JP2016540248A5 - - Google Patents

Download PDF

Info

Publication number
JP2016540248A5
JP2016540248A5 JP2016534714A JP2016534714A JP2016540248A5 JP 2016540248 A5 JP2016540248 A5 JP 2016540248A5 JP 2016534714 A JP2016534714 A JP 2016534714A JP 2016534714 A JP2016534714 A JP 2016534714A JP 2016540248 A5 JP2016540248 A5 JP 2016540248A5
Authority
JP
Japan
Prior art keywords
electroactive
conductive layer
substrate
layers
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2016534714A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016540248A (ja
JP6340079B2 (ja
Filing date
Publication date
Priority claimed from US14/095,308 external-priority patent/US20150153622A1/en
Application filed filed Critical
Publication of JP2016540248A publication Critical patent/JP2016540248A/ja
Publication of JP2016540248A5 publication Critical patent/JP2016540248A5/ja
Application granted granted Critical
Publication of JP6340079B2 publication Critical patent/JP6340079B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2016534714A 2013-12-03 2014-12-03 電気活性素子および電気活性素子の作製方法 Expired - Fee Related JP6340079B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/095,308 2013-12-03
US14/095,308 US20150153622A1 (en) 2013-12-03 2013-12-03 Methods for producing lower electrical isolation in electrochromic films
PCT/US2014/068357 WO2015084952A1 (en) 2013-12-03 2014-12-03 Electroactive device and a method of fabricating the same

Publications (3)

Publication Number Publication Date
JP2016540248A JP2016540248A (ja) 2016-12-22
JP2016540248A5 true JP2016540248A5 (OSRAM) 2017-02-02
JP6340079B2 JP6340079B2 (ja) 2018-06-06

Family

ID=53265206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016534714A Expired - Fee Related JP6340079B2 (ja) 2013-12-03 2014-12-03 電気活性素子および電気活性素子の作製方法

Country Status (6)

Country Link
US (3) US20150153622A1 (OSRAM)
EP (1) EP3078056B1 (OSRAM)
JP (1) JP6340079B2 (OSRAM)
CN (2) CN105793965A (OSRAM)
DK (1) DK3078056T3 (OSRAM)
WO (1) WO2015084952A1 (OSRAM)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9958750B2 (en) 2010-11-08 2018-05-01 View, Inc. Electrochromic window fabrication methods
US12496809B2 (en) 2010-11-08 2025-12-16 View Operating Corporation Electrochromic window fabrication methods
US10802371B2 (en) 2011-12-12 2020-10-13 View, Inc. Thin-film devices and fabrication
US11865632B2 (en) 2011-12-12 2024-01-09 View, Inc. Thin-film devices and fabrication
US12061402B2 (en) 2011-12-12 2024-08-13 View, Inc. Narrow pre-deposition laser deletion
KR20200035328A (ko) 2011-12-12 2020-04-02 뷰, 인크. 박막 디바이스 및 제조
US10295880B2 (en) 2011-12-12 2019-05-21 View, Inc. Narrow pre-deposition laser deletion
US12403676B2 (en) 2011-12-12 2025-09-02 View Operating Corporation Thin-film devices and fabrication
US20150153622A1 (en) 2013-12-03 2015-06-04 Sage Electrochromics, Inc. Methods for producing lower electrical isolation in electrochromic films
US12235560B2 (en) 2014-11-25 2025-02-25 View, Inc. Faster switching electrochromic devices
CN107533267A (zh) 2015-03-20 2018-01-02 唯景公司 更快速地切换低缺陷电致变色窗
CN110337716A (zh) 2017-02-27 2019-10-15 Sage电致变色显示有限公司 包括基板和透明导电层的电气设备及形成电气设备的方法
EP3857277B1 (en) * 2018-09-26 2024-08-14 Sage Electrochromics, Inc. Electroactive device and methods
US20200301228A1 (en) * 2019-03-20 2020-09-24 Sage Electrochromics, Inc. Made-to-stock patterned transparent conductive layer
US20220198118A1 (en) * 2020-12-21 2022-06-23 Sage Electrochromics, Inc. Apparatus and method for manufacturing a motherboard comprising one or more electrochromic devices
WO2024102694A1 (en) * 2022-11-10 2024-05-16 Energy Materials Corporation Photovoltaic modules and methods of making same

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5321544A (en) 1991-09-04 1994-06-14 Sun Active Glass Electrochromics, Inc. Electrochromic structures and methods
US5724177A (en) 1991-09-04 1998-03-03 Sun Active Glass Electrochromics, Inc. Electrochromic devices and methods
US5404244A (en) 1992-04-10 1995-04-04 Sun Active Glass Electrochromics, Inc. Electrochromic structures and methods
US5370775A (en) 1992-04-10 1994-12-06 Sun Active Glass Electrochromics, Inc. Formation of chemically reduced electrode layers
ES2186676T3 (es) 1992-04-10 2003-05-16 Sun Active Glass Electrochrom Estructuras electrocromas y procedimientos.
US5724175A (en) * 1997-01-02 1998-03-03 Optical Coating Laboratory, Inc. Electrochromic device manufacturing process
US6700692B2 (en) * 1997-04-02 2004-03-02 Gentex Corporation Electrochromic rearview mirror assembly incorporating a display/signal light
US6515787B1 (en) * 2000-03-07 2003-02-04 Eclipse Energy Systems, Inc. Electrochromic layer
JP4171166B2 (ja) * 2000-08-31 2008-10-22 三洋電機株式会社 光起電力装置及びその製造方法
US7255451B2 (en) * 2002-09-20 2007-08-14 Donnelly Corporation Electro-optic mirror cell
FR2833107B1 (fr) 2001-12-05 2004-02-20 Saint Gobain Electrode de dispositifs electrochimiques/electrocommandables
US6838157B2 (en) * 2002-09-23 2005-01-04 Siemens Westinghouse Power Corporation Method and apparatus for instrumenting a gas turbine component having a barrier coating
JP2004198966A (ja) * 2002-12-20 2004-07-15 Tokai Rika Co Ltd 反射鏡
KR100980796B1 (ko) 2003-01-31 2010-09-10 엔테라 리미티드 전기변색 디스플레이 장치
US6885033B2 (en) * 2003-03-10 2005-04-26 Cree, Inc. Light emitting devices for light conversion and methods and semiconductor chips for fabricating the same
DE10333764B3 (de) 2003-07-23 2004-12-30 Outokumpu Oy Verfahren zum Chargieren von feinkörnigen Metallen in einen Elektrolichtbogenofen
EP1557875A1 (en) * 2003-12-29 2005-07-27 STMicroelectronics S.r.l. Process for forming tapered trenches in a dielectric material
US7372610B2 (en) 2005-02-23 2008-05-13 Sage Electrochromics, Inc. Electrochromic devices and methods
US7593154B2 (en) * 2005-10-11 2009-09-22 Sage Electrochromics, Inc. Electrochromic devices having improved ion conducting layers
US7483454B2 (en) * 2006-05-26 2009-01-27 Hauck James P Laser system architecture and method of using the same
US7749907B2 (en) 2006-08-25 2010-07-06 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
US8148259B2 (en) 2006-08-30 2012-04-03 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing semiconductor device
JP5205042B2 (ja) 2006-12-20 2013-06-05 株式会社半導体エネルギー研究所 半導体装置の作製方法
US8168265B2 (en) * 2008-06-06 2012-05-01 Applied Materials, Inc. Method for manufacturing electrochromic devices
CN102308409B (zh) 2009-02-05 2015-01-28 皇家飞利浦电子股份有限公司 电致发光装置
US9664974B2 (en) * 2009-03-31 2017-05-30 View, Inc. Fabrication of low defectivity electrochromic devices
FR2944610B1 (fr) 2009-04-16 2011-06-24 Saint Gobain Dispositif electrochrome a transparence controlee
JP5111450B2 (ja) * 2009-06-23 2013-01-09 三菱電機株式会社 薄膜太陽電池およびその製造方法
US20120318776A1 (en) * 2009-09-24 2012-12-20 Electro Scientific Industries, Inc. Method and apparatus for machining a workpiece
US8493646B2 (en) * 2010-04-22 2013-07-23 Sage Electrochromics, Inc. Series connected electrochromic devices
FR2962818B1 (fr) 2010-07-13 2013-03-08 Saint Gobain Dispositif electrochimique a proprietes de transmission optique et/ou energetique electrocommandables.
KR101172178B1 (ko) 2010-09-01 2012-08-07 엘지이노텍 주식회사 태양광 발전장치 및 이의 제조방법
US8134067B1 (en) * 2011-01-21 2012-03-13 Chin-Yao Tsai Thin film photovoltaic device
US10429712B2 (en) * 2012-04-20 2019-10-01 View, Inc. Angled bus bar
JP2012243864A (ja) * 2011-05-17 2012-12-10 Mitsubishi Electric Corp 集積型薄膜太陽電池とその製造方法及びそのレーザ加工方法
EP2721665B1 (en) * 2011-06-17 2021-10-27 Sion Power Corporation Plating technique for electrode
KR20200035328A (ko) * 2011-12-12 2020-04-02 뷰, 인크. 박막 디바이스 및 제조
US8652940B2 (en) * 2012-04-10 2014-02-18 Applied Materials, Inc. Wafer dicing used hybrid multi-step laser scribing process with plasma etch
CN110716362B (zh) * 2012-04-25 2022-11-18 唯景公司 电致变色窗制造方法
US9013778B2 (en) * 2013-03-06 2015-04-21 Sage Electrochromics, Inc. Laser cuts to reduce electrical leakage
US9152001B2 (en) 2013-07-25 2015-10-06 Sage Electrochromics, Inc. Electrochromic devices having improved structure for reducing current leakage across lower transparent conductor layers
US20150153622A1 (en) 2013-12-03 2015-06-04 Sage Electrochromics, Inc. Methods for producing lower electrical isolation in electrochromic films

Similar Documents

Publication Publication Date Title
JP2016540248A5 (OSRAM)
WO2012161462A3 (ko) 전도성 기판 및 이를 포함하는 터치 패널
JP2015513691A5 (OSRAM)
JP2015518659A5 (OSRAM)
WO2016064134A3 (en) Light emitting device and method of fabricating the same
WO2015031435A3 (en) Method of separating a glass sheet from a carrier
WO2014163801A8 (en) Flipped cell sensor pattern
EP2031934A3 (en) Heating substrate equipped with conductive-thin-film and electrode and manufacturing method of the same
WO2012129033A3 (en) Conductive foils having multiple layers and methods of forming same
JP2014529108A5 (OSRAM)
JP2016534552A5 (OSRAM)
JP2016536808A5 (OSRAM)
JP2014502053A5 (OSRAM)
MX2016002822A (es) Metodo para producir un cristal con un recubrimiento electricamente conductor con defectos aislados electricamente.
JP2015533263A5 (OSRAM)
JP2013042180A5 (OSRAM)
WO2012134174A3 (ko) 전도성 구조체， 터치패널 및 이의 제조방법
JP2016174148A5 (OSRAM)
EP4300576A3 (en) Method of manufacturing a component carrier
JP2012063156A5 (OSRAM)
RU2014106931A (ru) Защита поверхности от электромагнитной энергии
WO2019164588A3 (en) Multi-layer solid-state devices and methods for forming the same
JP2010109361A5 (ja) 半導体基板の作製方法
JP2015065162A5 (OSRAM)
JP5934834B2 (ja) 導電性メッシュにおけるブリッジ構造を製造するための方法