JP2017088987A - Apparatus for conveying thin plate in liquid - Google Patents

Apparatus for conveying thin plate in liquid Download PDF

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JP2017088987A
JP2017088987A JP2015224614A JP2015224614A JP2017088987A JP 2017088987 A JP2017088987 A JP 2017088987A JP 2015224614 A JP2015224614 A JP 2015224614A JP 2015224614 A JP2015224614 A JP 2015224614A JP 2017088987 A JP2017088987 A JP 2017088987A
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thin plate
liquid
substrate
conveyance
conveying
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JP6602648B2 (en
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一之 岸
Kazuyuki Kishi
一之 岸
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FUASHIRITEI KK
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Abstract

PROBLEM TO BE SOLVED: To provide an apparatus for conveying a thin plate in a liquid capable of conveying a thin plate of various thicknesses and dimensions in a stable posture without increasing the area of a section to hold the thin plate.SOLUTION: An apparatus for conveying a thin plate that conveys a thin plate submerged in a process liquid is equipped with a treatment tank to contain the process liquid and thin plate conveying means to convey the thin plate kept in a vertical posture in the horizontal direction, and a plurality of rollers arranged along both sides of a conveying route of the thin plate. The rollers are located apart from the thin plate at a specified distance and rotatable in the conveying direction of the thin plate.SELECTED DRAWING: Figure 1

Description

本件出願に係る発明は、薄板液中搬送装置に関する。   The invention according to the present application relates to a transport device in a thin plate liquid.

従来より、例えば、基板の表面に薬液を接触させて、めっき、エッチング、洗浄等の処理を行う場合に、当該基板を薬液中に浸漬させた状態で搬送させる薄板液中搬送装置が用いられている。薄板を処理液中で搬送する薄板液中搬送装置には、基板に代表されるような薄板を垂直に立たせた状態で搬送する所謂垂直搬送方式の装置がある。この所謂垂直搬送方式の薄板液中搬送装置は、例えば厚みが薄くフレキシブル性に富んだ基板に上述した薬液処理を施す場合、当該基板の上部を挟持して吊り下げた状態で搬送すると、基板自体が撓んで揺動することにより、安定した薬液処理が出来ない場合がある。そこで、搬送中の基板の垂直姿勢を維持すべく搬送路の両側には、例えば板状のガイド部材が設けられることも考えられている。しかし、このような従来のガイド部材が備わる薄板液中搬送装置は、薄板の処理液中搬送時における揺動に伴う問題が完全に解消されるわけではなく、当該基板が搬送中に当該ガイド部材と接触して傷が付く問題がある。例えば、基板に対して電気めっきを施す場合には、形成されるめっき被膜の表面に傷が発生しやすく、めっき品質の低下を招いてしまう。そのため、従来より、基板等の薄板を処理液中に浸漬させた状態で搬送させる際の当該薄板の垂直姿勢の安定性を維持するために、様々な工夫がなされている。   Conventionally, for example, when a chemical solution is brought into contact with the surface of a substrate to perform a process such as plating, etching, cleaning, etc., a thin plate submerged transport device that transports the substrate while immersed in the chemical solution has been used. Yes. 2. Description of the Related Art A thin plate liquid transport device that transports a thin plate in a processing liquid includes a so-called vertical transport type device that transports a thin plate as represented by a substrate in a vertical state. For example, when the above-described chemical processing is performed on a substrate having a small thickness and excellent flexibility, the so-called vertical transport method in a thin plate liquid transport device, when transported in a state where the upper part of the substrate is held and suspended, May be unable to perform stable chemical treatment due to bending and swinging. In view of this, for example, plate-like guide members may be provided on both sides of the transport path in order to maintain the vertical posture of the substrate being transported. However, in the thin plate liquid transport device provided with such a conventional guide member, the problem associated with the swing during the transport of the thin plate in the processing liquid is not completely solved, and the guide member is being transported while the substrate is being transported. There is a problem of scratching on contact. For example, when electroplating is performed on the substrate, the surface of the plating film to be formed is likely to be scratched, resulting in a decrease in plating quality. For this reason, conventionally, various measures have been taken to maintain the stability of the vertical posture of the thin plate when the thin plate such as a substrate is transported while being immersed in the processing liquid.

例えば、特許文献1には、基板を垂直に立てた状態でめっき槽内のめっき液中を移動させて当該基板にめっきを施す縦型搬送式(所謂垂直搬送式)めっき装置について開示がされている。特許文献1に開示の縦型搬送式めっき装置は、当該基板の上部を挟持して当該基板を当該めっき槽内に垂下させるクリップと、当該めっき槽内の下部に当該基板の移動方向に沿って配置され、中央部に構成されたスリットに当該基板の下部が配置されて当該基板をガイドするガイドレールと、当該基板の下部に取り付けられ、当該基板に重力をかけて補強する基板補強治具とを有することを特徴とするものである。   For example, Patent Document 1 discloses a vertical conveyance type (so-called vertical conveyance type) plating apparatus that performs plating on a substrate by moving the plating solution in a plating tank while the substrate is standing vertically. Yes. The vertical conveyance type plating apparatus disclosed in Patent Document 1 includes a clip that holds the upper part of the substrate and hangs the substrate into the plating tank, and a lower part of the plating tank along the moving direction of the substrate. A guide rail that guides the board by placing the lower part of the board in a slit formed in the center, and a board reinforcing jig that is attached to the lower part of the board and reinforces the board by applying gravity It is characterized by having.

特開2010−24514号公報JP 2010-24514 A

しかし、特許文献1に開示の所謂垂直搬送式の薄板液中搬送装置では、基板の大きさに合わせて専用の治具を用いる必要があるため汎用性に欠くという問題や、基板を保持する部分を上部と下部とに設ける必要があるため薬液処理が施されない未処理領域の増大を招くといった問題が生じてしまう。また、特許文献1に開示の所謂垂直搬送式の薄板液中搬送装置は、基板の上部がクリップで挟持され、基板の下部がガイドレールにガイドされた状態で基板が搬送されるが、基板の厚みが薄くなるほど、対流等のめっき液の動きにより基板に圧力がかかって撓みやすくなり、安定的に基板表面に均一にめっき処理を施すことが困難であった。   However, in the so-called vertical conveyance type thin plate submerged conveyance device disclosed in Patent Document 1, it is necessary to use a dedicated jig in accordance with the size of the substrate, so that there is a problem of lack of versatility, and a portion for holding the substrate Therefore, there is a problem that an unprocessed area that is not subjected to the chemical treatment is increased. In addition, in the so-called vertical conveyance type thin plate liquid conveyance device disclosed in Patent Document 1, the substrate is conveyed with the upper part of the substrate held between clips and the lower part of the substrate guided by the guide rail. As the thickness is reduced, pressure is applied to the substrate due to the movement of the plating solution such as convection and the substrate is more easily bent, and it is difficult to stably apply the plating process to the substrate surface uniformly.

以上のことから、本件発明は、薄板の様々な厚みや寸法に対応でき、且つ、当該薄板を保持する部分の面積を増大させずに、当該薄板を安定した姿勢で搬送することの可能な薄板液中搬送装置を提供することを目的とする。   From the above, the present invention can cope with various thicknesses and dimensions of the thin plate and can transport the thin plate in a stable posture without increasing the area of the portion holding the thin plate. It is an object of the present invention to provide a submerged transport device.

そこで、本件発明者等は、鋭意研究の結果、以下に示す薄板液中搬送装置を提供することで、上述した課題を達成出来ることに想到した。   Thus, as a result of intensive studies, the inventors of the present invention have conceived that the above-described problems can be achieved by providing the following thin plate liquid transport device.

本件発明に係る薄板液中搬送装置は、薄板を処理液中に浸漬させた状態で搬送させる薄板液中搬送装置であって、当該処理液を収容する処理槽と、当該薄板を垂直姿勢のまま水平方向に搬送する薄板搬送手段と、当該薄板の搬送経路の両側に沿って配列した複数のローラとを備え、当該ローラは、当該薄板と所定間隔離れて位置し、且つ、当該薄板の搬送方向に回転自在であることを特徴とする。   The transport device in the thin plate liquid according to the present invention is a transport device in the thin plate liquid that transports the thin plate immersed in the processing liquid, and the processing tank containing the processing liquid and the thin plate remain in a vertical posture. A thin plate transporting means for transporting in the horizontal direction and a plurality of rollers arranged along both sides of the transport path of the thin plate, the rollers being located at a predetermined distance from the thin plate, and the transport direction of the thin plate It is characterized by being freely rotatable.

また、本件発明に係る薄板液中搬送装置において、前記ローラは、回転子を鉛直方向に所定間隔をあけて複数配置したものであることが好ましい。   Moreover, in the thin plate submerged conveying device according to the present invention, it is preferable that a plurality of the rollers are arranged with a predetermined interval in the vertical direction.

また、本件発明に係る薄板液中搬送装置は、搬送経路を通過する薄板の両面に対して、斜め後方から前記処理液を噴出する処理液噴出手段を備えたことが好ましい。   Moreover, it is preferable that the thin board | substrate liquid conveyance apparatus which concerns on this invention was provided with the process liquid ejection means which ejects the said process liquid from diagonally back with respect to both surfaces of the thin plate which passes a conveyance path | route.

また、本件発明に係る薄板液中搬送装置において、前記ローラは、回転羽根部材を備えたことが好ましい。   Moreover, in the thin plate submerged conveying device according to the present invention, it is preferable that the roller includes a rotary blade member.

また、本件発明に係る薄板液中搬送装置は、前記薄板の搬送経路に沿って延在する薄板ガイド部材を備えたことが好ましい。   Moreover, it is preferable that the thin board | substrate liquid conveyance apparatus which concerns on this invention was equipped with the thin plate guide member extended along the conveyance path | route of the said thin board.

また、本件発明に係る薄板液中搬送装置は、前記処理槽は、前記薄板の搬送方向出口側に前記処理液を回収する処理液回収部を設けたことが好ましい。   Moreover, it is preferable that the processing liquid collection | recovery part which collect | recovers the said processing liquid is provided in the said processing tank at the conveyance direction exit side of the said thin plate.

本件発明に係る薄板液中搬送装置によれば、薄板の様々な厚みや寸法に対応でき、且つ、当該薄板を保持する部分の面積を増大させず、当該薄板を安定した姿勢で搬送することが可能となる。従って、本件発明に係る薄板液中搬送装置は、例えば基板に対して薬液処理を施すために用いた場合に、当該基板に施す薬液処理を基板の厚みや寸法を問わず均一に行えるため、安定的に高品質の基板を製造することが出来る。   According to the thin plate submerged transport device according to the present invention, it is possible to cope with various thicknesses and dimensions of the thin plate, and to transport the thin plate in a stable posture without increasing the area of the portion holding the thin plate. It becomes possible. Accordingly, when the thin plate submerged transport device according to the present invention is used to perform a chemical treatment on a substrate, for example, the chemical treatment applied to the substrate can be performed uniformly regardless of the thickness and dimensions of the substrate. It is possible to manufacture a high quality substrate.

本件発明の一実施形態に係る薄板液中搬送装置の概略図である。It is the schematic of the conveyance apparatus in a thin plate liquid which concerns on one Embodiment of this invention. 図1のA−A線断面図である。It is the sectional view on the AA line of FIG. 処理液噴出手段からの処理液の噴出角度を説明するために処理液噴出手段を上方からみた図である。It is the figure which looked at the process liquid ejection means from upper direction in order to demonstrate the jet angle of the process liquid from a process liquid ejection means. 処理液噴出手段からの処理液の噴出角度を説明するために処理液噴出手段を側方からみた図である。It is the figure which looked at the process liquid ejection means from the side, in order to demonstrate the ejection angle of the process liquid from a process liquid ejection means. 図1に示す薄板液中搬送装置をめっき処理装置として採用したときの概略図である。It is the schematic when employ | adopting the conveyance apparatus in a thin plate liquid shown in FIG. 1 as a plating processing apparatus.

以下、図を用いながら、本件発明に係る薄板液中搬送装置の一実施形態について説明する。図1は、本件発明の一実施形態に係る薄板液中搬送装置の概略図である。また、図2は、図1のA−A線断面図である。   Hereinafter, an embodiment of a thin plate liquid transport device according to the present invention will be described with reference to the drawings. FIG. 1 is a schematic view of a thin plate liquid transport device according to an embodiment of the present invention. FIG. 2 is a cross-sectional view taken along line AA in FIG.

薄板液中搬送装置: 本件発明に係る薄板液中搬送装置1は、薄板Wを処理液14中に浸漬させた状態で搬送させる装置である。ここで、薄板Wとしては、例えばプリント基板を用いることができ、片面基板、両面基板、多層基板、フレキシブル基板、ビルドアップ基板等の種類のものを用いることができ、その材質や構造に関して特に限定されない。そして、本件発明に係る薄板液中搬送装置1は、処理液14を収容する処理槽2と、薄板Wを垂直姿勢のまま水平方向に搬送する薄板搬送手段(図1,2中の符号3〜6を参照のこと。)と、薄板Wの搬送経路の両側に沿って配列した複数のローラ7とを構成に備えている。以下に、これらの構成について説明する。 Thin plate liquid transport device: The thin plate liquid transport device 1 according to the present invention is a device that transports the thin plate W in a state of being immersed in the processing liquid 14. Here, as the thin plate W, for example, a printed board can be used, and a single-sided board, a double-sided board, a multilayer board, a flexible board, a build-up board, and the like can be used, and the material and structure thereof are particularly limited. Not. And the thin-plate liquid conveyance apparatus 1 which concerns on this invention is the processing tank 2 which accommodates the process liquid 14, and the thin-plate conveyance means (code | symbol 3 in FIG. 1, 2) which conveys the thin plate W in a horizontal direction with a vertical attitude | position. 6) and a plurality of rollers 7 arranged along both sides of the conveyance path of the thin plate W. Below, these structures are demonstrated.

処理槽: 本件発明に係る薄板液中搬送装置1を構成する処理槽2は、薄板Wを浸漬する処理液14を収容する。ここで、処理槽2に収容する処理液14としては、めっき液、前処理液、後処理液、デスミア液、洗浄液、触媒付与液、エッチング液等の薬液を用いることができ、特に限定されるものではない。そして、本件発明における処理槽2は、これらの処理液14を収容することで、薄板Wに対して様々な湿式処理を施すことが出来る。 Processing tank: The processing tank 2 which comprises the conveyance apparatus 1 in a thin plate liquid which concerns on this invention accommodates the processing liquid 14 in which the thin plate W is immersed. Here, as the processing liquid 14 accommodated in the processing tank 2, chemical liquids such as plating liquid, pre-processing liquid, post-processing liquid, desmear liquid, cleaning liquid, catalyst application liquid, and etching liquid can be used, and are particularly limited. It is not a thing. And the processing tank 2 in this invention can perform various wet processing with respect to the thin plate W by accommodating these process liquids 14. FIG.

本件発明における処理槽2は、薄板Wの搬送方向出口側に処理液14を回収する処理液回収部15を設けることが出来る。例えば図2に示す如く、処理槽2内の薄板Wの搬送方向突き当たりの壁面に、オーバーフローした処理液14を回収する処理液回収部15を設けることで、処理槽2内に乱流が生まれるのを抑制して処理槽2内の処理液14中で薄板Wを常に安定した姿勢で搬送することが可能となる。ここで、本件発明における処理液回収部15は、図2に示す形態に限定されず、例えば処理槽2の薄板Wの搬送方向出口側付近にオーバーフローパイプを配置する構成とすることも出来る。なお、処理液回収部15により回収された処理液14は、処理槽2に接続された配管16やポンプ17を介して処理液噴出手段12へ送られ、循環使用させる構成とすることも出来る。また、このときに、処理液回収部15で回収した処理液14を貯留槽(不図示)に収容し、ポンプ17により循環させる構成としてもよい。   The processing tank 2 in the present invention can be provided with a processing liquid recovery unit 15 that recovers the processing liquid 14 on the exit side of the thin plate W in the conveyance direction. For example, as shown in FIG. 2, a turbulent flow is generated in the processing tank 2 by providing a processing liquid recovery unit 15 that recovers the overflowing processing liquid 14 on the wall surface of the processing tank 2 in the conveyance direction of the thin plate W. And the thin plate W can be always conveyed in a stable posture in the treatment liquid 14 in the treatment tank 2. Here, the treatment liquid recovery unit 15 in the present invention is not limited to the form shown in FIG. 2, and for example, an overflow pipe may be arranged in the vicinity of the exit side in the conveyance direction of the thin plate W of the treatment tank 2. Note that the processing liquid 14 recovered by the processing liquid recovery unit 15 may be sent to the processing liquid jetting unit 12 via a pipe 16 or a pump 17 connected to the processing tank 2 and circulated for use. At this time, the processing liquid 14 recovered by the processing liquid recovery unit 15 may be stored in a storage tank (not shown) and circulated by the pump 17.

薄板搬送手段: 本件発明に係る薄板液中搬送装置1を構成する薄板搬送手段5は、薄板Wを垂直姿勢で水平方向に搬送させる構造を備えたものである。本件発明における薄板搬送手段5は、例えば図1に示す如く、薄板Wの上部をクリップ4で挟持して直立状態に吊り下げることの可能な治具3を用い、この治具3をモータ等の駆動手段(不図示)を駆動させることで薄板Wを搬送方向に移動させる構造とすることが出来る。このように、本件発明における薄板搬送手段5は、用いる治具3に関して、薄板Wを保持する部分の面積を極力増大させない構成とすることで、例えば薄板Wに薬液処理を施す場合でも未処理領域の極小化を実現する。更に、薄板Wを搬送する際にこのような治具3を用いることで、薄板Wの様々な厚みや寸法に対応が可能となり、汎用性が向上する。なお、本件発明における薄板搬送手段5において、薄板Wを搬送する方法に関しては特に限定されず、従前の公知技術によって実施されることが出来るため、詳細な説明は省略する。 Thin plate conveying means: The thin plate conveying means 5 constituting the thin plate in-liquid conveying device 1 according to the present invention has a structure for conveying the thin plate W in a horizontal direction in a vertical posture. For example, as shown in FIG. 1, the thin plate conveying means 5 in the present invention uses a jig 3 that can hold the upper portion of the thin plate W with a clip 4 and suspend it in an upright state. It can be set as the structure which moves the thin plate W to a conveyance direction by driving a drive means (not shown). As described above, the thin plate transport means 5 in the present invention has a configuration in which the area of the portion holding the thin plate W is not increased as much as possible with respect to the jig 3 to be used. Realization of minimization. Further, by using such a jig 3 when transporting the thin plate W, it is possible to cope with various thicknesses and dimensions of the thin plate W, and versatility is improved. In addition, in the thin plate conveyance means 5 in this invention, it does not specifically limit regarding the method of conveying the thin plate W, Since it can implement by a conventional well-known technique, detailed description is abbreviate | omitted.

ローラ: 本件発明に係る薄板液中搬送装置1を構成するローラ7は、処理槽2内に、薄板Wの搬送経路の両側に沿って配列して複数配置される。よって、薄板搬送手段5により搬送される薄板Wが、浮力や液流の作用等によって揺動するのを規制する。ここで、ローラ7は、例えば図1,2に示すように、鉛直方向に位置したシャフト8上に、回転子10を、所定間隔をあけてシャフト8の軸を中心として回転自在に複数配置して備えることが出来る。このときに、回転子10は、薄板Wの搬送経路を挟んで相対向して配置されることで、薄板Wの搬送中の姿勢をより安定させることが出来る。また、シャフト8は、隣り合うシャフト8同士の間隔を薄板Wの搬送方向の長さよりも狭くすることで、薄板Wのシャフト8への巻付きを効果的に防ぐことが出来る。本件発明に係る薄板液中搬送装置1は、このような構成を採ることで、例え薄板Wがフレキシブル性に富んだものであっても問題なくスムーズに搬送させることが出来る。なお、ローラ7及び回転子10に関しては、その形状、寸法、材質に関しても特に限定されず、適宜変更することが出来る。ただし、ローラ7及び回転子10の少なくとも薄板Wと接触する箇所に関しては、材質をPP(ポリプロピレン)等の樹脂とすることで薄板Wの損傷が抑止されるため好ましい。 Roller: A plurality of rollers 7 constituting the thin plate submerged transport device 1 according to the present invention are arranged in the processing tank 2 along both sides of the transport path of the thin plate W. Therefore, the thin plate W conveyed by the thin plate conveying means 5 is restricted from swinging due to buoyancy, liquid flow action, or the like. Here, for example, as shown in FIGS. 1 and 2, a plurality of rotors 10 are arranged on a shaft 8 positioned in the vertical direction so that the roller 7 is rotatable about the axis of the shaft 8 at a predetermined interval. Can be prepared. At this time, the rotor 10 is disposed opposite to each other across the conveyance path of the thin plate W, so that the posture during the conveyance of the thin plate W can be further stabilized. Further, the shaft 8 can effectively prevent winding of the thin plate W around the shaft 8 by making the interval between the adjacent shafts 8 narrower than the length of the thin plate W in the conveying direction. By adopting such a configuration, the thin plate submerged conveying device 1 according to the present invention can be smoothly conveyed without any problems even if the thin plate W is rich in flexibility. Note that the shape, size, and material of the roller 7 and the rotor 10 are not particularly limited, and can be changed as appropriate. However, at least portions of the roller 7 and the rotor 10 that are in contact with the thin plate W are preferably made of a resin such as PP (polypropylene) because damage to the thin plate W is suppressed.

更に、本件発明に係る薄板液中搬送装置1において、ローラ7は、処理液14との接触により回転する回転羽根部材9を備えることも出来る。ここで、回転羽根部材9が自身の回転に伴いローラ7を回転させるようにローラ7に接続固定されることで、処理液噴出手段12から噴出される処理液14により、ローラ7が薄板Wを搬送方向に進める方向に回転して、ローラ7と薄板Wとの間での摩擦力が低減され、薄板Wが揺動したとしても、擦り傷が付く等といった問題が確実に回避される。また、ローラ7が複数の回転子10を備える場合には、回転羽根部材9が自身の回転に伴い回転子10を回転させるように回転子10に接続固定されることで同様の効果を得ることが出来る。そして、このときの回転羽根部材9の回転によりその周囲で回転流が生じるため、ローラ7(又は回転子10)を薄板Wの搬送経路の両側に相対向して一対を一組として複数組位置することで、この回転流の作用によってより安定的に薄板Wを垂直姿勢で搬送させることが出来る。   Furthermore, in the thin plate liquid transport device 1 according to the present invention, the roller 7 may include a rotating blade member 9 that rotates by contact with the processing liquid 14. Here, the rotating blade member 9 is connected and fixed to the roller 7 so as to rotate the roller 7 with its rotation, so that the roller 7 causes the thin plate W to be moved by the processing liquid 14 ejected from the processing liquid ejecting means 12. The frictional force between the roller 7 and the thin plate W is reduced by rotating in the conveying direction, and even if the thin plate W swings, problems such as scratches are reliably avoided. Further, when the roller 7 includes a plurality of rotors 10, the same effect can be obtained by connecting and fixing the rotating blade member 9 to the rotor 10 so as to rotate the rotor 10 with its rotation. I can do it. And since rotation flow arises in the circumference | surroundings by rotation of the rotary blade member 9 at this time, the roller 7 (or rotor 10) opposes both sides of the conveyance path | route of the thin plate W, and a plurality of sets position as a pair. By doing so, the thin plate W can be more stably transported in the vertical posture by the action of the rotating flow.

処理液噴出手段: また、本件発明に係る薄板液中搬送装置1は、搬送経路を通過する薄板Wの両面に対して、斜め後方から処理液14を噴出する処理液噴出手段を更に構成に備えることも出来る。本件発明における処理液噴出手段12は、薄板Wの両側に向けて搬送方向に対する斜め後方から処理液14を噴出するにあたって、例えば噴出ノズル13を備えることが出来る。噴出ノズル13は、薄板Wの搬送経路を挟んで両側に相対向して位置することで、薄板Wの搬送中の姿勢を安定化させることが出来る。ここで、処理液噴出手段12からの薄板W表面に対する処理液14の噴出角度は、図3に示す如く、薄板Wの斜め後方より薄板W表面に対して45°以上90°未満とすることが好ましい(図3に示すθ1を参照のこと。)。処理液噴出手段12からこのような角度を付けて処理液14を噴出することで、噴出される処理液14の水圧により薄板Wが治具3からずれ動いたり脱落したりするといったような問題が確実に回避される。また、本件発明における処理液噴出手段12は、噴出する処理液14の送出圧力を調整することで、薄板Wの搬送中の揺動をより効果的に抑制することが出来る。 Processing liquid jetting means: Further, the thin plate liquid in-conveying device 1 according to the present invention further includes a processing liquid jetting means for jetting the processing liquid 14 obliquely from both sides of the thin plate W passing through the transport path. You can also The processing liquid jetting means 12 in the present invention can be provided with, for example, a jet nozzle 13 when jetting the processing liquid 14 from both sides of the thin plate W from obliquely rearward with respect to the transport direction. The ejection nozzle 13 can be positioned opposite to both sides across the conveyance path of the thin plate W, so that the posture during conveyance of the thin plate W can be stabilized. Here, the ejection angle of the processing liquid 14 with respect to the surface of the thin plate W from the processing liquid ejecting means 12 may be set to 45 ° or more and less than 90 ° with respect to the surface of the thin plate W from obliquely behind the thin plate W as shown in FIG. Preferred (see θ1 shown in FIG. 3). By ejecting the treatment liquid 14 at such an angle from the treatment liquid ejecting means 12, there is a problem that the thin plate W is displaced from the jig 3 or dropped by the water pressure of the ejected treatment liquid 14. It is definitely avoided. Further, the processing liquid ejection means 12 in the present invention can more effectively suppress the swing during the transport of the thin plate W by adjusting the delivery pressure of the ejected processing liquid 14.

更に、本件発明に係る薄板液中搬送装置1を薄板Wを薬液処理する際に用いる場合には、処理液噴出手段12より薬液14が搬送経路を通過する薄板Wの両面に対して斜め後方から噴出されることで、処理槽2内における薬液14の成分の偏りを効果的に軽減することができ、薄板Wの処理品質や処理効率を高めることが出来る。ここで、処理液噴出手段12からの薄板W表面に対する処理液14の噴出角度は、図4に示す如く、薄板Wの搬送方向(水平方向L)より0°を超えて45°以下とすることが好ましい(図4に示すθ2を参照のこと。)。処理液噴出手段12からこのような角度を付けて処理液14を下方に噴出することで、より均一な薬液処理を施すことが可能となると共に、処理効率の更なる向上を図ることが出来る。   Further, when the thin plate liquid transport device 1 according to the present invention is used when the thin plate W is subjected to the chemical treatment, the chemical solution 14 from the treatment liquid ejecting means 12 is obliquely rearward with respect to both surfaces of the thin plate W passing through the transport path. By ejecting, the deviation of the component of the chemical solution 14 in the processing tank 2 can be effectively reduced, and the processing quality and processing efficiency of the thin plate W can be improved. Here, the jetting angle of the processing liquid 14 from the processing liquid jetting means 12 to the surface of the thin plate W is set to be more than 0 ° and not more than 45 ° from the conveying direction (horizontal direction L) of the thin plate W as shown in FIG. Is preferable (see θ2 shown in FIG. 4). By jetting the processing liquid 14 downward from the processing liquid jetting unit 12 at such an angle, it is possible to perform a more uniform chemical processing and further improve the processing efficiency.

薄板ガイド部材: そして、本件発明に係る薄板液中搬送装置1は、薄板Wの搬送経路に沿って延在して薄板Wを案内する薄板ガイド部材11を更に構成に備えることも好ましい。ここで、薄板ガイド部材11は、薄板Wの搬送経路に沿って延在して位置させるものであるが、例えばクリップ等を用いた取り外し自在の構造として上述したシャフト8に直接取付固定することが出来る。本件発明に係る薄板液中搬送装置1は、薄板ガイド部材11を構成に備えることで、例え薄板Wがフレキシブル性に富んだものであったとしても薄板Wが搬送中に揺動して大きく変形することを確実に防ぐと共に、薄板Wがシャフト8に巻付くことが確実に防止されるため、薄板Wを処理槽2内でよりスムーズに搬送させることが可能となる。 Thin plate guide member: The thin plate submerged transport device 1 according to the present invention preferably further includes a thin plate guide member 11 that extends along the transport path of the thin plate W and guides the thin plate W. Here, the thin plate guide member 11 extends and is positioned along the conveyance path of the thin plate W. For example, the thin plate guide member 11 may be directly attached and fixed to the shaft 8 as a detachable structure using a clip or the like. I can do it. The thin plate submerged transport device 1 according to the present invention includes the thin plate guide member 11 in the configuration, so that even if the thin plate W is rich in flexibility, the thin plate W is oscillated during transportation and greatly deformed. It is possible to reliably prevent the thin plate W from being wound around the shaft 8 and to convey the thin plate W more smoothly in the processing tank 2.

以上に、本件発明に係る薄板液中搬送装置1の各構成について説明したが、以下に本件発明に係る薄板液中搬送装置1の動作に関して、薄板液中搬送装置1をめっき処理装置として採用した場合を例に挙げて説明する。   As mentioned above, although each structure of the thin-plate liquid conveyance apparatus 1 which concerns on this invention was demonstrated, the thin-plate liquid conveyance apparatus 1 was employ | adopted as a plating processing apparatus regarding the operation | movement of the thin-plate liquid conveyance apparatus 1 which concerns on this invention below. A case will be described as an example.

図5は、図1に示す薄板液中搬送装置をめっき処理装置として採用したときの概略図である。本件発明の薄板液中搬送装置1は、基板Wに電気めっき処理を施すために用いる場合には、例えば図5に示す如く、処理槽2と薄板搬送手段3〜6とローラ7との他に、基板Wに接続する陰極(陰極レール6)、及び処理槽2に設けられた陽極(陽極部材51)と、両電極に電流を供給する電源50とを備える。   FIG. 5 is a schematic view when the thin plate liquid transport device shown in FIG. 1 is employed as a plating apparatus. When used for carrying out an electroplating process on the substrate W, the in-plate liquid transport device 1 of the present invention, for example, as shown in FIG. , A cathode (cathode rail 6) connected to the substrate W, an anode (anode member 51) provided in the processing tank 2, and a power supply 50 for supplying current to both electrodes.

そして、薄板液中搬送装置1を用いて基板Wに電気めっきを施す場合には、図5に示す如く、処理槽2にめっき液14を収容し、めっき液14中に基板Wを浸漬した状態で、基板Wをガイドする陰極レール6に横移動自在に支持された治具3によって、基板Wの上部を陰極レール6と電気接続された陰極クリップ4によって挟持して吊り下げる。処理槽2の両端側には、棒状又は板状の陽極部材51がそれぞれ配置され、陰極レール6が電源50のマイナス(−)側に接続され、陽極部材51が電源50のプラス(+)側に接続される。   And when performing electroplating to the board | substrate W using the thin-plate liquid conveyance apparatus 1, as shown in FIG. 5, the plating solution 14 is accommodated in the processing tank 2, and the state which immersed the board | substrate W in the plating solution 14 is shown. Then, the upper part of the substrate W is sandwiched and suspended by the cathode clip 4 electrically connected to the cathode rail 6 by the jig 3 that is supported by the cathode rail 6 that guides the substrate W so as to be laterally movable. A rod-like or plate-like anode member 51 is disposed on both ends of the treatment tank 2, the cathode rail 6 is connected to the minus (−) side of the power source 50, and the anode member 51 is on the plus (+) side of the power source 50. Connected to.

ここで、薄板液中搬送装置1は、陰極レール6から治具3を介して基板W上部で給電しながら、処理槽2内のめっき液14中に基板Wを垂直姿勢で水平方向に搬送させる。その結果、基板Wは、搬送経路に沿って搬送されながら(図2中の矢印を参照のこと。)その両面にめっき処理が施される。   Here, the thin plate liquid transport device 1 transports the substrate W in the vertical direction in the plating solution 14 in the processing tank 2 while feeding power from the cathode rail 6 to the upper portion of the substrate W via the jig 3. . As a result, the substrate W is subjected to plating treatment while being transported along the transport path (see the arrow in FIG. 2).

このときに、本件発明に係る薄板液中搬送装置1は、その構成にローラ7を備えることで、例え基板Wが剛性が弱く撓みやすいものであったり、基板Wが搬送される途中でめっき液14の流動による圧力を受けたとしても、基板Wの揺れを抑制することが出来る。このため、本件発明に係る薄板液中搬送装置1によれば、基板Wをその上部のみで保持した場合でも安定した姿勢で搬送することができ、様々な厚みや寸法の基板Wの表面に均一にめっき処理を行うことが出来る。また、ローラ7は、基板W表面と接触した場合に接触抵抗なく回転することで、基板W表面に形成されるめっき被膜に傷が付き難くなる。   At this time, the transport device 1 in the thin plate liquid according to the present invention includes the roller 7 in its configuration, so that, for example, the substrate W is weak in rigidity and easily bent, or the plating solution is being transported while the substrate W is being transported. Even if the pressure due to the flow of 14 is received, shaking of the substrate W can be suppressed. For this reason, according to the thin plate liquid transport device 1 according to the present invention, the substrate W can be transported in a stable posture even when the substrate W is held only on the upper portion thereof, and is uniform on the surface of the substrate W having various thicknesses and dimensions. The plating process can be performed. Further, when the roller 7 comes into contact with the surface of the substrate W and rotates without contact resistance, the plating film formed on the surface of the substrate W is hardly damaged.

また、本件発明に係る薄板液中搬送装置1は、基板Wの両側に設置された処理液噴出手段12からめっき液14を回転羽根部材9に向けて噴出してローラ7(又はローラ7に備わる回転子10)を回転させることで、めっき液14噴流が整流され、よりスムーズに基板Wを垂直姿勢で移送させることが出来る。更に、ローラ7(又はローラ7に備わる回転子10)との摩擦力が抵抗となって基板W表面に形成されるめっき被膜に傷が付くとか、処理液噴出手段12から噴出されるめっき液の水圧で基板Wが脱落するといったような問題が確実に回避される。   Further, in the thin plate submerged transport device 1 according to the present invention, the plating solution 14 is ejected from the processing solution ejecting means 12 installed on both sides of the substrate W toward the rotary blade member 9 and is provided in the roller 7 (or the roller 7). By rotating the rotor 10), the jet of the plating solution 14 is rectified, and the substrate W can be more smoothly transferred in a vertical posture. Further, the frictional force with the roller 7 (or the rotor 10 provided in the roller 7) becomes a resistance and the plating film formed on the surface of the substrate W is damaged, or the plating solution ejected from the processing solution ejecting means 12 is removed. Problems such as the substrate W dropping off due to water pressure are reliably avoided.

本件発明に係る薄板液中搬送装置1は、ローラ7が、薄板Wと所定間隔離れて位置し、且つ、薄板Wの搬送方向に回転自在に設けられるものである。本件発明に係る薄板液中搬送装置1は、このような条件でローラ7を設けることで、処理槽2に収容した処理液14中において薄板Wを地面に対して垂直となる姿勢で吊り下げたまま、薄板Wをその両面が搬送方向に沿うように且つ水平方向に安定的に搬送させることができ、薄板Wに変形等が生じるのを抑制することが出来る。よって、本件発明に係る薄板液中搬送装置1によれば、薄板Wとしてフレキシブル性に富んだ基板を用い、基板Wを薬液14中に浸漬させた状態で搬送させながら薬液処理を施す場合であっても、未処理領域を極力少なくすると共に、基板Wに対して薬液処理を均一に施すことが可能となる。   In the thin plate submerged transport device 1 according to the present invention, the roller 7 is provided at a predetermined distance from the thin plate W and is rotatably provided in the transport direction of the thin plate W. The thin plate liquid transport device 1 according to the present invention suspends the thin plate W in a posture perpendicular to the ground in the processing liquid 14 accommodated in the processing tank 2 by providing the roller 7 under such conditions. The thin plate W can be stably transported in the horizontal direction so that both surfaces thereof are along the transport direction, and deformation or the like of the thin plate W can be suppressed. Therefore, according to the thin plate liquid transport device 1 according to the present invention, a substrate having high flexibility is used as the thin plate W, and chemical processing is performed while transporting the substrate W while being immersed in the chemical solution 14. However, the unprocessed area can be reduced as much as possible, and the chemical treatment can be uniformly performed on the substrate W.

本件発明に係る薄板液中搬送装置は、様々な寸法や形状の薄板を常に安定した姿勢に保ちながら搬送することが可能であるため、薄板の搬送中に当該薄板に傷や変形が生じるようなことがない。従って、本件発明に係る薄板液中搬送装置は、小型化、極薄化、フレキシブル化が進むプリント配線基板等の薄板を薬液に接触させて湿式処理するに際して好適に用いることができ、安定的に高品質の基板を製造することが出来る。   Since the thin plate submerged transport device according to the present invention can transport a thin plate of various sizes and shapes while always maintaining a stable posture, the thin plate may be damaged or deformed during the transport of the thin plate. There is nothing. Therefore, the thin plate submerged transport device according to the present invention can be suitably used when wet processing is performed by bringing a thin plate such as a printed wiring board, which is becoming smaller, ultrathin, and flexible, into contact with a chemical. High quality substrates can be manufactured.

1 薄板液中搬送装置
2 処理槽
3 治具
4 クリップ(又は陰極クリップ)
5 薄板搬送手段
6 ガイドレール(又は陰極レール)
7 ローラ
8 シャフト
9 回転羽根部材
10 回転子
11 薄板ガイド部材
12 処理液噴出手段
13 噴出ノズル
14 処理液(又は薬液)
15 処理液回収部
16 配管
17 ポンプ
50 電源
51 陽極部材
W 薄板(又は基板)
DESCRIPTION OF SYMBOLS 1 Conveyor apparatus in thin plate liquid 2 Processing tank 3 Jig 4 Clip (or cathode clip)
5 Thin plate conveying means 6 Guide rail (or cathode rail)
7 Roller 8 Shaft 9 Rotating blade member 10 Rotor 11 Thin plate guide member 12 Treatment liquid ejection means 13 Ejection nozzle 14 Treatment liquid (or chemical liquid)
15 Processing liquid recovery part 16 Piping 17 Pump 50 Power supply 51 Anode member W Thin plate (or substrate)

Claims (6)

薄板を処理液中に浸漬させた状態で搬送させる薄板液中搬送装置であって、
当該処理液を収容する処理槽と、
当該薄板を垂直姿勢のまま水平方向に搬送する薄板搬送手段と、
当該薄板の搬送経路の両側に沿って配列した複数のローラとを備え、
当該ローラは、当該薄板と所定間隔離れて位置し、且つ、当該薄板の搬送方向に回転自在であることを特徴とする薄板液中搬送装置。
A thin plate liquid transport device that transports a thin plate immersed in a processing liquid,
A treatment tank containing the treatment liquid;
A thin plate conveying means for conveying the thin plate in a horizontal direction in a vertical posture;
A plurality of rollers arranged along both sides of the conveyance path of the thin plate,
The apparatus for transporting liquid in a thin plate, wherein the roller is located at a predetermined distance from the thin plate and is rotatable in the transport direction of the thin plate.
前記ローラは、回転子を鉛直方向に所定間隔をあけて複数配置したものである請求項1に記載の薄板液中搬送装置。   The thin plate submerged transport device according to claim 1, wherein a plurality of the rotors are arranged with a predetermined interval in the vertical direction. 搬送経路を通過する薄板の両面に対して、斜め後方から前記処理液を噴出する処理液噴出手段を備えた請求項1又は請求項2に記載の薄板液中搬送装置。   The thin-plate liquid conveyance apparatus of Claim 1 or 2 provided with the process liquid ejection means which ejects the said process liquid from diagonally back with respect to both surfaces of the thin plate which passes a conveyance path | route. 前記ローラは、回転羽根部材を備えた請求項1〜請求項3のいずれかに記載の薄板液中搬送装置。   The said board | substrate is a conveyance apparatus in a thin plate liquid in any one of Claims 1-3 provided with the rotary blade member. 前記薄板の搬送経路に沿って延在する薄板ガイド部材を備えた請求項1〜請求項4のいずれかに記載の薄板液中搬送装置。   The thin plate submerged conveyance apparatus in any one of Claims 1-4 provided with the thin plate guide member extended along the conveyance path | route of the said thin plate. 前記処理槽は、前記薄板の搬送方向出口側に前記処理液を回収する処理液回収部を設けた請求項1〜請求項5のいずれかに記載の薄板液中搬送装置。   The said process tank is a conveyance apparatus in a thin plate liquid in any one of Claims 1-5 which provided the process liquid collection | recovery part which collect | recovers the said process liquid in the conveyance direction exit side of the said thin plate.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110980107A (en) * 2019-11-29 2020-04-10 中国建材国际工程集团有限公司 Plate conveying device with multiple limiting functions
CN111441040A (en) * 2018-12-26 2020-07-24 株式会社杰希优 Wet processing device for resin film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111441040A (en) * 2018-12-26 2020-07-24 株式会社杰希优 Wet processing device for resin film
CN110980107A (en) * 2019-11-29 2020-04-10 中国建材国际工程集团有限公司 Plate conveying device with multiple limiting functions

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