JP2017215225A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2017215225A5 JP2017215225A5 JP2016109806A JP2016109806A JP2017215225A5 JP 2017215225 A5 JP2017215225 A5 JP 2017215225A5 JP 2016109806 A JP2016109806 A JP 2016109806A JP 2016109806 A JP2016109806 A JP 2016109806A JP 2017215225 A5 JP2017215225 A5 JP 2017215225A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- incident
- optical
- measurement apparatus
- gas cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 claims description 18
- 238000001514 detection method Methods 0.000 claims description 10
- 239000000523 sample Substances 0.000 claims description 10
- 238000005259 measurement Methods 0.000 claims description 8
- 150000001340 alkali metals Chemical group 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 3
- 230000010287 polarization Effects 0.000 claims 2
- 238000002834 transmittance Methods 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016109806A JP2017215225A (ja) | 2016-06-01 | 2016-06-01 | 磁場計測装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016109806A JP2017215225A (ja) | 2016-06-01 | 2016-06-01 | 磁場計測装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017215225A JP2017215225A (ja) | 2017-12-07 |
JP2017215225A5 true JP2017215225A5 (enrdf_load_stackoverflow) | 2019-05-30 |
Family
ID=60575540
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016109806A Withdrawn JP2017215225A (ja) | 2016-06-01 | 2016-06-01 | 磁場計測装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2017215225A (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6675362B2 (ja) * | 2017-11-08 | 2020-04-01 | 株式会社大一商会 | 遊技機 |
JP2020003270A (ja) * | 2018-06-26 | 2020-01-09 | 株式会社リコー | 原子磁気センサ、グラジオメータ、生体磁気計測装置 |
CN109521376B (zh) * | 2018-11-09 | 2023-12-15 | 中国计量科学研究院 | 基于微型原子气室的原子磁力仪 |
CN112557971B (zh) * | 2020-12-03 | 2022-06-03 | 中国船舶重工集团有限公司第七一0研究所 | 一种高灵敏度激光光泵磁强计及设计方法 |
CN115128517B (zh) * | 2022-06-09 | 2024-08-02 | 电子科技大学 | 一种基于单光源的三轴地磁矢量原子磁力计 |
-
2016
- 2016-06-01 JP JP2016109806A patent/JP2017215225A/ja not_active Withdrawn
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2017215225A5 (enrdf_load_stackoverflow) | ||
JP5738835B2 (ja) | 複屈折の対象のための検出器 | |
JP2017223487A5 (enrdf_load_stackoverflow) | ||
JP5607392B2 (ja) | 光干渉測定装置 | |
WO2012141544A3 (ko) | Tsv 측정용 간섭계 및 이를 이용한 측정방법 | |
WO2009073259A3 (en) | Common-path interferometer rendering amplitude and phase of scattered light | |
EP2010877A4 (en) | INTERFEROMETRIC DETECTOR BASED ON POLARIZATION | |
JP2007171206A5 (enrdf_load_stackoverflow) | ||
RU2013143824A (ru) | Устройство измерения оптических характеристик и способ измерения оптических характеристик | |
WO2009146906A3 (de) | Ophthalmologisches lasersystem und betriebsverfahren | |
JP2016114523A5 (enrdf_load_stackoverflow) | ||
JP2014517505A5 (enrdf_load_stackoverflow) | ||
JP2010256294A5 (enrdf_load_stackoverflow) | ||
CN105181590B (zh) | 一种基于飞秒激光的探测超快现象的共光路干涉装置 | |
JP2014184023A5 (enrdf_load_stackoverflow) | ||
CN103743674A (zh) | 一种非镜面反射效应的增强方法及系统 | |
JP2014524325A (ja) | 毛検出器を備えたヘアトリートメント装置 | |
JP2014523517A5 (enrdf_load_stackoverflow) | ||
JP2008128942A (ja) | 光熱変換測定装置 | |
JP2015152405A5 (enrdf_load_stackoverflow) | ||
JP5370409B2 (ja) | 絶対反射測定装置 | |
WO2014023498A3 (de) | Messsystem zur bestimmung von reflexionscharakteristiken von solarspiegelmaterialien und verfahren zur qualitätsbestimmung einer spiegelmaterialprobe | |
JP2009141048A5 (enrdf_load_stackoverflow) | ||
KR101508432B1 (ko) | 이동 재료 웹 캡쳐 장치 | |
WO2014108528A3 (en) | Polarization measuring device, lithography apparatus, measuring arrangement, and method for polarization measurement |