JP2015095602A5 - - Google Patents

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Publication number
JP2015095602A5
JP2015095602A5 JP2013235385A JP2013235385A JP2015095602A5 JP 2015095602 A5 JP2015095602 A5 JP 2015095602A5 JP 2013235385 A JP2013235385 A JP 2013235385A JP 2013235385 A JP2013235385 A JP 2013235385A JP 2015095602 A5 JP2015095602 A5 JP 2015095602A5
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JP
Japan
Prior art keywords
substrate
foreign matter
chuck
determined
detection method
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Application number
JP2013235385A
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English (en)
Japanese (ja)
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JP2015095602A (ja
JP6343140B2 (ja
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Priority to JP2013235385A priority Critical patent/JP6343140B2/ja
Priority claimed from JP2013235385A external-priority patent/JP6343140B2/ja
Priority to KR1020140153026A priority patent/KR20150055558A/ko
Priority to US14/533,733 priority patent/US9599903B2/en
Publication of JP2015095602A publication Critical patent/JP2015095602A/ja
Publication of JP2015095602A5 publication Critical patent/JP2015095602A5/ja
Application granted granted Critical
Publication of JP6343140B2 publication Critical patent/JP6343140B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013235385A 2013-11-13 2013-11-13 異物の検出方法および検出装置、露光方法、ならびに、デバイスの製造方法 Expired - Fee Related JP6343140B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013235385A JP6343140B2 (ja) 2013-11-13 2013-11-13 異物の検出方法および検出装置、露光方法、ならびに、デバイスの製造方法
KR1020140153026A KR20150055558A (ko) 2013-11-13 2014-11-05 이물의 검출 방법, 이물의 검출 장치, 노광 방법, 및 디바이스의 제조 방법
US14/533,733 US9599903B2 (en) 2013-11-13 2014-11-05 Foreign substance detection method, foreign substance detection apparatus, exposure method, and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013235385A JP6343140B2 (ja) 2013-11-13 2013-11-13 異物の検出方法および検出装置、露光方法、ならびに、デバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2015095602A JP2015095602A (ja) 2015-05-18
JP2015095602A5 true JP2015095602A5 (enExample) 2017-01-05
JP6343140B2 JP6343140B2 (ja) 2018-06-13

Family

ID=53043556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013235385A Expired - Fee Related JP6343140B2 (ja) 2013-11-13 2013-11-13 異物の検出方法および検出装置、露光方法、ならびに、デバイスの製造方法

Country Status (3)

Country Link
US (1) US9599903B2 (enExample)
JP (1) JP6343140B2 (enExample)
KR (1) KR20150055558A (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20190121230A1 (en) * 2016-04-27 2019-04-25 Asml Holding N.V. Image processing convolution algorithm for defect detection
JP6638796B2 (ja) * 2018-11-06 2020-01-29 東京エレクトロン株式会社 基板処理装置、基板処理方法及び記憶媒体
JP2024041389A (ja) * 2022-09-14 2024-03-27 キヤノン株式会社 判断装置、パターン形成装置、及び物品の製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08110586A (ja) * 1994-10-12 1996-04-30 Hitachi Ltd 露光装置
JPH09266157A (ja) * 1996-03-28 1997-10-07 Nec Corp 縮小投影露光方法およびその装置
JP2002164270A (ja) * 2000-11-27 2002-06-07 Seiko Epson Corp 露光装置
JP2002237452A (ja) * 2001-12-17 2002-08-23 Nikon Corp 投影露光方法及び装置、デバイス製造方法、並びに該方法により製造されたデバイス
JP2005079449A (ja) * 2003-09-02 2005-03-24 Nikon Corp パターン不良予測装置、基板処理システム、パターン不良予測プログラム、及び情報記録媒体
CN101487981A (zh) 2004-10-13 2009-07-22 株式会社尼康 曝光装置、曝光方法及组件制造方法
JP4961709B2 (ja) 2004-10-13 2012-06-27 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
JP2006128346A (ja) * 2004-10-28 2006-05-18 Tokyo Seimitsu Co Ltd 露光装置、異物検出方法、異物位置特定方法及び露光方法
JP2008140814A (ja) 2006-11-30 2008-06-19 Matsushita Electric Ind Co Ltd 露光装置及び露光方法
JP2008282885A (ja) * 2007-05-08 2008-11-20 Canon Inc 露光装置及びデバイス製造方法
JP2010016256A (ja) * 2008-07-04 2010-01-21 Nikon Corp 異物検出方法、露光方法、及びデバイス製造方法
JP2010141210A (ja) * 2008-12-12 2010-06-24 Nikon Corp クリーニング工具、クリーニング方法、及びデバイス製造方法

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