JP2016535300A5 - - Google Patents

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Publication number
JP2016535300A5
JP2016535300A5 JP2016525045A JP2016525045A JP2016535300A5 JP 2016535300 A5 JP2016535300 A5 JP 2016535300A5 JP 2016525045 A JP2016525045 A JP 2016525045A JP 2016525045 A JP2016525045 A JP 2016525045A JP 2016535300 A5 JP2016535300 A5 JP 2016535300A5
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JP
Japan
Prior art keywords
printing
printing units
image
substrate
units
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016525045A
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English (en)
Japanese (ja)
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JP2016535300A (ja
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Publication date
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Priority claimed from PCT/US2014/057120 external-priority patent/WO2015060972A1/en
Publication of JP2016535300A publication Critical patent/JP2016535300A/ja
Publication of JP2016535300A5 publication Critical patent/JP2016535300A5/ja
Pending legal-status Critical Current

Links

JP2016525045A 2013-10-22 2014-09-24 アクティブアラインメントを用いたロールツーロールのマスクレスリソグラフィー Pending JP2016535300A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361894249P 2013-10-22 2013-10-22
US61/894,249 2013-10-22
PCT/US2014/057120 WO2015060972A1 (en) 2013-10-22 2014-09-24 Roll to roll mask-less lithography with active alignment

Publications (2)

Publication Number Publication Date
JP2016535300A JP2016535300A (ja) 2016-11-10
JP2016535300A5 true JP2016535300A5 (https=) 2017-11-02

Family

ID=52993351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016525045A Pending JP2016535300A (ja) 2013-10-22 2014-09-24 アクティブアラインメントを用いたロールツーロールのマスクレスリソグラフィー

Country Status (7)

Country Link
US (1) US20160238951A1 (https=)
EP (1) EP3061120A4 (https=)
JP (1) JP2016535300A (https=)
KR (1) KR20160073415A (https=)
CN (2) CN106933073A (https=)
TW (1) TW201516580A (https=)
WO (1) WO2015060972A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017199658A1 (ja) * 2016-05-19 2017-11-23 株式会社ニコン 基板支持装置、露光装置、および、パターニング装置
US10133193B2 (en) * 2016-07-19 2018-11-20 Applied Materials, Inc. Piecewise alignment modeling method
CN109997082B (zh) * 2016-11-28 2021-11-16 富林特集团德国有限公司 曝光设备和将板状材料曝光的方法
CN106997156B (zh) * 2017-03-27 2018-11-06 深圳市优盛科技有限公司 在高弧度三维立体上制备高精度线路图形的曝光方法
US10935892B2 (en) 2017-05-15 2021-03-02 Applied Materials, Inc. Freeform distortion correction
CN109143792A (zh) * 2018-09-03 2019-01-04 中山新诺科技股份有限公司 一种空心柱立体结构的图形加工方法
US10761430B2 (en) 2018-09-13 2020-09-01 Applied Materials, Inc. Method to enhance the resolution of maskless lithography while maintaining a high image contrast
US10678150B1 (en) 2018-11-15 2020-06-09 Applied Materials, Inc. Dynamic generation of layout adaptive packaging
NO20190876A1 (en) * 2019-07-11 2021-01-12 Visitech As Real time Registration Lithography system
CN110333648A (zh) * 2019-07-16 2019-10-15 中山新诺科技股份有限公司 在三维多面体上制备高精度线路图形的曝光系统及方法
CN111880379A (zh) * 2020-07-03 2020-11-03 合肥芯碁微电子装备股份有限公司 曝光机的曝光图形的处理方法、装置及曝光机

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
JP2004157219A (ja) * 2002-11-05 2004-06-03 Fuji Photo Film Co Ltd 露光ヘッドおよび露光装置
JP2005300805A (ja) * 2004-04-09 2005-10-27 Pentax Corp 描画装置
JP4362847B2 (ja) * 2004-04-09 2009-11-11 株式会社オーク製作所 描画装置
JP2006098719A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 露光装置
US7459247B2 (en) * 2004-12-27 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4304165B2 (ja) * 2005-04-08 2009-07-29 株式会社 インテグレイテッド ソリューションズ 露光方法および露光装置
KR101273800B1 (ko) * 2006-02-02 2013-06-11 엘지전자 주식회사 마스크리스 노광기의 정렬장치
JP2007298603A (ja) * 2006-04-28 2007-11-15 Shinko Electric Ind Co Ltd 描画装置および描画方法
US7799182B2 (en) * 2006-12-01 2010-09-21 Applied Materials, Inc. Electroplating on roll-to-roll flexible solar cell substrates
US8027086B2 (en) * 2007-04-10 2011-09-27 The Regents Of The University Of Michigan Roll to roll nanoimprint lithography
SG172243A1 (en) * 2008-12-23 2011-07-28 3M Innovative Properties Co Roll-to-roll digital photolithography
JP5282895B2 (ja) * 2009-03-06 2013-09-04 株式会社ニコン 露光装置、露光方法、およびデバイス製造方法
US8264666B2 (en) * 2009-03-13 2012-09-11 Nikon Corporation Exposure apparatus, exposure method, and method of manufacturing device
JP2010271603A (ja) * 2009-05-25 2010-12-02 Nikon Corp 面位置検出装置、パターン形成装置、面位置検出方法、パターン形成方法及びデバイス製造方法
US20130188324A1 (en) * 2010-09-29 2013-07-25 Posco Method for Manufacturing a Flexible Electronic Device Using a Roll-Shaped Motherboard, Flexible Electronic Device, and Flexible Substrate
US9616614B2 (en) * 2012-02-22 2017-04-11 Canon Nanotechnologies, Inc. Large area imprint lithography
CN106597816B (zh) * 2012-03-26 2019-08-27 株式会社尼康 基板处理装置
JP2013213983A (ja) * 2012-04-03 2013-10-17 Nikon Corp 露光装置及びデバイス製造方法
CN102790002B (zh) * 2012-07-27 2015-02-11 京东方科技集团股份有限公司 柔性基板处理装置

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