JP2017195370A - 高効率発光ダイオード - Google Patents
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- 230000000903 blocking effect Effects 0.000 claims abstract description 156
- 238000000926 separation method Methods 0.000 claims abstract description 93
- 239000000758 substrate Substances 0.000 claims abstract description 67
- 238000002955 isolation Methods 0.000 claims abstract description 37
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052681 coesite Inorganic materials 0.000 claims description 2
- 229910052906 cristobalite Inorganic materials 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 229910052682 stishovite Inorganic materials 0.000 claims description 2
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- 229910002601 GaN Inorganic materials 0.000 description 3
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- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- 229910004205 SiNX Inorganic materials 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
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- 235000012489 doughnuts Nutrition 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- -1 gallium nitride compound Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Abstract
【解決手段】基板と、基板上に位置し下部半導体層、上部半導体層及び下部半導体層と上部半導体層との間に活性層を含み、上部半導体層、活性層及び下部半導体層を介し基板を露出させる分離溝を有する半導体積層体と、上部半導体層に電気的に接続する第1電極パッド及び上部延長部と、下部半導体層に電気的に接続する第2電極パッド及び下部延長部と、分離溝を横切って上部延長部と下部延長部とを連結し、上部延長部と下部延長部の幅より広い幅を有する連結部と、下部延長部と下部半導体層との間に介在した第1電流遮断層と、第2電極パッドと下部半導体層との間に介在した第2電流遮断層を含み、第1電流遮断層は互いに離れた複数のドットを含み、各ドット幅は下部延長部より大きく、第2電流遮断層の幅は第2電極パッドより狭く、分離溝から第1電流遮断層までの最短距離は複数のドット間の離隔距離より大きい。
【選択図】図1
Description
Claims (19)
- 基板と、
前記基板上に位置し、下部半導体層、上部半導体層、及び前記下部半導体層と前記上部半導体層との間に配置された活性層を含み、前記上部半導体層、前記活性層及び前記下部半導体層を介して前記基板を露出させる分離溝を有する半導体積層体と、
前記上部半導体層に電気的に接続する第1電極パッド及び上部延長部と、
前記下部半導体層に電気的に接続する第2電極パッド及び下部延長部と、
前記分離溝を横切って前記上部延長部と前記下部延長部とを連結し、前記上部延長部と前記下部延長部の幅より広い幅を有する連結部と、
前記下部延長部と前記下部半導体層との間に介在した第1電流遮断層と、
前記第2電極パッドと前記下部半導体層との間に介在した第2電流遮断層と、を含み、
前記第1電流遮断層は互いに離隔した複数のドットを含み、各ドットの幅は前記下部延長部の幅より大きく、
前記第2電流遮断層の幅は前記第2電極パッドの幅より狭く、
前記分離溝から前記第1電流遮断層までの最短距離は前記複数のドット間の離隔距離より大きい、発光ダイオード。 - 前記分離溝と前記第1電流遮断層との間の領域で前記連結部及び前記下部延長部が前記下部半導体層に接続する接続領域の長さは、隣り合う二つのドット間で前記下部延長部が前記下部半導体層に接続する接続領域の長さより大きい、請求項1に記載の発光ダイオード。
- 前記上部延長部は前記下部延長部の端部を取り囲むように配置された、請求項1に記載の発光ダイオード。
- 前記下部延長部の端部は前記下部半導体層と直接接続する、請求項3に記載の発光ダイオード。
- 前記下部延長部の端部から前記上部延長部までの垂直距離より、前記下部延長部の端部から前記上部延長部までの傾斜距離が大きく、
前記垂直距離は、前記下部延長部の端部から前記下部延長部に垂直方向への前記上部延長部までの距離であり、前記傾斜距離は、前記下部延長部の端部から前記垂直方向に対して傾斜した方向への前記上部延長部までの距離である、請求項4に記載の発光ダイオード。 - 前記第1電流遮断層及び第2電流遮断層はSiO2層又は分布ブラッグ反射器層である、請求項1に記載の発光ダイオード。
- 前記上部半導体層上に配置された透明電極層をさらに含み、
前記透明電極層の一部は、前記上部半導体層と前記第1電極パッドとの間及び前記上部半導体層と前記上部延長部との間に配置される、請求項1に記載の発光ダイオード。 - 前記第1電極パッドの下部で、前記上部半導体層と前記透明電極層との間に配置される第3電流遮断層をさらに含む、請求項7に記載の発光ダイオード。
- 前記透明電極層は、前記第3電流遮断層を露出させる開口部を有し、
前記第1電極パッドは、前記開口部を介して前記第3電流遮断層に接する、請求項8に記載の発光ダイオード。 - 前記第3電流遮断層は、前記第1電極パッドが前記第3電流遮断層の上部に限定的に配置されるように前記第1電極パッドより広い面積を有する、請求項9に記載の発光ダイオード。
- 前記半導体積層体は、前記下部半導体層を露出させるメサ分離溝をさらに含み、
前記半導体積層体は、前記分離溝又は前記メサ分離溝によって定義される複数の発光セルを含み、
前記複数の発光セルは、それぞれ前記下部延長部及び前記上部延長部を含む、請求項1に記載の発光ダイオード。 - 前記連結部は、隣接する二つの発光セルの前記上部延長部及び前記下部延長部を電気的に連結する、請求項11に記載の発光ダイオード。
- 前記複数の発光セルは、第1発光セル、第2発光セル、第3発光セルおよび第4発光セルを含み、
前記下部半導体層は、前記分離溝によって互いに離隔した第1下部半導体層及び第2下部半導体層を含み、
前記第1発光セルと前記第2発光セルは前記第1下部半導体層を共有し、
前記第3発光セルと前記第4発光セルは前記第2下部半導体層を共有し、
前記第1発光セルは前記連結部を介して前記第3発光セルに直列に連結され、
前記第2発光セルは前記連結部を介して前記第4発光セルに直列に連結される、請求項12に記載の発光ダイオード。 - 各発光セルの下部延長部は同一の方向に延長する直線領域を含み、
前記第1発光セルの前記下部延長部の直線領域は、前記第3発光セルの前記下部延長部の直線領域と同一軸上に位置し、前記第2発光セルの前記下部延長部の直線領域は、前記第4発光セルの下部延長部の直線領域と同一軸上に位置する、請求項13に記載の発光ダイオード。 - 前記第1電極パッドは、前記メサ分離溝上に配置され、前記第1発光セル及び前記第2発光セルにわたって配置され、
前記第2電極パッドは、前記メサ分離溝上に配置され、前記第2下部半導体層に電気的に接続される、請求項14に記載の発光ダイオード。 - 前記第1発光セル及び前記第2発光セル上に配置された前記上部延長部は前記第1電極パッドに電気的に接続され、
前記第3発光セル及び前記第4発光セルの前記下部半導体層上に配置される前記下部延長部は前記第2電極パッドに電気的に接続された、請求項15に記載の発光ダイオード。 - 前記各発光セルの前記上部延長部は、対応する前記下部延長部の一部を取り囲む形状を有する主上部延長部と、前記主上部延長部から突出する補助上部延長部と、を含む、請求項16に記載の発光ダイオード。
- 前記第1発光セル及び前記第2発光セル上の前記補助上部延長部は、前記主上部延長部を前記第1電極パッドに連結するように配置され、
前記第3発光セル及び前記第4発光セル上の前記補助上部延長部は、前記第3発光セル及び前記第4発光セル上の前記主上部延長部を前記第1発光セル及び前記第2発光セルの前記下部延長部にそれぞれ連結するように配置される、請求項17に記載の発光ダイオード。 - 前記第1発光セル及び前記第3発光セルは、前記第1電極パッド及び前記第2電極パッドを介して前記第2発光セル及び前記第4発光セルと並列に連結される、請求項18に記載の発光ダイオード。
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KR1020160047054A KR102519080B1 (ko) | 2016-04-18 | 2016-04-18 | 복수의 발광셀들을 갖는 발광 다이오드 |
KR10-2016-0047054 | 2016-04-18 | ||
KR20160149627 | 2016-11-10 | ||
KR10-2016-0149627 | 2016-11-10 | ||
KR1020170020233A KR102641965B1 (ko) | 2016-11-10 | 2017-02-14 | 고효율 발광 다이오드 |
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KR102377198B1 (ko) * | 2018-01-19 | 2022-03-21 | 시아먼 산안 옵토일렉트로닉스 테크놀로지 캄파니 리미티드 | 발광 다이오드 및 그 제조방법 |
CN109192830B (zh) * | 2018-07-17 | 2024-04-19 | 厦门乾照光电股份有限公司 | 用于发光二极管的半导体芯片 |
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CN112992957A (zh) * | 2019-12-17 | 2021-06-18 | 深圳第三代半导体研究院 | 一种发光二极管 |
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US11239387B2 (en) | 2022-02-01 |
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CN110061110A (zh) | 2019-07-26 |
US20190148588A1 (en) | 2019-05-16 |
JP6317502B2 (ja) | 2018-04-25 |
CN110061110B (zh) | 2021-09-21 |
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