JP2017011144A5 - - Google Patents

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Publication number
JP2017011144A5
JP2017011144A5 JP2015126268A JP2015126268A JP2017011144A5 JP 2017011144 A5 JP2017011144 A5 JP 2017011144A5 JP 2015126268 A JP2015126268 A JP 2015126268A JP 2015126268 A JP2015126268 A JP 2015126268A JP 2017011144 A5 JP2017011144 A5 JP 2017011144A5
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JP
Japan
Prior art keywords
lower electrode
piezoelectric
forming
manufacturing
piezoelectric film
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Application number
JP2015126268A
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English (en)
Japanese (ja)
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JP6122066B2 (ja
JP2017011144A (ja
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Priority to JP2015126268A priority Critical patent/JP6122066B2/ja
Priority claimed from JP2015126268A external-priority patent/JP6122066B2/ja
Priority to PCT/JP2016/067395 priority patent/WO2016208425A1/ja
Priority to TW105119414A priority patent/TWI693731B/zh
Publication of JP2017011144A publication Critical patent/JP2017011144A/ja
Publication of JP2017011144A5 publication Critical patent/JP2017011144A5/ja
Application granted granted Critical
Publication of JP6122066B2 publication Critical patent/JP6122066B2/ja
Active legal-status Critical Current
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JP2015126268A 2015-06-24 2015-06-24 高周波超音波圧電素子、その製造方法、及びそれを含む高周波超音波プローブ Active JP6122066B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2015126268A JP6122066B2 (ja) 2015-06-24 2015-06-24 高周波超音波圧電素子、その製造方法、及びそれを含む高周波超音波プローブ
PCT/JP2016/067395 WO2016208425A1 (ja) 2015-06-24 2016-06-10 高周波超音波圧電素子、その製造方法、及びそれを含む高周波超音波プローブ
TW105119414A TWI693731B (zh) 2015-06-24 2016-06-21 高頻超音波壓電元件、其製造方法以及包含該高頻超音波壓電元件的高頻超音波探頭

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015126268A JP6122066B2 (ja) 2015-06-24 2015-06-24 高周波超音波圧電素子、その製造方法、及びそれを含む高周波超音波プローブ

Publications (3)

Publication Number Publication Date
JP2017011144A JP2017011144A (ja) 2017-01-12
JP2017011144A5 true JP2017011144A5 (https=) 2017-02-16
JP6122066B2 JP6122066B2 (ja) 2017-04-26

Family

ID=57584920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015126268A Active JP6122066B2 (ja) 2015-06-24 2015-06-24 高周波超音波圧電素子、その製造方法、及びそれを含む高周波超音波プローブ

Country Status (3)

Country Link
JP (1) JP6122066B2 (https=)
TW (1) TWI693731B (https=)
WO (1) WO2016208425A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101965171B1 (ko) * 2018-08-24 2019-08-13 (주)비티비엘 초음파센서의 제조방법
EP4468743A4 (en) * 2022-01-19 2026-01-07 Cast Inc ULTRASONIC PROBE AND METHOD FOR MANUFACTURING ULTRASONIC PROBE

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH071920Y2 (ja) * 1988-05-10 1995-01-18 東レ株式会社 超音波トランスデューサ
JP2002008939A (ja) * 2000-04-13 2002-01-11 Fujitsu Ltd 選択的コーティングによるセラミック体の製造方法
JP4759117B2 (ja) * 2000-06-22 2011-08-31 日本特殊陶業株式会社 金属酸化物膜付き基板及び金属酸化物膜付き基板の製造方法
JP2004111835A (ja) * 2002-09-20 2004-04-08 Canon Inc 圧電体素子の製造方法、圧電体素子及びインクジェット式記録ヘッド
JP2005327919A (ja) * 2004-05-14 2005-11-24 Seiko Epson Corp デバイスの製造方法及びデバイス、電気光学素子、プリンタ
US7449821B2 (en) * 2005-03-02 2008-11-11 Research Triangle Institute Piezoelectric micromachined ultrasonic transducer with air-backed cavities
JP2012011024A (ja) * 2010-07-01 2012-01-19 Konica Minolta Medical & Graphic Inc 超音波探触子、および超音波診断装置
JP5540361B2 (ja) * 2011-06-07 2014-07-02 日立Ｇｅニュークリア・エナジー株式会社 超音波センサ及びその製造方法
JP2013168573A (ja) * 2012-02-16 2013-08-29 Mitsubishi Heavy Ind Ltd 超音波厚みセンサの製造方法
JP2013207155A (ja) * 2012-03-29 2013-10-07 Mitsubishi Materials Corp 強誘電体薄膜の製造方法
JP6132337B2 (ja) * 2013-04-24 2017-05-24 国立大学法人電気通信大学 超音波診断装置及び超音波画像構築方法

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