JP2017135204A5 - - Google Patents
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- Publication number
- JP2017135204A5 JP2017135204A5 JP2016012558A JP2016012558A JP2017135204A5 JP 2017135204 A5 JP2017135204 A5 JP 2017135204A5 JP 2016012558 A JP2016012558 A JP 2016012558A JP 2016012558 A JP2016012558 A JP 2016012558A JP 2017135204 A5 JP2017135204 A5 JP 2017135204A5
- Authority
- JP
- Japan
- Prior art keywords
- photoresist
- measuring
- photoresist stripping
- stripping solution
- concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 claims 33
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 7
- 238000000034 method Methods 0.000 claims 5
- 239000007788 liquid Substances 0.000 claims 4
- 229910052717 sulfur Inorganic materials 0.000 claims 4
- 239000011593 sulfur Substances 0.000 claims 4
- 238000000605 extraction Methods 0.000 claims 3
- 239000000470 constituent Substances 0.000 claims 2
- QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical compound [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 claims 2
- 229920003986 novolac Polymers 0.000 claims 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016012558A JP6643710B2 (ja) | 2016-01-26 | 2016-01-26 | フォトレジスト成分濃度測定装置および濃度測定方法 |
| CN201680079908.3A CN108604534B (zh) | 2016-01-26 | 2016-12-26 | 光致抗蚀剂成分浓度测定装置及浓度测定方法 |
| PCT/JP2016/088687 WO2017130620A1 (ja) | 2016-01-26 | 2016-12-26 | フォトレジスト成分濃度測定装置および濃度測定方法 |
| TW105144149A TWI697743B (zh) | 2016-01-26 | 2016-12-30 | 光阻劑成分濃度測定裝置及濃度測定方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016012558A JP6643710B2 (ja) | 2016-01-26 | 2016-01-26 | フォトレジスト成分濃度測定装置および濃度測定方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017135204A JP2017135204A (ja) | 2017-08-03 |
| JP2017135204A5 true JP2017135204A5 (enExample) | 2019-02-14 |
| JP6643710B2 JP6643710B2 (ja) | 2020-02-12 |
Family
ID=59398246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016012558A Active JP6643710B2 (ja) | 2016-01-26 | 2016-01-26 | フォトレジスト成分濃度測定装置および濃度測定方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6643710B2 (enExample) |
| CN (1) | CN108604534B (enExample) |
| TW (1) | TWI697743B (enExample) |
| WO (1) | WO2017130620A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102020130415B4 (de) | 2019-12-26 | 2025-01-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | Versorgungssystem für chemische flüssigkeiten und verfahren zur versorgung mit chemischen flüssigkeiten |
| US11715656B2 (en) | 2019-12-26 | 2023-08-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chemical liquid supplying system and method of supplying chemical liquid |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3093975B2 (ja) * | 1996-07-02 | 2000-10-03 | 株式会社平間理化研究所 | レジスト剥離液管理装置 |
| JP2000058411A (ja) * | 1998-08-04 | 2000-02-25 | Mitsubishi Electric Corp | 半導体製造装置 |
| WO2004022612A1 (en) * | 2002-08-09 | 2004-03-18 | E. I. Du Pont De Nemours And Company | Photoresists, fluoropolymers and processes for 157 nm microlithography |
| JP2005191030A (ja) * | 2003-12-24 | 2005-07-14 | Sharp Corp | レジスト除去装置およびレジスト除去方法 |
| JP2007316360A (ja) * | 2006-05-26 | 2007-12-06 | Nishimura Yasuji | 水系フォトレジスト剥離液の管理方法および管理装置 |
| JP4923882B2 (ja) * | 2006-09-07 | 2012-04-25 | 三菱化学エンジニアリング株式会社 | フォトレジスト供給装置およびフォトレジスト供給方法 |
| JP5019393B2 (ja) * | 2008-04-14 | 2012-09-05 | 東亞合成株式会社 | 導電性高分子膜上のレジスト被膜の除去方法および除去装置 |
| JP6028973B2 (ja) * | 2012-11-08 | 2016-11-24 | パナソニックＩｐマネジメント株式会社 | フォトレジスト濃度測定装置および測定方法 |
| JP6501448B2 (ja) * | 2014-02-28 | 2019-04-17 | 芝浦メカトロニクス株式会社 | 処理装置および処理方法 |
-
2016
- 2016-01-26 JP JP2016012558A patent/JP6643710B2/ja active Active
- 2016-12-26 CN CN201680079908.3A patent/CN108604534B/zh active Active
- 2016-12-26 WO PCT/JP2016/088687 patent/WO2017130620A1/ja not_active Ceased
- 2016-12-30 TW TW105144149A patent/TWI697743B/zh active
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