JP2017223831A - Electrode substrate film and manufacturing method of the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a metal electrode film having a regular reflection component and a diffused reflected light component in the vicinity which are visually recognized as black or similar color.SOLUTION: There is provided an electrode substrate film formed by depositing a metal absorption layer and a metal layer on a resin film substrate. The electrode substrate film is characterized in that: when a light receiving element 12 that moves a received light angle with each constant angle interval receives diffused reflected light incident from an irradiation element 11 fixed with respect to a portion on the deposited surface, b* value in an L*a*b* color system of the diffused reflected light received without the shade of the irradiation element 11 and the regular reflection component falls in a range of -15 to 0; or, when a fixed light receiving element 22 receives diffused reflected light incident from an irradiation element 21 that moves an incident light angle with respect to the portion on the deposited surface with each certain angle interval, b* value in an L*a*b* color system of the diffused reflected light obtained without the shade of the light receiving element 22 and the regular reflection component falls in a range of -15 to 0.SELECTED DRAWING: Figure 5

Description

  The present invention relates to an electrode substrate film in which a metal layer is formed on a substrate made of a resin film, and a method for manufacturing the electrode substrate film, and in particular, an electrode substrate film for a touch panel in which diffuse dispersion light in the vicinity of the regular reflection component is visually recognized as almost black. And a manufacturing method thereof.

  In recent years, a “touch panel” is often installed on the surface of a flat panel display (FPD) provided in an electronic device such as a mobile phone, a portable electronic document device, a vending machine, or a car navigation system. The “touch panel” has a structure in which a grid electrode is sandwiched between two transparent substrates, and this grid electrode has a patterned conductive layer or metal layer such as ITO (indium oxide-tin oxide). Is used.

  Among these, the metal layer has a lower electrical resistance value than ITO, so it is suitable for increasing the size of touch panels and increasing the response speed. However, since the reflectance in the visible wavelength region is high, it has a fine line structure and a fine mesh structure. Even if patterning is performed, it may be a problem that the circuit pattern is visually recognized under high luminance illumination. In order to suppress this problem, various techniques have been proposed.

  For example, a technique for forming a black metal absorption layer having physical properties with a high extinction coefficient on a metal layer has been proposed. However, the metal absorption layer has a limit in film thickness in consideration of the manufacturing cost and patterning processing by etching performed in a later process, and the required low reflectance or black may not be realized. Therefore, as a method of reducing the reflectance relatively reliably, a method of scattering the specular reflection component by making the surface of the metal layer rough is proposed.

  For example, in Patent Document 1, a plurality of conical protrusions are arranged in a matrix at a submicron pitch on at least one surface of a transparent substrate, and high-luminance illumination is performed by forming metal thin wires on the obtained conical protrusion group. An electrode substrate film having an improved antireflection function below is disclosed. It has been shown that this electrode substrate film further absorbs light in the visible wavelength region by providing a black layer between the conical projection group and the metal fine wire or on the metal fine wire.

  However, even if the electrode substrate film has the above-described structure to achieve low reflectance, the color of the diffused light generated thereby may not be preferred depending on the color, and even when a black layer is provided. On the other hand, there is a possibility that the grid-like wiring is conspicuous in the glossy black. In Patent Document 2, the a * value and b in the L * a * b * color system of the specular reflection component are used so that the color tone does not vary even when the transparent conductive film is viewed from various angles. * A technique for suppressing variation in values to a predetermined value is disclosed.

Japanese Patent Laying-Open No. 2006-9285 Japanese Patent Laying-Open No. 2015-179489

  As described above, although the grid electrodes constituting the touch panel are usually devised to be difficult to see with the naked eye, they are slightly visible under high-intensity illumination due to the inherently high reflectivity of the metal. Sometimes. Among electronic devices provided with a touch panel, mobile devices, in particular, may be used with the panel surface slightly tilted in order to avoid reflection of strong illumination light. Therefore, even if the surface is roughened as described above, the color of the diffused light (diffuse reflected light) resulting from this may become a quality problem, and in order to suppress this, the diffused light component near the regular reflection component It is also desirable that the color be close to black.

  The present invention has been made in view of the above-described problems of conventional electrode substrate films used for touch panels. When patterned as a grid electrode, the specular reflection component and the diffuse reflection light component in the vicinity thereof are present. It aims at providing the metal electrode film visually recognized by the color close | similar to black.

  To achieve the above object, an electrode substrate film according to the present invention is an electrode substrate film in which a laminate comprising a metal absorption layer and a metal layer is formed on at least one surface of a resin film substrate, When diffuse reflected light when incident from an irradiation element fixed at a predetermined incident light angle with respect to an arbitrary part on the film formation surface is received by a light receiving element whose light receiving angle moves at regular angular intervals, The b * value in the L * a * b * color system of the diffusely reflected light received in the L * a * b * color system is in the range of −15 to 0 except for the angular position that is behind the irradiation element and the angular position where the specular reflection component is received The diffuse reflected light when incident from an irradiation element whose incident light angle moves at a certain angular interval with respect to an arbitrary part on the film formation surface of the electrode substrate film is fixed at a predetermined light receiving angle. Receive light The b * value in the L * a * b * color system of the diffuse reflected light is −15 to 0 except for the angular position behind the light receiving element and the angular position where the specular reflection component is received. It is characterized by being in range.

  According to the present invention, the diffused light component in the vicinity of the regular reflection component of the grid-like electrode is visually recognized as almost black even when the panel surface is slightly tilted to avoid the reflection of a high-intensity illumination lamp or the like. A touch panel can be provided.

It is sectional drawing of the electrode substrate film of one specific example of this invention. It is sectional drawing of the grid | lattice-like electrode substrate film obtained by patterning the electrode substrate film of FIG. It is a front view which shows the method of irradiating with a fixed incident light angle from an irradiation element with respect to an electrode substrate film, and measuring the diffuse reflection light by changing the light reception angle of a light receiving element. It is a front view which shows the method of irradiating an electrode substrate film, changing an incident light angle from an irradiation element, and measuring the diffuse reflection light, fixing the light reception angle of a light receiving element. The a * value and b * in the L * a * b * color system of diffuse reflected light when the electrode substrate films of Sample A (a) and Sample B (b) of the example were measured by the method shown in FIG. It is the graph which plotted the value by making a horizontal axis the light reception angle. The a * value and b * in the L * a * b * color system of diffuse reflected light when the electrode substrate films of Sample A (a) and Sample B (b) of the example were measured by the method shown in FIG. It is the graph which plotted the value by making a horizontal axis into incident light angle.

  Hereinafter, the electrode substrate film of one specific example of the present invention will be described in detail with reference to FIG. The electrode substrate film of one specific example of the present invention includes a resin film substrate 50, a first metal absorption layer 51 formed on both surfaces thereof by a vacuum film formation method such as a sputtering method, and a similar film formation thereon. The thin film metal layer 52 formed by the method, the thick metal layer 53 formed by the wet plating method thereon, and the vacuum metal film method such as the sputtering method or the wet plating method formed thereon. It is comprised from the 2nd metal absorption layer 54 of the outermost surface.

  The material of the resin film substrate 50 is not particularly limited, but polyethylene terephthalate (PET), polyethersulfone (PES), polyarylate (PAR), polycarbonate (PC), polyolefin (PO), triacetyl cellulose (TAC) ) And a resin film selected from the group of resin materials such as norbornene, or a composite comprising one or both sides of this resin film alone covered with an acrylic organic film is preferable. In the case of norbornene, representative examples include ZEONOR (trade name) of ZEON Corporation and ARTON (trade name) of JSR Corporation. Since the electrode substrate film of one specific example of the present invention is used as a touch panel, it is desirable that the resin film substrate is excellent in transparency in the visible wavelength region.

  The 1st metal absorption layer 51 plays the role which makes the back surface of the opposite laminated film difficult to be visually recognized through a resin film board | substrate when patterning the said metal layer and a metal absorption layer, and forming a grid | lattice-like electrode. In addition, the thin metal layer 52 serves as an electrode in the subsequent wet plating. In the wet plating used in the formation of the thick metal layer 53 and the second metal absorption layer 54, the surface roughness can be adjusted by changing the additive and applied current to the plating solution. The rate can be reduced.

  The material of the first and second metal absorption layers 51 and 54 is one kind selected from the group consisting of Ni alone or Ni and Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, Cu, and Zn. A Ni-based alloy to which the above elements are added is adopted, or Cu is selected from the group consisting of Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, Ni, and Zn on Cu alone or Cu. It is preferable to employ a Cu-based alloy to which more than one element is added. On the other hand, the thin and thick metal layers 52 and 53 are made of Cu alone or one or more elements selected from the group consisting of Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, Ni and Zn on Cu. It is preferable to employ a Cu-based alloy to which is added.

  In addition, when laminating the first and second metal absorption layers, the thin film, and the thick film metal layer in the above order only on one side of the resin film substrate, the first metal absorption is performed from the resin film substrate side even after film formation. It is possible to measure the spectroscopic properties of the layer. However, as shown in FIG. 1, when the first and second metal absorption layers, the thin film, and the thick metal layer are laminated on the both sides of the resin film substrate in the above order, the spectroscopic optics of the first metal absorption layer after the film formation is formed. It is impossible to measure properties.

  Striped or grid-like electrodes for a touch panel with respect to the electrode substrate film as shown in FIG. 1 having the laminate composed of the first and second metal absorption layers and the thin film and the thick film metal layer produced by the above method. By patterning so that a (wiring) pattern is formed, an electrode for a touch panel as shown in FIG. 2 can be produced.

  That is, the grid electrode shown in FIG. 2 is provided with a laminated body that is patterned on both surfaces of the resin film substrate 50. The laminated body includes a first metal absorption layer 51a, a thin metal layer 52a, a thick film. The metal layer 53a and the second metal absorption layer 54a are stacked in this order. Since this patterned electrode (wiring) maintains the laminated structure of the electrode substrate film shown in FIG. 1, it has the same characteristics as the optical properties described later of the electrode substrate film of FIG. For this reason, the reflectance in the visible wavelength region is suppressed almost uniformly without causing bluishness. Therefore, even if the wiring width is about 5 μm, it is hardly visible to the naked eye.

  There is no limitation about the patterning method of said electrode wiring, A well-known subtractive method can be used. In the subtractive method, a photoresist film is applied to the surface of the laminate, and after exposure and development so that a photoresist film having the same pattern as a desired wiring pattern remains, the photoresist film is covered with the remaining photoresist film. In this method, a wiring pattern is formed by chemically etching an exposed portion of the laminated body using an etching solution such as a ferric chloride aqueous solution or a cupric chloride aqueous solution.

(3) Measurement of L * a * b * color system The electrode substrate film of one specific example of the present invention having the above laminated structure has a predetermined structure with respect to an arbitrary portion on the film formation surface of the electrode substrate film. When diffusely reflected light when incident from an irradiation element fixed at an incident light angle is received by a light receiving element whose light receiving angle moves at regular angular intervals, the angular position and the specular reflection component that are shaded by the irradiation element are The b * value in the L * a * b * color system of the received diffuse reflected light, excluding the received angular position, is in the range of -15 to 0, or on the film formation surface of the electrode substrate film When diffusely reflected light received from an illuminating element whose incident light angle moves at a certain angular interval with respect to any part of the light is received by a light receiving element fixed at a predetermined light receiving angle, And the angular position where the specular reflection component is received The b * value in the L * a * b * color system of the received diffuse reflected light is in the range of -15 to 0 except for.

  More specifically, the electrode substrate film of one specific example of the present invention has diffuse reflection light measured by two types of measurement methods, the first measurement method shown in FIG. 3 and the second measurement method shown in FIG. This defines the b * value in the L * a * b * color system. In the first measurement method shown in FIG. 3, the incident light is incident on an arbitrary part on the film formation surface of the electrode substrate film with the direction (normal line) perpendicular to the film formation surface of the electrode substrate film being 0 ° Diffuse reflected light when incident from the irradiation element 11 whose angle is fixed at −45 °, for example, is received while changing the light reception angle of the light receiving element 12 from −80 ° to 80 ° at regular angular intervals. In the measuring method of FIG. 3, the light receiving element 12 is a semicircle centered on the irradiated portion on the surface perpendicular to the film formation surface and including the optical path 11a of the incident light from the irradiation element 11 fixed. It will move on the circumference.

  In the above measurement, depending on the size of the irradiation element 11 and the angular interval of the light receiving element 12 that is moved at regular angular intervals, for example, when the light receiving element 12 is moved every 5 °, it is behind the irradiation element 11. Light cannot be received at −45 ° and before and after that at −40 ° and −50 °. In addition, when using a flat panel display, it is necessary to intentionally tilt the panel surface so that the specular reflection component and its nearby components are not seen in order to avoid illumination lamps, etc. appearing on the panel surface. Therefore, the specular reflection component 45 ° and the front and rear 40 ° and 50 ° are not included in the evaluation.

  On the other hand, in the second measuring method shown in FIG. 4, an irradiation element is applied to an arbitrary part on the film formation surface of the electrode substrate film with the direction (normal line) perpendicular to the surface of the electrode substrate film being 0 °. Diffuse reflected light when incident while changing the incident light angle from 21 at a constant angular interval from −80 ° to 80 °, for example, is received by the light receiving element 22 fixed at a light receiving angle of 45 °, for example. In the measurement method of FIG. 4, the irradiation element 21 is a part on the film-forming surface that the light-receiving element 22 faces on the surface that is perpendicular to the film-forming surface and includes the light-receiving optical path 22a to the light-receiving element 22 that is fixed. It moves on a semicircle centered on.

  At that time, depending on the size of the light receiving element 22 and the angular interval of the light receiving element 21 moved at regular angular intervals, for example, when the irradiation element 21 is moved every 5 °, it is 45 ° which is the shadow of the light receiving element 22. Irradiation is not possible at 40 ° and 50 ° before and after that. In addition, when using a flat panel display, it is necessary to intentionally tilt the panel surface so that the specular reflection component and its nearby components are not seen in order to avoid illumination lamps, etc. appearing on the panel surface. Therefore, the specular reflection component of −45 ° and -40 ° and −50 ° before and after the specular reflection component are not included in the evaluation.

  In the electrode substrate film of one specific example of the present invention, the b * value in the L * a * b * display system of diffuse reflected light measured by the first and second measuring methods is within a range of −15 to 0. There is a requirement. The reason for this is that when the electrode substrate film of one embodiment of the present invention is processed into a grid electrode and then used as a touch panel, the panel surface is often tilted slightly to avoid reflection of a high brightness object. When the b * value in the L * a * b * color system of the diffuse reflection light component excluding the regular reflection component and its vicinity is smaller than −15, the color tone when viewing the panel surface becomes blue, which is not preferable. Conversely, if the b * value is greater than 0, the color tone when viewing the panel surface is yellow, which is not preferable.

  When the b * value in the L * a * b * color system of the diffuse reflected light component is out of the above range, it is preferable to adjust the film forming conditions. In other words, the reflection of a high-brightness object is a regular reflection component according to Snell's law, and if the interface is perfectly mirror (flat), there is no component other than regular reflection, but actually the resin film substrate and the metal absorption layer There are scattering components due to the surface roughness of the interface, the interface between the metal layer and the metal absorption layer, and the interface between the metal absorption layer and the medium. Among these, the largest influence on scattering is the roughness of the interface between the metal layer and the metal absorption layer, and these layers are formed by a wet plating method. In the wet plating method, the surface roughness can be controlled by an additive or an applied current. Therefore, the wet plating method is used in the wet plating step based on the result of the b * value in the L * a * b * display system of the diffuse reflection light. What is necessary is just to adjust an additive and an applied electric current.

  Specifically, when the b * value in the L * a * b * color system of diffuse reflected light when the electrode substrate film is measured by the above method is smaller than −15, the applied current value is lowered to reduce the outermost surface. The metal absorption film may be thinned. Conversely, if this b * value is greater than 0, the applied current value may be increased to thicken the outermost metal absorption film. Therefore, by performing this measurement as an inspection process after manufacturing, variations in the quality of the electrode substrate film can be suppressed. In general, if the surface roughness is too rough, the scattering component increases and the specular reflection component decreases to a so-called matte color, but the scattering component may appear bluish.

  As described above, the electrode substrate film of the present invention is patterned by defining the b * value in the L * a * b * color system of diffuse reflected light received under a predetermined condition within the range of −15 to 0. Even if the panel surface is tilted after processing, it does not feel bluish or yellowish, and becomes almost uniform black. Therefore, a high quality electrode substrate film with little variation in color can be provided.

  As shown in FIG. 1, an electrode substrate film in which a laminate is provided on both surfaces of a resin film substrate 50 is manufactured, and an electrode substrate is used using a measuring instrument equipped with an irradiation element and a light receiving element that can move at a constant angular interval. The film surface is irradiated with light, its diffuse reflection light is measured, the a * value and b * value in the L * a * b * color system are obtained, and then patterning is performed to obtain the color tone of the surface. Was visually inspected. The present invention is not limited to the following examples.

  More specifically, two PET films having a width of 600 mm and a length of 1200 m are prepared as the resin film substrate 50, and each of the PET films is used by using a sputtering web coater capable of continuously performing dry plating. After forming a Ni—Cu layer with a thickness of 200 nm as the first metal absorption layer 51 on the surface, a Cu layer with a thickness of 800 nm is formed as the thin metal layer 52 on the first metal absorption layer 51. A 200 nm thick Ni—Cu layer as the metal absorbing layer 51 and a 800 nm thick Cu layer as the thin metal layer 52 were formed. When the Ni—Cu layer was formed by sputtering, a black film was obtained by a reactive sputtering method in which oxygen was introduced. Thereby, since the reflectance of the Ni—Cu layer is lowered, it was possible to make it difficult to see the laminated body on the back side through the PET after patterning processing for forming a grid electrode described later.

  Next, a Cu layer having a thickness of 2000 nm was formed as the thick metal layer 53 by a wet plating method. In this wet plating method, two PET films formed by dry plating were plated with different applied currents to obtain Sample A with a surface roughness Ra of 15 nm and Sample B with a thickness of 25 nm. For each of these samples, a Ni—Cu layer having a thickness of 200 nm was formed on both surfaces as the second metal absorption layer 54 using a sputtering web coater again. When the Ni—Cu layer was formed by sputtering, a black film was obtained by a reactive sputtering method in which oxygen was introduced. Thereby, since the reflectance of the said Ni-Cu layer falls, it was made difficult to see a laminated body from the surface after the patterning process for grid | lattice electrode formation mentioned later.

  For each of the electrode substrate films of Samples A and B produced above, diffuse reflected light L * a * b * using the variable angle spectrocolorimetry system GCMS-4 manufactured by Murakami Color Research Laboratory Co., Ltd. The a * value and b * value in the color system were measured. Specifically, as shown in FIG. 3, first, the irradiation element is fixed to irradiate each sample so that the incident light angle is −45 °, and the diffuse reflected light has a light receiving angle of −80 °. The light receiving element was moved so as to change from 5 ° to 80 ° at intervals of 5 ° to receive light. At that time, −50 °, −45 °, and −40 °, which are shaded by the irradiation element, cannot receive light, and the specular reflection component and its neighboring 40 °, 45 °, and 50 ° are reflected on the panel surface. It was not included in the evaluation because it was removed by deliberately tilting to avoid. The measurement wavelength interval was 10 nm according to JIS Z8722.

  Next, as shown in FIG. 4, the light receiving element is fixed at a light receiving angle of 45 ° by irradiating each sample while moving the irradiation element so that the incident light angle changes at intervals of 5 ° from 80 ° to 80 °. The diffuse reflected light was received at. At that time, 40 °, 45 °, and 50 °, which are shaded by the light receiving element, cannot be measured, and −40 °, −45 °, and −50 °, which are specular reflection components, intentionally avoid reflection of the touch panel. Not included in the evaluation to tilt. The measurement wavelength interval was 10 nm according to JIS Z8722.

  Graphs in which the a * value and b * value of sample A with surface roughness Ra 15 nm and sample B with Ra 25 nm measured by the measurement method of FIG. 3 are plotted with the horizontal axis as the light receiving angle are shown in FIG. Shown in 5 (b). As can be seen from these figures, there is almost no difference in the a * value between sample A and sample B, but with respect to the b * value, sample A satisfies the requirements of the present invention, but the sample has a large surface roughness. B is smaller than −15.

  Further, graphs in which the a * value and the b * value of the sample A having a surface roughness Ra of 15 nm and the sample B having a surface roughness Ra of 25 nm measured by the measurement method of FIG. As shown in FIG. As can be seen from these figures, there is almost no difference in the a * value between sample A and sample B, but with respect to the b * value, sample A satisfies the requirements of the present invention, but the sample has a large surface roughness. B is smaller than −15.

  Next, the electrode substrate films of both samples were patterned into a grid electrode in consideration of the case where the electrode substrate film was used as a touch panel. When these two samples were slightly tilted to avoid the reflection of a high-luminance object, sample A had no particular problem with the color tone near the regular reflection component, but sample B had a bluish color near the regular reflection component. This is presumably because Sample B has a b * value smaller than −15 in the L * a * b * color system.

  From the above, the regular reflection area and the non-measurable area are excluded in both cases where the incident light angle is fixed and the light reception angle is variable, or where the light reception angle is fixed and the incident light angle is variable. If the b * value in the L * a * b * color system of diffuse reflected light is smaller than −15, the panel surface after patterning will feel blue when tilted, so it is provided under the outermost metal absorption layer. It can be seen that when the Cu layer is formed by wet plating, it is necessary to adjust the surface roughness appropriately so that the b * value does not become smaller than −15.

DESCRIPTION OF SYMBOLS 11, 21 Irradiation element 12, 22 Light receiving element 11a Optical path of incident light 22a Optical path of light reception 50 Resin film substrate 51, 51a First metal absorption layer 52, 52a Thin metal layer 53, 53a Thick metal layer 54, 54a Second metal Absorption layer

Claims (11)

An electrode substrate film in which a laminate comprising a metal absorption layer and a metal layer is formed on at least one surface of a resin film substrate,
Diffuse reflected light when incident from an irradiation element fixed at a predetermined incident light angle with respect to an arbitrary part on the film formation surface of the electrode substrate film is received by a light receiving element whose light receiving angle moves at regular angular intervals. When the received light is received, the b * value in the L * a * b * color system of the received diffuse reflected light is −15 except for the angular position behind the irradiation element and the angular position where the regular reflection component is received. Or in the range of 0,
Alternatively, a light receiving element in which diffuse reflected light when incident from an irradiation element whose incident light angle moves at a certain angular interval with respect to an arbitrary portion on the film forming surface of the electrode substrate film is fixed at a predetermined light receiving angle The b * value in the L * a * b * color system of the diffusely reflected light is from −15 except for the angular position behind the light receiving element and the angular position where the specular reflection component is received. An electrode substrate film characterized by being in the range of 0.   2. The predetermined incident light angle is −45 °, and the predetermined light receiving angle is 45 °, where a direction perpendicular to the film formation surface of the electrode substrate film is 0 °. The electrode substrate film as described.   The moving range of the light receiving element is −80 ° on a semicircular center around the irradiated part on a plane perpendicular to the film formation surface and including an optical path of incident light from the fixed irradiation element. The irradiation element moves within a range perpendicular to the film formation surface and includes a light reception optical path to the fixed light reception element on the film formation surface facing the light reception element. The electrode substrate film according to claim 2, wherein the electrode substrate film has an angle range of −80 ° to 80 ° on a semicircle centered on the portion.   The electrode substrate film according to claim 3, wherein the predetermined angular interval is 5 °.   The angular positions behind the irradiation element are −40 ° −45 ° and −50 °, and the angular positions where the specular reflection component is received when the irradiation element is fixed are 40 ° 45 ° and 50 °. And the angular position behind the light receiving element is 40 ° 45 ° and 50 °, and the angular position where the specular reflection component is received when the light receiving element is fixed is −40 ° -45 °, and The electrode substrate film according to claim 4, which is −50 °.   The electrode substrate film according to claim 1, wherein an outermost surface layer of the electrode substrate film is a metal absorption layer.   As the material of the metal absorption layer, one or more elements selected from the group consisting of Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, Cu, and Zn are added to Ni alone or Ni. Cu alloy in which one or more elements selected from the group consisting of Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, Ni, and Zn are added to Ni alloy or Cu alone or Cu It is an alloy, The electrode substrate film of any one of Claims 1-6 characterized by the above-mentioned.   The material of the metal layer is Cu alone or Cu in which one or more elements selected from the group consisting of Ti, Al, V, W, Ta, Si, Cr, Ag, Mo, Ni, and Zn are added to Cu. The electrode substrate film according to claim 1, wherein the electrode substrate film is a system alloy.   The electrode substrate film according to claim 1, wherein the metal layer is formed by a wet plating method. A method for producing an electrode substrate film in which a laminate comprising a metal absorption layer and a metal layer is formed on at least one surface of a resin film substrate,
Diffuse reflected light when incident from an irradiation element fixed at a predetermined incident light angle with respect to an arbitrary part on the film formation surface of the electrode substrate film is received by a light receiving element whose light receiving angle moves at regular angular intervals. When the received light is received, the b * value in the L * a * b * color system of the received diffuse reflected light is −15 except for the angular position behind the irradiation element and the angular position where the regular reflection component is received. To adjust the surface roughness of the metal layer to be in the range of 0 to 0,
Alternatively, a light receiving element in which diffuse reflected light when incident from an irradiation element whose incident light angle moves at a certain angular interval with respect to an arbitrary portion on the film forming surface of the electrode substrate film is fixed at a predetermined light receiving angle The b * value in the L * a * b * color system of the diffusely reflected light is from −15 except for the angular position behind the light receiving element and the angular position where the specular reflection component is received. A method for producing an electrode substrate film, comprising adjusting the surface roughness of a metal layer so as to be within a range of 0. An inspection method of an electrode substrate film in which a laminate composed of a metal absorption layer and a metal layer is formed on at least one surface of a resin film substrate,
Diffuse reflected light when incident from an irradiation element fixed at a predetermined incident light angle with respect to an arbitrary part on the film formation surface of the electrode substrate film is received by a light receiving element whose light receiving angle moves at regular angular intervals. When the received light is received, the b * value in the L * a * b * color system of the received diffuse reflected light is −15 except for the angular position behind the irradiation element and the angular position where the regular reflection component is received. Is out of range from 0,
Alternatively, a light receiving element in which diffuse reflected light when incident from an irradiation element whose incident light angle moves at a certain angular interval with respect to an arbitrary portion on the film forming surface of the electrode substrate film is fixed at a predetermined light receiving angle The b * value in the L * a * b * color system of the diffusely reflected light is from −15 except for the angular position behind the light receiving element and the angular position where the specular reflection component is received. A method for inspecting an electrode substrate film, wherein it is judged that there is a problem in quality when it is out of a range of 0.

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