JP2017103389A5 - - Google Patents

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Publication number
JP2017103389A5
JP2017103389A5 JP2015236642A JP2015236642A JP2017103389A5 JP 2017103389 A5 JP2017103389 A5 JP 2017103389A5 JP 2015236642 A JP2015236642 A JP 2015236642A JP 2015236642 A JP2015236642 A JP 2015236642A JP 2017103389 A5 JP2017103389 A5 JP 2017103389A5
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JP
Japan
Prior art keywords
substrate body
oxide
electrostatic chuck
der
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2015236642A
Other languages
English (en)
Japanese (ja)
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JP2017103389A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2015236642A priority Critical patent/JP2017103389A/ja
Priority claimed from JP2015236642A external-priority patent/JP2017103389A/ja
Priority to US15/347,842 priority patent/US20170162416A1/en
Publication of JP2017103389A publication Critical patent/JP2017103389A/ja
Publication of JP2017103389A5 publication Critical patent/JP2017103389A5/ja
Pending legal-status Critical Current

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JP2015236642A 2015-12-03 2015-12-03 静電チャック及び半導体製造装置 Pending JP2017103389A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2015236642A JP2017103389A (ja) 2015-12-03 2015-12-03 静電チャック及び半導体製造装置
US15/347,842 US20170162416A1 (en) 2015-12-03 2016-11-10 Electrostatic chuck and semiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015236642A JP2017103389A (ja) 2015-12-03 2015-12-03 静電チャック及び半導体製造装置

Publications (2)

Publication Number Publication Date
JP2017103389A JP2017103389A (ja) 2017-06-08
JP2017103389A5 true JP2017103389A5 (https=) 2018-10-25

Family

ID=58800353

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015236642A Pending JP2017103389A (ja) 2015-12-03 2015-12-03 静電チャック及び半導体製造装置

Country Status (2)

Country Link
US (1) US20170162416A1 (https=)
JP (1) JP2017103389A (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7168430B2 (ja) * 2018-12-04 2022-11-09 株式会社アイシン福井 レーザ溶接装置
JP7239307B2 (ja) * 2018-12-04 2023-03-14 株式会社アイシン福井 レーザ溶接装置
JP7312712B2 (ja) * 2020-02-07 2023-07-21 新光電気工業株式会社 セラミックス基板、静電チャック、静電チャックの製造方法
KR20230096465A (ko) 2021-12-23 2023-06-30 주식회사 미코세라믹스 세라믹 서셉터의 제조 방법
JP2024174805A (ja) 2023-06-05 2024-12-17 株式会社神戸製鋼所 放熱材料、放熱部品、静電チャック及び放熱材料の製造方法
CN121753541A (zh) * 2023-08-22 2026-03-27 日本碍子株式会社 半导体制造装置用部件

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6088346B2 (ja) * 2013-05-09 2017-03-01 新光電気工業株式会社 静電チャック及び半導体製造装置

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