JP2017504842A - LED light source device for exposure and LED light source device management system for exposure - Google Patents
LED light source device for exposure and LED light source device management system for exposure Download PDFInfo
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- 239000011159 matrix material Substances 0.000 claims description 18
- 239000000758 substrate Substances 0.000 claims description 17
- 238000004891 communication Methods 0.000 claims description 7
- 230000009977 dual effect Effects 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 239000002131 composite material Substances 0.000 claims description 3
- 238000012937 correction Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 17
- 238000013461 design Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- PWPJGUXAGUPAHP-UHFFFAOYSA-N lufenuron Chemical compound C1=C(Cl)C(OC(F)(F)C(C(F)(F)F)F)=CC(Cl)=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F PWPJGUXAGUPAHP-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 235000020004 porter Nutrition 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B45/00—Circuit arrangements for operating light-emitting diodes [LED]
- H05B45/10—Controlling the intensity of the light
- H05B45/14—Controlling the intensity of the light using electrical feedback from LEDs or from LED modules
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- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
本発明は、露光用ＬＥＤ光源装置に関するものであり、複数のＬＥＤ光源ユニットを含む複数のＬＥＤ光源モジュール、複数のＬＥＤ光源モジュールの複数のＬＥＤ光源ユニットに供給される電流の大きさをそれぞれ制御して露光領域に到達する光の強度を決定し、電流の供給及び中断を制御する制御部、制御部の制御に従って複数のＬＥＤ光源モジュールに電流を供給する電源供給部、複数のＬＥＤ光源モジュールのそれぞれの動作状態及び供給電流値を使用者に表示する表示部、及び、複数のＬＥＤ光源モジュールに供給される電流の大きさを制御するように制御部に使用者の外部命令を入力するキー操作部を含む。The present invention relates to an LED light source device for exposure, and controls a plurality of LED light source modules including a plurality of LED light source units and a magnitude of current supplied to the plurality of LED light source units of the plurality of LED light source modules. A control unit that determines the intensity of light reaching the exposure region and controls supply and interruption of current, a power supply unit that supplies current to a plurality of LED light source modules according to control of the control unit, and a plurality of LED light source modules, respectively. A display unit for displaying the operating state and the supplied current value to the user, and a key operation unit for inputting an external command of the user to the control unit so as to control the magnitude of the current supplied to the plurality of LED light source modules including.
Description
本発明は、ＰＣＢ基板、半導体ウエハ又はディスプレイパネルの露光用光源装置に関するもので、ＬＥＤ（Ｌｉｇｈｔ Ｅｍｉｔｔｉｎｇ Ｄｉｏｄｅ）を光源とする光源ユニットを多数個含む光源装置、及びこれを効率的に管理することができる管理システムに関する。 The present invention relates to a light source device for exposure of a PCB substrate, a semiconductor wafer, or a display panel. The management system that can.
ＰＣＢ基板、半導体ウエハ又はディスプレイパネルの製造工程において、ウエハ及び基板の表面にコーティングされたＰＲ等を選択的に除去する露光作業が行われる。従来は、露光のための光源として超高圧水銀ランプ、ハロゲンランプを使用したが、このようなランプ光源は、寿命問題、高電圧問題、費用問題、環境問題が発生する。よって、最近はＬＥＤ（Ｌｉｇｈｔ Ｅｍｉｔｔｉｎｇ Ｄｉｏｄｅ）を使用して露光装置を構成する技術が開発されている。 In the manufacturing process of a PCB substrate, a semiconductor wafer, or a display panel, an exposure operation for selectively removing PR and the like coated on the surface of the wafer and the substrate is performed. Conventionally, an ultra-high pressure mercury lamp and a halogen lamp are used as a light source for exposure. However, such a lamp light source causes a life problem, a high voltage problem, a cost problem, and an environmental problem. Therefore, recently, a technique for configuring an exposure apparatus using an LED (Light Emitting Diode) has been developed.
韓国公開特許第２０１１−００５８５０１号は、露光用ＬＥＤランプ及びこれを用いた露光装置を開示している。図１は、従来技術による露光用ＬＥＤランプが適用された露光装置を示す。 Korean Published Patent No. 2011-0058501 discloses an exposure LED lamp and an exposure apparatus using the same. FIG. 1 shows an exposure apparatus to which a conventional LED lamp for exposure is applied.
図１を参考にすると、紫外線光源を用いてガラス基板の願う部分に回路パターンを形成する露光装置は、回路パターンが形成されたＰＣＢ基板にＬＥＤ素子を一定に配列しＬＥＤ素子の発光によって発生する熱を冷却する手段で構成され、露光用光源を発光させる露光用ＬＥＤランプユニット、露光用ＬＥＤランプユニットのＬＥＤ素子を保護する保護ガラス、露光用ＬＥＤランプユニットの点灯によって発生する不安定な紫外線光である露光用光源を均一な光源に変化させるフライアイレンズ（Ｆｌｙｅｙｅ Ｌｅｎｓ）、フライアイレンズを通って均一に変化した散乱光形態の光源を１次的に平行光形態にする１次コンデンサーレンズ（Ｃｏｎｄｅｎｓｅｒ Ｌｅｎｓ）、１次コンデンサーレンズによって１次的に平行光形態にされた光源を精密な平行光に集光してガラス基板に照射されるようにする２次コンデンサーレンズ（Ｃｏｎｄｅｎｓｅｒ Ｌｅｎｓ）、及び、ガラス基板の願う部分にだけ紫外線光が露出するようにするマスクを含んだ構成からなる。 Referring to FIG. 1, an exposure apparatus that forms a circuit pattern on a desired portion of a glass substrate using an ultraviolet light source generates LED elements by regularly arranging LED elements on a PCB substrate on which the circuit pattern is formed. LED lamp unit for exposure that emits light from the exposure light source, protection glass that protects the LED elements of the LED lamp unit for exposure, and unstable ultraviolet light generated by lighting of the LED lamp unit for exposure. A fly-eye lens that changes the exposure light source to a uniform light source (Flyeye Lens), and a primary condenser lens that makes the light source in the form of scattered light uniformly changed through the fly-eye lens a primary parallel light form ( Condenser Lens) A light source that is primarily collimated by a primary condenser lens. A structure including a secondary condenser lens (Condenser Lens) that condenses the light into precise parallel light and irradiates the glass substrate, and a mask that exposes ultraviolet light only to a desired portion of the glass substrate. Consists of.
しかし、このような従来技術の露光装置は、単一波長を有するＵＶ ＬＥＤを用いて露光装置を構成するため、多様な形態のフィルム及びインクが塗布されているＰＣＢ銅板にマスクを介して回路が形状化されることができるように均一にビームを照射するには困難があった。 However, in such a conventional exposure apparatus, the UV LED having a single wavelength is used to configure the exposure apparatus, so that a circuit is provided through a mask on a PCB copper plate coated with various forms of film and ink. It was difficult to irradiate the beam uniformly so that it could be shaped.
また、露光用ＬＥＤランプユニットの大きさが初めから決まっているため、多様な大きさの露光対象物に合わせて露光装置の大きさを変化させるのが難しく、多面積露光装置を構成することができないという問題点があった。 In addition, since the size of the LED lamp unit for exposure is determined from the beginning, it is difficult to change the size of the exposure apparatus according to exposure objects of various sizes, and a multi-area exposure apparatus can be configured. There was a problem that it was not possible.
本発明は上記した点を勘案して発明されたものであり、多様な形態及び大きさの露光対象物に対して容易に露光を実施することができる露光用ＬＥＤ光源装置、及び露光用ＬＥＤ光源装置管理システムを提供することにその目的がある。 The present invention has been invented in consideration of the above points, and an exposure LED light source device and an exposure LED light source capable of easily performing exposure on exposure objects of various forms and sizes. The purpose is to provide a device management system.
上記目的を達成するための本発明の一形態は、複数のＬＥＤ光源ユニットを含む複数のＬＥＤ光源モジュール、上記複数のＬＥＤ光源モジュールの上記複数のＬＥＤ光源ユニットに供給される電流の大きさをそれぞれ制御して露光領域に到達する光の強度を決定し、電流の供給及び中断を制御する制御部、上記制御部の制御に従って上記複数のＬＥＤ光源モジュールに電流を供給する電源供給部、上記複数のＬＥＤ光源モジュールのそれぞれの動作状態及び供給電流値を使用者に表示する表示部、及び、上記複数のＬＥＤ光源モジュールに供給される電流の大きさを制御するように上記制御部に使用者の外部命令を入力するキー操作部を含む露光用ＬＥＤ光源装置である。 One mode of the present invention for achieving the above object is to provide a plurality of LED light source modules including a plurality of LED light source units and magnitudes of currents supplied to the plurality of LED light source units of the plurality of LED light source modules, respectively. A control unit configured to control the light intensity reaching the exposure region and control supply and interruption of current; a power supply unit configured to supply current to the plurality of LED light source modules according to control of the control unit; A display unit for displaying the operating state and supply current value of each LED light source module to the user, and the control unit external to the user so as to control the magnitude of the current supplied to the plurality of LED light source modules. It is the LED light source device for exposure including the key operation part which inputs a command.
このとき、上記複数のＬＥＤ光源モジュールはマトリックス形態に配列され、上記ＬＥＤ光源モジュール内の上記複数のＬＥＤ光源ユニットは、マトリックス形態に配列されることが望ましい。 At this time, it is preferable that the plurality of LED light source modules are arranged in a matrix form, and the plurality of LED light source units in the LED light source module are arranged in a matrix form.
また、上記ＬＥＤ光源モジュール内の上記複数のＬＥＤ光源ユニットは、互いに波長が異なる２種類のＬＥＤ光源ユニットからなることができる。このとき、上記ＬＥＤ光源モジュール内の上記複数のＬＥＤ光源ユニットは３×３マトリックス形態に配列され、中央部の１個のＬＥＤ光源ユニットは４０５ｎｍの波長を有し、周辺部の８個のＬＥＤ光源ユニットは３６５ｎｍの波長を有することができる。上記１個の４０５ｎｍＬＥＤ光源ユニットのビームが、上記８個の３６５ｎｍＬＥＤ光源ユニットのビームと全て重畳して複合波長になることができるように、上記４０５ｎｍＬＥＤ光源ユニットを上記３６５ｎｍＬＥＤ光源ユニットより大きく構成することが望ましい。 Further, the plurality of LED light source units in the LED light source module can be composed of two types of LED light source units having different wavelengths. At this time, the plurality of LED light source units in the LED light source module are arranged in a 3 × 3 matrix form, and one LED light source unit in the central portion has a wavelength of 405 nm, and eight LED light sources in the peripheral portion. The unit can have a wavelength of 365 nm. The 405 nm LED light source unit may be configured to be larger than the 365 nm LED light source unit so that the beam of the one 405 nm LED light source unit can overlap with all the beams of the eight 365 nm LED light source units to form a composite wavelength. desirable.
さらに、上記制御部は、上記ＬＥＤ光源モジュールの互いに波長が異なる２種類のＬＥＤ光源ユニットに対して２セットデュアル制御を行うことが望ましい。また制御部は、マトリックス形態に配列された上記複数のＬＥＤ光源ユニットの間のビーム重畳部の出力が低下しないように、ＬＥＤの照射面積をＬＥＤの大きさより大きく調節することが望ましい。 Furthermore, it is desirable that the control unit performs two sets of dual control for two types of LED light source units having different wavelengths from each other of the LED light source module. Further, it is desirable that the control unit adjust the irradiation area of the LED to be larger than the size of the LED so that the output of the beam superimposing unit between the plurality of LED light source units arranged in a matrix form does not decrease.
また、上記ＬＥＤ光源ユニットは、供給電流に応じて強度が制御された光を発生させるＬＥＤ光源、上記ＬＥＤ光源が配置され、回路パターンが形成されたＬＥＤ基板、上記ＬＥＤ光源から放射されたビームに対して角補正を行う１次レンズ、上記１次レンズを経たビームに対して集光収斂を行う２次レンズ、上記ＬＥＤ光源、上記ＬＥＤ基板、上記１次レンズ及び上記２次レンズに対してハウジングを提供するユニットボディーを含むことができる。 The LED light source unit includes an LED light source that generates light whose intensity is controlled according to a supply current, an LED substrate on which the LED light source is arranged and a circuit pattern is formed, and a beam emitted from the LED light source. A primary lens that performs angle correction on the secondary lens, a secondary lens that condenses light on the beam that has passed through the primary lens, a housing for the LED light source, the LED substrate, the primary lens, and the secondary lens. A unit body can be included.
上記目的を達成するための本発明の他の形態は、複数のＬＥＤ光源ユニットを含む複数のＬＥＤ光源モジュール、上記複数のＬＥＤ光源モジュールの上記複数のＬＥＤ光源ユニットに供給される電流の大きさをそれぞれ制御して露光領域に到達する光の強度を決定し、電流の供給及び中断を制御する制御部、上記制御部の制御に従って上記複数のＬＥＤ光源モジュールに電流を供給する電源供給部、上記複数のＬＥＤ光源モジュールのそれぞれの動作状態及び供給電流値を使用者に表示する表示部、及び、上記複数のＬＥＤ光源モジュールに供給される電流の大きさを制御するように上記制御部に使用者の外部命令を入力するキー操作部を含む露光用ＬＥＤ光源装置、及び、多数の露光装備にそれぞれ設置される上記露光用ＬＥＤ光源装置を有無線通信網を介して遠隔で統合制御及び管理する中央管理サーバーを含む露光用ＬＥＤ光源装置管理システムである。 According to another aspect of the present invention for achieving the above object, a plurality of LED light source modules including a plurality of LED light source units, and a magnitude of current supplied to the plurality of LED light source units of the plurality of LED light source modules. A control unit that determines the intensity of light reaching the exposure area by controlling each of them and controls supply and interruption of current; a power supply unit that supplies current to the plurality of LED light source modules according to control of the control unit; A display unit for displaying the operating state and supply current value of each of the LED light source modules to the user, and the control unit for controlling the magnitude of the current supplied to the plurality of LED light source modules. An LED light source device for exposure including a key operation unit for inputting an external command, and the LED light source device for exposure described above installed in many exposure equipments An exposure for the LED light source device management system including a central management server to integrated control and management remotely via a wireless communication network.
上記のように、本発明によれば、２種類以上のＬＥＤ光源ユニットをマトリックス形態に配列してＬＥＤ光源モジュールを構成するため、多様なパターンの太さの露光対象物に対して容易に露光を実施することができる効果がある。すなわち、ＬＥＤをアレイ化して強度（Ｉｎｔｅｎｓｉｔｙ）及び均一度（Ｕｎｉｆｏｒｍｉｔｙ）の最適化が可能となり、ＬＥＤの数量が１５０ＥＡ以内で露光実面積５１０＊６１０ｍｍ内に光効率が９０％となるようにした。 As described above, according to the present invention, since an LED light source module is configured by arranging two or more types of LED light source units in a matrix form, an exposure object with various pattern thicknesses can be easily exposed. There is an effect that can be implemented. That is, the LEDs are arrayed to optimize the intensity and uniformity, and the light efficiency is 90% within the actual exposure area 510 * 610 mm when the number of LEDs is within 150 EA.
また、多数のＬＥＤ光源モジュールをアレイ化して露光装置を構成するため、多面積の露光対象物に対して容易に露光を実施することができる効果がある。 In addition, since an exposure apparatus is configured by arraying a large number of LED light source modules, there is an effect that exposure can be easily performed on a multi-area exposure object.
以下、添付された図面を参照して本発明による望ましい実施例を詳細に説明することにする。しかし、以下の実施例は、この技術分野で通常的な知識を有する者に本発明が充分に理解されるように提供されるものであり、様々な他の形態に変形されることができ、本発明の範囲が次に記述される実施例に限定されるものではない。 Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. However, the following examples are provided so that those skilled in the art can fully understand the present invention and can be modified into various other forms. The scope of the present invention is not limited to the examples described below.
図２は本発明の望ましい実施例による露光用ＬＥＤ光源装置を説明するブロック図である。図２を参考にすると、本発明の望ましい実施例による露光用ＬＥＤ光源装置１００は、ＬＥＤ光源モジュール１１０、制御部１２０、電源供給部１３０、キー操作部１５０、表示部１４０、通信部１６０、運用端末２００を含む。 FIG. 2 is a block diagram illustrating an LED light source device for exposure according to a preferred embodiment of the present invention. Referring to FIG. 2, an LED light source device 100 for exposure according to a preferred embodiment of the present invention includes an LED light source module 110, a control unit 120, a power supply unit 130, a key operation unit 150, a display unit 140, a communication unit 160, an operation. A terminal 200 is included.
図３は本発明の一実施例によるＬＥＤ光源モジュールを説明する概念図で、図４は図３によるＬＥＤ光源モジュールの３次元設計図である。 FIG. 3 is a conceptual diagram illustrating an LED light source module according to an embodiment of the present invention. FIG. 4 is a three-dimensional design diagram of the LED light source module according to FIG.
図３及び図４を参考にすると、ＬＥＤ光源モジュール１１０は、複数のＬＥＤ光源ユニット１１２ａ，１１２ｂを含むが、複数のＬＥＤ光源ユニット１１２ａ，１１２ｂはマトリックス形態に配列される。例えば、図３及び図４に示されたように、ＬＥＤ光源モジュール１１０内の複数のＬＥＤ光源ユニット１１２ａ，１１２ｂは３×３マトリックス形態に配列されるが、Ｘで表示した中央部の１個のＬＥＤ光源ユニット１１２ｂは４０５ｎｍの波長を有し、Ｏで表示した周辺部の８個のＬＥＤ光源ユニット１１２ａは３６５ｎｍの波長を有するもので配列されることができる。このように、ＬＥＤ光源モジュール１１０内の複数のＬＥＤ光源ユニット１１２ａ，１１２ｂは、互いに波長が異なる多種類、例えば２種類のＬＥＤ光源ユニットからなることができる。マトリックス形態の大きさ及び互いに異なるＬＥＤ光源ユニットの配置は、図３及び図４に限定されず、露光対象物の特性に応じて変わることができる。 Referring to FIGS. 3 and 4, the LED light source module 110 includes a plurality of LED light source units 112a and 112b, and the plurality of LED light source units 112a and 112b are arranged in a matrix form. For example, as shown in FIGS. 3 and 4, the plurality of LED light source units 112 a and 112 b in the LED light source module 110 are arranged in a 3 × 3 matrix form, but one central portion indicated by X is used. The LED light source unit 112b has a wavelength of 405 nm, and the eight LED light source units 112a in the peripheral portion indicated by O can be arranged with a wavelength of 365 nm. As described above, the plurality of LED light source units 112a and 112b in the LED light source module 110 can be composed of many types, for example, two types of LED light source units having different wavelengths. The size of the matrix form and the arrangement of the LED light source units different from each other are not limited to those in FIGS. 3 and 4, and can vary depending on the characteristics of the exposure object.
さらに、図４に示されたように、中央部の１個の４０５ｎｍＬＥＤ光源ユニットのビームが、周辺部の８個の３６５ｎｍＬＥＤ光源ユニットのビームと全て重畳して複合波長になることができるように、４０５ｎｍＬＥＤ光源ユニットを３６５ｎｍＬＥＤ光源ユニットより大きく構成することが望ましい。 Furthermore, as shown in FIG. 4, the beam of one 405 nm LED light source unit in the central part can be superposed with the beams of eight 365 nm LED light source units in the peripheral part to be a composite wavelength. It is desirable to configure the 405 nm LED light source unit to be larger than the 365 nm LED light source unit.
このように互いに異なる波長を有する多種類のＬＥＤ光源ユニットを一つのＬＥＤ光源モジュールにマトリックス形態に配置することにより、露光対象物の特性に合わせてＬＥＤ光源の波長を選択することができる。例えば、３６５ｎｍ（ｉ−ｌｉｎｅ）と４０５ｎｍ（ｈ−ｌｉｎｅ）の複合波長ＵＶ（紫外線）領域のＬＥＤビームをフォトマスクに照射してマスク上の回路パターンをコーティングされたＰＣＢ基板に転写することができるようになる。 As described above, by arranging various types of LED light source units having different wavelengths in a matrix form in one LED light source module, the wavelength of the LED light source can be selected in accordance with the characteristics of the exposure object. For example, a photomask can be irradiated with an LED beam in a combined wavelength UV (ultraviolet) region of 365 nm (i-line) and 405 nm (h-line) to transfer the circuit pattern on the mask onto the coated PCB substrate. It becomes like this.
図５は本発明の一実施例による複数のＬＥＤ光源モジュールが配置されたことを説明する概念図で、図６は図５によるＬＥＤ光源モジュールの３次元設計図である。 FIG. 5 is a conceptual diagram illustrating a plurality of LED light source modules according to an embodiment of the present invention, and FIG. 6 is a three-dimensional design diagram of the LED light source module according to FIG.
図５及び図６に示されたように、複数のＬＥＤ光源モジュール１１０はマトリックス形態に配列される。このように複数のＬＥＤ光源モジュールをマトリックス形態に配列することにより、露光対象物の大きさに合わせて自由に大きさを変形させることができ、多面積を有する露光装置を容易に作ることができる。例えば、図５のように３×３のＬＥＤ光源モジュール１１０を３×３のマトリックス形態に配列すれば、計８１個のＬＥＤ光源ユニットを配置することができる。そして、図６のように、３×３のＬＥＤ光源モジュールを４×４のマトリックス形態に配列すれば、１４４個のＬＥＤ光源ユニットを配置することができる。よって、本発明によるマトリックス配列の露光用ＬＥＤ光源装置によれば、１：１マスクパターン露光方式でＵＶ領域のＬＥＤビームが均一に露光対象物に照射されることが可能となる。 As shown in FIGS. 5 and 6, the plurality of LED light source modules 110 are arranged in a matrix form. By arranging a plurality of LED light source modules in a matrix form in this way, the size can be freely changed in accordance with the size of the object to be exposed, and an exposure apparatus having a large area can be easily made. . For example, if 3 × 3 LED light source modules 110 are arranged in a 3 × 3 matrix form as shown in FIG. 5, a total of 81 LED light source units can be arranged. Then, as shown in FIG. 6, if the 3 × 3 LED light source modules are arranged in a 4 × 4 matrix, 144 LED light source units can be arranged. Therefore, according to the LED light source device for exposure with a matrix arrangement according to the present invention, it becomes possible to uniformly irradiate the exposure object with the LED beam in the UV region by the 1: 1 mask pattern exposure method.
図７は本発明の一実施例によるＬＥＤ光源ユニットを説明する断面図で、図８は図７によるＬＥＤ光源ユニットの３次元設計図である。図７を参考にすると、ＬＥＤ光源ユニット１１２は、ＬＥＤ光源１１４、ＬＥＤ基板１１８、１次レンズ１１５、２次レンズ１１６及び、ユニットボディー１１７を含んでなる。 FIG. 7 is a cross-sectional view illustrating an LED light source unit according to an embodiment of the present invention, and FIG. 8 is a three-dimensional design diagram of the LED light source unit according to FIG. Referring to FIG. 7, the LED light source unit 112 includes an LED light source 114, an LED substrate 118, a primary lens 115, a secondary lens 116, and a unit body 117.
ＬＥＤ光源１１４は、供給電流に応じて強度が制御された光を発生させるもので、ＬＥＤ基板１１８上に設置される。ＬＥＤ基板１１８は、回路パターンが形成されＬＥＤに電流と電圧を供給する。１次レンズ１１５は、ＬＥＤ光源１１４から放射されたビームに対して角補正を行う。すなわち、図７に示されたように、ＬＥＤ光源の広さより広い面積にビームが照射されることができるようにする。２次レンズ１１６は、１次レンズ１１５を経たビームに対して集光収斂を行う。このようなＬＥＤ光源１１４、ＬＥＤ基板１１８、１次レンズ１１５及び２次レンズ１１６は、ユニットボディー１１７に設置されて一つのＬＥＤ光源ユニット１１２を構成する。 The LED light source 114 generates light whose intensity is controlled according to the supplied current, and is installed on the LED substrate 118. The LED substrate 118 is formed with a circuit pattern and supplies current and voltage to the LED. The primary lens 115 performs angle correction on the beam emitted from the LED light source 114. That is, as shown in FIG. 7, the beam can be irradiated to an area wider than the area of the LED light source. The secondary lens 116 converges and converges the beam that has passed through the primary lens 115. The LED light source 114, the LED substrate 118, the primary lens 115, and the secondary lens 116 are installed on the unit body 117 to constitute one LED light source unit 112.
図９は隣接して配列された２個のＬＥＤ光源ユニット１１２からビームが照射されることを説明する図である。図９を参考にすると、個別ＬＥＤの照射面積が１０ｍｍであるとき、個別ＬＥＤの間の部分（１ｍｍ）は出力が低下することがあり得る。よって、ＬＥＤの照射面積を１０ｍｍより若干大きく調節し、重畳部分（すなわち、ＬＥＤのエッジ部位）の出力が低下しないように制御する。例えば、一方のＬＥＤから５０％のビーム、他方のＬＥＤから５０％のビームを受信することにより、ＬＥＤユニットの間の重畳部分は出力が低下せずＬＥＤ内部の出力と同じに制御されてエネルギー密度が均一になる。
再び図２を参考にすると、制御部１２０は、ＬＥＤ光源モジュール１１０のＬＥＤ光源ユニット１１２に供給される電流の大きさをそれぞれ制御して露光領域に到達する光の強度を決定し、電流の供給及び中断を制御する。
FIG. 9 is a diagram for explaining that a beam is emitted from two LED light source units 112 arranged adjacent to each other. Referring to FIG. 9, when the irradiation area of the individual LEDs is 10 mm, the output between the individual LEDs (1 mm) may decrease. Therefore, the irradiation area of the LED is adjusted to be slightly larger than 10 mm so that the output of the overlapping portion (that is, the edge portion of the LED) is not lowered. For example, by receiving a 50% beam from one LED and a 50% beam from the other LED, the overlapping portion between the LED units is controlled to be the same as the output inside the LED without decreasing the output, and the energy density Becomes uniform.
Referring to FIG. 2 again, the controller 120 determines the intensity of light reaching the exposure area by controlling the magnitude of the current supplied to the LED light source unit 112 of the LED light source module 110, and supplies the current. And control interruptions.
ＬＥＤ光源モジュール１１０に互いに波長が異なる２種類のＬＥＤ光源ユニット１１２ａ，１１２ｂが配列された場合、制御部１２０は、ＬＥＤ光源モジュールに対して２セットデュアル制御を行う。すなわち、３６５ｎｍのＬＥＤ光源ユニットに対しては１４．９ｖ及び７００ｍＡを供給するように制御し、４０５ｎｍＬＥＤ光源ユニットに対しては１２〜４８ｖ及び１０００〜１８００ｍＡを供給するように制御することができる。よって、図３に示されたように、ＬＥＤ光源モジュール１１０に２種類９個のＬＥＤ光源ユニット１１２ａ，１１２ｂが配列された場合にも、単にデュアルチャンネルで制御を行うことができる。 When two types of LED light source units 112a and 112b having different wavelengths are arranged on the LED light source module 110, the control unit 120 performs two sets of dual control on the LED light source module. That is, it can be controlled to supply 14.9 v and 700 mA to the 365 nm LED light source unit, and can be controlled to supply 12 to 48 v and 1000 to 1800 mA to the 405 nm LED light source unit. Therefore, as shown in FIG. 3, even when two types and nine LED light source units 112a and 112b are arranged in the LED light source module 110, the control can be simply performed in the dual channel.
また、制御部１２０は、必要時のみＬＥＤ光源ユニットをＯｎして、不要な電力消耗及び性能低下を防止することができる。このような本発明の制御部１２０は、アナログ制御方式の代りにデジタル制御方式によるＭＣＵで具現することができる。このようなＭＣＵは、設備Ｉ／Ｏ制御、光源制御、外部環境制御が可能であり、一つのＭＣＵで３６ＣＨ制御を行うとき、３２ＣＨは３６５ｎｍＬＥＤ光源ユニットを制御し、他の４ＣＨは４０５ｎｍＬＥＤ光源ユニットを制御するものとして動作することができる。図１０は制御部として使用されるＭＣＵの一例を説明するためのブロック図である。 Further, the controller 120 can turn on the LED light source unit only when necessary to prevent unnecessary power consumption and performance degradation. The control unit 120 of the present invention can be implemented by an MCU using a digital control method instead of an analog control method. Such MCU is capable of facility I / O control, light source control, and external environment control. When performing 36CH control with one MCU, 32CH controls the 365nm LED light source unit, and the other 4CH controls the 405nm LED light source unit. Can operate as a control. FIG. 10 is a block diagram for explaining an example of the MCU used as the control unit.
電源供給部１３０は、制御部１２０の制御に従ってＬＥＤ光源モジュール１１０に電圧及び電流を供給する。電源供給部１３０は定電流制御方式でＬＥＤ光源ユニットに安定的な電圧及び電流を供給することができる。 The power supply unit 130 supplies voltage and current to the LED light source module 110 according to the control of the control unit 120. The power supply unit 130 can supply a stable voltage and current to the LED light source unit by a constant current control method.
表示部１４０は、ＬＥＤ光源モジュール１１０のそれぞれの動作状態及び供給電流値を使用者に表示する。キー操作部１５０は、ＬＥＤ光源モジュール１１０に供給される電流の大きさを制御するように、制御部１２０に使用者の外部命令を入力する。このような表示部１４０及びキー操作部１５０は、一つのＬＣＤタッチスクリーンで具現されることができる。 The display unit 140 displays each operation state and supply current value of the LED light source module 110 to the user. The key operation unit 150 inputs a user's external command to the control unit 120 so as to control the magnitude of the current supplied to the LED light source module 110. The display unit 140 and the key operation unit 150 may be implemented with a single LCD touch screen.
本発明の望ましい実施例による露光用ＬＥＤ光源装置は、この露光用ＬＥＤ光源装置１００を個別的に制御、管理及び運用する運用端末２００を含むことができる。運用端末２００は、ＰＣ形態のコンピューター端末又は現場管理者の携帯型モバイル端末がなることができ、通信部１６０を介して露光用ＬＥＤ光源装置１００に有無線連結される。 The LED light source device for exposure according to a preferred embodiment of the present invention may include an operation terminal 200 that individually controls, manages, and operates the LED light source device 100 for exposure. The operation terminal 200 can be a PC-type computer terminal or a portable mobile terminal of a site manager, and is connected to the LED light source device 100 for exposure via a communication unit 160 via a wireless connection.
通信部１６０は、運営端末２００からＬＥＤ光源モジュール１１０の制御命令を受信し、ＬＥＤ光源モジュール１１０の動作に関する各種情報を運営端末２００に伝送するためにＲＳ２３２、ＲＳ４８５ポート等で具現されることができ、伝送された情報及びデータは、運営端末２００に保存及び維持されることができる。この他にも、露光設備と通信する通信部をさらに備えることができる。 The communication unit 160 may be implemented with an RS232 port, an RS485 port, or the like in order to receive a control command for the LED light source module 110 from the operation terminal 200 and transmit various information regarding the operation of the LED light source module 110 to the operation terminal 200. The transmitted information and data can be stored and maintained in the operation terminal 200. In addition, a communication unit that communicates with the exposure equipment can be further provided.
本発明による露光用ＬＥＤ光源装置は、有無線ネットワークを介して中央管理サーバーに連結されることができる。中央管理サーバーは、遠隔地から複数台の露光用ＬＥＤ光源装置１００を全体的に制御及び管理することができる。一方、運用端末２００は、選択的に使用されることができ、運用端末２００が使用されない場合には、露光用ＬＥＤ光源装置１００が直接有無線ネットワークを介して中央管理サーバー（３００）に接続される。 The LED light source device for exposure according to the present invention can be connected to a central management server via a wired / wireless network. The central management server can generally control and manage a plurality of LED light source devices 100 for exposure from a remote location. On the other hand, the operation terminal 200 can be selectively used. When the operation terminal 200 is not used, the exposure LED light source device 100 is directly connected to the central management server (300) via the wired / wireless network. The
図１０は、制御部として使用されるＭＣＵの一例を説明するためのブロック図である。 FIG. 10 is a block diagram for explaining an example of the MCU used as the control unit.
［未説明符号］
１：ＰＯＲＴＦ ＤＲＩＶＥＲＳ、２：ＰＯＲＴＡ ＤＲＩＶＥＲＳ、 ３：ＰＯＲＴＣ ＤＲＩＶＥＲＳ、４：ＤＡＴＡ ＲＥＧＩＳＴＥＲ ＰＯＲＴＦ、５：ＤＡＴＡ ＤＩＲ． ＲＥＧ． ＰＯＲＴＦ、６：ＤＡＴＡ ＲＥＧＩＳＴＥＲ ＰＯＲＴＡ、７：ＤＡＴＡ ＤＩＲ． ＲＥＧ． ＰＯＲＴＡ、８：ＤＡＴＡ ＲＥＧＩＳＴＥＲ ＰＯＲＴＣ、９：ＤＡＴＡ ＤＩＲ． ＲＥＧ． ＰＯＲＴＣ、 １０：ＡＤＣ、１１：ＪＴＡＧ ＴＡＰ、１２：ＰＲＯＧＲＡＭ ＣＯＵＮＴＥＲ、１３：ＳＴＡＣＫ ＰＯＩＮＴＥＲ、１４：ＯＮ−ＣＨＩＰ ＤＥＢＵＧ、１５：ＰＲＯＧＲＡＭ ＦＬＡＳＨ、１６：ＳＲＡＭ、１７：ＢＯＵＮＤＡＲＹ． ＳＣＡＮ、１８：ＩＮＳＴＲＵＣＴＩＯＮ ＲＥＧＩＳＴＥＲ、１９：ＧＥＮＥＲＡＬ ＰＵＲＰＯＳＥ ＲＥＧＩＳＴＥＲＳ、２０：ＰＲＯＧＲＡＭＭＩＮＧ ＬＯＧＩＣ、２１：ＩＮＳＴＲＵＣＴＩＯＮ ＤＥＣＯＤＥＲ、２２：ＡＬＵ、２３：ＳＴＡＴＵＳ ＲＥＧＩＳＴＥＲ、２４：ＵＳＡＲＴＯ、２５：ＩＮＴＥＲＮＡＬ ＯＳＣＩＬＬＡＴＯＲ、２６：ＷＡＴＣＨＤＯＧ ＴＩＭＥＲ、２７：ＭＣＵ ＣＯＮＴＲＯＬ ＲＥＧＩＳＴＥＲ、２８：ＴＩＭＥＲ／ＣＯＵＮＴＥＲＳ、２９：ＩＮＴＥＲＲＵＰＴ ＵＮＩＴ、３０：ＥＥＰＲＯＭ、３１：ＣＡＬＩＢ． ＯＳＣ、３２：ＯＳＣＩＬＬＡＴＯＲ、３３：ＯＳＣＩＬＬＡＴＯＲ、３４：ＴＩＭＩＮＧ ＡＮＤ ＣＯＮＴＲＯＬ、３５：ＳＰＩ、３６：ＵＳＡＲＴ１、３７：ＴＷＯ−ＷＩＲＥ ＳＥＲＩＡＬ ＩＮＴＥＲＦＡＣＥ、３８：ＤＡＴＡ ＲＥＧＩＳＴＥＲ ＰＯＲＴＥ、３９：ＤＡＴＡ ＤＩＲ． ＲＥＧ． ＰＯＲＴＥ、４０：ＤＡＴＡ ＲＥＧＩＳＴＥＲ ＰＯＲＴＢ、４１：ＤＡＴＡ ＤＩＲ． ＲＥＧ． ＰＯＲＴＢ、４２：ＤＡＴＡ ＲＥＧＩＳＴＥＲ ＰＯＲＴＤ、４３：ＤＡＴＡ ＤＩＲ． ＲＥＧ． ＰＯＲＴＤ、４４：ＤＡＴＡ ＲＥＧ． ＰＯＲＴＧ、４５：ＤＡＴＡ ＤＩＲ． ＲＥＧ． ＰＯＲＴＧ、４６：ＰＯＲＴＥ ＤＲＩＶＥＲＳ、４７：ＰＯＲＴＢ ＤＲＩＶＥＲＳ、４８：ＰＯＲＴＤ ＤＲＩＶＥＲＳ、４９：ＰＯＲＴＧ ＤＲＩＶＥＲＳ、５０：ＡＮＡＬＯＧ ＣＯＭＰＡＲＡＴＯＲ．
[Unexplained code]
1: PORTF DRIVERS, 2: PORTA DRIVERS, 3: PORTC DRIVERS, 4: DATA REGISTER PORTF, 5: DATA DIR. REG. PORTF, 6: DATA REGISTER PORTA, 7: DATA DIR. REG. PORTA, 8: DATA REGISTER PORTC, 9: DATA DIR. REG. PORTTC, 10: ADC, 11: JTAG TAP, 12: PROGRAM COUNTER, 13: STACK POINTER, 14: ON-CHIP DEBUG, 15: PROGRAM FLASH, 16: SRAM, 17: BOUNDARY. SCAN, 18: INSTRUTION REGISTER, 19: GENERAL PURPOSE REGISTERS, 20: PROGRAMMING LOGIC, 21: INSTRUTION DECODER, 22: ALU, 23: STATUS REGISTER, 24: USERRTO REGISTER, 28: TIMER / COUNTERS, 29: INTERRUPT UNIT, 30: EEPROM, 31: CALIB. OSC, 32: OSCILLATOR, 33: OSCILLATOR, 34: TIMING AND CONTROL, 35: SPI, 36: USART1, 37: TWO-WISER SERIAL INTERFACE, 38: DATA REGISTER PORTE, 39: DATA DIR. REG. PORTE, 40: DATA REGISTER PORTB, 41: DATA DIR. REG. PORTB, 42: DATA REGISTER PORTD, 43: DATA DIR. REG. PORTD, 44: DATA REG. PORTG, 45: DATA DIR. REG. PORTG, 46: PORTER DRIVERS, 47: PORTB DRIVERS, 48: PORTD DRIVERS, 49: PORTG DRIVERS, 50: ANALOG COMPARATOR.
１００ 露光用ＬＥＤ光源装置
１１０ ＬＥＤ光源モジュール
１１２ ＬＥＤ光源ユニット
１１２ａ ＬＥＤ光源ユニット
１１２ｂ ＬＥＤ光源ユニット
１１４ ＬＥＤ光源ユニット
１１５ １次レンズ
１１６ ２次レンズ
１１７ ユニットボディー
１１８ ＬＥＤ基板
１２０ 制御部
１３０ 電源供給部
１４０ 表示部
１５０ キー操作部
１６０ 通信部
２００ 運用端末
100 LED light source device for exposure 110 LED light source module 112 LED light source unit 112a LED light source unit 112b LED light source unit 114 LED light source unit 115 primary lens 116 secondary lens 117 unit body 118 LED substrate 120 control unit 130 power supply unit 140 display unit 150 Key operation unit 160 Communication unit 200 Operation terminal
Claims (10)
上記複数のＬＥＤ光源モジュールの上記複数のＬＥＤ光源ユニットに供給される電流の大きさをそれぞれ制御して露光領域に到達する光の強度を決定し、電流の供給及び中断を制御する制御部；
上記制御部の制御に従って上記複数のＬＥＤ光源モジュールに電流を供給する電源供給部；
上記複数のＬＥＤ光源モジュールのそれぞれの動作状態及び供給電流値を使用者に表示する表示部；及び
上記複数のＬＥＤ光源モジュールに供給される電流の大きさを制御するように上記制御部に使用者の外部命令を入力するキー操作部を含むことを特徴とする露光用ＬＥＤ光源装置。 A plurality of LED light source modules including a plurality of LED light source units;
A control unit for controlling the supply and interruption of current by determining the intensity of light reaching the exposure region by controlling the magnitude of the current supplied to the plurality of LED light source units of the plurality of LED light source modules;
A power supply unit for supplying current to the plurality of LED light source modules according to the control of the control unit;
A display unit that displays to the user operating states and supply current values of the plurality of LED light source modules; and a user to the control unit to control the magnitude of the current supplied to the plurality of LED light source modules. An LED light source device for exposure comprising a key operation unit for inputting the external command.
供給電流に応じて強度が制御された光を発生させるＬＥＤ光源；
上記ＬＥＤ光源が配置され、回路パターンが形成されたＬＥＤ基板；
上記ＬＥＤ光源から放射されたビームに対して角補正を行う１次レンズ；
上記１次レンズを経たビームに対して集光収斂を行う２次レンズ；
上記ＬＥＤ光源、上記ＬＥＤ基板、上記１次レンズ及び上記２次レンズに対してハウジングを提供するユニットボディーを含むことを特徴とする、請求項１に記載の露光用ＬＥＤ光源装置。 The LED light source unit is
An LED light source that generates light of controlled intensity according to the supply current;
An LED substrate on which the LED light source is arranged and a circuit pattern is formed;
A primary lens that performs angle correction on the beam emitted from the LED light source;
A secondary lens that converges and converges the beam that has passed through the primary lens;
2. The LED light source device for exposure according to claim 1, further comprising a unit body that provides a housing for the LED light source, the LED substrate, the primary lens, and the secondary lens.
多数の露光装備にそれぞれ設置される上記露光用ＬＥＤ光源装置を有無線通信網を介して遠隔で統合制御及び管理する中央管理サーバーを含む露光用ＬＥＤ光源装置管理システム。 A plurality of LED light source modules including a plurality of LED light source units and a current intensity supplied to the plurality of LED light source units of the plurality of LED light source modules are controlled to determine the intensity of light reaching the exposure region. A control unit that controls supply and interruption of current, a power supply unit that supplies current to the plurality of LED light source modules according to the control of the control unit, and an operation state and a supply current value of each of the plurality of LED light source modules LED light source device for exposure including a display unit for display to a person and a key operation unit for inputting an external command of the user to the control unit so as to control the magnitude of current supplied to the plurality of LED light source modules ,as well as;
An exposure LED light source device management system including a central management server that remotely controls and manages the LED light source device for exposure, which is installed in each of a plurality of exposure equipments, via a wired / wireless communication network.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020130130288A KR101532352B1 (en) | 2013-10-30 | 2013-10-30 | LED light source apparatus for exposure resist and management system for the same |
| KR10-2013-0130288 | 2013-10-30 | ||
| PCT/KR2013/009944 WO2015064801A1 (en) | 2013-10-30 | 2013-11-05 | Exposure led light source apparatus and exposure led light source apparatus management system |
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| Publication Number | Publication Date |
|---|---|
| JP2017504842A true JP2017504842A (en) | 2017-02-09 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2016552366A Pending JP2017504842A (en) | 2013-10-30 | 2013-11-05 | LED light source device for exposure and LED light source device management system for exposure |
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| Country | Link |
|---|---|
| JP (1) | JP2017504842A (en) |
| KR (1) | KR101532352B1 (en) |
| CN (1) | CN105765459A (en) |
| WO (1) | WO2015064801A1 (en) |
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| JP2020095147A (en) * | 2018-12-12 | 2020-06-18 | フェニックス電機株式会社 | Light source for exposure apparatus, exposure apparatus using the same, and method for controlling light source for exposure apparatus |
| JP2021021748A (en) * | 2019-07-24 | 2021-02-18 | 株式会社Ｓｃｒｅｅｎホールディングス | Additional exposure apparatus and pattern forming method |
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| KR101649129B1 (en) * | 2015-08-21 | 2016-08-18 | (주)블루코어 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
| KR20170015075A (en) | 2015-12-01 | 2017-02-08 | 조남직 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
| KR20170022877A (en) | 2016-08-01 | 2017-03-02 | 조남직 | UV LED light source module unit for exposure photolithography process and exposure photolithography apparatus used the same |
| JP6866631B2 (en) * | 2016-12-20 | 2021-04-28 | 東京エレクトロン株式会社 | Optical processing equipment, coating, developing equipment, optical processing method and storage medium |
| KR102627984B1 (en) | 2021-08-17 | 2024-01-23 | 유버 주식회사 | Light emitting device for exposure |
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Also Published As
| Publication number | Publication date |
|---|---|
| KR20150049563A (en) | 2015-05-08 |
| KR101532352B1 (en) | 2015-06-29 |
| CN105765459A (en) | 2016-07-13 |
| WO2015064801A1 (en) | 2015-05-07 |
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