JP2016529397A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016529397A5 JP2016529397A5 JP2016527066A JP2016527066A JP2016529397A5 JP 2016529397 A5 JP2016529397 A5 JP 2016529397A5 JP 2016527066 A JP2016527066 A JP 2016527066A JP 2016527066 A JP2016527066 A JP 2016527066A JP 2016529397 A5 JP2016529397 A5 JP 2016529397A5
- Authority
- JP
- Japan
- Prior art keywords
- fluid
- gaps
- gap
- sheet
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000012530 fluid Substances 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 29
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- 238000005137 deposition process Methods 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 3
- 238000000231 atomic layer deposition Methods 0.000 claims description 2
- 238000001338 self-assembly Methods 0.000 claims description 2
- 238000001179 sorption measurement Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- 230000006978 adaptation Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201361846675P | 2013-07-16 | 2013-07-16 | |
| US61/846,675 | 2013-07-16 | ||
| PCT/US2014/046828 WO2015009811A1 (en) | 2013-07-16 | 2014-07-16 | Sheet coating method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016529397A JP2016529397A (ja) | 2016-09-23 |
| JP2016529397A5 true JP2016529397A5 (enExample) | 2017-08-31 |
Family
ID=52346697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016527066A Ceased JP2016529397A (ja) | 2013-07-16 | 2014-07-16 | シートのコーティング方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US10072333B2 (enExample) |
| EP (1) | EP3022329A4 (enExample) |
| JP (1) | JP2016529397A (enExample) |
| KR (1) | KR20160031517A (enExample) |
| CN (1) | CN105392919B (enExample) |
| WO (1) | WO2015009811A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10741735B2 (en) | 2014-06-02 | 2020-08-11 | 3M Innovative Properties Company | LED with remote phosphor and shell reflector |
| CN212460103U (zh) | 2017-10-18 | 2021-02-02 | 3M创新有限公司 | 光纤连接系统 |
| CN212255779U (zh) | 2017-10-18 | 2020-12-29 | 3M创新有限公司 | 光纤连接系统 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3103186B2 (ja) * | 1992-03-19 | 2000-10-23 | 富士通株式会社 | 原子層エピタキシー装置および原子層エピタキシー法 |
| US20030049372A1 (en) | 1997-08-11 | 2003-03-13 | Cook Robert C. | High rate deposition at low pressures in a small batch reactor |
| US6812157B1 (en) * | 1999-06-24 | 2004-11-02 | Prasad Narhar Gadgil | Apparatus for atomic layer chemical vapor deposition |
| TW496907B (en) * | 2000-04-14 | 2002-08-01 | Asm Microchemistry Oy | Method and apparatus of growing a thin film onto a substrate |
| JP3670628B2 (ja) * | 2002-06-20 | 2005-07-13 | 株式会社東芝 | 成膜方法、成膜装置、および半導体装置の製造方法 |
| US20040157047A1 (en) | 2003-02-06 | 2004-08-12 | Ali Mehrabi | Continuous process for manufacturing electrostatically self-assembled coatings |
| US20050268848A1 (en) | 2004-04-28 | 2005-12-08 | Nanodynamics, Inc | Atomic layer deposition apparatus and process |
| JP4595702B2 (ja) * | 2004-07-15 | 2010-12-08 | 東京エレクトロン株式会社 | 成膜方法、成膜装置及び記憶媒体 |
| DE102004056170A1 (de) * | 2004-08-06 | 2006-03-16 | Aixtron Ag | Vorrichtung und Verfahren zur chemischen Gasphasenabscheidung mit hohem Durchsatz |
| US7407892B2 (en) * | 2005-05-11 | 2008-08-05 | Micron Technology, Inc. | Deposition methods |
| JP2009500857A (ja) * | 2005-07-08 | 2009-01-08 | アヴィザ テクノロジー インコーポレイテッド | シリコン含有膜の堆積方法 |
| TWI267994B (en) * | 2005-08-24 | 2006-12-01 | Advanced Semiconductor Eng | Package structure and manufacturing process thereof |
| US20070065578A1 (en) * | 2005-09-21 | 2007-03-22 | Applied Materials, Inc. | Treatment processes for a batch ALD reactor |
| US8993055B2 (en) * | 2005-10-27 | 2015-03-31 | Asm International N.V. | Enhanced thin film deposition |
| US7863198B2 (en) * | 2006-05-18 | 2011-01-04 | Micron Technology, Inc. | Method and device to vary growth rate of thin films over semiconductor structures |
| JP4228008B2 (ja) * | 2006-08-23 | 2009-02-25 | エルピーダメモリ株式会社 | 半導体装置の製造方法 |
| EP2082075B1 (en) | 2006-09-08 | 2017-05-17 | Massachusetts Institute of Technology | Automated layer by layer spray technology |
| US7816278B2 (en) | 2008-03-28 | 2010-10-19 | Tokyo Electron Limited | In-situ hybrid deposition of high dielectric constant films using atomic layer deposition and chemical vapor deposition |
| US9328417B2 (en) * | 2008-11-01 | 2016-05-03 | Ultratech, Inc. | System and method for thin film deposition |
| EP2281921A1 (en) * | 2009-07-30 | 2011-02-09 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Apparatus and method for atomic layer deposition. |
| US8348390B2 (en) * | 2011-05-18 | 2013-01-08 | Xerox Corporation | Enhancing superoleophobicity and reducing adhesion through multi-scale roughness by ALD/CVD technique in inkjet application |
| US20130129922A1 (en) * | 2011-11-21 | 2013-05-23 | Qualcomm Mems Technologies, Inc. | Batch processing for electromechanical systems and equipment for same |
-
2014
- 2014-07-16 WO PCT/US2014/046828 patent/WO2015009811A1/en not_active Ceased
- 2014-07-16 EP EP14826501.0A patent/EP3022329A4/en not_active Withdrawn
- 2014-07-16 JP JP2016527066A patent/JP2016529397A/ja not_active Ceased
- 2014-07-16 KR KR1020167003497A patent/KR20160031517A/ko not_active Withdrawn
- 2014-07-16 CN CN201480040452.0A patent/CN105392919B/zh not_active Expired - Fee Related
- 2014-07-16 US US14/905,223 patent/US10072333B2/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10858737B2 (en) | Showerhead assembly and components thereof | |
| WO2012118952A3 (en) | Apparatus and process for atomic layer deposition | |
| JP2016526587A5 (enExample) | ||
| WO2016014813A3 (en) | Process for preparing multi-layer electrochromic stacks | |
| WO2010065473A3 (en) | Gas distribution blocker apparatus | |
| GB202016154D0 (en) | Polymerizable self-assembled monolayers for use in atomic layer deposition | |
| PH12017501170B1 (en) | Alcrn-based coating providing enhanced crater wear resistance | |
| JP2013508561A5 (enExample) | ||
| MY168293A (en) | Anti-coking catalyst coatings with alumina barrier layer | |
| WO2012075017A3 (en) | Apparatus and process for atomic layer deposition | |
| WO2012027009A3 (en) | Gas distribution showerhead with high emissivity surface | |
| CO2016004864A1 (es) | Métodos y aparatos interactivos de selección y orden de productos de pintura | |
| CL2012000221A1 (es) | Lamina de transferencia que comprende pigmento magnetico opticamente variable, procedimiento de fabricacion, uso de lamina de transferencia y articulo o documento que comprende la misma. | |
| WO2012118887A3 (en) | Apparatus and process for atomic layer deposition | |
| KR20200110464A (ko) | Ald 코팅에 의한 목표 펌프의 내부 보호 | |
| US20140220244A1 (en) | Ald reactor for coating porous substrates | |
| NZ602430A (en) | Die, system, and method for coextruding a plurality of fluid layers | |
| JP2018501405A5 (enExample) | ||
| MX2013011770A (es) | Mejora de perfil de suministro de adhesivo. | |
| WO2016014407A3 (en) | Apparatus and process for face painting substrates with pgm and base metal solutions | |
| Lee et al. | Scale-up design for industrial development of a PP-MOCVD coating system | |
| MY188421A (en) | Polymer coatings and methods for depositing polymer coatings | |
| EP2868723A4 (en) | MATERIAL FOR PRODUCING A SEAMLESS FILM, COATING LIQUID FOR PRODUCING A SEAMLESS FILM, SEALANT ARTICLES, AND METHOD FOR PRODUCING THEREOF | |
| SG11202102152WA (en) | Gas intake device for atomic layer deposition process, and atomic layer deposition apparatus | |
| FR2986720B1 (fr) | Procede de depot de particules sur un substrat, comprenant une etape de structuration d'un film de particules sur un convoyeur liquide |