KR100614114B1 - Dilute system for wafer washing and dilute method thereof - Google Patents

Abstract

The present invention relates to a solution dilution system and method for cleaning substrates. Among these, a solution dilution system for substrate cleaning comprises: a stock solution tank containing a predetermined additive; A mixing tank; A stock solution line having one end connected to the stock solution tank and the other end connected to the mixing tank to supply an additive in the stock solution tank to the mixing tank; A waterline for supplying water to the mixing tank; A mixed liquid line for delivering a mixed liquid of the mixed water and the raw liquid in the mixing tank; A mixed liquid tank for storing a mixed liquid provided from the mixed liquid line; And a mixed liquid supply line for supplying the mixed liquid in the mixed liquid tank to a substrate cleaning process.

Thereby, a substrate cleaning solution dilution system and method are provided in which a separate additive is diluted in a predetermined ratio in the substrate cleaning water to clean the substrate, thereby activating the interface of the substrate to prevent generation of static electricity at the interface. .

Description

Dilute system for wafer washing and dilute method

1 is a block diagram of a solution dilution system for cleaning a substrate according to the present invention;

2 is a view showing an embodiment according to the arrangement of the weight sensor;

3 is a view showing another embodiment of a solution dilution system for cleaning substrates according to the present invention;

* Explanation of symbols for the main parts of the drawings

20: Dilution system 22: Stock tank

24: mixing tank 25: agitator

26: mixed liquid tank 30: control unit

31: feed solution line 32: feed solution line

33: waterline 34: mixed liquid line

The present invention relates to a solution dilution system and method for substrate cleaning, and more particularly, by diluting an additive in a substrate cleaning water and cleaning the substrate to activate the interface of the substrate to generate static electricity at the substrate interface. A solution dilution system and method for cleaning semiconductor substrates can be prevented.

The substrate refers to a so-called semiconductor substrate, but on the other hand, LCDs, PDPs, and organic ELs whose manufacturing processes are similar to semiconductors may also be called substrates. Among these classifications, the semiconductor substrate is described as follows.

A semiconductor is a substance in which electrical conduction is made of electrons and holes, and its electrical resistivity, that is, the resistivity takes the intermediate value between the conductor and the insulator resistivity values. A semiconductor substrate using this property is applied to products of various high-tech industries.

The process of forming an electrode on such a semiconductor substrate is typically performed by a sequence of film formation, PR coating, photomask, exposure, development, cleaning and etching processes. In particular, in the washing step, washing is performed using ordinary water (so-called "DI Water"). Of course, the reason for cleaning in the whole process of etching is to raise the efficiency of etching.

In the case of diluting the stock solution and water at a predetermined ratio to clean the conventional substrate, first, the ratio is determined by adjusting the supply amount of the stock solution and the supply amount of water using a weight sensor (so-called "Load Cell").

Then, after the liquid supplied to the mixing tank at a predetermined ratio is mixed by a mechanical tool for a predetermined time, the completely mixed liquid is stored in the mixed liquid tank. This series of processes consists of one batch in the mixing tank, and after completion of one batch, is stored in the mixed liquor tank.

By the way, when the electrode is formed on the semiconductor substrate by the conventional method, it is only to clean the semiconductor substrate using ordinary water after developing the semiconductor substrate, so that it is practical to overcome the occurrence of static electricity or the like on the semiconductor substrate. It was difficult.

Accordingly, an object of the present invention is to dilute an additive in a predetermined amount of water for cleaning the substrate to clean the substrate, thereby activating the interface of the substrate to prevent generation of static electricity at the interface. And a method.

The object is, according to the present invention, a stock solution tank containing a predetermined additive (Dopant); A mixing tank; A stock solution line having one end connected to the stock solution tank and the other end connected to the mixing tank to supply an additive in the stock solution tank to the mixing tank; A waterline for supplying water to the mixing tank; A mixed liquid line for delivering a mixed liquid of the mixed water and the raw liquid in the mixing tank; A mixed liquid tank for storing a mixed liquid provided from the mixed liquid line; And a mixed solution supply line for supplying a mixed solution in the mixed solution tank to a substrate cleaning process.

Here, a stock solution supply line is provided to provide a stock solution in which a predetermined additive is pre-mixed into the stock solution tank.

Each said tank is provided with the weight sensor which measures the weight of the fluid in each said tank.

Each of the lines is provided with at least one of an on-off valve for selectively opening and closing the flow path of the corresponding line, and a pump for pumping the fluid flowing along the line.

And a controller configured to control an on / off operation of the on / off valve and the pump based on the signal of the weight sensor.

One or more agitators are mounted in the mixing tank.

Any one or more of the stock solution tank, the mixing tank, and the mixed solution tank is designed to allow level detection by a weight sensor.

The dilution system includes a detection sensor provided in at least one of the stock solution tank, the mixing tank, and the mixed solution tank to detect any one or more of the concentration or viscosity of the contents contained in the tank; It further comprises a monitor unit in which any one of said detected concentration or viscosity is monitored.

At this time, it may further include a program for automatically determining whether or not the concentration or viscosity of the content of the monitored content monitor.

On the other hand, according to another field of the present invention, the object is, according to the invention, the step of supplying a stock solution; Supplying water; It is also achieved by a solution dilution method for substrate cleaning, comprising the step of mixing the mixed solution and the water mixed in the state in which the feed weight of the water and the stock solution is determined according to the type of the stock solution.

 Storing a mixed liquid formed by mixing the water and the stock solution; The method may further include supplying a predetermined amount of the stored mixed solution to the substrate cleaning process.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

1 is a block diagram of a solution dilution system for cleaning a substrate according to the present invention. As shown in this figure, the dilution system 20 for cleaning a semiconductor substrate according to the present invention includes a stock solution tank 22, a mixing tank 24, and a mixed liquid, which largely contain a predetermined additive. It has the mixed liquid tank 26 to store.

Each of the stock solution tanks 22, the mixing tank 24, and the mixed solution tank 26 have first to third weight sensors 22a, 24a, and 26a for measuring the weight of the liquid in each of the tanks 22, 24, and 26. It is prepared.

And, each of the liquid tank 22, the mixing tank 24, the mixed liquid tank 26 is added with a level sensor function for measuring the liquid level in each tank (22, 24, 26), in this embodiment the mixed liquid tank ( 26 implements only the level sensor 27 function.

One side of the raw liquid tank 22 is a raw liquid supply line 31 for providing a predetermined raw liquid to the raw liquid tank 22 is disposed.

The stock solution supply line 31 is interposed with a first pump 41 so that the stock solution may be smoothly provided to the stock tank 22. If you want to clean the inside of the raw liquid tank 22 or to replace with a new raw liquid, the existing liquid remaining in the raw liquid tank 22 may be discharged using the discharge line 31a formed on the other side of the raw liquid 22. .

A stock solution line 32 is provided between the stock solution tank 22 and the mixing tank 24 to provide the stock solution to the mixing tank 24. The stock solution line 32 has one end connected to the stock solution tank 22 and the other end communicates with the mixing tank 24 to supply the stock solution in the stock solution tank 22 to the mixing tank 24. The stock solution line 32 is equipped with a first open / close valve 51.

The waterline 33 is disposed on one side of the mixing tank 24. One end of the waterline 33 is connected to a water supply source such as tap water, and the other end is provided in the mixing tank 24. The water line 33 is also equipped with a second opening / closing valve 52 similarly to the stock solution line 32.

At this time, the water may be provided to the mixing tank 24 or the stock solution tank 22 through the waterline 33. Accordingly, the waterline 33 is bifurcated into two branches, and a separate opening / closing valve 52a is further formed in the line facing the stock solution tank 22.

When water is provided into the mixing tank 24 through the waterline 33 and the stock solution in the stock solution tank 22 is provided to the mixing tank 24, the water and the stock solution are mixed in the mixing tank 24. For this purpose, in the mixing tank 24, the stirrer 25 is attached. The stirrer 25 is comprised from the stirring shaft 25a and the stirring blade 25b provided in the lower end of the stirring shaft 25a.

A mixed liquid line 34 is provided between the mixing tank 24 and the mixed liquid tank 26 to deliver a mixed liquid of the mixed water and the raw liquid in the mixing tank 24. The mixed liquid line 34 is provided with a third open / close valve 53.

A mixed liquid supply line 35 is provided outside the mixed liquid tank 26 to supply the mixed liquid in the mixed liquid tank 26 to the semiconductor substrate 10 cleaning process. The second liquid pump 42 is provided in the mixed liquid supply line 35.

With this configuration, when the developing process 17 of the semiconductor substrate 10 is completed and the cleaning process is reached, the first pump 41 is operated by the control unit 30 so that the raw liquid is supplied into the stock tank 22. do.

When a predetermined amount of the stock solution is provided, the first weight sensor 22a detects this and transmits it to the controller 30, and the controller 30 stops the operation of the first pump 41 and at the same time the first opening / closing valve 51. ) To open the stock solution into the mixing tank (24).

Subsequently, the second opening / closing valve 52 is operated to introduce water into the mixing tank 24 through the waterline 33. When the water flows into the mixing tank 24 by a certain amount, the second weight sensor 24a senses this and the second opening / closing valve 52 intercepts the flow path of the waterline 33 through the controller 30. do.

When a predetermined amount of water and stock solution flows into the mixing tank 24, the stirrer 25 is operated by the control unit 30, and mixing of the water and stock solution is started by the stirring blade 25b. At this time, the mixing ratio of the water and the stock solution may vary depending on the type of additives included in the stock solution.

For example, the mixing ratio of water and stock solution can be selectively adjusted from 0: 0 to 50:50.

When the mixing is completed, the third opening and closing valve 53 is operated by the control unit 30 to provide the mixed liquid tank 26 with the mixed liquid mixed with water and the raw liquid in the mixing tank 24.

When the mixed liquid flows into the mixed liquid tank 26 by a predetermined amount, the third weight sensor 26a and the level sensor 27 respectively detect this, send the signal to the control unit 30, and the control unit 30 based on this signal. By operating the second pump 42, the mixed liquid is supplied to the cleaning process of the semiconductor substrate 10 through the mixed liquid supply line 35.

As a result, the semiconductor substrate 10 on which the development 17 process is completed can be appropriately cleaned through a mixture of water and the stock solution. Therefore, it is possible to prevent the generation of static electricity and the like on the semiconductor substrate 10.

Meanwhile, referring to FIG. 1, although the first to third weight sensors 22a, 24a, and 26a are provided under the respective tanks 22, 24, and 26, as shown in FIG. 2, the first to third weight sensors are provided. The weight sensors 22'a, 24'a, and 26'a may be provided at the lower ends of the flange portions 22 ', 24', and 26 'of the tanks 22, 24 and 26, respectively.

By using the weight sensor in such a manner as to dilute at a constant ratio, the ratio can be adjusted more precisely and reliably.

In addition, the system 20 of the present invention may be integrally mounted to a separate system body 21 having a wheel 21a at the bottom thereof, and may be easily moved to a desired place.

On the other hand, in the above-described embodiment has been described and described to the extent that the stock solution supply line 31 for providing a predetermined stock solution to the stock solution tank 22 on one side of the stock solution tank 22 is disposed.

However, as shown in FIG. 3, a separate stock solution supply unit 60 may be additionally installed in the supply end region of the stock solution supply line 31 for supplying stock solution.

At this time, if the stock solution supply unit 60 is configured as a drawer, when the stock solution is lost, there is an advantage that it is easy to fill. That is, there is an advantage that a predetermined amount of the raw liquid can be supplied during the process operation even without stopping the present system.

Briefly, the drawer configuration, the stock solution supply unit 60 for receiving a predetermined amount of the stock solution is coupled to the sliding rail 61 supporting the stock solution supply unit 60. Thus, while the user slides the stock solution supply unit 60 with respect to the sliding rail 61, the user may fill or reversely extract the stock solution as necessary, and the stock solution may be easily replaced during the process. Since the drawer type configuration is generalized, detailed drawings thereof will be omitted.

On the other hand, according to the embodiment described above, the first to third weight sensors for measuring the weight of the liquid in each tank 22, 24, 26 in the stock solution tank 22, mixing tank 24, mixed liquid tank 26 It is said that 22a, 24a, and 26a are provided. In this case, the amount of the contents in the tank can be measured as desired due to the mounted first to third weight sensors 22a, 24a, 26a.

However, in this case, the desired amount is accurately measured, but it is difficult to accurately calculate the concentration or viscosity of the contents contained in the tank or formed by stirring. In particular, since it is difficult to accurately determine the concentration or viscosity of the mixed solution, which is the content contained in the mixed solution tank 26, which is subjected to the last process, the measurer intermittently extracts a certain amount to determine the concentration or viscosity accordingly.

Accordingly, the present applicant, at least one or more of the concentration or viscosity of the contents contained in the tank in at least one or both of the stock solution tank 22, the mixing tank 24, the mixed solution tank 26 to solve this disadvantage. The detection sensor (not shown) which detects this is provided.

Conventionally, although the stock solution and the additive (Dopant) or DI was mixed according to the desired ratio through the weight sensors 22a, 24a, and 26a, the ratio (concentration) was not known to be accurate. It is preparing a sensor. Of course, if the amount of the additive (Dopant) is insufficient according to the detected result, it is necessary to accurately calculate the amount of the substance and add it to the process.

If such a structure is further equipped with a solution dilution system for cleaning the substrate, in addition to the exact amount of the substance, there is an advantage that the concentration or viscosity of the substance can also be accurately detected and used.

Although the present invention has been described in detail with reference to the drawings, the present invention is not limited thereto.

In the above embodiment, the present invention has been described using the semiconductor substrate as an example, but the idea of the present invention can be sufficiently applied to LCD, PDP, organic EL, and the like, which are similar to the semiconductor substrate.

On the other hand, in the above-described embodiment, it is described that each tank is provided with a so-called “load cell” weight sensor, but it goes without saying that a level sensor or the like may be employed in addition to such a sensor.

As described above, according to the present invention, dilution of a separate additive in the substrate cleaning water to clean the substrate, thereby activating the interface of the substrate to prevent the generation of static electricity at the substrate interface. Systems and methods are provided.

In addition, by using a weight sensor in a method of diluting at a constant ratio, the ratio can be adjusted more precisely and reliably.

Claims (12)

A stock solution tank containing a predetermined additive; A mixing tank; A weight sensor for measuring a weight of the fluid provided in the mixing tank; A detection sensor provided in the mixing tank to detect the concentration or viscosity of the contents contained in the tank; One or more agitators mounted in the mixing tank; A stock solution line having one end connected to the stock solution tank and the other end connected to the mixing tank to supply the stock solution to the mixing tank; A waterline for supplying water to the mixing tank; A mixed liquid line for delivering a mixed liquid of the mixed water and the raw liquid in the mixing tank; A mixed liquid tank for storing a mixed liquid provided from the mixed liquid line; A mixed liquid supply line for supplying a mixed liquid in the mixed liquid tank to a substrate cleaning process; A pump installed in each of the lines and pumping fluid flowing along the on-off valve or line for selectively opening and closing the flow path of the corresponding line; A control unit controlling an on / off operation of the on / off valve or the pump based on the signal of the weight sensor; Solution dilution system for cleaning the substrate comprising a. The method of claim 1, A stock solution supply line providing a predetermined stock solution to the stock solution tank; A feed solution supply unit disposed in a supply end region of the feed solution supply line; Solution dilution system for cleaning the substrate further comprising. The method according to claim 1 or 2, The stock solution tank or the mixed solution tank is provided with a weight sensor for measuring the weight of the fluid in the tank, a detection sensor for detecting the concentration or viscosity is provided. delete delete delete The method of claim 3, Any one or two or more of the stock solution tank, mixing tank, mixed solution tank is provided with a level sensor function for a substrate cleaning solution dilution system. delete delete delete delete delete

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