JP2017188464A5 - - Google Patents

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JP2017188464A5
JP2017188464A5 JP2017091857A JP2017091857A JP2017188464A5 JP 2017188464 A5 JP2017188464 A5 JP 2017188464A5 JP 2017091857 A JP2017091857 A JP 2017091857A JP 2017091857 A JP2017091857 A JP 2017091857A JP 2017188464 A5 JP2017188464 A5 JP 2017188464A5
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generator
power
impedance
generators
local controller
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JP2017188464A (ja
JP6425765B2 (ja
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JP2017091857A 2011-01-04 2017-05-02 プラズマ処理負荷へのシステムレベルの電力送達 Active JP6425765B2 (ja)

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US201161429472P 2011-01-04 2011-01-04
US61/429,472 2011-01-04

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JP2016053392A Division JP6141478B2 (ja) 2011-01-04 2016-03-17 プラズマ処理負荷へのシステムレベルの電力送達

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JP2017188464A JP2017188464A (ja) 2017-10-12
JP2017188464A5 true JP2017188464A5 (cg-RX-API-DMAC7.html) 2017-11-24
JP6425765B2 JP6425765B2 (ja) 2018-11-21

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JP2013547731A Active JP5946227B2 (ja) 2011-01-04 2012-01-04 電力送達システム、電力制御システム、および、電力を送達するまたは電力制御する方法
JP2016053392A Active JP6141478B2 (ja) 2011-01-04 2016-03-17 プラズマ処理負荷へのシステムレベルの電力送達
JP2017091857A Active JP6425765B2 (ja) 2011-01-04 2017-05-02 プラズマ処理負荷へのシステムレベルの電力送達

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JP2013547731A Active JP5946227B2 (ja) 2011-01-04 2012-01-04 電力送達システム、電力制御システム、および、電力を送達するまたは電力制御する方法
JP2016053392A Active JP6141478B2 (ja) 2011-01-04 2016-03-17 プラズマ処理負荷へのシステムレベルの電力送達

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US (2) US9088267B2 (cg-RX-API-DMAC7.html)
JP (3) JP5946227B2 (cg-RX-API-DMAC7.html)
KR (1) KR101675625B1 (cg-RX-API-DMAC7.html)
WO (1) WO2012094416A1 (cg-RX-API-DMAC7.html)

Families Citing this family (71)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102016882B (zh) * 2007-12-31 2015-05-27 应用识别公司 利用脸部签名来标识和共享数字图像的方法、系统和计算机程序
KR101675625B1 (ko) * 2011-01-04 2016-11-22 어드밴스드 에너지 인더스트리즈 인코포레이티드 플라즈마 처리 부하에 대한 시스템 레벨 전원 공급
KR101303040B1 (ko) * 2012-02-28 2013-09-03 주식회사 뉴파워 프라즈마 플라즈마 챔버의 아크 검출 방법 및 장치
US9685297B2 (en) 2012-08-28 2017-06-20 Advanced Energy Industries, Inc. Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
JP6113450B2 (ja) * 2012-09-07 2017-04-12 株式会社ダイヘン インピーダンス調整装置
JP6084417B2 (ja) 2012-09-28 2017-02-22 株式会社ダイヘン インピーダンス調整装置
CN103730316B (zh) * 2012-10-16 2016-04-06 中微半导体设备(上海)有限公司 一种等离子处理方法及等离子处理装置
US8736377B2 (en) * 2012-10-30 2014-05-27 Mks Instruments, Inc. RF pulse edge shaping
US9620334B2 (en) * 2012-12-17 2017-04-11 Lam Research Corporation Control of etch rate using modeling, feedback and impedance match
US9536713B2 (en) * 2013-02-27 2017-01-03 Advanced Energy Industries, Inc. Reliable plasma ignition and reignition
US10821542B2 (en) 2013-03-15 2020-11-03 Mks Instruments, Inc. Pulse synchronization by monitoring power in another frequency band
US9854659B2 (en) * 2014-10-16 2017-12-26 Advanced Energy Industries, Inc. Noise based frequency tuning and identification of plasma characteristics
EP3091559A1 (en) * 2015-05-05 2016-11-09 TRUMPF Huettinger Sp. Z o. o. Plasma impedance matching unit, system for supplying rf power to a plasma load, and method of supplying rf power to a plasma load
US9721758B2 (en) * 2015-07-13 2017-08-01 Mks Instruments, Inc. Unified RF power delivery single input, multiple output control for continuous and pulse mode operation
KR101777762B1 (ko) * 2015-09-03 2017-09-12 에이피시스템 주식회사 고주파 전원 공급장치 및 이를 포함하는 기판 처리장치
US9577516B1 (en) * 2016-02-18 2017-02-21 Advanced Energy Industries, Inc. Apparatus for controlled overshoot in a RF generator
JP6157036B1 (ja) 2016-07-08 2017-07-05 株式会社京三製作所 高周波電源装置、及び高周波電源装置の制御方法
JP2017073770A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
JP2017073772A (ja) * 2016-09-30 2017-04-13 株式会社ダイヘン 高周波整合システム
JP6463786B2 (ja) * 2017-01-25 2019-02-06 株式会社ダイヘン 高周波整合システムのインピーダンス調整方法
US10879044B2 (en) * 2017-04-07 2020-12-29 Lam Research Corporation Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing
US11651939B2 (en) 2017-07-07 2023-05-16 Advanced Energy Industries, Inc. Inter-period control system for plasma power delivery system and method of operating same
US11615943B2 (en) 2017-07-07 2023-03-28 Advanced Energy Industries, Inc. Inter-period control for passive power distribution of multiple electrode inductive plasma source
WO2019010312A1 (en) 2017-07-07 2019-01-10 Advanced Energy Industries, Inc. INTER-PERIODIC CONTROL SYSTEM FOR PLASMA POWER SUPPLY SYSTEM AND METHOD OF OPERATION
US10679825B2 (en) * 2017-11-15 2020-06-09 Lam Research Corporation Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate
US11437221B2 (en) 2017-11-17 2022-09-06 Advanced Energy Industries, Inc. Spatial monitoring and control of plasma processing environments
US12505986B2 (en) 2017-11-17 2025-12-23 Advanced Energy Industries, Inc. Synchronization of plasma processing components
US12230476B2 (en) 2017-11-17 2025-02-18 Advanced Energy Industries, Inc. Integrated control of a plasma processing system
TWI792598B (zh) 2017-11-17 2023-02-11 新加坡商Aes 全球公司 用於在空間域和時間域上控制基板上的電漿處理之系統和方法,及相關的電腦可讀取媒體
US12288673B2 (en) 2017-11-29 2025-04-29 COMET Technologies USA, Inc. Retuning for impedance matching network control
CN111699542B (zh) 2017-11-29 2023-05-16 康姆艾德技术美国分公司 用于阻抗匹配网络控制的重新调谐
US10553400B2 (en) * 2018-03-30 2020-02-04 Applied Materials, Inc. Methods and apparatus for frequency generator and match network communication
US10916409B2 (en) * 2018-06-18 2021-02-09 Lam Research Corporation Active control of radial etch uniformity
US11804362B2 (en) 2018-12-21 2023-10-31 Advanced Energy Industries, Inc. Frequency tuning for modulated plasma systems
KR20210149225A (ko) 2019-04-29 2021-12-08 램 리써치 코포레이션 Rf 플라즈마 툴들의 멀티 레벨 펄싱을 위한 시스템들 및 방법들
KR102763163B1 (ko) * 2019-04-29 2025-02-07 삼성전자주식회사 Rf 파워 모니터링 장치, 및 그 장치를 포함하는 pe 시스템
US11114279B2 (en) 2019-06-28 2021-09-07 COMET Technologies USA, Inc. Arc suppression device for plasma processing equipment
US11527385B2 (en) 2021-04-29 2022-12-13 COMET Technologies USA, Inc. Systems and methods for calibrating capacitors of matching networks
US11596309B2 (en) 2019-07-09 2023-03-07 COMET Technologies USA, Inc. Hybrid matching network topology
US11107661B2 (en) 2019-07-09 2021-08-31 COMET Technologies USA, Inc. Hybrid matching network topology
JP7318114B2 (ja) * 2019-08-28 2023-07-31 アプライド マテリアルズ インコーポレイテッド プラズマ安定性を改善するための同調方法
WO2021041984A1 (en) 2019-08-28 2021-03-04 COMET Technologies USA, Inc. High power low frequency coils
US11521832B2 (en) 2020-01-10 2022-12-06 COMET Technologies USA, Inc. Uniformity control for radio frequency plasma processing systems
US12027351B2 (en) 2020-01-10 2024-07-02 COMET Technologies USA, Inc. Plasma non-uniformity detection
US11670488B2 (en) 2020-01-10 2023-06-06 COMET Technologies USA, Inc. Fast arc detecting match network
US11830708B2 (en) 2020-01-10 2023-11-28 COMET Technologies USA, Inc. Inductive broad-band sensors for electromagnetic waves
US11887820B2 (en) 2020-01-10 2024-01-30 COMET Technologies USA, Inc. Sector shunts for plasma-based wafer processing systems
US11605527B2 (en) 2020-01-20 2023-03-14 COMET Technologies USA, Inc. Pulsing control match network
US11961711B2 (en) * 2020-01-20 2024-04-16 COMET Technologies USA, Inc. Radio frequency match network and generator
US12261029B2 (en) * 2020-06-17 2025-03-25 Lam Research Corporation Protection system for switches in direct drive circuits of substrate processing systems
US11373844B2 (en) 2020-09-28 2022-06-28 COMET Technologies USA, Inc. Systems and methods for repetitive tuning of matching networks
KR20220067554A (ko) * 2020-11-16 2022-05-25 세메스 주식회사 기판 처리 장치 및 임피던스 정합 방법
US12057296B2 (en) 2021-02-22 2024-08-06 COMET Technologies USA, Inc. Electromagnetic field sensing device
US11961712B2 (en) 2021-04-26 2024-04-16 Advanced Energy Industries, Inc. Combining the determination of single and mutual, preset preserving, impedance loads with advances in single and double sensor calibration techniques in the application of single and pairwise calibration of sensors
US12020901B2 (en) * 2021-05-07 2024-06-25 Applied Materials, Inc. RF impedance matching networks for substrate processing platform
EP4105962A1 (en) * 2021-06-17 2022-12-21 Impedans Ltd A controller for a matching unit of a plasma processing system
EP4105963A1 (en) * 2021-06-17 2022-12-21 Impedans Ltd A controller for a matching unit of a plasma processing system
US11923175B2 (en) 2021-07-28 2024-03-05 COMET Technologies USA, Inc. Systems and methods for variable gain tuning of matching networks
US11942309B2 (en) 2022-01-26 2024-03-26 Advanced Energy Industries, Inc. Bias supply with resonant switching
US11670487B1 (en) 2022-01-26 2023-06-06 Advanced Energy Industries, Inc. Bias supply control and data processing
US12046448B2 (en) 2022-01-26 2024-07-23 Advanced Energy Industries, Inc. Active switch on time control for bias supply
WO2023167854A1 (en) * 2022-03-03 2023-09-07 COMET Technologies USA, Inc. Retuning for impedance matching network control
US12243717B2 (en) 2022-04-04 2025-03-04 COMET Technologies USA, Inc. Variable reactance device having isolated gate drive power supplies
DE102022108642A1 (de) 2022-04-08 2023-10-12 TRUMPF Hüttinger GmbH + Co. KG Plasmazünderkennungsvorrichtung zum Anschluss an eine Impedanzanpassungsschaltung für ein Plasmaerzeugungssystem
US11657980B1 (en) 2022-05-09 2023-05-23 COMET Technologies USA, Inc. Dielectric fluid variable capacitor
US12040139B2 (en) 2022-05-09 2024-07-16 COMET Technologies USA, Inc. Variable capacitor with linear impedance and high voltage breakdown
US12051549B2 (en) 2022-08-02 2024-07-30 COMET Technologies USA, Inc. Coaxial variable capacitor
US11978613B2 (en) 2022-09-01 2024-05-07 Advanced Energy Industries, Inc. Transition control in a bias supply
US12132435B2 (en) 2022-10-27 2024-10-29 COMET Technologies USA, Inc. Method for repeatable stepper motor homing
KR20240138176A (ko) * 2023-03-10 2024-09-20 삼성전자주식회사 Rf 전력 제공 장치 및 그것의 동작 방법
KR102850760B1 (ko) * 2024-05-09 2025-08-28 엠케이에스코리아 유한회사 펄스 발생기의 비대칭 멀티-레벨 제어

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3251087B2 (ja) * 1993-02-16 2002-01-28 東京エレクトロン株式会社 プラズマ処理装置
JP2929284B2 (ja) * 1997-09-10 1999-08-03 株式会社アドテック 高周波プラズマ処理装置のためのインピーダンス整合及び電力制御システム
JP4088499B2 (ja) * 2002-08-28 2008-05-21 株式会社ダイヘン インピーダンス整合器の出力端特性解析方法、およびインピーダンス整合器、ならびにインピーダンス整合器の出力端特性解析システム
US6703080B2 (en) * 2002-05-20 2004-03-09 Eni Technology, Inc. Method and apparatus for VHF plasma processing with load mismatch reliability and stability
US20040016402A1 (en) * 2002-07-26 2004-01-29 Walther Steven R. Methods and apparatus for monitoring plasma parameters in plasma doping systems
JP4411282B2 (ja) * 2003-11-27 2010-02-10 株式会社ダイヘン 高周波電力供給システム
US7169256B2 (en) * 2004-05-28 2007-01-30 Lam Research Corporation Plasma processor with electrode responsive to multiple RF frequencies
JP4739793B2 (ja) * 2005-03-31 2011-08-03 株式会社ダイヘン 高周波電源装置
TWI425767B (zh) * 2005-10-31 2014-02-01 Mks Instr Inc 無線電頻率電力傳送系統
US20080179948A1 (en) * 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
EP1952533A1 (en) * 2005-10-31 2008-08-06 MKS Instruments, Inc. Radio frequency power delivery system
JP2007336148A (ja) * 2006-06-14 2007-12-27 Daihen Corp 電気特性調整装置
JP2007313432A (ja) 2006-05-25 2007-12-06 Nippon Kankyo Calcium Kenkyusho:Kk 廃棄物処分場を覆う盛土部における設備
JP2008157906A (ja) * 2006-12-25 2008-07-10 Adtec Plasma Technology Co Ltd 出力インピーダンス検出方法およびこの方法を用いたインピーダンスのセンサー、高周波電源につながる負荷側の電力モニターならびに高周波電源の制御装置
KR101528528B1 (ko) 2008-05-14 2015-06-12 어플라이드 머티어리얼스, 인코포레이티드 Rf 전력 전달을 위한 시간 분해된 조정 방식을 이용하는 펄스화된 플라즈마 처리를 위한 방법 및 장치
US8040068B2 (en) * 2009-02-05 2011-10-18 Mks Instruments, Inc. Radio frequency power control system
KR101675625B1 (ko) * 2011-01-04 2016-11-22 어드밴스드 에너지 인더스트리즈 인코포레이티드 플라즈마 처리 부하에 대한 시스템 레벨 전원 공급

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