JP2017010972A5 - - Google Patents
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- Publication number
- JP2017010972A5 JP2017010972A5 JP2015121639A JP2015121639A JP2017010972A5 JP 2017010972 A5 JP2017010972 A5 JP 2017010972A5 JP 2015121639 A JP2015121639 A JP 2015121639A JP 2015121639 A JP2015121639 A JP 2015121639A JP 2017010972 A5 JP2017010972 A5 JP 2017010972A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- processing apparatus
- plasma processing
- disposed
- wall member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000460 chlorine Substances 0.000 claims 10
- 229910052782 aluminium Inorganic materials 0.000 claims 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 3
- 238000004140 cleaning Methods 0.000 claims 3
- 229910052751 metal Inorganic materials 0.000 claims 3
- 239000002184 metal Substances 0.000 claims 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 2
- 229910052801 chlorine Inorganic materials 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 229910003902 SiCl 4 Inorganic materials 0.000 claims 1
- 230000005684 electric field Effects 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- 230000003993 interaction Effects 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 claims 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015121639A JP6486215B2 (ja) | 2015-06-17 | 2015-06-17 | プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015121639A JP6486215B2 (ja) | 2015-06-17 | 2015-06-17 | プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017010972A JP2017010972A (ja) | 2017-01-12 |
| JP2017010972A5 true JP2017010972A5 (cg-RX-API-DMAC7.html) | 2018-02-22 |
| JP6486215B2 JP6486215B2 (ja) | 2019-03-20 |
Family
ID=57764161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015121639A Active JP6486215B2 (ja) | 2015-06-17 | 2015-06-17 | プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6486215B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11355324B2 (en) | 2017-03-27 | 2022-06-07 | Hitachi High-Tech Corporation | Plasma processing method |
| JP7190938B2 (ja) * | 2019-02-27 | 2022-12-16 | 東京エレクトロン株式会社 | プラズマ処理方法及びプラズマ処理装置 |
| CN115023794A (zh) * | 2020-02-10 | 2022-09-06 | 株式会社日立高新技术 | 等离子处理方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002359233A (ja) * | 2001-06-01 | 2002-12-13 | Hitachi Ltd | プラズマ処理装置 |
| JP2004079609A (ja) * | 2002-08-12 | 2004-03-11 | Renesas Technology Corp | 半導体装置の製造方法 |
| US7147749B2 (en) * | 2002-09-30 | 2006-12-12 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
| JP5450187B2 (ja) * | 2010-03-16 | 2014-03-26 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置およびプラズマ処理方法 |
| JP2015088696A (ja) * | 2013-11-01 | 2015-05-07 | 株式会社日立ハイテクノロジーズ | プラズマ処理方法 |
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2015
- 2015-06-17 JP JP2015121639A patent/JP6486215B2/ja active Active