JP2017526977A5 - - Google Patents

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Publication number
JP2017526977A5
JP2017526977A5 JP2017512630A JP2017512630A JP2017526977A5 JP 2017526977 A5 JP2017526977 A5 JP 2017526977A5 JP 2017512630 A JP2017512630 A JP 2017512630A JP 2017512630 A JP2017512630 A JP 2017512630A JP 2017526977 A5 JP2017526977 A5 JP 2017526977A5
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JP
Japan
Prior art keywords
substrate
curable material
amount
elements
curable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2017512630A
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English (en)
Japanese (ja)
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JP2017526977A (ja
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Publication date
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Priority claimed from PCT/SG2015/050113 external-priority patent/WO2015174930A1/en
Publication of JP2017526977A publication Critical patent/JP2017526977A/ja
Publication of JP2017526977A5 publication Critical patent/JP2017526977A5/ja
Priority to JP2020030681A priority Critical patent/JP6987907B2/ja
Pending legal-status Critical Current

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JP2017512630A 2014-05-16 2015-05-14 装置の、特に光学装置のウェーハレベル製造 Pending JP2017526977A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2020030681A JP6987907B2 (ja) 2014-05-16 2020-02-26 装置の、特に光学装置のウェーハレベル方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461994358P 2014-05-16 2014-05-16
US61/994,358 2014-05-16
PCT/SG2015/050113 WO2015174930A1 (en) 2014-05-16 2015-05-14 Wafer-level maufacture of devices, in particular of optical devices

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2020030681A Division JP6987907B2 (ja) 2014-05-16 2020-02-26 装置の、特に光学装置のウェーハレベル方法

Publications (2)

Publication Number Publication Date
JP2017526977A JP2017526977A (ja) 2017-09-14
JP2017526977A5 true JP2017526977A5 (https=) 2018-06-21

Family

ID=54480324

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2017512630A Pending JP2017526977A (ja) 2014-05-16 2015-05-14 装置の、特に光学装置のウェーハレベル製造
JP2020030681A Active JP6987907B2 (ja) 2014-05-16 2020-02-26 装置の、特に光学装置のウェーハレベル方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2020030681A Active JP6987907B2 (ja) 2014-05-16 2020-02-26 装置の、特に光学装置のウェーハレベル方法

Country Status (8)

Country Link
US (1) US10682824B2 (https=)
EP (1) EP3142859B1 (https=)
JP (2) JP2017526977A (https=)
KR (1) KR102352424B1 (https=)
CN (1) CN106573460B (https=)
SG (2) SG10201810219TA (https=)
TW (1) TWI710455B (https=)
WO (1) WO2015174930A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2016689B1 (en) * 2016-04-28 2017-11-20 Anteryon Wafer Optics B V Replication tool
CN109116680A (zh) * 2018-09-27 2019-01-01 京东方科技集团股份有限公司 压印模板及其制作方法
US10867955B2 (en) * 2018-09-27 2020-12-15 Taiwan Semiconductor Manufacturing Company, Ltd. Package structure having adhesive layer surrounded dam structure
WO2020185167A1 (en) * 2019-03-12 2020-09-17 Ams Sensors Singapore Pte. Ltd. Yard control features
CN113906319A (zh) * 2019-05-30 2022-01-07 ams传感器新加坡私人有限公司 复制光学元件的方法和复制的光学元件
GB2594998A (en) * 2020-05-15 2021-11-17 Ams Sensors Asia Pte Ltd Wafer level chip scale packaging
CN115097553B (zh) * 2022-06-24 2023-10-31 京东方科技集团股份有限公司 微透镜阵列基板及其制备方法、显示装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4963148B2 (ja) 2001-09-18 2012-06-27 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
TW544894B (en) * 2002-04-10 2003-08-01 Siliconware Precision Industries Co Ltd Chip carrier with dam bar
EP1443344A1 (en) 2003-01-29 2004-08-04 Heptagon Oy Manufacturing micro-structured elements
US20040241323A1 (en) 2003-05-29 2004-12-02 3M Innovative Properties Company Method for applying adhesive to a substrate
JP4362380B2 (ja) * 2004-01-13 2009-11-11 フジノン株式会社 光学素子の成形方法及び組み合わせ光学素子
US20070216048A1 (en) * 2006-03-20 2007-09-20 Heptagon Oy Manufacturing optical elements
US20070216046A1 (en) * 2006-03-20 2007-09-20 Heptagon Oy Manufacturing miniature structured elements with tool incorporating spacer elements
US20080113160A1 (en) * 2006-11-14 2008-05-15 Glimmerglass Networks, Inc. Method And Apparatus For Localized Bonding
JP4507126B2 (ja) * 2007-10-29 2010-07-21 ソニー株式会社 偏光板の製造方法
US20090159200A1 (en) 2007-12-19 2009-06-25 Heptagon Oy Spacer element and method for manufacturing a spacer element
JP2009204752A (ja) 2008-02-26 2009-09-10 Sanyo Electric Co Ltd 複合レンズ
JP2010052086A (ja) * 2008-08-28 2010-03-11 Oki Semiconductor Co Ltd 半導体装置及びその製造方法
JP5047243B2 (ja) * 2008-09-26 2012-10-10 シャープ株式会社 光学素子ウエハモジュール、光学素子モジュール、光学素子モジュールの製造方法、電子素子ウエハモジュール、電子素子モジュールの製造方法、電子素子モジュールおよび電子情報機器
US8792180B2 (en) 2009-06-12 2014-07-29 Konica Minolta Opto, Inc. Production method of wafer lens, intermediate die, optical component, molding die, and production method of molding die
US20130273238A1 (en) * 2012-04-16 2013-10-17 Peter S. Andrews Inverted Curing of Liquid Optoelectronic Lenses
JP6395600B2 (ja) * 2012-05-30 2018-09-26 オリンパス株式会社 撮像装置の製造方法および半導体装置の製造方法
SG10201701641RA (en) 2012-09-11 2017-04-27 Heptagon Micro Optics Pte Ltd Manufacture of truncated lenses, of pairs of truncated lenses and of corresponding devices
CN104854483A (zh) 2012-12-15 2015-08-19 柯尼卡美能达株式会社 透镜阵列构造体的制造方法以及透镜阵列构造体

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