JP2017502331A5 - - Google Patents

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Publication number
JP2017502331A5
JP2017502331A5 JP2016536814A JP2016536814A JP2017502331A5 JP 2017502331 A5 JP2017502331 A5 JP 2017502331A5 JP 2016536814 A JP2016536814 A JP 2016536814A JP 2016536814 A JP2016536814 A JP 2016536814A JP 2017502331 A5 JP2017502331 A5 JP 2017502331A5
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JP
Japan
Prior art keywords
liquid composition
photoreactive liquid
photon
free radical
component
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JP2016536814A
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English (en)
Japanese (ja)
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JP2017502331A (ja
JP6566952B2 (ja
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Priority claimed from PCT/US2014/067955 external-priority patent/WO2015084735A2/en
Publication of JP2017502331A publication Critical patent/JP2017502331A/ja
Publication of JP2017502331A5 publication Critical patent/JP2017502331A5/ja
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Publication of JP6566952B2 publication Critical patent/JP6566952B2/ja
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JP2016536814A 2013-12-06 2014-12-01 光反応性液体組成物及び構造体の作製方法 Active JP6566952B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361912754P 2013-12-06 2013-12-06
US61/912,754 2013-12-06
PCT/US2014/067955 WO2015084735A2 (en) 2013-12-06 2014-12-01 Liquid photoreactive composition and method of fabricating structures

Publications (3)

Publication Number Publication Date
JP2017502331A JP2017502331A (ja) 2017-01-19
JP2017502331A5 true JP2017502331A5 (https=) 2017-11-09
JP6566952B2 JP6566952B2 (ja) 2019-08-28

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JP2016536814A Active JP6566952B2 (ja) 2013-12-06 2014-12-01 光反応性液体組成物及び構造体の作製方法

Country Status (5)

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US (1) US10133174B2 (https=)
EP (1) EP3077421B1 (https=)
JP (1) JP6566952B2 (https=)
CN (1) CN105917275B (https=)
WO (1) WO2015084735A2 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5584202B2 (ja) 2008-05-21 2014-09-03 セラジェクト， インコーポレイテッド 固溶体穿孔器パッチの製造方法及びその使用
CN105793758A (zh) 2013-12-06 2016-07-20 3M创新有限公司 具有保护元件的半潜式显微镜物镜和物镜在多光子成像方法中的用途
FR3049606B1 (fr) 2016-03-30 2018-04-13 Universite Grenoble Alpes Composition photosensible activable par absorption multiphotonique pour fabrication tridimensionnelle
CN107390471A (zh) * 2017-08-21 2017-11-24 中国科学院重庆绿色智能技术研究院 一类用于双光子光刻的抗蚀剂及其应用
CN107322927A (zh) * 2017-08-22 2017-11-07 瑞安市麦田网络科技有限公司 一种光固化3d打印机
US11809161B2 (en) * 2020-07-13 2023-11-07 Lawrence Livermore National Security, Llc Computed axial lithography optimization system
US20220035251A1 (en) * 2020-07-31 2022-02-03 Applied Materials, Inc. Methods to fabricate 2d wedge and localized encapsulation for diffractive optics
US20250325986A1 (en) 2022-06-23 2025-10-23 Solventum Intellectual Properties Company Methods and devices for removing particles from fluids
WO2024105470A1 (en) 2022-11-15 2024-05-23 Solventum Intellectual Properties Company Microstructured substrate including connected wells
EP4619157A1 (en) 2022-11-15 2025-09-24 Solventum Intellectual Properties Company Methods and kits for removing particles from fluids

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3808006A (en) 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3729313A (en) 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3741769A (en) 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4250053A (en) 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
CA1323949C (en) 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4859572A (en) 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
WO1998021521A1 (en) 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6608228B1 (en) 1997-11-07 2003-08-19 California Institute Of Technology Two-photon or higher-order absorbing optical materials for generation of reactive species
US6335149B1 (en) 1997-04-08 2002-01-01 Corning Incorporated High performance acrylate materials for optical interconnects
US6025406A (en) 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US5859251A (en) 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
US5770737A (en) 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
US6100405A (en) 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US6852766B1 (en) 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
JP2004503831A (ja) 2000-06-15 2004-02-05 スリーエム　イノベイティブ　プロパティズ　カンパニー マルチパス多光子吸収方法および装置
WO2001096917A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
EP1297021B1 (en) 2000-06-15 2009-03-18 3M Innovative Properties Company Multiphoton photosensitization system
KR100795759B1 (ko) 2000-06-15 2008-01-21 쓰리엠 이노베이티브 프로퍼티즈 캄파니 미세유체 물품의 제조 방법
JP4965052B2 (ja) 2000-06-15 2012-07-04 スリーエム イノベイティブ プロパティズ カンパニー ３次元光学素子の加工方法
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
WO2001096959A2 (en) 2000-06-15 2001-12-20 3M Innovative Properties Company Multidirectional photoreactive absorption method
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
EP2236488A1 (en) 2001-03-30 2010-10-06 The Arizona Board of Regents on behalf of the University of Arizona Materials, methods and uses for photochemical generation of acids and/or radical species
US20040012872A1 (en) 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
US20030155667A1 (en) 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
TWI223736B (en) 2002-12-19 2004-11-11 Ind Tech Res Inst Hybrid photoresist with multi reaction models and process for forming pattern using the same
JP4430622B2 (ja) 2003-12-05 2010-03-10 スリーエム イノベイティブ プロパティズ カンパニー フォトニック結晶の製造方法
US20050124712A1 (en) 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
JP5306814B2 (ja) 2005-09-13 2013-10-02 スリーディー システムズ インコーポレーテッド Ａｂｓ類似物品製造を目的とした光硬化性組成物
US7893410B2 (en) 2005-12-21 2011-02-22 3M Innovative Properties Company Method and apparatus for processing multiphoton curable photoreactive compositions
US7583444B1 (en) 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
WO2007112309A2 (en) 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
JP2009537870A (ja) * 2006-05-18 2009-10-29 スリーエム イノベイティブ プロパティズ カンパニー 抽出構造体を備えた導光体の製造方法及びその方法で製造された導光体
JP5559033B2 (ja) 2007-04-13 2014-07-23 スリーディー システムズ インコーポレーテッド 二元光開始剤、光硬化型組成物、三次元物品製造へのこれらの使用、および製造方法
WO2009032813A2 (en) 2007-09-06 2009-03-12 3M Innovative Properties Company Lightguides having light extraction structures providing regional control of light output
US9102083B2 (en) 2007-09-06 2015-08-11 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds
WO2009048705A1 (en) 2007-10-11 2009-04-16 3M Innovative Properties Company Highly functional multiphoton curable reactive species
WO2009070500A1 (en) 2007-11-27 2009-06-04 Huntsman Advanced Materials Americas Inc. Photocurable resin composition for producing three dimensional articles having high clarity
CN103257379B (zh) 2007-11-27 2015-08-05 3M创新有限公司 形成具有悬浮合成图像的片材的母模
KR101403187B1 (ko) 2008-02-19 2014-06-02 삼성전자주식회사 감광성 조성물, 이를 이용한 미세 가공 방법 및 그에 의해형성된 미세 가공물
JP5584202B2 (ja) 2008-05-21 2014-09-03 セラジェクト， インコーポレイテッド 固溶体穿孔器パッチの製造方法及びその使用
CN102301277B (zh) 2008-12-05 2013-07-17 3M创新有限公司 使用非线性热聚合的三维制品
JP5346618B2 (ja) * 2009-02-19 2013-11-20 シーメット株式会社 炭素質立体造形物の製造方法
ES2464495T3 (es) 2009-07-30 2014-06-03 3M Innovative Properties Company Tobera y método para hacer la misma
JP2012047787A (ja) 2010-08-24 2012-03-08 Daicel Corp 体積ホログラム記録用感光性組成物および媒体製造法
DE102011012484B4 (de) 2011-02-25 2025-08-14 Nanoscribe Holding Gmbh Verfahren und Vorrichtung zum ortsaufgelösten Einbringen eines Intensitätsmusters aus elektromagnetischer Strahlung in eine photosensitive Substanz sowie Verwendung hiervon
CN103492951A (zh) 2011-04-22 2014-01-01 3M创新有限公司 增大多光子成像分辨率的方法
CN105793758A (zh) 2013-12-06 2016-07-20 3M创新有限公司 具有保护元件的半潜式显微镜物镜和物镜在多光子成像方法中的用途

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