JP2017504946A - Sofc陰極拡散バリア層を生成する方法およびsofc - Google Patents
Sofc陰極拡散バリア層を生成する方法およびsofc Download PDFInfo
- Publication number
- JP2017504946A JP2017504946A JP2016564382A JP2016564382A JP2017504946A JP 2017504946 A JP2017504946 A JP 2017504946A JP 2016564382 A JP2016564382 A JP 2016564382A JP 2016564382 A JP2016564382 A JP 2016564382A JP 2017504946 A JP2017504946 A JP 2017504946A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- precursor
- diffusion barrier
- cathode
- thd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009792 diffusion process Methods 0.000 title claims abstract description 36
- 230000004888 barrier function Effects 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims abstract description 24
- 239000003792 electrolyte Substances 0.000 claims abstract description 23
- 239000002243 precursor Substances 0.000 claims abstract description 23
- 229910052963 cobaltite Inorganic materials 0.000 claims abstract description 11
- 238000000151 deposition Methods 0.000 claims abstract description 10
- 229910052747 lanthanoid Inorganic materials 0.000 claims abstract description 7
- 150000002602 lanthanoids Chemical class 0.000 claims abstract description 7
- 238000007650 screen-printing Methods 0.000 claims abstract description 4
- 238000000231 atomic layer deposition Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 13
- 229910002076 stabilized zirconia Inorganic materials 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical group [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 229910018921 CoO 3 Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- VNLSCKAQGGXPRI-UHFFFAOYSA-N 2,2,6,6-tetramethyl-3,5-dioxoheptanoic acid Chemical compound CC(C)(C)C(=O)CC(=O)C(C)(C)C(O)=O VNLSCKAQGGXPRI-UHFFFAOYSA-N 0.000 claims description 2
- 150000002601 lanthanoid compounds Chemical class 0.000 claims description 2
- 229910052706 scandium Inorganic materials 0.000 claims description 2
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical group [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical group [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 2
- 238000010926 purge Methods 0.000 abstract description 6
- 239000000446 fuel Substances 0.000 description 15
- 239000007787 solid Substances 0.000 description 9
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- 239000002019 doping agent Substances 0.000 description 4
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 150000001768 cations Chemical class 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910052746 lanthanum Inorganic materials 0.000 description 3
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000012695 Ce precursor Substances 0.000 description 2
- PACGUUNWTMTWCF-UHFFFAOYSA-N [Sr].[La] Chemical compound [Sr].[La] PACGUUNWTMTWCF-UHFFFAOYSA-N 0.000 description 2
- 239000010406 cathode material Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- YRAJNWYBUCUFBD-UHFFFAOYSA-N 2,2,6,6-tetramethylheptane-3,5-dione Chemical compound CC(C)(C)C(=O)CC(=O)C(C)(C)C YRAJNWYBUCUFBD-UHFFFAOYSA-N 0.000 description 1
- 229910002483 Cu Ka Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000002001 electrolyte material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010416 ion conductor Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- 238000013341 scale-up Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45553—Atomic layer deposition [ALD] characterized by the use of precursors specially adapted for ALD
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/56—After-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/10—Fuel cells with solid electrolytes
- H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/10—Fuel cells with solid electrolytes
- H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte
- H01M8/1213—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the electrode/electrolyte combination or the supporting material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/10—Fuel cells with solid electrolytes
- H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte
- H01M8/1213—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the electrode/electrolyte combination or the supporting material
- H01M8/1226—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the electrode/electrolyte combination or the supporting material characterised by the supporting layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/10—Fuel cells with solid electrolytes
- H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte
- H01M8/124—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the process of manufacturing or by the material of the electrolyte
- H01M8/1246—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the process of manufacturing or by the material of the electrolyte the electrolyte consisting of oxides
- H01M8/1253—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the process of manufacturing or by the material of the electrolyte the electrolyte consisting of oxides the electrolyte containing zirconium oxide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M8/00—Fuel cells; Manufacture thereof
- H01M8/10—Fuel cells with solid electrolytes
- H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte
- H01M2008/1293—Fuel cells with solid oxide electrolytes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Sustainable Energy (AREA)
- Sustainable Development (AREA)
- Electrochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Inert Electrodes (AREA)
- Fuel Cell (AREA)
Abstract
Description
(i)予備焼成された基板上にスクリーン印刷し、その後、1200℃から1400℃の間で焼結し、基板へのいくつかの反応で厚さ0.5〜5マイクロメートルを有する多孔質層を生成する[非特許文献1];
(ii)400〜800℃でパルスレーザー堆積させ、柱状構造を生成する[非特許文献2][非特許文献3];
(iii)800℃でマグネトロンスパッタリングによって物理気相堆積させ、柱状構造を生成し、(i)に対して利点をもたらす[非特許文献4]
ことによって生産することができる。
拡散バリア層CeO2、CeO2:Gd、およびCeO2:Yを、固体酸化物燃料電池(SOFC)ボタン電池上に原子層堆積(ALD)によって堆積させて、陰極から電解質への陽イオンの拡散を防止した。最初に、二元酸化物CeO2、Gd2O3、およびY2O3の成長速度を、Si(100)ウエハーおよびイットリア安定化ジルコニア(YSZ)上で判定した。次いでドープ膜を、異なるCe:Gd前駆体パルス比およびCe:Y前駆体パルス比を用いてSi(100)上に堆積させて、ドーパント含有量について適切な比を見出した。実際の膜は、NiO/YSZ陽極およびYSZ電解質からなっていたSOFC半電池上に堆積させた。
最初に半電池を製造する。半電池を、YSZおよびNiOから構成される陽極支持層(5)をテープキャスティングし、この上にYSZおよびNiOから構成される陽極活性層(4)をスクリーン印刷し、この上にYSZから構成される電解質層(3)をスクリーン印刷し、この多層未焼結半電池を1400℃で焼結することによって製造する。
Claims (10)
- SOFC陰極拡散バリア層を製造する方法であって、
a)焼結された半電池の異種原子価的に安定化されたジルコニアからなる電解質層上に、原子層堆積によって純粋なセリアまたは異種原子価的にドープされたセリア層を堆積させるステップであって、膜が堆積される電解質の表面は、1または複数のランタニドの第1の前駆体からの1回分の蒸気に曝露され、その前駆体からの任意の過剰の未反応蒸気が除去され、第2の前駆体の1回分の蒸気が表面にもたらされ、反応させられ、このサイクルのステップが繰り返されて、より厚い膜が構築されるステップと、
b)前記層の上にコバルタイト系陰極層をスクリーン印刷するステップと、
c)前記陰極拡散バリア層および陰極層が一緒に加熱されるステップと
の連続したステップを含む方法。 - 前記第1の前駆体が一般式Ln(thd)n(式中、thdは、2,2,6,6−テトラメチルヘプタン−3,5−ジオネートである)を有するランタニドジケトネート、または自己制限的成長の要件を満たすのに十分熱的に安定である任意の他の揮発性ランタニド化合物であり、
前記第2の前駆体がオゾンまたは水である、請求項1に記載の方法。 - 前記電解質層はイットリウム安定化ジルコニアである、請求項1に記載の方法。
- 前記電解質層はスカンジウム安定化ジルコニアである、請求項1に記載の方法。
- 前記セリア層は、好ましくはYまたはGdドープセリア層である、請求項1に記載の方法。
- 前記第1の前駆体Ce(thd)4とY(thd)3またはGd(thd)3との堆積のためのパルシング比(pulsing ratio)は、30:1〜5:1、好ましくは10:1である、請求項5に記載の方法。
- 前記コバルタイト系陰極層は好ましくはLSC(LaxSr(1-x)CoO3)またはLSCF(LaxSr(1-x)CoyFe(1-y)O3)層である、請求項1に記載の方法。
- 前記加熱する温度は、1000〜1200℃の間、好ましくは1000〜1100℃の間である、請求項1に記載の方法。
- 前記ステップa)の連続したサイクル中で異なるランタニドが使用され、混合酸化物を構築する、請求項1に記載の方法。
- 請求項1に記載の方法で製造した陰極拡散バリア層を含むSOFC。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EE2014/000001 WO2015106769A1 (en) | 2014-01-14 | 2014-01-14 | A method of producing sofc cathode diffusion barrier layer and a sofc |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017504946A true JP2017504946A (ja) | 2017-02-09 |
JP6337146B2 JP6337146B2 (ja) | 2018-06-06 |
Family
ID=50064321
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016564382A Active JP6337146B2 (ja) | 2014-01-14 | 2014-01-14 | Sofc陰極拡散バリア層を生成する方法およびsofc |
Country Status (11)
Country | Link |
---|---|
US (1) | US20160333476A1 (ja) |
EP (1) | EP3099836B1 (ja) |
JP (1) | JP6337146B2 (ja) |
KR (1) | KR102294212B1 (ja) |
DK (1) | DK3099836T3 (ja) |
ES (1) | ES2912750T3 (ja) |
LT (1) | LT3099836T (ja) |
PL (1) | PL3099836T3 (ja) |
PT (1) | PT3099836T (ja) |
RU (1) | RU2656436C2 (ja) |
WO (1) | WO2015106769A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9755235B2 (en) | 2014-07-17 | 2017-09-05 | Ada Technologies, Inc. | Extreme long life, high energy density batteries and method of making and using the same |
US10217571B2 (en) | 2015-05-21 | 2019-02-26 | Ada Technologies, Inc. | High energy density hybrid pseudocapacitors and method of making and using the same |
US11996564B2 (en) | 2015-06-01 | 2024-05-28 | Forge Nano Inc. | Nano-engineered coatings for anode active materials, cathode active materials, and solid-state electrolytes and methods of making batteries containing nano-engineered coatings |
WO2017023797A1 (en) | 2015-07-31 | 2017-02-09 | Ada Technologies, Inc. | High energy and power electrochemical device and method of making and using same |
WO2017205660A1 (en) * | 2016-05-25 | 2017-11-30 | Saint-Gobain Ceramics & Plastics, Inc. | Electrode comprising heavily-doped ceria |
US11024846B2 (en) | 2017-03-23 | 2021-06-01 | Ada Technologies, Inc. | High energy/power density, long cycle life, safe lithium-ion battery capable of long-term deep discharge/storage near zero volt and method of making and using the same |
WO2020053765A2 (en) * | 2018-09-11 | 2020-03-19 | Versa Power Systems Ltd | Redox mitigating solid oxide cell compositions |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009069685A1 (ja) * | 2007-11-27 | 2009-06-04 | Honda Motor Co., Ltd. | 自立膜型電解質・電極接合体 |
US20120094213A1 (en) * | 2010-10-19 | 2012-04-19 | Samsung Electronics Co., Ltd. | Solid oxide electrolyte membrane, method of manufacturing the same and fuel cell including the solid oxide electrolyte membrane |
JP2012195281A (ja) * | 2011-03-03 | 2012-10-11 | Ngk Insulators Ltd | 固体酸化物形燃料電池 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2424604C1 (ru) * | 2007-05-31 | 2011-07-20 | Элкоген Ас | Способ изготовления одиночного твердооксидного топливного элемента |
EP2031684B1 (en) * | 2007-08-31 | 2016-08-10 | Technical University of Denmark | Metal supported solid oxide fuel cell |
EA021907B1 (ru) * | 2008-06-13 | 2015-09-30 | Серес Интеллекчуал Проперти Компани Лимитед | Способ осаждения керамических пленок |
-
2014
- 2014-01-14 DK DK14702745.2T patent/DK3099836T3/da active
- 2014-01-14 WO PCT/EE2014/000001 patent/WO2015106769A1/en active Application Filing
- 2014-01-14 PT PT147027452T patent/PT3099836T/pt unknown
- 2014-01-14 KR KR1020167021878A patent/KR102294212B1/ko active IP Right Grant
- 2014-01-14 PL PL14702745.2T patent/PL3099836T3/pl unknown
- 2014-01-14 LT LTEPPCT/EE2014/000001T patent/LT3099836T/lt unknown
- 2014-01-14 US US15/111,200 patent/US20160333476A1/en not_active Abandoned
- 2014-01-14 JP JP2016564382A patent/JP6337146B2/ja active Active
- 2014-01-14 EP EP14702745.2A patent/EP3099836B1/en active Active
- 2014-01-14 RU RU2016133145A patent/RU2656436C2/ru active
- 2014-01-14 ES ES14702745T patent/ES2912750T3/es active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009069685A1 (ja) * | 2007-11-27 | 2009-06-04 | Honda Motor Co., Ltd. | 自立膜型電解質・電極接合体 |
US20120094213A1 (en) * | 2010-10-19 | 2012-04-19 | Samsung Electronics Co., Ltd. | Solid oxide electrolyte membrane, method of manufacturing the same and fuel cell including the solid oxide electrolyte membrane |
JP2012195281A (ja) * | 2011-03-03 | 2012-10-11 | Ngk Insulators Ltd | 固体酸化物形燃料電池 |
Non-Patent Citations (1)
Title |
---|
ZENG FAN: "Improving solid oxide fuel cells with yttria-doped ceria interlayers by atomic layer deposition", JOURNAL OF MATERIALS CHEMISTRY, vol. Vol.21, JPN6017036768, 2011, pages 10903-10906 * |
Also Published As
Publication number | Publication date |
---|---|
DK3099836T3 (da) | 2022-05-30 |
US20160333476A1 (en) | 2016-11-17 |
RU2016133145A (ru) | 2018-02-16 |
WO2015106769A1 (en) | 2015-07-23 |
PT3099836T (pt) | 2022-05-11 |
JP6337146B2 (ja) | 2018-06-06 |
KR102294212B1 (ko) | 2021-08-30 |
RU2656436C2 (ru) | 2018-06-05 |
EP3099836B1 (en) | 2022-04-20 |
ES2912750T3 (es) | 2022-05-27 |
PL3099836T3 (pl) | 2022-07-18 |
EP3099836A1 (en) | 2016-12-07 |
KR20160107284A (ko) | 2016-09-13 |
LT3099836T (lt) | 2022-05-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6337146B2 (ja) | Sofc陰極拡散バリア層を生成する方法およびsofc | |
Fabbri et al. | Towards the next generation of solid oxide fuel cells operating below 600 C with chemically stable proton‐conducting electrolytes | |
JP5762295B2 (ja) | 低温sofc用の新素材および構造 | |
Liu et al. | Improving the performance of the Ba0. 5Sr0. 5Co0. 8Fe0. 2O3-δ cathode for proton-conducting SOFCs by microwave sintering | |
US8592101B2 (en) | Electrolyte comprising YSZ for SOFC battery, and method comprising CVD for making same | |
US20150099061A1 (en) | Formation of solid oxide fuel cells | |
US8337939B2 (en) | Method of processing a ceramic layer and related articles | |
US9660273B2 (en) | Liquid phase modification of solid oxide fuel cells | |
AU2003229677B2 (en) | High-temperature solid electrolyte fuel cell comprising a composite of nanoporous thin-film electrodes and a structured electrolyte | |
KR101288375B1 (ko) | 원자막 증착법으로 형성된 이트리아-안정화 지르코니아 기능층을 포함하는 세리아계 전해질 및 이를 포함하는 고체 산화물 연료전지 | |
JP2020129433A (ja) | 固体電解質部材、固体酸化物型燃料電池、水電解装置、水素ポンプ及び固体電解質部材の製造方法 | |
WO2018230247A1 (ja) | 固体電解質部材、固体酸化物型燃料電池、水電解装置、水素ポンプ及び固体電解質部材の製造方法 | |
US20050250000A1 (en) | Novel composite solid oxide fuel cell anode based on ceria and strontium titanate | |
Kim et al. | Stable ceria-based electrolytes for intermediate temperature-solid oxide fuel cells via hafnium oxide blocking layer | |
JP6879456B2 (ja) | 固体電解質部材、固体酸化物型燃料電池、水電解装置、水素ポンプ及び固体電解質部材の製造方法 | |
JPH1074528A (ja) | 固体電解質型燃料電池およびその製造方法 | |
JP5550223B2 (ja) | セラミック電解質の処理方法および関連製品 | |
Ju et al. | New buffer layer material La (Pr) CrO3 for intermediate temperature solid oxide fuel cell using LaGaO3-based electrolyte film | |
KR102267721B1 (ko) | 고체 산화물 연료전지용 연료극 제조방법 | |
KR20200135027A (ko) | 고체 산화물 연료전지용 전극 재료 및 그의 제조방법 | |
JP2001015129A (ja) | 固体電解質型燃料電池セル | |
US20150099063A1 (en) | Method of producing layers for solid oxide fuel cells | |
Lessing et al. | Fabrication Technologies for a Planar Solid Oxide Fuel Cell | |
Karimaghaloo | Nanoscale Functionalization of SOFC Cathode Surface and Interfaces | |
Xie | Process development of BaZrO3-BaCeO3 based electrolytes for proton-conducting solid oxide fuel cells |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20161115 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170913 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170926 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20171225 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20180403 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20180507 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6337146 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |