JP2017516288A5 - - Google Patents
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- JP2017516288A5 JP2017516288A5 JP2016547862A JP2016547862A JP2017516288A5 JP 2017516288 A5 JP2017516288 A5 JP 2017516288A5 JP 2016547862 A JP2016547862 A JP 2016547862A JP 2016547862 A JP2016547862 A JP 2016547862A JP 2017516288 A5 JP2017516288 A5 JP 2017516288A5
- Authority
- JP
- Japan
- Prior art keywords
- light beam
- adaptive
- optical
- optical amplifier
- output
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000003287 optical effect Effects 0.000 claims 40
- 230000003044 adaptive effect Effects 0.000 claims 27
- 238000000034 method Methods 0.000 claims 7
- 239000013077 target material Substances 0.000 claims 5
- 239000012530 fluid Substances 0.000 claims 4
- 230000005855 radiation Effects 0.000 claims 2
- 230000001939 inductive effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
- 230000001902 propagating effect Effects 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/194,027 US9380691B2 (en) | 2014-02-28 | 2014-02-28 | Adaptive laser system for an extreme ultraviolet light source |
| US14/194,027 | 2014-02-28 | ||
| PCT/EP2015/053763 WO2015128297A1 (en) | 2014-02-28 | 2015-02-24 | Adaptive laser system for an extreme ultraviolet light source |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017516288A JP2017516288A (ja) | 2017-06-15 |
| JP2017516288A5 true JP2017516288A5 (cg-RX-API-DMAC7.html) | 2018-04-05 |
| JP6663353B2 JP6663353B2 (ja) | 2020-03-11 |
Family
ID=52577856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016547862A Active JP6663353B2 (ja) | 2014-02-28 | 2015-02-24 | 極端紫外光源のための適応レーザシステム |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9380691B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6663353B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR102458094B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN106465525B (cg-RX-API-DMAC7.html) |
| TW (1) | TWI670996B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2015128297A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20170311429A1 (en) * | 2016-04-25 | 2017-10-26 | Asml Netherlands B.V. | Reducing the effect of plasma on an object in an extreme ultraviolet light source |
| US10411435B2 (en) * | 2016-06-06 | 2019-09-10 | Raytheon Company | Dual-axis adaptive optic (AO) system for high-power lasers |
| US9778022B1 (en) * | 2016-09-14 | 2017-10-03 | Asml Netherlands B.V. | Determining moving properties of a target in an extreme ultraviolet light source |
| US10524345B2 (en) * | 2017-04-28 | 2019-12-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Residual gain monitoring and reduction for EUV drive laser |
| US11121526B2 (en) * | 2018-05-24 | 2021-09-14 | Panasonic Intellectual Property Management Co., Ltd. | Exchangeable laser resonator modules with angular adjustment |
| CN108982399B (zh) * | 2018-07-09 | 2021-04-06 | 安徽建筑大学 | 一种烟道氨浓度激光在线检测系统 |
| CN108982411B (zh) * | 2018-07-09 | 2021-04-06 | 安徽建筑大学 | 一种检测烟道中氨气浓度的激光原位检测系统 |
| NL2023633A (en) * | 2018-09-25 | 2020-04-30 | Asml Netherlands Bv | Laser system for target metrology and alteration in an euv light source |
| EP3871473B1 (en) * | 2018-10-26 | 2025-03-26 | ASML Netherlands B.V. | Monitoring light emissions |
| KR102614548B1 (ko) * | 2019-03-27 | 2023-12-14 | 사이머 엘엘씨 | 압력 제어식 스펙트럼 특징 조정기 |
| US11929714B2 (en) | 2019-05-30 | 2024-03-12 | University Of Virginia Patent Foundation | Low power receiver and related circuits |
| JP7329422B2 (ja) * | 2019-11-18 | 2023-08-18 | ギガフォトン株式会社 | ビームデリバリシステム、焦点距離選定方法及び電子デバイスの製造方法 |
| WO2021204481A1 (en) | 2020-04-09 | 2021-10-14 | Asml Netherlands B.V. | Seed laser system for radiation source |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3900467C2 (de) | 1989-01-10 | 1995-09-07 | Trumpf Lasertechnik Gmbh | Vorrichtung mit einem Spiegelkopf |
| US7491954B2 (en) * | 2006-10-13 | 2009-02-17 | Cymer, Inc. | Drive laser delivery systems for EUV light source |
| US6880942B2 (en) | 2002-06-20 | 2005-04-19 | Nikon Corporation | Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system |
| JP5833806B2 (ja) | 2008-09-19 | 2015-12-16 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置用レーザ光源装置及び極端紫外光源装置用レーザ光源の調整方法 |
| JP5587578B2 (ja) | 2008-09-26 | 2014-09-10 | ギガフォトン株式会社 | 極端紫外光源装置およびパルスレーザ装置 |
| JP5368261B2 (ja) | 2008-11-06 | 2013-12-18 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置の制御方法 |
| US8283643B2 (en) | 2008-11-24 | 2012-10-09 | Cymer, Inc. | Systems and methods for drive laser beam delivery in an EUV light source |
| JP5946612B2 (ja) | 2010-10-08 | 2016-07-06 | ギガフォトン株式会社 | ミラー、ミラー装置、レーザ装置および極端紫外光生成装置 |
| US8810902B2 (en) | 2010-12-29 | 2014-08-19 | Asml Netherlands B.V. | Multi-pass optical apparatus |
| JP5816440B2 (ja) * | 2011-02-23 | 2015-11-18 | ギガフォトン株式会社 | 光学装置、レーザ装置および極端紫外光生成装置 |
| JP2013201388A (ja) * | 2012-03-26 | 2013-10-03 | Gigaphoton Inc | レーザシステム及び極端紫外光生成システム |
| US8811440B2 (en) * | 2012-09-07 | 2014-08-19 | Asml Netherlands B.V. | System and method for seed laser mode stabilization |
| CN103560387A (zh) * | 2013-11-14 | 2014-02-05 | 中国电子科技集团公司第十一研究所 | 一种双程吸收分光匹配激光放大器及其放大方法 |
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2014
- 2014-02-28 US US14/194,027 patent/US9380691B2/en active Active
-
2015
- 2015-02-09 TW TW104104272A patent/TWI670996B/zh active
- 2015-02-24 WO PCT/EP2015/053763 patent/WO2015128297A1/en not_active Ceased
- 2015-02-24 JP JP2016547862A patent/JP6663353B2/ja active Active
- 2015-02-24 KR KR1020167022708A patent/KR102458094B1/ko active Active
- 2015-02-24 CN CN201580011220.7A patent/CN106465525B/zh active Active