レーザ敏感度Lsが1.6<−log(Ls)<5.6である特性を満たし、
前記赤外線領域の波長を有する電磁波の照射により、導電性金属元素またはそのイオンを含む金属核を発生させる導電性シード形成剤をさらに含む、請求項1に記載の電磁波照射による導電性パターン形成用組成物。 - 前記導電性シード形成剤は、前記高分子樹脂の表面に塗布および形成される、請求項6に記載の電磁波照射による導電性パターン形成用組成物。
- 前記電磁波吸収性無機添加剤は、Fe3(PO4)2、Zn3(PO4)2、ZnFe2(PO4)2、NbOxおよびMoOxからなる群より選択された1種以上を含み、
前記導電性シード形成剤は、銅(Cu)、白金(Pt)、パラジウム(Pd)、銀(Ag)、金(Au)、ニッケル(Ni)、タングステン(W)、チタニウム(Ti)、クロム(Cr)、アルミニウム(Al)、亜鉛(Zn)、錫(Sn)、鉛(Pb)、マグネシウム(Mg)、マンガン(Mn)および鉄(Fe)からなる群より選択された1種以上の導電性金属、そのイオンまたは錯イオンを含む、請求項6に記載の電磁波照射による導電性パターン形成用組成物。 - カーボンブラック、松煙、油煙、ランプブラック、チャンネルブラック、ファーネスブラック、アセチレンブラックおよび二酸化チタン(TiO2)からなる群より選択された1種以上の電磁波吸収補助剤をさらに含む、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 前記電磁波吸収性無機添加剤は、全体組成物に対して0.05乃至30重量%で含まれる、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 1000nm乃至1200nmの波長を有するレーザ電磁波が1乃至20Wの平均パワーで照射され、前記レーザ電磁波の照射領域にメッキが行われて導電性パターンを形成する、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 前記電磁波吸収性無機添加剤は、0.05乃至20μmの平均粒径を有する、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 前記電磁波吸収補助剤は、全体組成物に対して0.01乃至20重量%で含まれる、請求項9に記載の電磁波照射による導電性パターン形成用組成物。
- 熱安定剤、UV安定剤、難燃剤、滑剤、抗酸化剤、無機充填剤、色添加剤、衝撃補強剤、流動性改質剤および機能性補強剤からなる群より選択された1種以上の添加剤を全体組成物に対して0.01乃至30重量%でさらに含む、請求項1に記載の電磁波照射による導電性パターン形成用組成物。
- 請求項1乃至14のいずれか一項に記載の導電性パターン形成用組成物を樹脂製品で成形したり、他の製品に塗布して樹脂層を形成する段階と、
前記樹脂製品または樹脂層の所定領域に赤外線領域の波長を有する電磁波を照射する段階と、
前記電磁波の照射領域をメッキさせて導電性金属層を形成する段階と、を含む電磁波の直接照射による導電性パターン形成方法。 - 前記電磁波を照射する段階で1000nm乃至1200nmの波長を有するレーザ電磁波が1乃至20Wの平均パワーで照射される、請求項15に記載の電磁波の直接照射による導電性パターン形成方法。
- ポリカーボネート樹脂を含む高分子樹脂基材と、
前記高分子樹脂基材に分散しており、赤外線領域の波長を有する電磁波を吸収し、下記数式1で定義されるレーザ敏感度Lsが1.6<−log(Ls)<6.0である特性を満たす電磁波吸収性無機添加剤と、
前記高分子樹脂基材の所定領域上に形成された導電性金属層と、を含む導電性パターンを有する樹脂構造体であって、
[数式1]
レーザ敏感度Ls=Re−1.4×wt×Iaa
であり、前記数式1で、
Reは、電磁波吸収性無機添加剤のBET比表面積A(m2/g)と、密度B(g/cm3)から、Re=300/[A(m2/g)×B(g/cm3)]の式により算出された 前記電磁波吸収性無機添加剤の有効半径を示し、
wtは、導電性パターン形成用組成物の全体含有量(導電性金属層を除いた高分子樹脂基材および電磁波吸収性無機添加剤の全体含有量)を1とする時、前記電磁波吸収性無機添加剤の含有量(重量)を全体組成物に対する重量分率で示す値であり、
Iaaは、前記電磁波吸収性無機添加剤に対して、UV−vis−IRスペクトルを用いて測定された所定の赤外線領域の波長を有する電磁波に対する吸光度IR(%)から、Iaa=(1−IR)2/2IRの式により算出された前記電磁波吸収性無機添加剤の有効光線吸収率を示す、導電性パターンを有する樹脂構造体。 - 前記導電性金属層が形成された所定領域は、前記高分子樹脂基材に赤外線領域の波長を有する電磁波が照射された領域に対応する、請求項17に記載の導電性パターンを有する樹脂構造体。
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