JP2017167194A - Apparatus for preparing aqueous resist peeling liquid and apparatus for preparing nonaqueous resist peeling liquid - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an apparatus for preparing a resist peeling liquid, which prepares a resist peeling liquid having a predetermined concentration of components from its raw materials precisely, automatically and continuously.SOLUTION: The preparation apparatus 10 comprises a preparation tank 3, a measurement means 2, and a control means 1. The preparation tank 3 receives a supply of raw materials of the resist peeling liquid and mixes them. The measurement means 2 measures, with regard to the resist peeling liquid in the preparation tank 3, at least either physical properties of the resist peeling liquid, which are correlated with a concentration of components of the resist peeling liquid, or a concentration of components of the resist peeling liquid. The control means 1 controls amounts of raw materials of the resist peeling liquid, which are supplied to the preparation tank 3 based on values measured by the measurement means 2, so that the resist peeling liquid prepared in the preparation tank 3 contains a predetermined concentration of components. By carrying out these steps automatically and continuously, there can be precisely prepared a resist peeling liquid of a desired component concentration.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a preparation apparatus for preparing an aqueous resist stripping solution used for resist stripping and a preparation apparatus for preparing a non-aqueous resist stripping liquid in a semiconductor manufacturing process and a flat panel display manufacturing process.

  In the final stage of the photolithography process in the semiconductor manufacturing process or the flat panel display substrate manufacturing process, a process of completely removing the resist from the substrate is necessary. In the resist stripping process of semiconductors and flat panel display substrates, a combination of a dry ashing process using oxygen plasma and a wet stripping process using a resist stripper is performed. Silicon oxide and aluminum oxide are formed on the substrate that has undergone the dry ashing process using oxygen plasma. In the next wet stripping process, it is necessary not only to strip the resist but also to completely remove the metal oxide. is there.

  In the resist stripping process for semiconductors and flat panel display substrates, as a resist stripping solution, a solution combining an organic alkali or an organic solvent (hereinafter also referred to as “non-aqueous resist stripping solution”) is mainly used. Further, a solution obtained by adding an appropriate amount of water to this solution (hereinafter also referred to as “aqueous resist stripping solution”) is used. In the present specification, when there is no need to clearly distinguish between “aqueous resist stripping solution” and “non-aqueous resist stripping solution”, they may be simply referred to as “resist stripping solution”.

  For example, the following Patent Document 1 and Patent Document 2 are known as resist stripping liquid management devices that manage the concentration of the resist stripping liquid.

  Patent Document 1 discloses a resist stripper discharging means for discharging a resist stripper by detecting the dissolved resist concentration of the resist stripper using an absorptiometer, and a liquid level meter for detecting the level of the resist stripper. , First supply means to replenish organic solvent and alkanolamine, or to replenish resist stripping freshly prepared organic solvent and alkanolamine, and detect alkanolamine concentration in resist stripping solution with absorptiometer And a second replenishing means for replenishing at least one of an organic solvent and an alkanolamine is described.

  Patent Document 2 listed below discloses a resist stripping solution discharging means for discharging a resist stripping solution by detecting a dissolved resist concentration of the resist stripping solution with an absorptiometer, and a liquid level meter for measuring the liquid level of the resist stripping solution. The first replenishing means that replenishes the resist stripping solution and pure water, or replenishes a resist stripping fresh solution prepared in advance by mixing the resist stripping stock solution and pure water, and the moisture concentration of the resist stripping solution. There is described a resist stripping liquid management apparatus comprising a second replenishing means that replenishes at least one of a resist stripping stock solution and pure water detected by an absorptiometer.

JP 7-235487 A Japanese Patent Laid-Open No. 10-22261

  As described in Patent Documents 1 and 2, a management apparatus for maintaining and managing a resist stripping solution at a predetermined component concentration has already been invented. However, there has been no preparation apparatus that automatically prepares a resist stripping solution having a predetermined component concentration from its raw material based on a measured value of the component concentration. This is because there is a fundamental difference between the management device and the preparation device as follows.

  In the case of the management apparatus, as in Patent Documents 1 and 2, the object to which the management apparatus is applied is a resist stripping solution that has a predetermined component concentration to be managed at first. By using the resist stripping solution, the component concentration of the resist stripping solution gradually shifts from the initial component concentration. On the other hand, the management device attempts to return the component concentration of the resist stripping solution to a predetermined concentration that should be initially managed by an operation such as replenishing the resist stripping solution with the replenishing solution. In other words, the management device is based on the technical idea that a stable control system for the component concentration centered on a predetermined component concentration to be managed is constructed by introducing a mechanism for restoring the component concentration.

  On the other hand, the preparation apparatus is an apparatus for preparing a resist stripping solution having a predetermined component concentration by mixing various raw materials. The object to which the preparation device is applied is not originally at the predetermined component concentration to be prepared. Therefore, the technical idea of the management device cannot be used as it is for the preparation device. The preparation device is not in a technical relationship that can be conceived immediately from the management device.

  Due to such a fundamental difference, even if there is a management apparatus such as Patent Documents 1 and 2, a preparation apparatus that measures a component concentration and prepares a resist stripping solution so as to obtain a predetermined component concentration has hitherto been used. There wasn't. Conventional apparatus for preparing a resist stripping solution adjusts the concentration of the raw material by its volume or weight. Therefore, the resist stripping solution prepared by a conventional preparation apparatus has not been very good in adjusting the component concentration. If the resist stripping solution is not adjusted to a predetermined concentration, a good stripping rate cannot be obtained, and stripping residues and metal oxide residues are generated, which may cause a decrease in yield. In addition, there is a problem that the amount of damage increases when a defective product occurs in the resist stripping process, which is the final stage of the photolithography process.

  The present invention has been made in view of such circumstances. An object of the present invention is to provide an aqueous resist stripping solution preparation device and a non-aqueous resist stripping solution preparation device that can accurately and continuously prepare a resist stripping solution having a predetermined concentration. .

  In order to achieve the above object, the present invention relates to a preparation tank in which an aqueous resist stripping solution having a predetermined component concentration is prepared, and an aqueous resist stripping solution in the preparation tank, and a correlation with the component concentration of the aqueous resist stripping solution. Measuring means for measuring at least one of the physical property value of the aqueous resist stripping solution and the component concentration of the aqueous resist stripping solution, and the aqueous resist stripping solution in the preparation tank based on the measured value measured by the measuring means And a control means for controlling the supply amount of the raw material of the aqueous resist stripping solution supplied to the preparation tank so as to have a predetermined component concentration.

  The apparatus for preparing an aqueous resist stripping solution of the present invention measures at least one of a physical property value or a component concentration correlated with the component concentration of the aqueous resist stripping solution to prepare an aqueous resist stripping solution. Therefore, according to the aqueous resist stripping solution preparation apparatus of the present invention, it is possible to prepare an aqueous resist stripping liquid having a more accurate component concentration than conventional preparation apparatuses prepared by volume or weight.

  In order to achieve the above object, the present invention relates to a preparation tank in which an aqueous resist stripping solution having a predetermined amine concentration is prepared, and an aqueous resist stripping solution in the preparation tank, which correlates with the amine concentration of the aqueous resist stripping solution. Based on the measured value measured by the measuring means for the amine for measuring at least one of the physical property value of the aqueous resist stripping solution and the amine concentration of the aqueous resist stripping solution, and in the preparation tank There is provided an aqueous resist stripping solution preparation apparatus comprising: an amine control unit that controls a supply amount of a raw material of an aqueous resist stripping solution supplied to a preparation tank so that the aqueous resist stripping solution has a predetermined amine concentration. .

  The apparatus for preparing an aqueous resist stripping solution of the present invention prepares an aqueous resist stripping solution by measuring at least one of a physical property value or an amine concentration correlated with the amine concentration of the aqueous resist stripping solution. Therefore, according to the preparation apparatus of the aqueous resist stripping solution of the present invention, an aqueous resist stripping liquid having a more accurate amine concentration can be prepared as compared with the conventional preparation apparatus prepared by capacity and weight.

  In order to achieve the above object, the present invention relates to a preparation tank in which an aqueous resist stripping solution having a predetermined water concentration is prepared, and an aqueous resist stripping solution in the preparation tank, which has a correlation with the water concentration of the aqueous resist stripping solution. Based on the measured value measured by the moisture measuring means for measuring at least one of the physical property value of the aqueous resist stripping solution and the water concentration of the aqueous resist stripping solution, and in the preparation tank An apparatus for preparing an aqueous resist stripping solution is provided, comprising: water-related control means for controlling the supply amount of the raw material of the aqueous resist stripping solution supplied to the preparation tank so that the aqueous resist stripping solution has a predetermined moisture concentration. .

  The apparatus for preparing an aqueous resist stripping solution of the present invention prepares an aqueous resist stripping solution by measuring at least one of a physical property value or a moisture concentration correlated with the water concentration of the aqueous resist stripping solution. Therefore, according to the apparatus for preparing an aqueous resist stripping solution of the present invention, an aqueous resist stripping liquid having a more accurate moisture concentration can be prepared as compared with a conventional preparing apparatus that has been prepared based on volume and weight.

  In order to achieve the above object, the present invention provides a preparation tank in which an aqueous resist stripping solution having a predetermined amine concentration and a predetermined water concentration is prepared, and an aqueous resist stripping solution in the preparation tank. About the physical property value of the aqueous resist stripping solution having a correlation with the amine concentration of the stripping solution, and the amine measuring means for measuring at least one of the amine concentration of the aqueous resist stripping solution, and the aqueous resist stripping solution in the preparation tank, Measured by a measuring means for water measuring at least one of the physical property value of the aqueous resist removing liquid having a correlation with the water concentration of the aqueous resist removing liquid and the water concentration of the aqueous resist removing liquid, and by a measuring means concerning the amine Based on the measured value and the measured value measured by the moisture-related measuring means, the aqueous resist in the preparation tank is removed. Provided is a water-based resist stripping solution preparation apparatus comprising: control means for controlling the supply amount of the water-based resist stripping solution supplied to the preparation tank so that the liquid has a predetermined amine concentration and a predetermined water concentration. To do.

  The apparatus for preparing an aqueous resist stripping solution of the present invention prepares an aqueous resist stripping solution by measuring at least one of a physical property value or an amine concentration correlated with the amine concentration of the aqueous resist stripping solution. At the same time, at least one of a physical property value or a moisture concentration correlated with the water concentration of the aqueous resist stripping solution is measured to prepare an aqueous resist stripping solution. Therefore, according to the preparation apparatus of the aqueous resist stripping solution of the present invention, an aqueous resist stripping solution having a more accurate amine concentration and a more accurate water concentration than a conventional preparation device prepared by volume and weight. Can be prepared.

  In a preferred aspect of the present invention, the amine-related measuring means includes any one of an absorptiometer, a conductivity meter, a density meter, an ultrasonic densitometer, and a viscometer. Since the absorbance, conductivity, density, ultrasonic wave propagation speed, and viscosity of the aqueous resist stripping solution measured by these measuring instruments have a correlation with the amine concentration of the aqueous resist stripping solution, the amine concentration is accurately adjusted to a predetermined concentration. Can be matched.

  In a more preferred embodiment of the present invention, when the measuring means relating to amine comprises an absorptiometer and the amine is monoethanolamine, the measuring wavelength of the absorptiometer is a specific wavelength selected from a wavelength region of 1000 to 1600 nm. When the amine is hydroxylamine, the measurement wavelength of the absorptiometer is a specific wavelength selected from the wavelength range of 1050 to 1090 nm.

  A relatively good linear relationship is obtained between the absorbance of the aqueous resist stripping solution measured in these wavelength regions and its amine concentration. For this reason, the absorbance measured in this wavelength region or the amine concentration obtained from this absorbance and this linear relationship is suitable for use in order to accurately set the amine concentration to a predetermined concentration. When the amine is monoethanolamine, the absorbance measured particularly at 1048 nm as the measurement wavelength, and when the amine is hydroxylamine, the absorbance measured particularly at 1074 nm as the measurement wavelength is particularly in the above-mentioned wavelength region. Since sensitivity is good and a good linear relationship is obtained with the amine concentration, it is even more preferable.

  In a preferred embodiment of the present invention, the moisture-related measuring means includes any one of an absorptiometer, a conductivity meter, a density meter, an ultrasonic densitometer, and a viscometer. Since the absorbance, conductivity, density, ultrasonic wave propagation speed, and viscosity of the aqueous resist stripping solution measured by these measuring devices have a correlation with the water concentration of the aqueous resist stripping solution, the water concentration is accurately adjusted to a predetermined concentration. Can be matched.

  In a more preferred embodiment of the present invention, the moisture-related measuring means is an absorptiometer, and the measuring wavelength of the absorptiometer is a specific wavelength selected from a wavelength region of 950 to 2000 nm.

  A relatively good linear relationship is obtained between the absorbance of the aqueous resist stripping solution measured at the measurement wavelength in the near infrared region and the water concentration. For this reason, the absorbance measured in this wavelength region, or the moisture concentration obtained from this measured absorbance and this linear relationship, is suitable for use in order to accurately set the moisture concentration to a predetermined concentration. In particular, the absorbance measured using 1940 nm and 976 nm as measurement wavelengths is even more preferable because it has particularly high sensitivity and a good linear relationship with the water concentration in this wavelength region.

  In the preferable aspect of this invention, the storage tank which stores the aqueous resist stripping solution prepared with the preparation tank is further provided.

  According to this aspect, since the aqueous resist stripping solution prepared at a predetermined component concentration is always stored in the storage tank, the aqueous resist stripping solution having the predetermined component concentration is required whenever the aqueous resist stripping solution is required. Can be obtained.

  In a preferred embodiment of the present invention, a plurality of preparation tanks are provided.

  According to this aspect, even if one of the preparation tanks does not move due to a failure or the like, the preparation of the aqueous resist stripping solution can be maintained by another preparation tank. Moreover, even if one preparation tank becomes empty, the supply of the aqueous resist stripping solution can be received from another preparation tank.

  In the preferable aspect of this invention, the preparation tank and the storage tank are connected by the communicating pipe.

  According to this aspect, even if the aqueous resist stripping solution in the storage tank decreases due to the supply of the aqueous resist stripping solution, the aqueous resist stripping solution prepared at a predetermined concentration from the preparation tank to the storage tank automatically continues. Then transferred. At this time, equipment such as a liquid feed pump is not required.

  In a preferred embodiment of the present invention, premixing means for premixing raw materials of the aqueous resist stripping solution supplied to the preparation tank is provided.

  In a preferred embodiment of the present invention, a premixing means for previously mixing the raw material of the aqueous resist stripping solution supplied to the preparation tank is provided for each preparation tank.

  According to this aspect, since the raw material of the aqueous resist stripping solution is mixed in advance, the burden of mixing and stirring in the preparation tank is reduced, and an aqueous resist stripping solution having a uniform concentration can be prepared more quickly. In addition, even when a correlation can be obtained only in a relatively narrow concentration range depending on the measured component concentration and physical property value, an aqueous resist stripping solution having a predetermined component concentration can be accurately obtained by using a premixing means. Can be prepared.

  In order to achieve the above object, the present invention provides a preparation tank in which a non-aqueous resist stripping solution having a predetermined component concentration is prepared, and a non-aqueous resist stripping solution component concentration in the preparation tank. Based on the measured value measured by the measuring means for measuring at least one of the physical property value of the non-aqueous resist stripping solution and the component concentration of the non-aqueous resist stripping solution A non-aqueous resist stripping solution preparation device comprising: control means for controlling a supply amount of the non-aqueous resist stripping solution supplied to the preparation tank so that the non-aqueous resist stripping solution has a predetermined component concentration. provide.

  The apparatus for preparing a non-aqueous resist stripping solution of the present invention prepares a non-aqueous resist stripping solution by measuring at least one of a physical property value or a component concentration correlated with the component concentration of the non-aqueous resist stripping solution. Therefore, according to the apparatus for preparing a non-aqueous resist stripping solution of the present invention, a non-aqueous resist stripping liquid having a more accurate component concentration can be prepared as compared with a conventional preparing apparatus that has been prepared based on volume and weight.

  In order to achieve the above object, the present invention provides a preparation tank in which a non-aqueous resist stripping solution having a predetermined amine concentration is prepared, and a non-aqueous resist stripping solution in which the amine concentration of the non-aqueous resist stripping liquid is prepared. Based on the measured value measured by the measuring means for the amine that measures at least one of the physical property value of the non-aqueous resist stripping solution and the amine concentration of the non-aqueous resist stripping solution, and the measuring means for the amine And an amine control means for controlling the supply amount of the raw material of the non-aqueous resist stripping solution supplied to the preparation tank so that the non-aqueous resist stripping solution in the preparation tank has a predetermined amine concentration. An apparatus for preparing a stripping solution is provided.

  The apparatus for preparing a non-aqueous resist stripping solution of the present invention measures at least one of a physical property value correlated with the amine concentration of the non-aqueous resist stripping solution and the amine concentration of the non-aqueous resist stripping solution, and based on this measured value. A non-aqueous resist stripping solution is prepared. Therefore, according to the apparatus for preparing a non-aqueous resist stripping solution of the present invention, a non-aqueous resist stripping liquid having a more accurate amine concentration can be prepared as compared with a conventional preparing apparatus that has been prepared based on volume and weight.

  In a preferred aspect of the present invention, the amine-related measuring means includes any one of an absorptiometer, a conductivity meter, a density meter, an ultrasonic densitometer, and a viscometer. The absorbance, conductivity, density, ultrasonic wave velocity, and viscosity of the non-aqueous resist stripping solution measured by these measuring devices have a correlation with the amine concentration of the non-aqueous resist stripping solution. Can be adjusted to the concentration.

  In a more preferred embodiment of the present invention, when the measuring means relating to amine comprises an absorptiometer and the amine is monoethanolamine, the measuring wavelength of the absorptiometer is a specific wavelength selected from a wavelength region of 1000 to 1600 nm. When the amine is hydroxylamine, the measurement wavelength of the absorptiometer is a specific wavelength selected from the wavelength range of 1050 to 1090 nm.

  A relatively good linear relationship is obtained between the absorbance of the non-aqueous resist stripping solution measured in these wavelength regions and its amine concentration. For this reason, the absorbance measured in this wavelength region or the amine concentration obtained from this absorbance and this linear relationship is suitable for use in order to accurately set the amine concentration to a predetermined concentration. When the amine is monoethanolamine, the absorbance measured particularly at 1048 nm as the measurement wavelength, and when the amine is hydroxylamine, the absorbance measured particularly at 1074 nm as the measurement wavelength is particularly in the above-mentioned wavelength region. Since sensitivity is good and a good linear relationship is obtained with the amine concentration, it is even more preferable.

  In the preferable aspect of this invention, the storage tank which stores the non-aqueous resist stripping solution prepared with the preparation tank is further provided.

  According to this aspect, since the non-aqueous resist stripping solution prepared at a predetermined component concentration is always stored in the storage tank, when the non-aqueous resist stripping solution is required, the non-aqueous system having a predetermined component concentration is required at any time. A resist stripping solution can be obtained.

  In a preferred embodiment of the present invention, a plurality of preparation tanks are provided.

  According to this aspect, even if one of the preparation tanks does not move due to a failure or the like, the preparation of the non-aqueous resist stripping solution can be maintained by another preparation tank. Moreover, even if one preparation tank becomes empty, supply of a non-aqueous resist stripping solution can be received from another preparation tank.

  In the preferable aspect of this invention, the preparation tank and the storage tank are connected by the communicating pipe.

  According to this aspect, even if the non-aqueous resist stripping solution in the storage tank decreases due to the supply of the non-aqueous resist stripping solution, the non-aqueous resist stripping solution prepared at a predetermined concentration from the preparation tank to the storage tank is automatically Continuously. At this time, equipment such as a liquid feed pump is not required.

  In a preferred embodiment of the present invention, premixing means for premixing raw materials of the non-aqueous resist stripping solution supplied to the preparation tank is provided.

  In the preferable aspect of this invention, the premixing means which mixes the raw material of the non-aqueous resist stripping solution supplied to a preparation tank beforehand is provided for every preparation tank.

  According to this aspect, since the raw material of the non-aqueous resist stripping solution is mixed in advance, the burden of mixing and stirring in the preparation tank is reduced, and a non-aqueous resist stripping solution having a uniform concentration can be prepared more quickly. In addition, even when a correlation can be obtained only in a relatively narrow concentration range depending on the measured component concentration and physical property value, a non-aqueous resist stripping solution having a predetermined component concentration can be accurately obtained by using a premixing means. Can be prepared.

  The apparatus for preparing an aqueous resist stripping solution of the present invention measures at least one of a physical property value having a correlation with the component concentration of the aqueous resist stripping solution and a component concentration of the aqueous resist stripping solution, and based on this measured value. The aqueous resist stripping solution is prepared so that the aqueous resist stripping solution in the preparation tank has a predetermined component concentration. Therefore, according to the aqueous resist stripping solution preparation apparatus of the present invention, it is possible to prepare an aqueous resist stripping liquid having an accurate component concentration as compared with the conventional preparation apparatus prepared by volume or weight. Moreover, according to the apparatus for preparing an aqueous resist stripping solution of the present invention, an aqueous resist stripping solution having a more accurate amine concentration and moisture concentration can be similarly prepared. Furthermore, according to the apparatus for preparing an aqueous resist stripping solution of the present invention, an aqueous resist stripping solution having a predetermined component concentration can be obtained whenever necessary. An aqueous resist stripping solution having a predetermined component concentration can also be prepared automatically and continuously.

  The apparatus for preparing a non-aqueous resist stripping solution of the present invention measures at least one of a physical property value having a correlation with a component concentration of the non-aqueous resist stripping solution and a component concentration of the non-aqueous resist stripping solution, Based on this, the non-aqueous resist stripping solution is prepared so that the non-aqueous resist stripping solution in the preparation tank has a predetermined component concentration. Therefore, according to the non-aqueous resist stripping solution preparation apparatus of the present invention, it is possible to prepare a non-aqueous resist stripping liquid having an accurate component concentration as compared with a conventional preparation apparatus prepared by volume or weight. Moreover, according to the apparatus for preparing a non-aqueous resist stripping solution of the present invention, a non-aqueous resist stripping solution having a more accurate amine concentration can be similarly prepared. Furthermore, according to the apparatus for preparing a non-aqueous resist stripping solution of the present invention, a non-aqueous resist stripping solution having a predetermined component concentration can be obtained whenever necessary. A non-aqueous resist stripping solution having a predetermined component concentration can be prepared automatically and continuously.

  Moreover, the preparation apparatus of the present invention can be used by being incorporated in equipment using a resist stripping solution. In this case, the resist stripping solution having an accurate concentration can always be supplied to equipment using the resist stripping solution.

It is a schematic diagram for demonstrating the preparation apparatus of the aqueous resist stripping solution of 1st Embodiment. It is a schematic diagram for demonstrating the preparation apparatus of the aqueous resist stripping solution of 2nd Embodiment. It is a graph which shows the relationship between the monoethanolamine density | concentration of a resist stripping solution, and a light absorbency. It is a graph which shows the relationship between the hydroxylamine density | concentration of a resist stripping solution, and a light absorbency. It is a schematic diagram for demonstrating the preparation apparatus of the aqueous resist stripping solution of 3rd Embodiment. It is a graph which shows the relationship between the water concentration of a water-system resist stripping solution, and a light absorbency. It is a schematic diagram for demonstrating the preparation apparatus of the aqueous resist stripping solution of 4th Embodiment. It is a schematic diagram for demonstrating the preparation apparatus of the aqueous resist stripping solution of 5th Embodiment. It is a schematic diagram for demonstrating the preparation apparatus of the aqueous resist stripping solution of 6th Embodiment. It is a schematic diagram for demonstrating the preparation apparatus of the aqueous resist stripping solution of 7th Embodiment. It is a schematic diagram for demonstrating the preparation apparatus of the non-aqueous resist peeling liquid of 8th Embodiment. It is a schematic diagram for demonstrating the preparation apparatus of the non-aqueous resist stripping solution of 9th Embodiment. It is a schematic diagram for demonstrating the preparation apparatus of the non-aqueous resist peeling liquid of 10th Embodiment. It is a schematic diagram for demonstrating the preparation apparatus of the non-aqueous resist peeling liquid of 11th Embodiment. It is a schematic diagram for demonstrating the preparation apparatus of the non-aqueous resist peeling liquid of 12th Embodiment.

  Hereinafter, preferred embodiments of the present invention will be described in detail with appropriate reference to the drawings. However, the shapes, sizes, dimensional ratios, relative arrangements, and the like of the component devices described in these embodiments are only those that illustrate the scope of the present invention unless otherwise specified. It is not limited to. It is only schematically shown as an illustrative example.

[Preparation equipment for aqueous resist stripper]
[First Embodiment]
FIG. 1 is a schematic view for explaining a preparation apparatus for an aqueous resist stripping solution according to this embodiment. A water-based resist stripping solution preparation apparatus 10 according to the present embodiment mainly includes a preparation tank 3, a measurement unit 2, a control unit 1, and the like.

  The preparation tank 3 is a preparation container for preparing a water-based resist stripping solution having a predetermined component concentration by blending the raw material of the water-based resist stripping solution supplied via a pipe or the like. In order to receive the supply of the raw material of the aqueous resist stripping solution, the preparation tank 3 is connected to the respective raw material supply pipes 41, 42, 43, and the like, and is equipped with a stirring means 36 for uniformly mixing the raw materials. . Further, a supply pipe 4 for supplying the prepared aqueous resist stripping solution having a predetermined component concentration is provided.

  The measuring means 2 measures at least one of the physical property value or the component concentration of the aqueous resist stripping solution prepared in the preparation tank 3. The physical property value of the aqueous resist stripping solution measured by the measuring means 2 is a physical property value having a correlation with the component concentration of the aqueous resist stripping solution. By using this correlation, the component concentration can be obtained from the measured physical property values, and the aqueous resist stripping solution can be adjusted to a predetermined component concentration.

  The control means 1 is connected to the measurement means 2 by a signal line 47 or the like so that the measurement signal of the measurement means 2 can be received. Further, the control means 1 is connected to control valves 17, 18, 19 provided in raw material supply pipes 41, 42, 43 for supplying raw materials to the preparation tank 3. When the control means 1 controls these control valves, the supply amount of the raw material supplied to the preparation tank 3 is adjusted so that the component concentration of the aqueous resist stripping solution becomes a predetermined component concentration.

  The aqueous resist stripping solution contains amine, an organic solvent and pure water as main components. The amine is supplied from the amine raw material inlet 52 to the preparation tank 3 through the amine raw material supply pipe 42. The organic solvent is supplied from the organic solvent raw material inlet 53 to the preparation tank 3 through the organic solvent raw material supply pipe 43. Similarly, pure water is supplied from the pure water inlet 51 to the preparation tank 3 via the pure water supply pipe 41. In addition to these, when there are other raw materials such as additives, an inlet, a supply pipe, a control valve and the like for supplying the raw materials may be prepared and supplied. The supply lines for other raw materials such as additives are not shown in FIG. Moreover, each raw material is not limited to the case where it is directly supplied to the preparation tank 3. For example, when the aqueous resist stripping solution in the preparation tank 3 is circulated and stirred, the respective raw materials may be supplied to the preparation tank 3 so as to be joined to the circulation pipe 34 through which the liquid circulates.

  The raw material supply pipes 41, 42, 43 are provided with control valves 17, 18, 19 connected to the control means 1 through a signal line 46. Each control valve is controlled in response to a control signal generated by the control means 1. Each control valve is preferably controlled by the control means 1 so as to increase or decrease the flow rate per unit time, for example. Each control valve has, as a default value of the flow rate, the component concentration of the aqueous resist stripping solution obtained by preparing the raw material supplied at this default value flow rate, and the physical property value measured by the measuring means 2 is correlated with the component concentration. It is assumed that it is set in advance so as to fall within the density range having

  The raw materials introduced from the raw material introduction ports 51, 52, 53 are supplied to the preparation tank 3 through the raw material supply pipes 41, 42, 43 and the control valves 17, 18, 19. The raw material supplied into the preparation tank 3 is stirred by the stirring means 36 to become a water-based resist stripping solution having a uniform concentration.

  The agitating means 36 agitates the inside of the preparation tank 3 to a uniform concentration. In FIG. 1, a part of the liquid in the preparation tank 3 is extracted via a circulation line 34 connected in a loop from the bottom to the side of the preparation tank 3, and this is extracted by the circulation stirring pump 33 into the preparation tank 3. Although the circulation stirring system which draws back in the preparation tank 3 again so that a stirring flow may be generated is drawn, it is not limited to this. A stirring device that rotates the stirring blade with a motor may be used, or a stirring bar that rotates in the preparation tank 3 may be used.

  The aqueous resist stripping solution prepared in the preparation tank 3 is measured by the measuring means 2. What is measured is at least one of the physical property value and the component concentration of the aqueous resist stripping solution prepared in the preparation tank 3. Both are good. The component concentration measured here is the concentration of the component of the aqueous resist stripping solution to be adjusted to a predetermined concentration. Similarly, the measured physical property value is a physical property value of the aqueous resist stripping solution having a correlation with a component of the aqueous resist stripping solution to be adjusted to a predetermined concentration. The number of components of the aqueous resist stripping solution corresponding to the physical property values and component concentrations measured by the measuring means 2 is not limited to one, and may be plural.

  Since the component concentration cannot be measured directly, the component concentration is usually calculated by measuring a physical property value correlated with the component concentration and using the correlation value from the measured value. Therefore, the measuring means 2 includes a measuring device that measures the physical property value of the aqueous resist stripping solution. When only the physical property value is measured, the measuring means 2 may be the measuring device itself. When calculating the component concentration from the measured physical property value, it is necessary to calculate and process the measured physical property value into the component concentration. Therefore, the measuring means 2 includes a measuring device and an arithmetic device that calculates the component concentration from the measured value. And so on.

  As an apparatus for measuring physical property values provided in the measuring means 2, an optimum apparatus is selected according to the components of the aqueous resist stripping solution whose concentration should be adjusted and the physical property values to be measured. A measuring device for measuring a physical property value capable of obtaining a good correlation with the component concentration in a concentration range including the predetermined component concentration to be adjusted for the component of the aqueous resist stripping solution whose concentration is to be adjusted. Adopt it. For example, as such a measuring apparatus, an absorptiometer, conductivity meter, density meter, ultrasonic densitometer, viscometer, and the like are suitable.

  The measuring means 2 samples the aqueous resist stripping solution prepared in the preparation tank 3 and measures its physical property value. It is preferable that the measurement is always performed under the same measurement conditions such as adjusting the temperature of the aqueous resist stripping solution sampled before the measurement. Therefore, it is preferable that the measuring unit 2 includes a sampling tube, a sampling pump (not shown), a temperature controller (not shown), and the like.

  However, the measurement method is not limited to the method of sampling a sample. What is necessary is just to measure by an optimal system according to the employ | adopted measuring apparatuses, such as the system which immerses a sensor part in a water-system resist stripping solution, and the system which installs a measuring apparatus in the circulation conduit 34.

  When the measuring means 2 measures the component concentration, the component concentration is calculated from the physical property values measured by the measuring device provided in the measuring means 2. For the calculation of the component concentration, the correlation between the physical property value and the component concentration is used. This correlation is a correspondence between the physical property value and the component concentration. If the two correspond one-to-one, the corresponding component concentration can be obtained from the measured physical property value based on this correlation. .

  The correlation is preferably provided with a certain degree of inclination in order to obtain a predetermined sensitivity, but may not necessarily be a straight line. If the component concentration has a correlation as a continuous function that has a one-to-one correspondence with the physical property value in the concentration range that includes the component concentration to be adjusted, the corresponding component concentration is calculated from the measured physical property value. it can.

  The measuring unit 2 transmits the measured physical property value or component concentration to the control unit 1. The control unit 1 receives the measurement value from the measurement unit 2. The measuring means 2 and the control means 1 are connected by a signal line 47. Measurement values are transmitted and received via the signal line 47. However, it is not limited to this. Measurement values may be transmitted and received via radio. Further, when physical property values and component concentrations are measured for a plurality of components, a signal line for connecting the measuring device and the control means 1 may be provided for each component.

  The control unit 1 is set with a target component concentration value for concentration control. The control means 1 compares the received measured value of the component concentration with the set target value of the component concentration. If the concentration of the component to be adjusted is lower than the target value as a result of the comparison, the corresponding control valve is controlled so that the supply amount of the component increases relative to the supply amounts of the other components. On the other hand, when the concentration of the component to be adjusted is higher than the target value, the corresponding control valve is controlled so that the supply amount of the component decreases relative to the supply amounts of the other components. The control means 1 appropriately calculates the control valve by the control program based on various conditions such as the degree of deviation of the component concentration from the target value, the composition of the raw material, and the concentration of each raw material. However, the control method is not limited to this. In addition to the proportional control (P control) that controls the target value of the control amount and the current value as described above, so-called integral control (I control), differential control (D control), and the like can be employed. It is preferable to control by PID control appropriately combining these control methods.

  Each control valve 17, 18, 19 provided in the water-based resist stripping solution raw material supply pipe is connected to the control means 1 by a signal line 46. In FIG. 1, the control valves 17, 18, and 19 are depicted as being connected in series by a signal line 46, but each control valve may be individually connected to the control unit 1 by a signal line. Regardless of the signal line, it may be wirelessly controlled.

  In FIG. 1, the control means 1 controls the control valve, but a computer is preferably employed as the control means 1. Control may be performed using a general-purpose controller instead of the computer. The control means 1 may be configured as a collection of controllers individually prepared for each component for adjusting the concentration. Further, instead of the measuring means 2 and the control means 1, a so-called concentration management device in which the measuring means 2 and the control means 1 are configured as one device may be used. In the case of using the concentration management device, the concentration management device may be controlled by the concentration management device so that the aqueous resist stripping solution in the preparation tank 3 always has a predetermined component concentration.

  When the physical property value is measured by the measuring device 2, the control device 1 performs control based on the physical property value. That is, since the physical property value measured by the measuring means has a correlation with the component concentration, a “predetermined physical property value” corresponding to the predetermined component concentration to be adjusted can be found on this correlation. The control unit 1 may control the control valves 17, 18, and 19 to increase or decrease the supply amount of the raw material so that the physical property value measured by the measurement unit 2 becomes this “predetermined physical property value”.

  The preparation apparatus 10 of the present embodiment can automatically and continuously prepare an aqueous resist stripping solution having a predetermined component concentration by repeatedly and continuously performing the above blending, measurement, and control cycles. Once the aqueous resist stripping solution with the prescribed component concentration is prepared in the preparation tank 3, the aqueous resist stripping solution is added while maintaining the prescribed component concentration so as to compensate for the amount reduced by the supply. What is necessary is just to prepare.

  The aqueous resist stripping solution prepared in the preparation tank 3 is supplied to the outside of the preparation tank 3 from the aqueous resist stripping solution supply pipe 4 connected to the bottom of the preparation tank 3. Although the preparation apparatus 10 can be used alone, it can also be used by connecting to other stripping equipment using an aqueous resist stripping solution. In this case, the aqueous resist stripping solution supply pipe 4 is connected to the aqueous resist stripping solution supply port 54 of another stripping facility. By doing so, it becomes possible to automatically supply a fresh aqueous resist stripping solution having a predetermined component concentration to other stripping equipment whenever necessary.

  The preparation apparatus 10 preferably includes a liquid level gauge 32 for detecting the liquid level position of the aqueous resist stripping solution in the preparation tank 3. If the supply amount of the water-based resist stripping solution supplied by the preparation device 10 is almost constant at all times, even if there is no liquid level gauge, the preparation amount can be balanced with the supply amount without emptying the preparation tank 3. Continuous preparation is possible. However, when the supply amount increases or decreases, it is preferable that the liquid level gauge 32 detects the liquid level position in the preparation tank 3 and controls the preparation tank 3 not to be emptied.

  The liquid level gauge 32 is installed in the preparation tank 3 so that the position of the liquid level in the preparation tank 3 can be detected, and is connected to the control means 1 through a signal line 48. For example, the liquid level gauge 32 detects that the liquid level in the preparation tank 3 has fallen below the lower limit value, and issues an alarm signal to the control means 1. The control means 1 controls the control valves 17, 18, and 19 to increase the supply amount of the raw material so as to recover the liquid level position, and increases the preparation amount of the aqueous resist stripping solution. When the liquid level position exceeds the lower limit value, the alarm signal is stopped, and when the amount of the aqueous resist stripping solution in the preparation tank 3 recovers to a predetermined amount, the control means 1 controls to maintain this liquid level position. In this way, it is possible to prevent the inside of the preparation tank 3 from becoming empty. If the upper limit of the liquid level is also set, the overflow of the preparation tank 3 can be prevented.

  In addition, although the raw material supply piping 41, 42, and 43 which supply each raw material of aqueous resist stripping solution was drawn in FIG. 1, the aspect connected to the side part of the preparation tank 3 was drawn, It is not limited to this. Depending on the situation, it may be connected to the top or bottom of the preparation tank 3. It may be connected to the circulation line 34. Moreover, the raw material supply pipes 41, 42, and 43 do not need to be integrally connected to the preparation tank 3. For example, the raw material may be supplied dropwise from above into the preparation tank. Further, when the raw material is not a liquid but a powder, a powder supply device may be connected instead of a pipe.

<Raw material for aqueous resist stripper>
In preparing the aqueous resist stripping solution, a raw material comprising an amine, water, an organic solvent and other additives can be used.

≪Amine≫
As the amine used as a raw material for the aqueous resist stripping solution, alkanolamine is preferably used. Examples of the alkanolamine include monoethanolamine, diethanolamine, triethanolamine, N, N-dimethylethanolamine, N, N-diethylethanolamine, aminoethylethanolamine, N-methyl-N, N-diethanolamine, N, N- Examples thereof include dibutylethanolamine, N-methylethanolamine, and 3-amino-1-propanol. Other amines include hydroxylamine, N-methyldiethanolamine, normal propanolamine, monoisopropanolamine, N-methyldiethanolamine, alkylbenzene sulfonic acid, diglycolamine, methylaminoethanol, ethylaminoethanol, 2- (2-amino Ethoxy) ethanol, triethylenetetramine, N, N dimethylacetamide, monomethylformamide can be used.

≪Organic solvent≫
As the organic solvent, a glycol ether organic solvent is preferably used. Examples of the glycol ether organic solvent include butyl diglycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, and diethylene glycol monopropyl ether. As other organic solvents, dimethyl sulfoxide, alkylhydroxybenzene, butynediol, SAA, methylmethoxybutanol, N-methyl-2-pyrrolidone, Phn, orthodichlorobenzene, triethylenetetramine, methyldiglycol can be used.

≪Other additives≫
As an aqueous resist stripping solution, in addition to amine, organic solvent, water (pure water), additives include catechol, maltol, silicon-based antifoaming agent, p-nitrobenzoic acid, reducing agent (such as sorbitol), Metal anticorrosives, chelating agents and the like can be added. Concentrations of other additives can be adjusted by adding them according to the volume of the aqueous resist stripping solution when preparing the aqueous resist stripping solution.

[Second Embodiment]
FIG. 2 is a schematic view for explaining the preparation apparatus of the aqueous resist stripping solution of the present embodiment. The aqueous resist stripping solution preparation apparatus 110 according to the present embodiment is substantially the same as the preparation apparatus 10 according to the first embodiment, and mainly includes a preparation tank 3, a measurement unit 102, a control unit 101, and the like. The measuring means 102 includes an amine-related measuring means 121, the control means 101 includes an amine-related control means 123, and is characterized in that an aqueous resist stripping solution having a predetermined amine concentration is prepared in the preparation tank 3.

  In the present embodiment, the measuring unit 102 includes a measuring unit 121 related to amine. The amine measuring means 121 is for measuring at least one of the physical property value of the aqueous resist stripping solution in the preparation tank 3 and the amine concentration. Both may be measured. If the preparation device 110 measures only the amine concentration and adjusts it to a predetermined concentration value, the measuring means 102 may be the same as the measuring means 121 for amine. However, in general, the measuring unit 102 may include a measuring unit for measuring other components in addition to the measuring unit 121 related to the amine.

  The physical property value measured by the measuring means 121 regarding the amine is a physical property value having a correlation with the amine concentration. As a physical property value having a correlation with the amine concentration, it is preferable to use a physical property value selected from absorbance, conductivity, density, ultrasonic wave propagation speed, and viscosity. In this case, the measuring means 121 relating to the amine is an absorptiometer, a conductivity meter, a density meter, an ultrasonic densitometer, a viscometer, or the like.

  As the measuring means 121 for amine, an absorptiometer is particularly preferable. If an appropriate measurement wavelength is used, a relatively good linear relationship can be obtained between the absorbance value of the aqueous resist stripping solution and the amine concentration.

  FIG. 3 and FIG. 4 can be shown as examples of physical property values having a linear relationship with the amine concentration. FIG. 3 is a graph showing the relationship between monoethanolamine (MEA) concentration and absorbance (measurement wavelength λ = 1048 nm), and FIG. 4 shows the relationship between hydroxylamine concentration and absorbance (measurement wavelength λ = 1074 nm). FIG.

  As shown in FIG. 3, when the amine contained in the aqueous resist stripping solution is monoethanolamine, which is a kind of alkanolamine, the concentration of monoethanolamine in the aqueous resist stripping solution is a specific value in the wavelength region of the near infrared region. It has a highly linear relationship with the absorbance of the aqueous resist stripper at a wavelength (for example, 1048 nm). Further, as shown in FIG. 4, the concentration of hydroxylamine in the aqueous resist stripping solution is also highly linear with respect to the absorbance of the aqueous resist stripping solution at a specific wavelength (for example, 1074 nm) in the near infrared wavelength region. Have. Therefore, the amine concentration can be accurately measured by measuring the absorbance of the aqueous resist stripping solution. When the amine is monoethanolamine, the wavelength to be measured is preferably a specific wavelength selected from a wavelength region of 1000 to 1600 nm. In the vicinity of 1048 nm where the influence of other components is small, the sensitivity is large and particularly good. Moreover, when it is hydroxylamine, it is preferable that it is a specific wavelength selected from the wavelength range of 1050 to 1090 nm. In the vicinity of 1074 nm where the influence of other components is small, the sensitivity is large and particularly good.

  In the preparation apparatus 110 of this embodiment, the measuring unit 121 related to amine measures the absorbance of the aqueous resist stripping solution at a measurement wavelength of 1048 nm, for example. The absorbance at this wavelength has a linear relationship as shown in FIG. 3 with the amine concentration (MEA concentration). Using this linear relationship, the amine concentration (MEA concentration) of the aqueous resist stripping solution can be accurately determined from the measured absorbance. Can be obtained.

  The control means 101 in this embodiment includes a control means 123 related to amine. When the preparation apparatus 110 of this embodiment adjusts only the amine concentration to a predetermined concentration, the control means 101 may be the same as the control means 123 related to amine. When the preparation apparatus 110 of the present embodiment adjusts the concentration of components other than amines, the control unit 101 not only includes the control unit 123 related to amines but also includes control units related to other components.

  The amine-related control means 123 is connected to the amine-related measuring means 121 by a signal line 147, and receives the measurement value obtained by the amine-related measuring means 121 from the amine-related measuring means 121. In the amine control means 123, the predetermined amine concentration to be adjusted is set as the target amine concentration in the concentration control. The amine-related control means 123 compares the received measured value of the amine concentration with the target amine concentration. The control means 123 related to the amine is connected to the control valves 17, 18, and 19 provided in the raw material supply pipes 41, 42, and 43 by a signal line 46. The control valves 17, 18, and 19 are appropriately controlled to operate.

  For example, when the amine concentration measured by the measuring means 121 related to the amine of the measuring means 102 is lower than the target amine concentration, the control means 123 related to the amine of the control means 101 increases the flow rate of the control valve 18 or controls it. Reduce the flow rate of valves 17 and 19 to increase the relative supply of amine stock solution. If the amine concentration is higher than the target amine concentration, conversely, the amine control means 123 decreases the flow rate of the control valve 18 or increases the flow rate of the control valves 17 and 19 so that the pure water and the organic solvent are supplied. The amine concentration is controlled by relatively increasing at least one of the feed rates and decreasing the relative feed rate of the amine stock solution. However, the control method is not limited to this. Various control methods such as PID control can be appropriately employed.

  The amine concentration may be controlled by comparing the measured physical property value with the physical property value corresponding to the target amine concentration in the correlation from the physical property value measured by the measuring means 121 related to the amine.

  For example, when the physical property value and the amine concentration have a one-to-one correlation, as in the case where a linear relationship as shown in FIG. 3 or FIG. 4 is obtained, the amine concentration is based on this correlation. The physical property value corresponding to can be obtained. Therefore, there is a “predetermined physical property value” corresponding to a predetermined amine concentration to be adjusted. Aqueous resist stripping solution prepared in the preparation tank 3 by controlling the supply amount of the raw material by the control unit 123 related to the amine so that the physical property value measured by the measurement unit 121 related to the amine becomes the “predetermined physical property value”. Can be set to a predetermined amine concentration.

  Since the other configuration common to the first embodiment of the present embodiment is the same as that of the first embodiment, the description thereof is omitted.

[Third Embodiment]
FIG. 5 is a schematic view for explaining an apparatus for preparing an aqueous resist stripping solution according to this embodiment. The aqueous resist stripping solution preparation apparatus 210 of the present embodiment is substantially the same as the preparation apparatus 10 of the first embodiment, and mainly includes the preparation tank 3, the measurement means 202, the control means 201, and the like. The measuring means 202 is provided with a measuring means 222 relating to moisture, the control means 201 is provided with a controlling means 224 relating to moisture, and is characteristic in that an aqueous resist stripping solution having a predetermined moisture concentration is prepared in the preparation tank 3.

  In the present embodiment, the measurement unit 202 includes a measurement unit 222 relating to moisture. The moisture measuring means 222 is for measuring at least one of the physical property value or the moisture concentration of the aqueous resist stripping solution in the preparation tank 3. Both may be measured. When the preparation device 210 measures only the moisture concentration and adjusts it to a predetermined concentration value, the measuring means 202 may be the same as the measuring means 222 for moisture. However, in general, the measurement unit 202 may include a measurement unit for performing measurement related to other components in addition to the measurement unit 222 related to moisture.

  The physical property value measured by the measuring means 222 relating to moisture is a physical property value having a correlation with the moisture concentration. As for the physical property value having a correlation with the water concentration, it is preferable to use a physical property value that is selected from absorbance, conductivity, density, ultrasonic wave propagation speed, and viscosity and has a linear relationship with the water concentration. In this case, the moisture measuring means 222 is an absorptiometer, conductivity meter, density meter, ultrasonic densitometer, viscometer, or the like.

  As the moisture measuring means 222, an absorptiometer is particularly preferable. If an appropriate measurement wavelength is used, a relatively good linear relationship can be obtained between the absorbance value of the aqueous resist stripping solution and the amine concentration.

  As an example of the physical property value having a linear relationship with the water concentration, FIG. 6 is a graph showing the relationship between the water concentration and the absorbance of the aqueous resist stripping solution. The absorbance measurement wavelength showing a linear relationship with the water concentration is preferably a specific wavelength selected from a range of 950 nm to 2000 nm in the near infrared region. The sensitivity is particularly high near 1940 nm, which is preferable. Further, the sensitivity is preferably large in the range of 950 nm to 1010 nm, particularly in the vicinity of 976 nm. FIG. 6 is a graph showing the relationship between the absorbance of the aqueous resist stripping solution and the water concentration at the measurement wavelength λ = 1940 nm. In addition, it has been confirmed by experiments that at the measurement wavelength λ = 976 nm, there is a high degree of linear relationship as in the graph shown in FIG. Thus, the moisture concentration can be accurately measured by detecting the absorbance of the aqueous resist stripping solution.

  In the preparation apparatus 210 of the present embodiment, the moisture measuring unit 222 measures the absorbance of the aqueous resist stripping solution at a measurement wavelength of 1940 nm, for example. Since the absorbance at this wavelength has a linear relationship with the water concentration as shown in FIG. 6, the moisture concentration of the aqueous resist stripping solution can be accurately obtained from the measured absorbance using this linear relationship.

  The control unit 201 in this embodiment includes a control unit 224 related to moisture. When the preparation apparatus 210 of the present embodiment adjusts only the moisture concentration to a predetermined concentration, the control unit 201 may be the same as the control unit 224 related to moisture. When the preparation apparatus 210 of the present embodiment adjusts the concentration of components other than water, the control unit 201 includes not only the control unit 224 related to moisture but also a control unit related to other components.

  The moisture-related control means 224 is connected to the moisture-related measuring means 222 by a signal line 247, and receives the measurement value obtained by the moisture-related measuring means 222 from the moisture-related measuring means 222. In the moisture control means 224, the predetermined moisture concentration to be adjusted is set as the moisture concentration of the target value in the concentration control. The moisture control means 224 compares the received measurement value of the moisture concentration with the target moisture concentration. The control means 224 related to moisture is connected to the control valves 17, 18, 19 provided in the raw material supply pipes 41, 42, 43 by a signal line 46, etc., and according to the result of the concentration comparison, The control valves 17, 18, and 19 are appropriately controlled to operate.

  As for the water concentration, when the water concentration measured by the measuring unit 222 relating to the water of the measuring unit 202 is lower than the target water concentration, the control unit 201 increases the flow rate of the control valve 17 or the control valve 18 or Reduce the flow rate of 19 to increase the relative supply of pure water. If the water concentration is higher than the target water concentration, conversely, the water control means 224 decreases the flow rate of the control valve 17 or increases the flow rate of the control valves 18 and 19 to reduce the concentration of the amine stock solution and the organic solvent. The water concentration is controlled by relatively increasing at least one of the supply amounts and decreasing the relative supply amount of pure water. However, the control method is not limited to this. Various control methods such as PID control can be appropriately employed.

  Regarding the adjustment of the moisture concentration, the moisture concentration is controlled by comparing the measured physical property value with the physical property value corresponding to the target moisture concentration in the correlation from the physical property value measured by the moisture measuring means 222. May be.

  For example, when the physical property value and the moisture concentration have a one-to-one correlation as in the case where a linear relationship as shown in FIG. 6 is obtained, the moisture concentration is handled based on this correlation. Physical property values can be obtained. Therefore, there is a “predetermined physical property value” corresponding to a predetermined moisture concentration to be adjusted. A water-based resist stripping solution prepared in the preparation tank 3 by the control unit 224 controlling the moisture so that the physical property value measured by the measuring unit 222 related to moisture becomes the “predetermined physical property value”. Can be set to a predetermined moisture concentration.

  Since the other configuration common to the first embodiment of the present embodiment is the same as that of the first embodiment, the description thereof is omitted.

[Fourth Embodiment]
FIG. 7 is a schematic view for explaining an apparatus for preparing an aqueous resist stripping solution according to the present embodiment. The aqueous resist stripping solution preparation apparatus 310 of the present embodiment is substantially the same as the preparation apparatus 10 of the first embodiment, and mainly includes the preparation tank 3, the measurement means 302, the control means 301, and the like. However, the measurement means 302 includes an amine measurement means 321 and a moisture measurement means 322, and the control means 301 is adjusted so that the amine concentration of the aqueous resist stripping solution in the preparation tank 3 becomes a predetermined amine concentration. The amount of the raw material supplied is controlled so that the water concentration of the aqueous resist stripping solution in the tank 3 becomes a predetermined water concentration, and the aqueous resist stripping solution having a predetermined amine concentration and a predetermined water concentration in the preparation tank 3 Is characteristic in that is prepared.

  In the present embodiment, the measuring unit 302 includes a measuring unit 321 related to amine and a measuring unit 322 related to moisture. The amine measuring means 321 is for measuring at least one of the physical property value or amine concentration of the aqueous resist stripping solution in the preparation tank 3. Both may be measured. The moisture measuring means 322 is for measuring at least one of the physical property value or the moisture concentration of the aqueous resist stripping solution in the preparation tank 3. Both may be measured. When the preparation device 310 measures only the amine concentration and the water concentration and adjusts them to predetermined concentration values, the measuring means 302 need only be the measuring means 321 related to amine and the measuring means 322 related to water. However, in general, the measuring unit 302 may additionally include a measuring unit for performing measurements on other components in addition to these.

  The control means 301 in this embodiment includes a control means 323 related to amine, a control means 324 related to moisture, a control means related to other components, and the like. Alternatively, it may be a single control unit that collectively includes functions corresponding to these functions. The control of the amine concentration in this embodiment is the same as that in the second embodiment. The control of the water concentration in the present embodiment is the same as in the third embodiment. In addition, since the configuration common to the first to third embodiments is the same as that described in each embodiment, the description in this embodiment is omitted.

  In addition, in FIG. 7, the preparation apparatus 310 of this embodiment showed the aspect connected to the raw material storage container 320 and the peeling equipment 390 which uses an aqueous resist stripping solution. In this way, the preparation device 310 can be connected to the raw material storage container 320 and the peeling facility 390 to perform on-site operation in a factory where the peeling process is performed.

  The raw material storage container 320 is a container for temporarily storing the raw material of the aqueous resist stripping solution. It consists of amine storage containers 311a and 311b, organic solvent storage containers 312a and 312b, and the like. The number of amine storage containers 311a and 311b and the number of organic solvent storage containers 312a and 312b may be one, but it is more preferable that two are provided as shown in FIG. In the amine storage containers 311a and 311b, amine is always stored from the amine material introduction port 52 through the amine material replenishment piping 342. The organic solvent storage containers 312a and 312b always store the organic solvent from the organic solvent raw material introduction port 53 through the organic solvent raw material replenishment piping 343. By always preparing the necessary raw material in the raw material storage container 320, the preparation device 310 can receive the raw material supply without interruption, and can continuously prepare the aqueous resist stripping solution.

  The amine storage containers 311 a and 311 b and the organic solvent storage containers 312 a and 312 b are connected by a preparation device 310, an amine supply pipe 344 and an organic solvent supply pipe 345, and various raw materials are supplied from the raw material storage container 320 to the preparation tank 3. . The supply method may be a method using a liquid feed pump or a pressurized / pressure feeding method of a container. If necessary, as shown in FIG. 7, control valves 313a to 316b are provided in the amine supply pipe 344 and the organic solvent supply pipe 345 that connect the raw material storage container 320 and the preparation tank 3, and the preparation apparatus 310 controls them. You may make it do.

  On the other hand, the preparation device 310 is connected to the peeling facility 390 via an aqueous resist stripping solution supply pipe 304 connected to the preparation tank 3. The aqueous resist stripping solution supply pipe 304 is provided with a liquid feed pump 325 and a control valve 326.

  The aqueous resist stripping solution prepared in the preparation tank 3 is supplied from the aqueous resist stripping solution supply port 354 to the stripping facility 390 by the liquid feed pump 325 through the aqueous resist stripping solution supply pipe 304. The peeling facility 390 is connected to the control unit 301 via the signal line 392. The control unit 301 receives the aqueous resist stripping solution supply request signal issued from the stripping facility 390 via the signal line 392. The control valve 326 is connected to the control unit 301 via the signal line 349. The control unit 301 controls the opening and closing of the control valve 326 in response to a request on the peeling facility 390 side. Thereby, the stripping equipment 390 can automatically receive the supply of the aqueous resist stripping solution by a necessary amount when the aqueous resist stripping solution is needed.

[Fifth Embodiment]
FIG. 8 is a schematic view for explaining an apparatus for preparing an aqueous resist stripping solution according to the fifth embodiment. The water-based resist stripping solution preparation apparatuses 10, 110, 210, and 310 according to the first to fourth embodiments are different from each other in that a storage tank 402 that stores the water-based resist stripping liquid prepared in the preparation tank 3 is provided. Yes.

  In the aqueous resist remover preparation apparatus 410 of the fifth embodiment, at least the physical property value or the component concentration of the aqueous resist remover in the preparation tank 3 is the same as the aqueous resist remover preparation apparatus 10 of the first embodiment. By measuring either one, the component concentration of the resist stripping solution in the preparation tank 3 is adjusted to a predetermined concentration.

  The aqueous resist stripping solution prepared in the preparation tank 3 is sent from the preparation tank 3 to the storage tank 402 and stored in the storage tank 402. The liquid feeding method may be a method of transferring with a liquid feeding pump or the like, and is not particularly limited. As shown in FIG. 8, it is convenient and convenient to connect the preparation tank 3 and the storage tank 402 with a communication pipe 435 because the liquid is naturally fed without a liquid feed pump or the like.

  The communication pipe 435 is a conduit through which the aqueous resist stripping solution flows. As shown in FIG. 8, the preparation tank 3 is installed at a position higher than the storage tank 402. For example, as shown in FIG. 8, the communication pipe 435 connects the bottom of the preparation tank 3 and the side of the storage tank 402. When the amount of the aqueous resist stripping solution stored in the storage tank 402 is reduced by supplying the aqueous resist stripping solution from the storage tank 402 to the stripping equipment 390, the aqueous resist stripping liquid prepared in the preparation tank 3 is communicated. It moves naturally through the tube 435 to the storage tank 402. The communication pipe 435 has an appropriate length and an inner diameter of the pipe, and has a buffering action of concentration fluctuation that prevents the fluctuation of the concentration of the aqueous resist stripping solution generated in the preparation tank 3 from reaching the storage tank 402.

  Similarly to the preparation tank 3, the storage tank 402 is preferably provided with a measuring unit 431 and a liquid level gauge 432. As the measuring means 431, the same one provided in the preparation tank 3 can be used. The measuring unit 431 may further include either or both of a measuring unit related to amine and a measuring unit related to moisture. With these devices, the physical property value or component concentration of the aqueous resist stripping solution stored in the storage tank 402 can be measured.

  Further, the measuring means 431 and the liquid level gauge 432 are also connected to the control means 401 via signal lines 447 and 448. The control means 401 corresponds to the physical property value or component concentration of the aqueous resist stripping solution in the storage tank 402 measured by the measuring means 431 and the liquid level position of the aqueous resist stripping liquid in the storage tank 402 measured by the liquid level gauge 432. Similarly to the case of the preparation tank 3, the control valves 17, 18, and 19 are appropriately controlled. Since the concentration fluctuation of the storage tank 402 is extremely small, actually, the concentration of the aqueous resist stripping solution inside the storage tank 402 is monitored and the liquid amount is managed.

  The aqueous resist stripping solution in the storage tank 402 is circulated and agitated by a circulation agitation pump 433 provided in the circulation line 434. Thereby, the aqueous resist stripping solution in the storage tank 402 is maintained at a uniform concentration.

[Sixth Embodiment]
FIG. 9 is a schematic view for explaining an apparatus for preparing an aqueous resist stripping solution according to the sixth embodiment. The aqueous resist remover preparation apparatus 510 according to the sixth embodiment is different from the aqueous resist remover preparation apparatus of the embodiments described above in that it includes two preparation tanks.

  Similar to the preparation tank 3, the preparation tank 503 includes a measuring unit 531 and a liquid level gauge 532, and is connected to the control unit 501 through a signal line 547 and a signal line 548. The physical property value or component concentration of the aqueous resist stripping solution in the preparation tank 503 and the liquid surface position are monitored by the control means 501, and the control valves 517, 518 and 519 connected via the signal line 546 are controlled to prepare. The component concentration and the liquid surface position are adjusted by the same method as that for adjusting the component concentration of the aqueous resist stripping solution in the tank 3. The aqueous resist stripping solution prepared in the preparation tank 503 is stored in the storage tank 402 through the communication pipe 535. The preparation tank 503 is provided with a circulation pipe 534, and the aqueous resist stripping solution in the preparation tank 503 is circulated and stirred by a circulation stirring pump 533 provided in the circulation pipe 534.

  According to the apparatus for preparing an aqueous resist stripping solution according to the sixth embodiment, since two preparation tanks are provided, for example, even if the preparation tank 3 does not move due to a failure or the like, the aqueous system is transferred from the preparation tank 503 to the storage tank 402. By preparing and supplying the resist stripping solution, the preparation and supply of the aqueous resist stripping solution can be continued without stopping the apparatus. Moreover, even if the inside of the preparation tank 3 is empty, the aqueous resist stripping solution can be supplied from the preparation tank 503.

  In addition, in FIG. 9, although the structure provided with two preparation tanks was described, the number of preparation tanks is not specifically limited, You may provide three or more several tanks. However, considering that the apparatus is enlarged and is a spare at the time of failure, it is sufficient to provide two preparation tanks for one storage tank.

[Seventh Embodiment]
FIG. 10 is a schematic diagram for explaining an apparatus for preparing an aqueous resist stripping solution according to the seventh embodiment. The water-based resist stripping solution preparation apparatus 610 according to the seventh embodiment has the mixing preparation tank 605 as a premixing means for premixing the raw material of the water-based resist stripping solution, and the water system according to the embodiments described so far. It is different from the resist stripper preparation device.

  The mixing preparation tank 605 is connected to the pure water supply pipe 41, the amine supply pipe 344, and the organic solvent supply pipe 345. Further, the mixing preparation tank 605 is connected to the preparation tank 3 by a pipe 606.

  A mixing preparation tank 605 is provided, and the raw materials supplied to the preparation tank 3 are mixed in the mixing preparation tank 605 and supplied to the preparation tank 3, thereby supplying the preparation tank 3 with a concentration close to the composition of the aqueous resist stripping solution. Can do. Therefore, the concentration of the aqueous resist stripping solution in the preparation tank 3 can be prevented from changing suddenly, and the aqueous resist stripping solution can be easily prepared. Moreover, since the raw material of the aqueous resist stripping solution is mixed in advance, the burden of mixing and stirring in the preparation tank 3 is reduced, and an aqueous resist stripping solution having a uniform concentration can be prepared more quickly.

  Mixing in the mixing preparation tank 605 controls the control valves 617, 618, and 619 connected via the signal line 646 by the control means 601 to control the flow rates of pure water, amine stock solution, and organic solvent. The concentration of the aqueous resist stripping solution prepared in the preparation tank 3 is preferable. Since the final concentration of the aqueous resist stripping solution is prepared in the preparation tank 3, the mixing preparation tank 605 may not be prepared with high accuracy. Each raw material may be mixed so that the concentration of the resist stripping solution mixed in the mixing preparation tank 605 falls within a concentration range in which the physical property value measured by the measuring unit 2 has a correlation with the component concentration. However, similarly to the preparation tank 3, the physical property value or the component concentration may be measured by a measuring device.

  The premixing means provided in the preparation apparatus 610 of the present embodiment is not limited to an aspect like the mixing preparation tank 605 that behaves as a simple mixing tank. For example, the pure water supply pipe 41, the amine supply pipe 344, the organic solvent supply pipe 345, and the like for supplying the raw material may be joined before the preparation tank 3 and the raw materials may be mixed in the joining pipe. In that case, a pipe-type mixing device such as an in-line mixer or a static mixer can also be employed. You may make it merge with the circulation line 34. FIG.

  In addition, the premixing means may be configured to include premixing means for each preparation tank in the aqueous resist stripping solution preparation apparatus including a plurality of preparation tanks as in the sixth embodiment.

[Non-aqueous resist stripper preparation equipment]
[Eighth Embodiment]
FIG. 11 is a schematic view for explaining the non-aqueous resist stripping solution preparation apparatus of the present embodiment. The non-aqueous resist stripper preparation apparatus 710 of the present embodiment mainly includes a preparation tank 703, a measurement unit 702, a control unit 701, and the like.

  The preparation tank 703 is a preparation container for preparing a non-aqueous resist stripping solution having a predetermined component concentration by blending raw materials of a non-aqueous resist stripping solution supplied via a pipe or the like. The preparation tank 703 is connected to the raw material supply pipes 742 and 743 in order to receive the supply of the raw material of the non-aqueous resist stripping solution, and is provided with a stirring means 736 for uniformly mixing the raw materials. Further, a supply pipe 704 is provided for supplying the prepared non-aqueous resist stripping solution having a predetermined component concentration.

  The measuring means 702 measures at least one of the physical property value and the component concentration of the non-aqueous resist stripping solution prepared in the preparation tank 703. The physical property value of the non-aqueous resist stripping solution measured by the measuring unit 702 is a physical property value having a correlation with the component concentration of the non-aqueous resist stripping solution. By using this correlation, the component concentration can be obtained from the measured physical property values, and the non-aqueous resist stripping solution can be adjusted to a predetermined component concentration.

  The control unit 701 is connected to the measurement unit 702 by a signal line 747 or the like so that the measurement signal of the measurement unit 702 can be received. The control means 701 is connected to control valves 718 and 719 provided in the raw material supply pipes 742 and 743 for supplying the raw material to the preparation tank 703. When the control means 701 controls these control valves, the supply amount of the raw material supplied to the preparation tank 703 is adjusted so that the component concentration of the aqueous resist stripping solution becomes a predetermined component concentration.

  The non-aqueous resist stripping solution contains an amine and an organic solvent as main components. The amine is supplied from the amine raw material inlet 752 to the preparation tank 703 via the amine raw material supply pipe 742. The organic solvent is supplied from the organic solvent raw material introduction port 753 to the preparation tank 703 through the organic solvent raw material supply pipe 743. In addition to these, when there are other raw materials such as additives, an inlet, a supply pipe, a control valve and the like for supplying the raw materials may be prepared and supplied. The supply lines for other raw materials such as additives are not shown in FIG. Moreover, each raw material is not limited to the case where it is directly supplied to the preparation tank 703. For example, when the non-aqueous resist stripping solution in the preparation tank 703 is circulated and stirred, the respective raw materials may be supplied to the preparation tank 703 so as to be joined to the circulation pipe 734 through which the liquid circulates.

  The raw material supply pipes 742 and 743 are provided with control valves 718 and 719 connected to the control means 701 through a signal line 746. Each control valve is controlled in response to a control signal issued by the control means 701. Each control valve is preferably controlled by the control means 701 so as to increase or decrease the flow rate per unit time, for example. For each control valve, the component concentration of the non-aqueous resist stripping solution obtained by preparing the raw material supplied at the default flow rate is used as the default value of the flow rate, and the physical property value measured by the measuring means 702 is correlated with the component concentration. It is assumed that it is set in advance so as to fall within the concentration range having the relationship.

  The respective raw materials introduced from the raw material introduction ports 752 and 753 are supplied to the preparation tank 703 via the raw material supply pipes 742 and 743 and the control valves 718 and 719. The raw material supplied into the preparation tank 703 is stirred by the stirring means 736 and becomes a non-aqueous resist stripping solution having a uniform concentration.

  The stirring means 736 is for stirring the inside of the preparation tank 703 to a uniform concentration. In FIG. 11, a part of the liquid in the preparation tank 703 is extracted through a circulation line 734 connected in a loop from the bottom to the side of the preparation tank 703, and this is extracted into the preparation tank 703 by the circulation stirring pump 733. Although the circulation stirring system which returns to the preparation tank 703 again so that a stirring flow may be produced is drawn, it is not limited to this. A stirring device that rotates the stirring blade with a motor may be used, or a stirring bar that rotates in the preparation tank 703 may be used.

  The non-aqueous resist stripping solution prepared in the preparation tank 703 is measured by the measuring means 702. What is measured is at least one of the physical property value and the component concentration of the non-aqueous resist stripping solution prepared in the preparation tank 703. Both are good. The component concentration measured here is the concentration of the component of the non-aqueous resist stripping solution that is to be adjusted to a predetermined concentration. Similarly, the measured physical property value is a physical property value of the non-aqueous resist stripping solution correlated with the component of the non-aqueous resist stripping solution to be adjusted to a predetermined concentration. The number of components of the non-aqueous resist stripping solution corresponding to the physical property values and component concentrations measured by the measuring unit 702 is not limited to one, and may be plural.

  Since the component concentration cannot be measured directly, the component concentration is usually calculated by measuring a physical property value correlated with the component concentration and using the correlation value from the measured value. Therefore, the measuring unit 702 includes a measuring device that measures the physical property value of the non-aqueous resist stripping solution. When only the physical property value is measured, the measuring unit 702 may be the measuring device itself. When the component concentration is calculated from the measured physical property value, the measured physical property value needs to be processed into the component concentration. Therefore, the measuring unit 702 includes a measuring device, and an arithmetic device that calculates the component concentration from the measured value. And so on.

  As an apparatus for measuring physical property values provided in the measuring means 702, an optimum apparatus is selected according to the components of the non-aqueous resist stripping solution whose concentration is to be adjusted and the physical property values to be measured. A measuring device that measures a physical property value capable of obtaining a good correlation with the component concentration in a concentration range including the predetermined component concentration to be adjusted with respect to the component of the non-aqueous resist stripping solution whose concentration is to be adjusted. Should be adopted. For example, as such a measuring apparatus, an absorptiometer, conductivity meter, density meter, ultrasonic densitometer, viscometer, and the like are suitable.

  The measuring means 702 samples the non-aqueous resist stripping solution prepared in the preparation tank 703 and measures its physical property value. It is preferable that the measurement is always performed under the same measurement conditions such as adjusting the temperature of the non-aqueous resist stripping solution sampled before the measurement. Therefore, the measuring unit 702 preferably includes a sampling tube, a sampling pump (not shown), a temperature controller (not shown), and the like.

  However, the measurement method is not limited to the method of sampling a sample. What is necessary is just to measure by an optimal system according to the employ | adopted measuring apparatuses, such as the system which immerses a sensor part in a non-aqueous resist stripping solution, the system which installs a measuring apparatus in the circulation pipe line 734, etc.

  When the measuring unit 702 measures the component concentration, the component concentration is calculated from the physical property values measured by the measuring device provided in the measuring unit 702. For the calculation of the component concentration, the correlation between the physical property value and the component concentration is used. This correlation is a correspondence between the physical property value and the component concentration. If the two correspond one-to-one, the corresponding component concentration can be obtained from the measured physical property value based on this correlation. .

  The correlation is preferably provided with a certain degree of inclination in order to obtain a predetermined sensitivity, but may not necessarily be a straight line. If the component concentration has a correlation as a continuous function that has a one-to-one correspondence with the physical property value in the concentration range that includes the component concentration to be adjusted, the corresponding component concentration is calculated from the measured physical property value. it can.

  The measuring unit 702 transmits the measured physical property value or component concentration to the control unit 701. The control unit 701 receives the measurement value from the measurement unit 702. Measuring means 702 and control means 701 are connected by a signal line 747. Measurement values are transmitted and received via this signal line 747. However, it is not limited to this. Measurement values may be transmitted and received via radio. Further, when physical property values and component concentrations are measured for a plurality of components, a signal line for connecting the measuring device and the control means 701 may be provided for each component.

  In the control means 701, a target component concentration value is set in the concentration control. The control unit 701 compares the received measured value of the component concentration with the set target value of the component concentration. If the concentration of the component to be adjusted is lower than the target value as a result of the comparison, the corresponding control valve is controlled so that the supply amount of the component increases relative to the supply amounts of the other components. On the other hand, when the concentration of the component to be adjusted is higher than the target value, the corresponding control valve is controlled so that the supply amount of the component decreases relative to the supply amounts of the other components. The control means 701 appropriately calculates which control valve is controlled based on various conditions such as the degree of deviation of the component concentration from the target value, the composition of the raw material, and the concentration of each raw material. However, the control method is not limited to this. In addition to the proportional control (P control) that controls the target value of the control amount and the current value as described above, so-called integral control (I control), differential control (D control), and the like can be employed. It is preferable to control by PID control appropriately combining these control methods.

  The control valves 718 and 719 provided on the raw water supply pipe for the non-aqueous resist stripping solution are connected to the control means 701 by a signal line 746. In FIG. 11, the control valves 718 and 719 are depicted as being connected in series by a signal line 746, but each control valve may be individually connected to the control unit 701 by a signal line. Regardless of the signal line, it may be wirelessly controlled.

  In FIG. 11, the control means 701 controls the control valve, but a computer is preferably employed as the control means 701. Control may be performed using a general-purpose controller instead of the computer. The control means 701 may be configured as a collection of controllers prepared separately for each component for adjusting the concentration. Further, instead of the measurement unit 702 and the control unit 701, a so-called concentration management device in which the measurement unit 702 and the control unit 701 are configured as one device may be used. When the concentration management device is used, the concentration management device may be controlled by the concentration management device so that the non-aqueous resist stripping solution in the preparation tank 703 always has a predetermined component concentration.

  When the physical property value is measured by the measuring unit 702, the control unit 701 performs control based on the physical property value. That is, since the physical property value measured by the measuring means has a correlation with the component concentration, a “predetermined physical property value” corresponding to the predetermined component concentration to be adjusted can be found on this correlation. The control unit 701 may control the control valves 718 and 719 so that the supply amount of the raw material is increased or decreased so that the physical property value measured by the measuring unit 702 becomes the “predetermined physical property value”.

  The preparation apparatus 710 of this embodiment can automatically and continuously prepare a non-aqueous resist stripping solution having a predetermined component concentration by repeatedly and continuously performing the above blending, measurement, and control cycles. Once a non-aqueous resist stripping solution having a predetermined component concentration is prepared in the preparation tank 703, the non-aqueous resist stripping solution is maintained while maintaining the predetermined component concentration so as to compensate for the amount reduced by the supply. May be additionally prepared.

  The non-aqueous resist stripping solution prepared in the preparation tank 703 is supplied to the outside of the preparation tank 703 from a non-aqueous resist stripping solution supply pipe 704 connected to the bottom of the preparation tank 703. The preparation device 710 can be used alone, but can also be used by connecting to other stripping equipment that uses a non-aqueous resist stripping solution. In this case, the non-aqueous resist stripping solution supply pipe 704 is connected to the non-aqueous resist stripping solution supply port 754 of another stripping facility. By doing so, it is possible to automatically supply a fresh non-aqueous resist stripping solution having a predetermined component concentration to other stripping equipment whenever necessary.

  The preparation device 710 preferably includes a liquid level gauge 732 for detecting the liquid level position of the non-aqueous resist stripping solution in the preparation tank 703. If the supply amount of the non-aqueous resist stripping solution supplied by the preparation device 710 is almost constant at all times, the preparation tank 703 is not emptied by balancing the preparation amount with the supply amount even without a liquid level gauge. Can be prepared continuously. However, when the supply amount increases or decreases, it is preferable to detect the liquid level position in the preparation tank 703 using the liquid level gauge 732 and control the preparation tank 703 so that it does not become empty.

  The liquid level gauge 732 is installed in the preparation tank 703 so that the liquid level position in the preparation tank 703 can be detected, and is connected to the control means 701 via the signal line 748. For example, the liquid level gauge 732 detects that the liquid level in the preparation tank 703 has fallen below the lower limit value, and issues an alarm signal to the control means 701. The control means 701 controls the control valves 718 and 719 to increase the supply amount of the raw material so as to recover the liquid level position, and increases the preparation amount of the non-aqueous resist stripping solution. When the liquid level position exceeds the lower limit value, the alarm signal is stopped, and when the amount of the non-aqueous resist stripping solution in the preparation tank 3 recovers to a predetermined amount, the control means 1 controls to maintain this liquid level position. . In this way, the inside of the preparation tank 703 can be prevented from becoming empty. In addition, if the upper limit of the liquid level position is set, overflow of the preparation tank 703 can be prevented.

  In addition, although the raw material supply piping 742 and 743 which supply each raw material of a non-aqueous resist stripping solution was drawn in FIG. 11, the aspect connected to the side part of the preparation tank 703 was drawn, It is not limited to this. Depending on the situation, it may be connected to the top or bottom of the preparation tank 703. It may be connected to the circulation line 34. Further, the raw material supply pipes 742 and 743 do not need to be integrally connected to the preparation tank 703. For example, the raw material may be supplied dropwise from above into the preparation tank. Further, when the raw material is not a liquid but a powder, a powder supply device may be connected instead of a pipe.

<Raw material for non-aqueous resist stripper>
The non-aqueous resist remover used in the non-aqueous resist remover preparation apparatus of the present embodiment can use a raw material composed of an amine, an organic solvent, and other additives.

≪Amine≫
As the amine used as a raw material for the non-aqueous resist stripping solution, alkanolamine is preferably used. Examples of the alkanolamine include monoethanolamine, diethanolamine, triethanolamine, N, N-dimethylethanolamine, N, N-diethylethanolamine, aminoethylethanolamine, N-methyl-N, N-diethanolamine, N, N- Examples thereof include dibutylethanolamine, N-methylethanolamine, and 3-amino-1-propanol. Other amines include hydroxylamine, N-methyldiethanolamine, normal propanolamine, monoisopropanolamine, N-methyldiethanolamine, alkylbenzene sulfonic acid, diglycolamine, methylaminoethanol, ethylaminoethanol, 2- (2-amino Ethoxy) ethanol, triethylenetetramine, N, N dimethylacetamide, monomethylformamide can be used.

≪Organic solvent≫
As the organic solvent, a glycol ether organic solvent is preferably used. Examples of the glycol ether organic solvent include butyl diglycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, and diethylene glycol monopropyl ether. As other organic solvents, dimethyl sulfoxide, alkylhydroxybenzene, butynediol, SAA, methylmethoxybutanol, N-methyl-2-pyrrolidone, Phn, orthodichlorobenzene, triethylenetetramine, methyldiglycol can be used.

≪Other additives≫
In addition to amines and organic solvents, non-aqueous resist stripping solutions include catechol, maltol, silicon-based antifoaming agents, p-nitrobenzoic acid, reducing agents (such as sorbitol), metal anticorrosives, and chelates. An agent or the like can be added. Concentrations of other additives can be adjusted by adding them according to the capacity of the non-aqueous resist stripping solution when preparing the non-aqueous resist stripping solution.

[Ninth Embodiment]
FIG. 12 is a schematic view for explaining the non-aqueous resist stripping solution preparation apparatus of the present embodiment. The non-aqueous resist stripping solution preparation apparatus 810 of this embodiment is substantially the same as the preparation apparatus 710 of the eighth embodiment, and mainly includes a preparation tank 703, a measuring means 802, a control means 801, and the like. However, it is characteristic in that the measuring unit 802 includes the measuring unit 821 related to amine, the control unit 801 includes the control unit 823 related to amine, and a non-aqueous resist stripping solution having a predetermined amine concentration is prepared in the preparation tank 703. is there.

  In the present embodiment, the measuring unit 802 includes a measuring unit 821 related to amine. The amine measuring means 821 is for measuring at least one of the physical property value or amine concentration of the non-aqueous resist stripping solution in the preparation tank 703. Both may be measured. If the preparation device 810 measures only the amine concentration and adjusts it to a predetermined concentration value, the measuring means 802 may be the same as the measuring means 821 for amine. However, in general, the measuring unit 802 may include a measuring unit for measuring other components in addition to the measuring unit 821 related to the amine.

  The physical property value measured by the measuring means 821 regarding the amine is a physical property value having a correlation with the amine concentration. As a physical property value having a correlation with the amine concentration, it is preferable to use a physical property value selected from absorbance, conductivity, density, ultrasonic wave propagation speed, and viscosity. In this case, the measurement means 821 related to amine is an absorptiometer, conductivity meter, density meter, ultrasonic densitometer, viscometer, etc., respectively.

  As the measuring means 821 for amine, an absorptiometer is particularly preferable. If an appropriate measurement wavelength is used, a relatively good linear relationship can be obtained between the absorbance value of the non-aqueous resist stripping solution and the amine concentration.

  For example, the absorbance shown in FIG. 3 and FIG. 4 can be used as a physical property value obtained in a linear relationship with the amine concentration. FIG. 3 is a graph showing the relationship between monoethanolamine (MEA) concentration and absorbance (measurement wavelength λ = 1048 nm), and FIG. 4 shows the relationship between hydroxylamine concentration and absorbance (measurement wavelength λ = 1074 nm). FIG. 3 and 4 are graphs showing the relationship between the amine concentration and the absorbance in the aqueous resist stripping solution, the same linear relationship is also obtained in the non-aqueous resist stripping solution.

  As shown in FIG. 3, when the amine contained in the non-aqueous resist stripping solution is monoethanolamine, which is a kind of alkanolamine, the concentration of monoethanolamine in the non-aqueous resist stripping solution is in the near infrared region wavelength region. It has a high linear relationship with the absorbance of the non-aqueous resist stripper at a specific wavelength (for example, 1048 nm). Further, as shown in FIG. 4, the concentration of hydroxylamine in the non-aqueous resist stripping solution is also highly linear with respect to the absorbance of the non-aqueous resist stripping solution at a specific wavelength (for example, 1074 nm) in the near infrared wavelength region. Have a relationship. Therefore, the amine concentration can be accurately measured by measuring the absorbance of the non-aqueous resist stripping solution. When the amine is monoethanolamine, the wavelength to be measured is preferably a specific wavelength selected from a wavelength region of 1000 to 1600 nm. In the vicinity of 1048 nm where the influence of other components is small, the sensitivity is large and particularly good. Moreover, when it is hydroxylamine, it is preferable that it is a specific wavelength selected from the wavelength range of 1050 to 1090 nm. In the vicinity of 1074 nm where the influence of other components is small, the sensitivity is large and particularly good.

  In the preparation apparatus 810 of the present embodiment, the amine measuring unit 821 measures the absorbance of the non-aqueous resist stripping solution at a measurement wavelength of 1048 nm, for example. The absorbance at this wavelength has a linear relationship as shown in FIG. 3 with the amine concentration (MEA concentration). Using this linear relationship, the amine concentration (MEA concentration) of the non-aqueous resist stripping solution can be accurately determined from the measured absorbance. Can be obtained.

  The control means 801 in this embodiment includes a control means 823 related to amine. When the preparation apparatus 810 of this embodiment adjusts only the amine concentration to a predetermined concentration, the control unit 801 may be the same as the control unit 823 related to amine. In the case where the preparation apparatus 810 of this embodiment adjusts the concentration of components other than amines, the control unit 801 not only includes a control unit 823 related to amines but also includes control units related to other components.

  The amine-related control means 823 is connected to the amine-related measuring means 821 by a signal line 847, and receives the measurement value obtained by the amine-related measuring means 821 from the amine-related measuring means 821. In the amine control means 823, the predetermined amine concentration to be adjusted is set as the target amine concentration in the concentration control. The amine control means 823 compares the received measured amine concentration with the target amine concentration. The control means 823 related to amine is connected to control valves 718 and 719 provided in the raw material supply pipes 742 and 743 by a signal line 746, and the control valve 718, 719 appropriately controls the operation.

  For example, when the amine concentration measured by the measuring means 821 related to the amine of the measuring means 802 is lower than the target amine concentration, the control means 823 related to the amine of the control means 801 increases the flow rate of the control valve 718 or Reduce the flow rate of valve 719 to increase the relative supply of amine stock solution. Conversely, when the amine concentration is higher than the target amine concentration, the amine-related control means 823 decreases the flow rate of the control valve 718 or increases the flow rate of the control valve 719 so that the supply amount of the organic solvent is relatively increased. And control the amine concentration by reducing the relative supply of amine stock solution. However, the control method is not limited to this. Various control methods such as PID control can be appropriately employed.

  The amine concentration may be controlled by comparing the measured physical property value with the physical property value corresponding to the amine concentration of the target value in the correlation from the physical property value measured by the measuring means 821 regarding the amine.

  For example, when the physical property value and the amine concentration have a one-to-one correlation, as in the case where a linear relationship as shown in FIG. 3 or FIG. 4 is obtained, the amine concentration is based on this correlation. The physical property value corresponding to can be obtained. Therefore, there is a “predetermined physical property value” corresponding to a predetermined amine concentration to be adjusted. The non-aqueous resist stripping prepared in the preparation tank 703 is controlled by the control means 823 for the amine so that the physical property value measured by the measurement means 821 for the amine becomes the “predetermined physical property value”. The liquid can be brought to a predetermined amine concentration.

  Since other configurations in common with the eighth embodiment of the present embodiment are the same as those of the eighth embodiment, description thereof is omitted.

  In addition, in FIG. 12, the preparation apparatus 810 of this embodiment showed the aspect connected to the raw material storage container 820 and the peeling equipment 890 which uses a non-aqueous resist stripping solution. Thus, the preparation apparatus 810 can be connected to the raw material storage container 820 and the peeling facility 890 to perform on-site operation in a factory where the peeling process is performed.

  The raw material storage container 820 is a container for temporarily storing the raw material of the non-aqueous resist stripping solution. It consists of amine storage containers 811a and 811b, organic solvent storage containers 812a and 812b, and the like. Each of the amine storage containers 811a and 811b and the organic solvent storage containers 812a and 812b may be one, but it is more preferable that two are provided as shown in FIG. In the amine storage containers 811a and 811b, amine is constantly stored from the amine raw material introduction port 752 through the amine raw material replenishment piping 842. Further, the organic solvent storage containers 812a and 812b always store the organic solvent from the organic solvent raw material inlet 753 through the organic solvent raw material replenishment piping 843. By always preparing necessary raw materials in the raw material storage container 820, the preparation device 810 can receive the supply of raw materials without interruption, and can continuously prepare a non-aqueous resist stripping solution. .

  The amine storage containers 811a and 811b and the organic solvent storage containers 812a and 812b are connected by a preparation device 810, an amine supply pipe 844 and an organic solvent supply pipe 845, and various raw materials are supplied from the raw material storage container 820 to the preparation tank 703. . The supply method may be a method using a liquid feed pump or a pressurized / pressure feeding method of a container. If necessary, as shown in FIG. 12, control valves 813a to 816b are provided in the amine supply pipe 844 and the organic solvent supply pipe 845 connecting the raw material storage container 820 and the preparation tank 703, and the preparation device 810 controls them. You may make it do.

  On the other hand, the preparation apparatus 810 is connected to the peeling facility 890 via a non-aqueous resist stripping solution supply pipe 804 connected to the preparation tank 703. The non-aqueous resist stripping solution supply pipe 804 is provided with a liquid feed pump 825, a control valve 826, and the like.

  The non-aqueous resist stripping solution prepared in the preparation tank 703 is supplied from the non-aqueous resist stripping solution supply port 854 to the stripping facility 890 by the liquid feed pump 825 through the non-aqueous resist stripping solution supply pipe 804. The peeling facility 890 is connected to the control unit 801 through a signal line 892. The control unit 801 receives a non-aqueous resist stripping solution supply request signal issued from the stripping facility 890 via the signal line 892. The control valve 826 is connected to the control unit 801 through a signal line 849. The control means 801 controls the opening and closing of the control valve 826 in response to a request on the peeling facility 890 side. As a result, the stripping equipment 890 can automatically receive the nonaqueous resist stripping solution in a necessary amount when the nonaqueous resist stripping solution is required.

[Tenth embodiment]
FIG. 13 is a schematic diagram for explaining a non-aqueous resist stripper preparation apparatus according to the tenth embodiment. The non-aqueous resist stripping solution preparation apparatuses 710 and 810 of the eighth and ninth embodiments are different from each other in that a storage tank 902 that stores the non-aqueous resist stripping liquid prepared in the preparation tank 703 is provided.

  In the non-aqueous resist stripping solution preparation apparatus 910 of the tenth embodiment, similarly to the non-aqueous resist stripping solution preparation apparatus 710 of the eighth embodiment, the physical property values or components of the non-aqueous resist stripping liquid in the preparation tank 703 By measuring at least one of the concentrations, the component concentration of the non-aqueous resist stripping solution in the preparation tank 703 is adjusted to a predetermined concentration.

  The non-aqueous resist stripping solution prepared in the preparation tank 703 is sent from the preparation tank 703 to the storage tank 902 and stored in the storage tank 902. The liquid feeding method may be a method of transferring with a liquid feeding pump or the like, and is not particularly limited. As shown in FIG. 13, it is convenient and convenient to connect the preparation tank 703 and the storage tank 902 by a communication pipe 935 because the liquid is naturally fed without requiring a liquid feed pump or the like.

  The communication tube 935 is a conduit through which a non-aqueous resist stripping solution flows. As shown in FIG. 13, the preparation tank 703 is installed at a position higher than the storage tank 902. For example, as shown in FIG. 13, the communication pipe 935 connects the bottom of the preparation tank 703 and the side of the storage tank 902. When the non-aqueous resist stripping solution is supplied from the storage tank 902 to the stripping equipment 890 and the non-aqueous resist stripping liquid stored in the storage tank 902 is reduced, the non-aqueous resist stripping liquid prepared in the preparation tank 703 Naturally moves through the communication pipe 935 to the storage tank 902. The communication pipe 935 has an appropriate length and an inner diameter of the pipe, and has a concentration fluctuation buffering action that prevents the fluctuation in the concentration of the non-aqueous resist stripping solution generated in the preparation tank 703 from reaching the storage tank 902.

  Similarly to the preparation tank 703, the storage tank 902 preferably includes a measuring unit 931 and a liquid level gauge 932. As the measuring means 931, the same one provided in the preparation tank 703 can be used. The measuring unit 931 may further include a measuring unit related to amine. With these devices, the physical property value or component concentration of the non-aqueous resist stripping solution stored in the storage tank 902 can be measured.

  Further, the measuring unit 931 and the liquid level gauge 932 are also connected to the control unit 901 via signal lines 947 and 948. The control means 901 controls the physical property value or component concentration of the non-aqueous resist stripping solution in the storage tank 902 measured by the measuring means 931 and the liquid level position of the non-aqueous resist stripping liquid in the storage tank 902 measured by the liquid level gauge 932. Accordingly, similarly to the case of the preparation tank 703, the control valves 718 and 719 are appropriately controlled. Since the concentration fluctuation of the storage tank 902 is extremely small, actually, the concentration of the non-aqueous resist stripping solution inside the storage tank 902 is monitored and the liquid amount is managed.

  The non-aqueous resist stripping solution in the storage tank 902 is circulated and agitated by a circulation agitation pump 933 provided in the circulation line 934. Thereby, the non-aqueous resist stripping solution in the storage tank 902 is maintained at a uniform concentration.

[Eleventh embodiment]
FIG. 14 is a schematic view for explaining a non-aqueous resist stripper preparation apparatus according to the eleventh embodiment. The non-aqueous resist stripping solution preparation apparatus 1010 according to the eleventh embodiment has two preparation tanks, and the non-aqueous resist stripping solution preparation apparatuses 710, 810, and 910 according to the eighth to tenth embodiments. Is different.

  Similar to the preparation tank 703, the preparation tank 1003 includes a measuring unit 1031 and a liquid level gauge 1032, and is connected to the control unit 1001 via a signal line 1047 and a signal line 1048. The physical property value or component concentration of the non-aqueous resist stripping solution in the preparation tank 1003 and the liquid surface position are monitored by the control means 1001, and the control valves 1018 and 1019 connected via the signal line 1046 are controlled to prepare the preparation tank. The component concentration and the liquid surface position are adjusted in the same manner as in the case of adjusting the component concentration of the non-aqueous resist stripping solution in 703. The non-aqueous resist stripping solution prepared in the preparation tank 1003 is stored in the storage tank 902 through the communication pipe 1035. The preparation tank 1003 is provided with a circulation line 1034, and the non-aqueous resist stripping solution in the preparation tank 1003 is circulated and stirred by a circulation stirring pump 1033 provided in the circulation line 1034.

  According to the non-aqueous resist stripping solution preparation apparatus 1010 according to the eleventh embodiment, since two preparation tanks are provided, for example, even if the preparation tank 703 stops moving due to a failure or the like, the preparation tank 1003 to the storage tank 902 By preparing and supplying the non-aqueous resist stripping solution, the preparation and supply of the non-aqueous resist stripping solution can be continued without stopping the apparatus. Even if the inside of the preparation tank 703 is empty, the non-aqueous resist stripping solution can be supplied from the preparation tank 1003.

  In addition, in FIG. 14, although the structure provided with two preparation tanks was described, the number of preparation tanks is not specifically limited, You may provide three or more several tanks. However, considering that the apparatus is enlarged and is a spare at the time of failure, it is sufficient to provide two preparation tanks for one storage tank.

[Twelfth embodiment]
FIG. 15 is a schematic diagram for explaining a non-aqueous resist stripper preparation apparatus according to the twelfth embodiment. The apparatus 1110 for preparing a non-aqueous resist stripping solution according to the twelfth embodiment is provided with a mixing preparation tank 1105 as premixing means for premixing raw materials of the non-aqueous resist stripping solution. This is different from the apparatus for preparing a non-aqueous resist stripping solution in the form.

  The mixing preparation tank 1105 is connected to the amine supply pipe 844 and the organic solvent supply pipe 845. In addition, the mixing preparation tank 1105 is connected to the preparation tank 703 by a pipe 1106.

  A mixing preparation tank 1105 is provided, and the raw material supplied to the preparation tank 703 is mixed in the mixing preparation tank 1105 and supplied to the preparation tank 703, whereby the preparation tank 703 is supplied at a concentration close to the composition of the non-aqueous resist stripping solution. be able to. Therefore, the concentration of the non-aqueous resist stripping solution in the preparation tank 703 can be prevented from changing suddenly, and the non-aqueous resist stripping solution can be easily prepared. Further, since the raw materials of the non-aqueous resist stripping solution are mixed in advance, the burden of mixing and stirring in the preparation tank 703 is reduced, and a non-aqueous resist stripping solution having a uniform concentration can be prepared more quickly.

  In the mixing preparation tank 1105, the control means 1101 controls the control valves 1118 and 1119 connected via the signal line 1146 to control the flow rates of the amine stock solution and the organic solvent, and the preparation tank 703. The concentration of the non-aqueous resist stripping solution prepared in step 1 is preferably used. Since the final concentration of the non-aqueous resist stripping solution is adjusted in the preparation tank 703, the mixing preparation tank 1105 may not be accurately prepared. It is sufficient that the raw materials are mixed so that the concentration of the resist stripping solution mixed in the mixing preparation tank 1105 falls within a concentration range in which the physical property value measured by the measuring unit 702 has a correlation with the component concentration. However, similarly to the preparation tank 703, the physical property value or the component concentration may be measured by a measuring device.

  The premixing means provided in the preparation apparatus 1110 of the present embodiment is not limited to a mode such as the mixing preparation tank 1105 that behaves as a simple mixing tank. For example, the raw material supply pipes 742, 743 and the like for supplying the raw materials may be joined before the preparation tank 703, and the raw materials may be mixed in the joining pipe. In that case, a pipe-type mixing device such as an in-line mixer or a static mixer can also be employed. You may make it merge with the circulation line 734. FIG.

  In addition, the premixing means may be configured such that a premixing means is provided for each preparation tank in the non-aqueous resist stripping solution preparation apparatus having two or more preparation tanks as in the eleventh embodiment.

  1, 101, 201, 301, 401, 501, 601, 701, 801, 901, 1001, 1101 ... control means 2, 102, 202, 302, 431, 531, 702, 802, 931, 1031 ... measurement means, 3, 503, 703, 1003 ... Preparation tank, 4, 304 ... Aqueous resist stripping solution supply piping (supply piping) 10, 110, 210, 310, 410, 510, 610 ... Aqueous resist stripping solution preparation device, 17, 18, 19, 313a, 313b, 314a, 314b, 315a, 315b, 316a, 316b, 326, 517, 518, 519, 617, 618, 619, 718, 719, 813a, 813b, 814a, 814b, 815a, 815b, 816a, 816b, 826, 1018, 1019, 1118, 1119 ... Control valve, 32, 432, 532, 732, 932, 1032 ... Level gauge, 33, 433, 533, 733, 933, 1033 ... Circulation stirring pump, 34, 434, 534, 734, 934, 1034 ... Circulation line , 36, 736 ... stirring means, 41 ... pure water supply pipe (raw material supply pipe), 42, 742 ... amine raw material supply pipe (raw material supply pipe), 43, 743 ... organic solvent raw material supply pipe (raw material supply pipe), 46 , 47, 48, 147, 247, 349, 392, 447, 448, 546, 547, 548, 646, 746, 747, 748, 847, 849, 892, 947, 948, 1046, 1047, 1048, 1146 ... signal Line 51 ... Pure water inlet (raw material inlet), 52, 752 ... Amine raw material inlet (raw material inlet), 53, 753 ... Organic solvent raw material introduction (Raw material introduction port), 54, 354 ... resist stripping solution supply port, 121,321,821 ... measuring means for amine, 123,323,823 ... control means for amine, 222,322 ... measuring means for moisture, 224,324 Control means for moisture, 311a, 311b, 811a, 811b ... amine storage container, 312a, 312b, 812a, 812b ... organic solvent storage container, 320, 820 ... raw material storage container, 325, 825 ... liquid feed pump, 342, 842 ... Amine raw material replenishment piping, 343, 843 ... Organic solvent raw material replenishment piping, 344,844 ... Amine supply piping, 345,845 ... Organic solvent supply piping, 402,902 ... Storage tank, 435, 535, 935, 1035 ... Communication pipe , 1105 ... mixing preparation tank, 606, 1106 ... piping, 704, 8 04 ... Non-aqueous resist stripping solution supply pipe (supply piping), 710, 810, 910, 1010, 1110 ... Non-aqueous resist stripping solution preparation device, 754, 854 ... Non-aqueous resist stripping solution supply port

Claims (22)

A preparation tank in which an aqueous resist stripping solution having a predetermined component concentration is prepared;
Measuring means for measuring at least one of the physical property value of the aqueous resist stripping solution having a correlation with the component concentration of the aqueous resist stripping solution and the component concentration of the aqueous resist stripping solution for the aqueous resist stripping solution in the preparation tank; ,
Based on the measured value measured by the measuring means, the supply amount of the raw material of the aqueous resist stripping solution supplied to the preparation tank is adjusted so that the aqueous resist stripping liquid in the preparation tank has the predetermined component concentration. An aqueous resist stripping solution preparation device comprising: a control means for controlling. A preparation tank in which an aqueous resist stripping solution having a predetermined amine concentration is prepared;
Measurement of amine for measuring at least one of physical property value of aqueous resist stripping solution having correlation with amine concentration of aqueous resist stripping solution and amine concentration of aqueous resist stripping solution for aqueous resist stripping solution in said preparation tank Means,
Supply of raw material of aqueous resist stripping solution supplied to the preparation tank based on the measurement value measured by the measuring means relating to the amine so that the aqueous resist stripping liquid in the preparation tank has the predetermined amine concentration And an aqueous resist remover preparation apparatus comprising: a control means for amine for controlling the amount. A preparation tank in which an aqueous resist stripping solution having a predetermined moisture concentration is prepared;
For water-based resist stripping solution in the preparation tank, measurement on water for measuring at least one of the physical property value of the water-based resist stripping solution having a correlation with the water concentration of the water-based resist stripping solution and the water concentration of the water-based resist stripping solution Means,
Supply of the raw material of the aqueous resist stripping solution supplied to the preparation tank so that the aqueous resist stripping liquid in the preparation tank has the predetermined moisture concentration based on the measurement value measured by the measurement means regarding the moisture An apparatus for preparing an aqueous resist stripping solution, comprising: water-related control means for controlling the amount. A preparation tank in which an aqueous resist stripping solution having a predetermined amine concentration and a predetermined water concentration is prepared;
Measurement of amine for measuring at least one of physical property value of aqueous resist stripping solution having correlation with amine concentration of aqueous resist stripping solution and amine concentration of aqueous resist stripping solution for aqueous resist stripping solution in said preparation tank Means,
For water-based resist stripping solution in the preparation tank, measurement on water for measuring at least one of the physical property value of the water-based resist stripping solution having a correlation with the water concentration of the water-based resist stripping solution and the water concentration of the water-based resist stripping solution Means,
Based on the measurement value measured by the measurement unit relating to the amine and the measurement value measured by the measurement unit relating to the water, the aqueous resist stripping solution in the preparation tank has the predetermined amine concentration and the predetermined amine concentration. An aqueous resist stripping solution preparation apparatus comprising: control means for controlling a supply amount of a raw material of the aqueous resist stripping solution supplied to the preparation tank so as to obtain a moisture concentration.   The water-based resist stripping solution preparation apparatus according to claim 2 or 4, wherein the amine-related measuring means includes any one of an absorptiometer, a conductivity meter, a density meter, an ultrasonic densitometer, and a viscometer. The measuring means for the amine comprises an absorptiometer,
When the amine is monoethanolamine, the measurement wavelength of the absorptiometer is a specific wavelength selected from a wavelength region of 1000 to 1600 nm,
The apparatus for preparing an aqueous resist stripping solution according to claim 5, wherein when the amine is hydroxylamine, a measurement wavelength of the absorptiometer is a specific wavelength selected from a wavelength region of 1050 to 1090 nm.   The water-based resist stripping solution preparation apparatus according to claim 3 or 4, wherein the moisture measuring means includes any one of an absorptiometer, a conductivity meter, a density meter, an ultrasonic densitometer, and a viscometer. The moisture measuring means comprises an absorptiometer,
The apparatus for preparing an aqueous resist stripping solution according to claim 7, wherein a measurement wavelength of the absorptiometer is a specific wavelength selected from a wavelength region of 950 to 2000 nm.   The apparatus for preparing an aqueous resist stripping solution according to any one of claims 1 to 8, further comprising a storage tank for storing the aqueous resist stripping solution prepared in the preparation tank.   The apparatus for preparing an aqueous resist stripping solution according to claim 9, comprising a plurality of said preparation tanks.   The apparatus for preparing an aqueous resist stripping solution according to claim 9 or 10, wherein the preparation tank and the storage tank are connected by a communication pipe.   The apparatus for preparing an aqueous resist stripping solution according to any one of claims 1 to 9 and 11, further comprising premixing means for premixing the raw materials supplied to the preparation tank.   The preparation apparatus of the aqueous | water-based resist stripping solution of Claim 10 provided with the preliminary mixing means which mixes the said raw material supplied to the said preparation tank beforehand for every said preparation tank. A preparation tank in which a non-aqueous resist stripping solution having a predetermined component concentration is prepared;
For the non-aqueous resist stripping solution in the preparation tank, measure at least one of the physical property value of the non-aqueous resist stripping solution having a correlation with the component concentration of the non-aqueous resist stripping solution and the component concentration of the non-aqueous resist stripping solution. Measuring means to
Supply of raw material of the non-aqueous resist stripping solution supplied to the preparation tank so that the non-aqueous resist stripping liquid in the preparation tank has the predetermined component concentration based on the measurement value measured by the measuring means A non-aqueous resist stripper preparation apparatus comprising: a control means for controlling the amount. A preparation tank in which a non-aqueous resist stripping solution having a predetermined amine concentration is prepared;
For the non-aqueous resist stripping solution in the preparation tank, measure at least one of the physical property value of the non-aqueous resist stripping solution having a correlation with the amine concentration of the non-aqueous resist stripping solution and the amine concentration of the non-aqueous resist stripping solution. Means for measuring amines,
The raw material of the non-aqueous resist stripping solution supplied to the preparation tank so that the non-aqueous resist stripping liquid in the preparation tank has the predetermined amine concentration based on the measurement value measured by the measuring means related to the amine And a control means for amine for controlling the supply amount of the non-aqueous resist stripping solution.   The apparatus for preparing a non-aqueous resist stripping solution according to claim 15, wherein the amine-related measuring means includes any one of an absorptiometer, a conductivity meter, a density meter, an ultrasonic densitometer, and a viscometer. The measuring means for the amine comprises an absorptiometer,
When the amine is monoethanolamine, the measurement wavelength of the absorptiometer is a specific wavelength selected from a wavelength region of 1000 to 1600 nm,
The apparatus for preparing a non-aqueous resist stripping solution according to claim 16, wherein when the amine is hydroxylamine, a measurement wavelength of the absorptiometer is a specific wavelength selected from a wavelength region of 1050 to 1090 nm.   The apparatus for preparing a non-aqueous resist stripping solution according to any one of claims 14 to 17, further comprising a storage tank for storing the non-aqueous resist stripping solution prepared in the preparation tank.   The apparatus for preparing a non-aqueous resist stripping solution according to claim 18, comprising a plurality of the preparation tanks.   The apparatus for preparing a non-aqueous resist stripping solution according to claim 18 or 19, wherein the preparation tank and the storage tank are connected by a communication pipe.   The apparatus for preparing a non-aqueous resist stripping solution according to any one of claims 14 to 18 and 20, further comprising premixing means for premixing the raw materials to be supplied to the preparation tank.   The apparatus for preparing a non-aqueous resist stripping solution according to claim 19, comprising premixing means for premixing the raw materials supplied to the preparation tank for each of the preparation tanks.

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