JP2016526292A - 基板をコーティングする装置及び方法 - Google Patents
基板をコーティングする装置及び方法 Download PDFInfo
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- JP2016526292A JP2016526292A JP2016514308A JP2016514308A JP2016526292A JP 2016526292 A JP2016526292 A JP 2016526292A JP 2016514308 A JP2016514308 A JP 2016514308A JP 2016514308 A JP2016514308 A JP 2016514308A JP 2016526292 A JP2016526292 A JP 2016526292A
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- coating
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B9/00—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour
- B05B9/002—Spraying apparatus for discharge of liquids or other fluent material, without essentially mixing with gas or vapour incorporating means for heating or cooling, e.g. the material to be sprayed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0466—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas
- B05D3/048—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a non-reacting gas for cooling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0486—Operating the coating or treatment in a controlled atmosphere
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0493—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases using vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/002—Pretreatement
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0406—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being air
- B05D3/0426—Cooling with air
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
- Coating Apparatus (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
・PGMEA
・ジエチルエーテル
・イソプロパノール
・ヘキサフルオロエタン
・メシチレン
・エタノール
・プロパノール
・アセトン
・水
である。
・ジエチルエーテル(156.93K)
・アセトン(178.86K)
・イソプロパノール(184.96K)
・ヘキサフルオロエタン(173.08K,26.60kPa)
・水(273.16K,0.6117kPa)。
・真空式サンプルホルダ
・静電気式サンプルホルダ
・磁気式サンプルホルダ
・機械式クランプを備えるサンプルホルダ
・接着面を備えるサンプルホルダ。
2 蒸発曲線又は凝縮曲線
3 融解又は凝固曲線
4 熱処理
5 凍結
6 昇華転移
7 チャンバ
8 収容装置
9 基板
9o 表面
10 冷却ノズル
11 スプレーノズル
12 収容面
13 保持装置
s 固相
l 液相
g 気相
B コーティング
B’コーティング
Claims (11)
- 少なくとも1つのコーティング成分と、少なくとも1つの溶剤とを有するコーティング材料によって、基板(9)の表面(9o)をコーティングする装置であって、
・特に周囲環境よりも低圧になるように調整可能な、圧力が印加されうるチャンバ(7)と、
・前記基板(9)を収容面(12)の上に収容するための収容装置(8)と、
・前記基板(9)をコーティングするためのスプレーノズル(11)と
を備える装置において、
前記装置は、前記収容装置(8)の前記収容面(12)の上に収容された前記基板(9)の少なくとも前記表面(9o)を冷却するための冷却手段を有する
ことを特徴とする、装置。 - 前記冷却手段は、少なくとも1つの冷却ノズル(10)を含み、及び/又は、少なくとも前記収容面(12)において冷却可能な収容装置(8)を含む
ことを特徴とする、請求項1記載の装置。 - 前記冷却ノズル(10)は、前記収容面(12)の上側に配置可能であるか、又は配置されている
ことを特徴とする、請求項2記載の装置。 - 前記装置は、特にソフトウェアによってサポートされた制御装置を含み、
前記制御装置によって前記スプレーノズル(11)と前記冷却手段とを、特に別個に制御可能である
ことを特徴とする、請求項1から3のいずれか一項記載の装置。 - 前記基板(9)の少なくとも前記表面(9o)が、前記コーティング時に、前記コーティング材料の液相から固相への相転移温度を下回る温度を有するように、前記制御装置によって前記冷却手段が制御されている
ことを特徴とする、請求項4記載の装置。 - 前記コーティング後に、特に温度が近似的に不変である場合には、前記溶剤の固相から気相への相境界を越えるように、その一方で、前記コーティング成分の固相から気相への相境界は越えないように、前記チャンバ(7)内の圧力を降下させるよう、前記制御装置によって制御される圧力印加手段が制御される
ことを特徴とする、請求項4又は5記載の装置。 - 前記装置は、前記基板(9)の前記表面(9o)及び/又は前記収容面(12)における温度を測定するための測定手段、及び/又は、前記チャンバ(7)内の圧力を測定するための測定手段を有する
ことを特徴とする、請求項1から6のいずれか一項記載の装置。 - 少なくとも1つのコーティング成分と、少なくとも1つの溶剤とを有するコーティング材料によって、基板(9)の表面(9o)をコーティングする方法であって、
前記基板(9)の少なくとも前記表面(9o)を、コーティング中に冷却する
方法。 - 前記コーティング中に、前記圧力と、前記表面(9o)における温度とを、制御装置によって制御する
請求項8記載の方法。 - 前記基板(9)の少なくとも前記表面(9o)は、前記コーティング時に、前記コーティング材料の液相から固相への相転移温度を下回る温度を有する
請求項8記載の方法。 - 前記コーティング後に、特に前記表面(9o)における温度が近似的に不変である場合には、前記溶剤の固相から気相への相境界を越えるように、その一方で、前記コーティング成分の固相から気相への相境界は越えないように、前記制御装置によって前記圧力を増加させる
請求項9又は10記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102013105320.3A DE102013105320A1 (de) | 2013-05-23 | 2013-05-23 | Vorrichtung und Verfahren zum Beschichten eines Substrats |
DE102013105320.3 | 2013-05-23 | ||
PCT/EP2014/056539 WO2014187600A1 (de) | 2013-05-23 | 2014-04-01 | Vorrichtung und verfahren zum beschichten eines substrats |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016526292A true JP2016526292A (ja) | 2016-09-01 |
JP6360160B2 JP6360160B2 (ja) | 2018-07-18 |
Family
ID=50424250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016514308A Active JP6360160B2 (ja) | 2013-05-23 | 2014-04-01 | 基板をコーティングする装置及び方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US9962721B2 (ja) |
JP (1) | JP6360160B2 (ja) |
KR (1) | KR102160846B1 (ja) |
CN (1) | CN105377452B (ja) |
AT (1) | AT520565B1 (ja) |
DE (1) | DE102013105320A1 (ja) |
SG (1) | SG11201509621VA (ja) |
TW (1) | TWI668052B (ja) |
WO (1) | WO2014187600A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3054338A1 (en) * | 2015-02-04 | 2016-08-10 | Georg-August-Universität Göttingen Stiftung Öffentlichen Rechts | Mounting device for a sample and method for removing a sample |
KR20230087612A (ko) * | 2016-09-29 | 2023-06-16 | 에베 그룹 에. 탈너 게엠베하 | 2개의 기판을 접합하기 위한 장치 및 방법 |
CN106423734B (zh) * | 2016-10-26 | 2022-05-10 | 广东工业大学 | 一种喷射点胶装置及工艺 |
KR102125141B1 (ko) * | 2017-09-22 | 2020-06-19 | 가부시키가이샤 스크린 홀딩스 | 기판 처리 방법 및 기판 처리 장치 |
US10994300B2 (en) * | 2018-11-27 | 2021-05-04 | Service Support Specialties, Inc | Method and/or system for coating a substrate |
CN113926603A (zh) * | 2021-11-19 | 2022-01-14 | 刘常青 | 一种家具油漆雾化敷涂装置 |
Citations (6)
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JPH07320999A (ja) * | 1993-03-25 | 1995-12-08 | Tokyo Electron Ltd | 塗布膜形成方法及びその装置 |
US20040048002A1 (en) * | 2002-09-11 | 2004-03-11 | Shifflette J. Michael | Method for coating objects |
JP2005342641A (ja) * | 2004-06-04 | 2005-12-15 | Matsushita Electric Ind Co Ltd | 液体の塗布装置及び塗布方法 |
JP2008053355A (ja) * | 2006-08-23 | 2008-03-06 | Tokyo Electron Ltd | 塗布処理方法、プログラム、コンピュータ読み取り可能な記録媒体及び塗布処理装置 |
JP2011005404A (ja) * | 2009-06-25 | 2011-01-13 | Dainippon Screen Mfg Co Ltd | 配線形成装置、配線形成方法および配線形成用材料 |
JP2011183385A (ja) * | 2011-04-04 | 2011-09-22 | Shibaura Mechatronics Corp | 溶液の塗布装置及び塗布方法 |
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-
2013
- 2013-05-23 DE DE102013105320.3A patent/DE102013105320A1/de not_active Ceased
-
2014
- 2014-04-01 JP JP2016514308A patent/JP6360160B2/ja active Active
- 2014-04-01 AT ATA9159/2014A patent/AT520565B1/de active
- 2014-04-01 SG SG11201509621VA patent/SG11201509621VA/en unknown
- 2014-04-01 WO PCT/EP2014/056539 patent/WO2014187600A1/de active Application Filing
- 2014-04-01 CN CN201480029673.8A patent/CN105377452B/zh active Active
- 2014-04-01 KR KR1020157031633A patent/KR102160846B1/ko active IP Right Grant
- 2014-04-01 US US14/785,731 patent/US9962721B2/en active Active
- 2014-04-25 TW TW103115075A patent/TWI668052B/zh active
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JPH07320999A (ja) * | 1993-03-25 | 1995-12-08 | Tokyo Electron Ltd | 塗布膜形成方法及びその装置 |
US20040048002A1 (en) * | 2002-09-11 | 2004-03-11 | Shifflette J. Michael | Method for coating objects |
JP2005342641A (ja) * | 2004-06-04 | 2005-12-15 | Matsushita Electric Ind Co Ltd | 液体の塗布装置及び塗布方法 |
JP2008053355A (ja) * | 2006-08-23 | 2008-03-06 | Tokyo Electron Ltd | 塗布処理方法、プログラム、コンピュータ読み取り可能な記録媒体及び塗布処理装置 |
JP2011005404A (ja) * | 2009-06-25 | 2011-01-13 | Dainippon Screen Mfg Co Ltd | 配線形成装置、配線形成方法および配線形成用材料 |
JP2011183385A (ja) * | 2011-04-04 | 2011-09-22 | Shibaura Mechatronics Corp | 溶液の塗布装置及び塗布方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20160016774A (ko) | 2016-02-15 |
AT520565A5 (de) | 2019-05-15 |
SG11201509621VA (en) | 2015-12-30 |
DE102013105320A1 (de) | 2014-11-27 |
TWI668052B (zh) | 2019-08-11 |
TW201501806A (zh) | 2015-01-16 |
JP6360160B2 (ja) | 2018-07-18 |
CN105377452B (zh) | 2018-09-25 |
AT520565B1 (de) | 2019-06-15 |
WO2014187600A1 (de) | 2014-11-27 |
KR102160846B1 (ko) | 2020-09-29 |
CN105377452A (zh) | 2016-03-02 |
US20160082453A1 (en) | 2016-03-24 |
US9962721B2 (en) | 2018-05-08 |
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